Semiconductor etching apparatus
    21.
    发明申请
    Semiconductor etching apparatus 有权
    半导体蚀刻装置

    公开(公告)号:US20080066867A1

    公开(公告)日:2008-03-20

    申请号:US11709400

    申请日:2007-02-22

    IPC分类号: C23F1/00

    CPC分类号: H01L21/68735 H01L21/6831

    摘要: There is provided a semiconductor etching apparatus which removes particles remaining on the upper surface of an electro static chuck (ESC) during an etching process, thereby preventing a chucking force from decreasing and minimizing a leak of helium. To prevent a failure of the etching process due to a wafer chucking failure, by preventing polymers from falling down on the upper part of the ESC when a wafer is dechucked or transferred, the semiconductor etching apparatus comprises: an ESC selectively holding a wafer to be entered and positioned inside a chamber, and including a lower electrode part to which RF power is applied; parts positioned at a stepped portion of the ESC and respectively surrounding a side of the ESC; and a gas flow blocking part blocking a gas flow in a vacuum path formed between the ESC and the parts.

    摘要翻译: 提供了一种半导体蚀刻装置,其在蚀刻过程中除去静电卡盘(ESC)的上表面上残留的颗粒,从而防止夹紧力降低并使氦泄漏最小化。 为了防止由于晶片夹紧故障引起的蚀刻工艺的故障,通过在晶片脱扣或转印时防止聚合物落下于ESC的上部,半导体蚀刻装置包括:选择性地保持晶片的ESC 进入并定位在室内,并且包括施加RF功率的下电极部分; 位于ESC的阶梯部分并分别围绕ESC的一侧的部件; 以及阻塞在ESC和部件之间形成的真空路径中的气流的气流阻塞部。

    Semiconductor etching apparatus
    22.
    发明授权
    Semiconductor etching apparatus 有权
    半导体蚀刻装置

    公开(公告)号:US07764483B2

    公开(公告)日:2010-07-27

    申请号:US11709400

    申请日:2007-02-22

    IPC分类号: H02N13/00

    CPC分类号: H01L21/68735 H01L21/6831

    摘要: There is provided a semiconductor etching apparatus which removes particles remaining on the upper surface of an electro static chuck (ESC) during an etching process, thereby preventing a chucking force from decreasing and minimizing a leak of helium. To prevent a failure of the etching process due to a wafer chucking failure, by preventing polymers from falling down on the upper part of the ESC when a wafer is dechucked or transferred, the semiconductor etching apparatus comprises: an ESC selectively holding a wafer to be entered and positioned inside a chamber, and including a lower electrode part to which RF power is applied; parts positioned at a stepped portion of the ESC and respectively surrounding a side of the ESC; and a gas flow blocking part blocking a gas flow in a vacuum path formed between the ESC and the parts.

    摘要翻译: 提供了一种半导体蚀刻装置,其在蚀刻过程中除去静电卡盘(ESC)的上表面上残留的颗粒,从而防止夹紧力降低并使氦泄漏最小化。 为了防止由于晶片夹紧故障引起的蚀刻工艺的故障,通过在晶片脱扣或转印时防止聚合物落下于ESC的上部,半导体蚀刻装置包括:选择性地保持晶片的ESC 进入并定位在室内,并且包括施加RF功率的下电极部分; 位于ESC的阶梯部分并分别围绕ESC的一侧的部件; 以及阻塞在ESC和部件之间形成的真空路径中的气流的气流阻塞部。

    Access network selection apparatus and method in a heterogeneous system
    24.
    发明申请
    Access network selection apparatus and method in a heterogeneous system 审中-公开
    异构系统中的接入网络选择装置和方法

    公开(公告)号:US20050070280A1

    公开(公告)日:2005-03-31

    申请号:US10948201

    申请日:2004-09-24

    CPC分类号: H04W48/18 H04W88/06

    摘要: An apparatus and method for connecting to one of different types of access networks in a heterogeneous network system in which the access networks overlap each other. The apparatus and method include attempting to connect to one of said one or more access networks according to a preset priority and receiving a communication service through the access network when a connection to the access network is successful; and attempting to connect to an access network having a next priority according to the preset priority when the connection to the access network is unsuccessful.

