公开(公告)号：US07511886B2

公开(公告)日：2009-03-31

申请号：US11271976

申请日：2005-11-14

申请人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

发明人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72

CPC分类号： G03F7/70183 ,  G02B5/32 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/095 ,  G02B27/0977 ,  G03F7/70108 ,  G03F7/70566

摘要： An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include a transformation element causing a radial redistribution of light intensity and having a transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include an optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface.

摘要翻译： 光束变换系统具有沿着光束转换系统的光轴布置的一系列光学元件，其被设计用于将入射光束分布到光束转换系统的入射面上，使得入射光分布从出射表面出射的出射光分布 的光束转换系统通过光强度的径向再分布。 光学元件包括变换元件，其导致光强度的径向重新分布并且具有相对于光轴倾斜的变换表面，并且根据转变表面的效率对称特性引起入射在相变表面上的光分布的偏振选择反射 。 光学元件还包括光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，在变换表面处实现由偏振选择反射引起的透射不均匀性的空间依赖补偿。

公开(公告)号：US20060164619A1

公开(公告)日：2006-07-27

申请号：US11316160

申请日：2005-12-21

申请人： Stephan Back ,  Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Schwaer ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Stephan Back ,  Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Schwaer ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70258

摘要： An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 所述线性驱动器具有至少一个移动元件，所述移动元件具有剪切部分和提升部分。 所述剪切部分被布置成移动光学元件，并且所述提升部分被布置成移动所述剪切部分。 所述线性驱动器具有支撑元件，该支撑元件在剪切部分被提升部分移动的同时与光学元件接触并防止其移动。

公开(公告)号：US07079331B2

公开(公告)日：2006-07-18

申请号：US11109316

申请日：2005-04-19

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

IPC分类号： G02B7/02 ,  G02B27/10 ,  G02B27/14 ,  G02B7/18 ,  G02F1/01

CPC分类号： G03F7/70825 ,  G02B7/008 ,  G02B7/1805 ,  G03F7/70891

摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件

公开(公告)号：US20060012893A1

公开(公告)日：2006-01-19

申请号：US10530689

申请日：2003-08-13

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer

IPC分类号： G02B7/02

CPC分类号： G03F9/7096 ,  G02B7/004 ,  G02B7/023 ,  G03F7/70833

摘要： An objective, in particular a projection objective in microlithography for producing semiconductor components, is assembled from a number of individual housing structures (4, 5), optical elements being arranged in each housing structure (4, 5), and a number of optical axes (15, 16, 18, 35) being formed by the housing structures (4, 5). At least one first housing structure (4) is provided with seats (22, 23, 24, 25) on which one or more further housing structures (5) and/or optical subassemblies (6, 8, 11, 14) are adjusted and are connected to the first housing structure (4).

摘要翻译： 特别是用于制造半导体部件的微光刻中的投影物镜的目的是从多个单独的外壳结构（4,5）组装，设置在每个外壳结构（4,5）中的光学元件，以及多个光轴 （15,16,18，35）由所述壳体结构（4,5）形成。 至少一个第一壳体结构（4）设置有座（22,23,24,25），其上调整了一个或多个另外的壳体结构（5）和/或光学子组件（6,8,11,14），并且 连接到第一壳体结构（4）。

公开(公告)号：US20050264786A1

公开(公告)日：2005-12-01

申请号：US11101235

申请日：2005-04-07

申请人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G02B7/02 ,  G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

公开(公告)号：US20050254773A1

公开(公告)日：2005-11-17

申请号：US11185066

申请日：2005-07-20

申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B6/00

CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

公开(公告)号：US06728021B1

公开(公告)日：2004-04-27

申请号：US10299032

申请日：2002-11-18

申请人： Alexander Kohl ,  Hubert Holderer

发明人： Alexander Kohl ,  Hubert Holderer

IPC分类号： G02F103

CPC分类号： G03F7/70966

摘要： High precision optical components, for example CaF2 lenses in lithographic systems for the production of integrated circuits, often suffer from stress induced birefringence and other imperfections. For altering the optical properties in a confined region of the optical component, the latter is exposed to a beam of ions having an energy preferably in the order 100 MeV/u. This results in a modification of the optical properties due to an interaction of the ions with the surrounding medium the optical component consists of. By carefully choosing the parameters of the process, it is possible to alter the refractive index or the mechanical stress distribution or other optical properties within a confined region of this medium.

摘要翻译： 高精度光学元件，例如用于生产集成电路的光刻系统中的CaF 2透镜，经常遭受应力引起的双折射和其它缺陷。 为了改变光学部件的限制区域中的光学性质，后者被暴露于具有优选为100MeV / u的量级的能量的离子束。 这导致由于离子与光学部件组成的周围介质的相互作用而导致的光学性质的改变。 通过仔细选择该过程的参数，可以改变该介质的限制区域内的折射率或机械应力分布或其他光学性质。

公开(公告)号：US09223226B2

公开(公告)日：2015-12-29

申请号：US13325734

申请日：2011-12-14

申请人： Alexander Kohl

发明人： Alexander Kohl

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70091 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70466 ,  G03F7/70566

摘要： Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

公开(公告)号：US08085382B2

公开(公告)日：2011-12-27

申请号：US11777845

申请日：2007-07-13

申请人： Alexander Kohl

发明人： Alexander Kohl

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70091 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70466 ,  G03F7/70566

摘要： Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

摘要翻译： 公开了诸如微光刻投影曝光设备照明光学器件的光学元件，以及相关的系统，方法，部件和装置。

公开(公告)号：US20090040487A1

公开(公告)日：2009-02-12

申请号：US12247597

申请日：2008-10-08

申请人： Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schongart ,  Markus Neumaier ,  Barbel Trossbach ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schongart ,  Markus Neumaier ,  Barbel Trossbach ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/42

CPC分类号： G03F7/70258 ,  G03F7/70825

摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。