公开(公告)号：US20060121195A1

公开(公告)日：2006-06-08

申请号：US11327447

申请日：2006-01-09

申请人： Ryujiro Udo ,  Masatsugu Arai ,  Masanori Kadotani

发明人： Ryujiro Udo ,  Masatsugu Arai ,  Masanori Kadotani

IPC分类号： C23C14/32 ,  C23C16/00 ,  C23C14/00

CPC分类号： H01L21/67069 ,  C25D11/005 ,  C25D11/026 ,  C25D11/04 ,  H01J37/32082 ,  H01L21/6831 ,  H01L21/6833

摘要： An electrostatic chuck comprising an insulating base 6, a plurality of conductive aluminum thin films 4a, 4b deposited on the surface of the base, and alumite films 2a, 2b formed by anodizing the surfaces of the conductive thin films 4a, 4b, wherein the conductive thin films 4a, 4b are each provided with a DC voltage of a different polarity so that a surface chucking a wafer 7 is electrostatically bipolar.

摘要翻译： 一种静电卡盘，其包括绝缘基体6，沉积在基底表面上的多个导电铝薄膜4a，4b和通过阳极氧化导电薄膜4a的表面形成的耐酸铝膜2a， 如图4b所示，其中导电薄膜4a，4b分别具有不同极性的DC电压，使得夹持晶片7的表面是静电双极的。

公开(公告)号：US20050045104A1

公开(公告)日：2005-03-03

申请号：US10795350

申请日：2004-03-09

申请人： Masatsugu Arai ,  Ryujiro Udo ,  Seiichiro Kanno ,  Tsuyoshi Yoshida

发明人： Masatsugu Arai ,  Ryujiro Udo ,  Seiichiro Kanno ,  Tsuyoshi Yoshida

IPC分类号： F25B1/00 ,  H01L21/00 ,  H01L21/3065 ,  C23C16/00

CPC分类号： H01L21/67248 ,  H01J37/32082 ,  H01J2237/2001 ,  H01L21/67109

摘要： A plasma processing apparatus having an electrostatic chucking electrode that allows temperature control of a semiconductor wafer during etching process with high efficiency comprises: a holder stage comprising an electrode block S having a dielectric film 4 on the surface thereof and a coolant flow passage 6 therein, in which temperature control is performed while holding a semiconductor wafer W on the dielectric film on the surface of the electrode block; and a cooling cycle 50 including a compressor 52, a condenser 55, an expansion valve 53, a heat exchanger 54 having a heater built therein, and an evaporator, wherein the temperature control of the electrode block S is performed by using a direct-expansion-type temperature controller in which the electrode block S is used as the evaporator of the cooling cycle, and the coolant is directly circulated and expanded inside the electrode block.

摘要翻译： 一种具有静电夹持电极的等离子体处理装置，其能够高效率地进行蚀刻处理时的半导体晶片的温度控制，包括：保持台，其具有在其表面具有电介质膜4的电极块S和冷却剂流路6， 在将半导体晶片W保持在电极块的表面上的电介质膜上的同时进行温度控制; 以及包括压缩机52，冷凝器55，膨胀阀53，内置加热器的热交换器54和蒸发器的冷却循环50，其中，电极块S的温度控制通过使用直接膨胀 型温度控制器，其中电极块S用作冷却循环的蒸发器，并且冷却剂在电极块内直接循环和膨胀。

公开(公告)号：US06838833B2

公开(公告)日：2005-01-04

申请号：US10670288

申请日：2003-09-26

申请人： Masatsugu Arai ,  Ryujiro Udo ,  Naoyuki Tamura ,  Masanori Kadotani ,  Motohiko Yoshigai

发明人： Masatsugu Arai ,  Ryujiro Udo ,  Naoyuki Tamura ,  Masanori Kadotani ,  Motohiko Yoshigai

IPC分类号： H01J37/32 ,  H01L21/00 ,  H01L21/683 ,  H01J7/24

CPC分类号： H01L21/67109 ,  H01J37/32724 ,  H01J2237/2001 ,  H01L21/6833

摘要： A plasma processing apparatus provided with a holding stage of a system in which a temperature of an electrode block is controlled so as to control the temperature of a semiconductor wafer. The electrode block is provided with at least first and second independent temperature controllers on inner and outer sides thereof, and a slit for suppressing heat transfer is provided in the electrode block between the first and second temperature controllers.