    摘要翻译: 一种用于连接到其中接入网络彼此重叠的异构网络系统中的不同类型的接入网络之一的装置和方法。 所述装置和方法包括:当与所述接入网络的连接成功时,根据预设优先级尝试连接到所述一个或多个接入网络之一并通过所述接入网络接收通信服务; 并且当与接入网络的连接不成功时,尝试根据预设优先级连接到具有下一优先级的接入网络。

    RF matching unit
    26.
    发明授权
    RF matching unit 有权
    射频匹配单元

    公开(公告)号:US06816029B2

    公开(公告)日:2004-11-09

    申请号:US09935582

    申请日:2001-08-24

    IPC分类号: H03H738

    摘要: An apparatus for matching the impedance of an RF generator to the impedance of an RF load, for use in manufacturing semiconductor devices by using a plasma. The apparatus includes a variable inductor coupled to a variable capacitor and an invariable capacitor, the variable inductor having two inductors coupled electrically with each other in series and disposed adjacent to each other. At least one of the two inductors is disposed movably to make the magnetic flux of the one inductor interfere with the magnetic flux of the other inductor, thereby to control the inductance of the variable inductor. In the case of a plasma enhanced semiconductor wafer processing system, the apparatus can reduce the time necessary to achieve an RF match between the RF generator and the RF load, thereby increasing the life of the apparatus.

    摘要翻译: 一种用于将RF发生器的阻抗与RF负载的阻抗相匹配的装置,用于通过使用等离子体制造半导体器件。 该装置包括耦合到可变电容器和不变电容器的可变电感器,该可变电感器具有串联并彼此相邻布置的彼此电耦合的两个电感器。 两个电感器中的至少一个被可移动地设置,以使一个电感器的磁通量与另一个电感器的磁通量相互干扰,从而控制可变电感器的电感。 在等离子体增强半导体晶片处理系统的情况下,该装置可以减少在RF发生器和RF负载之间实现RF匹配所需的时间,从而延长设备的使用寿命。

    Method of and an apparatus for regulating the temperature of an electrostatic chuck
    27.
    发明授权
    Method of and an apparatus for regulating the temperature of an electrostatic chuck 有权
    用于调节静电卡盘的温度的方法和装置

    公开(公告)号:US06684652B2

    公开(公告)日:2004-02-03

    申请号:US10134729

    申请日:2002-04-30

    IPC分类号: F25D1702

    摘要: A refrigeration system regulates the temperature of an electrostatic wafer chuck disposed in a process chamber. The refrigeration system includes a heat exchanger disposed in a heat exchange relationship with the electrostatic chuck, a refrigerator, a temperature sensor, and a temperature controller for controlling the refrigerator to cool the coolant withdrawn from the heat exchanger to a desired temperature in response to the temperature detected by the temperature sensor. The heat exchanger forms a coolant passageway inside the electrostatic chuck, and the refrigerator is disposed outside the process chamber. The temperature sensor is disposed within the body of the electrostatic chuck. The temperature of the electrostatic chuck can be regulated so as to be maintained nearly constant because the temperature used to control the cooling of the coolant is measured directly from the body of the electrostatic chuck.

    摘要翻译: 制冷系统调节设置在处理室中的静电晶片卡盘的温度。 制冷系统包括与静电卡盘热交换设置的热交换器,冰箱,温度传感器和温度控制器,用于控制冰箱以将从热交换器排出的冷却剂冷却至期望的温度 温度由温度传感器检测。 热交换器在静电卡盘内形成冷却剂通道,并且冰箱设置在处理室的外部。 温度传感器设置在静电卡盘的主体内。 由于用于控制冷却剂的冷却的温度直接从静电卡盘的主体测量,静电卡盘的温度可以被调节以保持几乎恒定。

    Apparatus for enhancing efficiency of antenna in a mobile terminal
    29.
    发明授权
    Apparatus for enhancing efficiency of antenna in a mobile terminal 有权
    用于提高移动终端天线效率的装置

    公开(公告)号:US09209849B2

    公开(公告)日:2015-12-08

    申请号:US12878230

    申请日:2010-09-09

    摘要: An apparatus for enhancing an efficiency of an antenna in a mobile terminal includes an antenna matcher whose setting is changed under control of a controller, the antenna matcher coupled to the antenna, a sensing unit for sensing whether or not a user holds the mobile terminal and a holding pattern in which the user holds the mobile terminal, and a controller for controlling the setting of the antenna matcher according to whether or not the user holds the mobile terminal and the holding pattern.

    摘要翻译: 一种用于提高移动终端中的天线的效率的装置,包括天线匹配器,其设置在控制器的控制下改变,天线匹配器耦合到天线,感测单元,用于感测用户是否保持移动终端;以及 用户握持移动终端的保持模式,以及控制器,用于根据用户是否保持移动终端和保持模式来控制天线匹配器的设置。