摘要翻译： 一种等离子体处理装置，其具有控制电极块的温度以控制半导体晶片的温度的系统的保持台。 电极块在其内侧和外侧设置有至少第一和第二独立温度控制器，并且在第一和第二温度控制器之间的电极块中设置用于抑制热传递的狭缝。

公开(公告)号：US06756737B2

公开(公告)日：2004-06-29

申请号：US10143790

申请日：2002-05-14

申请人： Akira Doi ,  Ken Yoshioka ,  Manabu Edamura ,  Hideyuki Kazumi ,  Saburou Kanai ,  Tsutomu Tetsuka ,  Masatsugu Arai ,  Kenji Maeda ,  Tsunehiko Tsubone

发明人： Akira Doi ,  Ken Yoshioka ,  Manabu Edamura ,  Hideyuki Kazumi ,  Saburou Kanai ,  Tsutomu Tetsuka ,  Masatsugu Arai ,  Kenji Maeda ,  Tsunehiko Tsubone

IPC分类号： H01J724

CPC分类号： H01J37/32091 ,  H01J37/32082 ,  H01J37/321

摘要： The main purpose of the present invention is to suppress deposition of byproducts on an inner wall of a vacuum chamber during wafer processing using plasma generated by an inductive coupling antenna and an electrostatic capacitive coupling antenna which are connected in series at a connection point. Deposition of byproducts on the inner wall of the vacuum chamber can be suppressed by grounding the connection point of the inductive coupling antenna and the electrostatic capacitive coupling antenna via a variable-impedance load and varying an impedance of the variable-impedance load, thereby controlling a ratio of plasma produced in the chamber by electrostatic capacitive coupling discharge.

摘要翻译： 本发明的主要目的是在使用在连接点处串联连接的电感耦合天线和静电电容耦合天线产生的等离子体的晶片处理期间，抑制副产物在真空室的内壁上的沉积。 通过可变阻抗负载接地电感耦合天线和静电电容耦合天线的连接点并改变可变阻抗负载的阻抗，可以抑制真空室内壁上的副产物的沉积，从而控制 通过静电电容耦合放电在室内产生的等离子体的比例。

公开(公告)号：US06499424B2

公开(公告)日：2002-12-31

申请号：US09909879

申请日：2001-07-23

申请人： Hideyuki Kazumi ,  Tsutomu Tetsuka ,  Ryoji Nishio ,  Masatsugu Arai ,  Ken Yoshioka ,  Tsunehiko Tsubone ,  Akira Doi ,  Manabu Edamura ,  Kenji Maeda ,  Saburo Kanai

发明人： Hideyuki Kazumi ,  Tsutomu Tetsuka ,  Ryoji Nishio ,  Masatsugu Arai ,  Ken Yoshioka ,  Tsunehiko Tsubone ,  Akira Doi ,  Manabu Edamura ,  Kenji Maeda ,  Saburo Kanai

IPC分类号： H05H100

CPC分类号： H01J37/32174 ,  H01J37/32009 ,  H01J37/321

摘要： A plasma is generated by feeding an antenna with radio-frequency electric power generated by a radio-frequency power source, and one end of the antenna is grounded to the earth through a capacitor of variable capacitance. A Faraday shield is electrically isolated from the earth, and the capacitance of the variable capacitor is determined to be such a value that the voltage at the two ends of the antenna may be equal in absolute values and inverted to reduce the partial removal of the wall after the plasma ignition. At the time of igniting the plasma, the capacitance of the capacitor is adjusted to a larger or smaller value than that minimizing the damage of the wall.

公开(公告)号：US08568916B2

公开(公告)日：2013-10-29

申请号：US12269081

申请日：2008-11-12

申请人： Kenji Nakai ,  Akinori Tada ,  Masatsugu Arai ,  Kinya Aota

发明人： Kenji Nakai ,  Akinori Tada ,  Masatsugu Arai ,  Kinya Aota

IPC分类号： H01M2/26

CPC分类号： H01M10/0525 ,  H01M2/263 ,  H01M10/0431 ,  H01M10/0587 ,  Y02T10/7011 ,  Y10T29/49108

摘要： A lithium ion secondary battery comprises a case; a positive electrode foil having a current collector foil on which a positive electrode material is coated; an negative electrode film having a current collector film on which an negative electrode material is coated; a separator sandwiched between the positive electrode film and the negative electrode film, the films and the separator being arranged in multiple layers to form a group of electrodes enclosed in the case, a positive collector disc plate connected to the positive electrode side of the group of the electrodes, and an negative collector disc plate connected to the negative electrode side of the group of the electrodes. Each of the current collector foils has a non-coated portion extended along one side of the foils, a part or the entire of the non-coated portion being exposed from a side of the separator. At least one of the collector disc plate is welded to the side of the exposed non-coated portion of the group of the electrodes. The periphery of the collector disc plate has an annular portion, which is bent towards the group of electrodes.

摘要翻译： 锂离子二次电池包括壳体; 具有集电箔的正极箔，其上涂覆有正极材料; 具有集电体膜的负极膜，其上涂覆有负极材料; 夹在正极膜和负极膜之间的隔膜，膜和隔膜被布置成多层以形成封闭在壳体中的一组电极，正极集电板盘连接到正极集电体的正极侧 所述电极和与所述电极组的负极侧连接的负极集电板。 每个集电箔具有沿箔的一侧延伸的未涂覆部分，未涂覆部分的一部分或全部从分离器的侧面露出。 集电盘片中的至少一个焊接到该组电极的暴露未涂覆部分的一侧。 集电盘片的周边具有朝向该组电极弯曲的环形部分。

公开(公告)号：US20110202250A1

公开(公告)日：2011-08-18

申请号：US13060579

申请日：2009-10-09

申请人： Ayumu Miyajima ,  Masatsugu Arai ,  Toshiyuki Innami ,  Kimio Nishino ,  Norikazu Matsuzaki ,  Masayuki Kikawa ,  Makoto Yamakado

发明人： Ayumu Miyajima ,  Masatsugu Arai ,  Toshiyuki Innami ,  Kimio Nishino ,  Norikazu Matsuzaki ,  Masayuki Kikawa ,  Makoto Yamakado

IPC分类号： B60T8/172

CPC分类号： B60T13/746 ,  B60T7/06 ,  B60T2220/06

摘要： Disclosed is a brake control apparatus which includes a brake booster for augmenting deceleration, and which addresses the problem in conventional brake control apparatuses that deceleration and pedal reaction force depend on driver brake pedal input, and thus the pedal response and the ride comfort from the feeling of deceleration are affected by the manner in which the brake pedal is actuated by the driver. The brake control apparatus comprises a pedal reaction force generation unit for generating a pedal reaction force on the brake pedal, and a brake control unit for controlling the brake force in such a way as to suppress driver brake input fluctuations, wherein the pedal reaction force generation unit suppresses pedal reaction force fluctuations in accordance with specific deceleration and pedal reaction force characteristics. The brake control apparatus further comprises a calculation unit for calculating a target deceleration on the basis of lateral acceleration information in the left-to-right direction of the vehicle, wherein the brake control unit suppresses the brake force in such a way that the target deceleration is produced and, when the amount by which the brake pedal is depressed reaches a specific amount in respect of the target deceleration, the pedal reaction force generated by the pedal reaction force generation unit may be increased.

摘要翻译： 公开了一种制动控制装置，其包括用于增加减速度的制动助力器，并且其解决了传统的制动控制装置中的减速和踏板反作用力取决于驾驶员制动踏板输入的问题，并且因此解决了来自感觉的踏板响应和乘坐舒适性 减速度受驾驶员制动踏板致动的方式的影响。 制动控制装置包括用于在制动踏板上产生踏板反作用力的踏板反作用力产生单元和用于控制制动力的制动控制单元，以抑制驾驶员制动输入波动，其中踏板反作用力产生 单位根据具体的减速度和踏板反作用力特性抑制踏板反作用力波动。 制动控制装置还包括：计算单元，其基于车辆的左右方向上的横向加速度信息计算目标减速度，其中，制动控制单元以这样的方式抑制制动力，使得目标减速度 并且当制动踏板被压下的量相对于目标减速度达到特定量时，可以增加由踏板反作用力产生单元产生的踏板反作用力。

公开(公告)号：US07989107B2

公开(公告)日：2011-08-02

申请号：US12057347

申请日：2008-03-27

申请人： Kenji Nakai ,  Akinori Tada ,  Seiichi Sato ,  Masatsugu Arai

发明人： Kenji Nakai ,  Akinori Tada ,  Seiichi Sato ,  Masatsugu Arai

IPC分类号： H01M4/02 ,  H01M4/13 ,  H01M2/16 ,  H01M2/18 ,  H01M2/26 ,  H01M2/28

CPC分类号： H01M10/0525 ,  H01M2/263 ,  H01M10/0431 ,  H01M10/0587 ,  Y02T10/7011

摘要： A lithium-ion secondary battery where a current collecting member and a foil are joined to each other securely while damage of the foil is suppressed is provided. The lithium-ion secondary battery is provided with a winding group obtained by winding a positive electrode plate and a negative electrode plate via a separator. An end portion of a positive electrode mixture non-application portion and an end portion of a negative electrode mixture non-application portion project at an upper portion and a lower portion of the winding group, respectively. Current collecting disks 7 are disposed so as to face both end faces of the winding group, respectively. The current collecting disk 7 has projecting ridge portions 8 on a face thereof opposite to the winding group and flat face portions facing the winding group at positions corresponding to the projecting ridge portions 8. The projecting ridge portions 8 are formed radially. The end portion of the positive electrode mixture non-application portion and the end portion of the negative electrode mixture non-application portion are caused to abut on the flat face portions of the current collecting disks 7 and joining is performed by irradiating the projecting ridge portions 8 with laser beam. The flat face portions of the current collecting disks 7 abut on the end portion of the positive electrode mixture non-application portion and the end portion of the negative electrode mixture non-application portion approximately evenly.

摘要翻译： 提供了一种锂电池，其中集电构件和箔片在损坏箔片的同时牢固地彼此接合。 锂离子二次电池具有经由隔板卷绕正极板和负极板而获得的绕组。 正极混合物非施加部分的端部和负极混合物非施加部分的端部分别在绕组的上部和下部突出。 集电盘7分别设置成面对卷绕组的两个端面。 集电盘7在与突出脊部8相对的位置上具有与绕组组相对的面上的突出脊部8和与突出脊部8对应的位置处的卷绕组的平面部。突出脊部8径向地形成。 使正极混合物非施加部分的端部和负极混合物非施加部分的端部抵接在集电盘7的平面部分上，并且通过照射突出脊部分 8带激光束。 集电盘7的平面部分大致均匀地抵接在正极混合物非施加部分的端部和负极混合物非施加部分的端部。

公开(公告)号：US20080182166A1

公开(公告)日：2008-07-31

申请号：US12018619

申请日：2008-01-23

申请人： Kinya AOTA ,  Kenji Nakai ,  Masatsugu Arai ,  Akinori Tada

发明人： Kinya AOTA ,  Kenji Nakai ,  Masatsugu Arai ,  Akinori Tada

IPC分类号： H01M10/36 ,  B23K28/00

CPC分类号： H01M2/263 ,  H01M10/0431 ,  H01M10/0587 ,  Y10T29/49108 ,  Y10T29/49114

摘要： In a secondary battery, for providing a structure which can enable a welding operation even when a gap is formed between a current collecting plate and a winding assembly, recessed portions are formed in a positive current collecting plate. The recessed portions are disposed opposite to the winding assembly. A laser beam is irradiated to welding protrusions located between the recessed portions to melt the welding protrusions. Here, since the end surface of a positive electrode foil is uneven in height, the positive electrode foil does not contact the positive current collecting plate necessarily. The welding operation is performed by heating, melting, and dropping the welding protrusions by the use of a YAG laser under the welding condition of a laser power of 900 W and a welding speed 2 m/min.

摘要翻译： 在二次电池中，为了提供即使在集电板和绕组组件之间形成间隙也能进行焊接操作的结构，在正极集电板中形成有凹部。 凹部设置成与卷绕组件相对。 将激光束照射到位于凹部之间的焊接突起，以熔化焊接突起。 这里，由于正极箔的端面高度不均匀，所以正极箔不必接触正极集电板。 在900W的激光功率和2m / min的焊接速度的焊接条件下，通过使用YAG激光器对焊接突起进行加热，熔化，滴下，进行焊接作业。

公开(公告)号：US20080017107A1

公开(公告)日：2008-01-24

申请号：US11798646

申请日：2007-05-15

申请人： Masatsugu Arai ,  Ryujiro Udo ,  Seiichiro Kanno ,  Tsuyoshi Yoshida

发明人： Masatsugu Arai ,  Ryujiro Udo ,  Seiichiro Kanno ,  Tsuyoshi Yoshida

IPC分类号： C23C16/00

CPC分类号： H01L21/67248 ,  H01J37/32082 ,  H01J2237/2001 ,  H01L21/67109

摘要： A plasma processing apparatus having an electrostatic chucking electrode that allows temperature control of a semiconductor wafer during etching process with high efficiency comprises: a holder stage comprising an electrode block S having a dielectric film 4 on the surface thereof and a coolant flow passage 6 therein, in which temperature control is performed while holding a semiconductor wafer W on the dielectric film on the surface of the electrode block; and a cooling cycle 50 including a compressor 52, a condenser 55, an expansion valve 53, a heat exchanger 54 having a heater built therein, and an evaporator, wherein the temperature control of the electrode block S is performed by using a direct-expansion-type temperature controller in which the electrode block S is used as the evaporator of the cooling cycle, and the coolant is directly circulated and expanded inside the electrode block.

摘要翻译： 一种具有静电夹持电极的等离子体处理装置，其能够高效率地进行蚀刻处理时的半导体晶片的温度控制，包括：保持台，其具有在其表面具有电介质膜4的电极块S和冷却剂流路6， 在将半导体晶片W保持在电极块的表面上的电介质膜上的同时进行温度控制; 以及包括压缩机52，冷凝器55，膨胀阀53，内置加热器的热交换器54和蒸发器的冷却循环50，其中，电极块S的温度控制通过使用直接膨胀 型温度控制器，其中电极块S用作冷却循环的蒸发器，并且冷却剂在电极块内直接循环和膨胀。