公开(公告)号：US20070196650A1

公开(公告)日：2007-08-23

申请号：US10591671

申请日：2005-02-28

申请人： Taro Yamamoto ,  Masanori Doi

发明人： Taro Yamamoto ,  Masanori Doi

IPC分类号： D02G3/00

CPC分类号： D01F1/10 ,  D01F6/70 ,  Y10T428/2927 ,  Y10T428/2933

摘要： A polyurethane elastic fiber, containing inorganic compound particles that have an average particle size of 0.5 to 5 mm and that show a refractive index of 1.4 to 1.6, having at least one protruded portion that has a maximum width of 0.5 to 5 μm, in the fiber surface, per 120-μm length in the fiber axis direction.

摘要翻译： 一种聚氨酯弹性纤维，其含有平均粒径为0.5〜5mm，折射率为1.4〜1.6的无机化合物粒子，其具有至少一个最大宽度为0.5〜5μm的突出部， 纤维表面，纤维轴方向每120m长。

公开(公告)号：US20070195297A1

公开(公告)日：2007-08-23

申请号：US11504785

申请日：2006-08-16

申请人： Masahiro Nakaharada ,  Seiki Ishida ,  Taro Yamamoto ,  Katsuhiro Morikawa

发明人： Masahiro Nakaharada ,  Seiki Ishida ,  Taro Yamamoto ,  Katsuhiro Morikawa

IPC分类号： G03B27/42

CPC分类号： G03D3/08 ,  H01L21/67126 ,  H01L21/68707 ,  Y10S414/141

摘要： A substrate carrying apparatus includes an arm body; supporting portion provided in the arm body and adapted to support a region inside the periphery of the rear face of the substrate; a one-side restricting portion and an other-side restricting portion provided at opposite positions across the periphery of the substrate to restrict the peripheral positions of the substrate; and liquid receivers provided between each supporting portion and each restricting portion. A liquid drop attached to the rear peripheral portion of the substrate flows down on the bottom face of each liquid receiver. Even though repeated substrate carrying operations are performed and thus the liquid drop is accumulated in each liquid receiver, there is no risk that the liquid drop in each liquid receiver would be scattered in the air by the action of the periphery of the substrate and hence the scattered liquid would be attached again onto the surface of the substrate.

摘要翻译： 基板承载装置包括臂体; 支撑部，其设置在所述臂主体中并且适于支撑所述基板的后表面的周边内的区域; 一侧限制部和另一侧限制部，设置在穿过基板的周边的相对位置，以限制基板的周边位置; 以及设置在每个支撑部分和每个限制部分之间的液体接收器。 附着在基板的后周缘部分的液滴在每个液体接收器的底面上向下流动。 即使进行重复的基板搬运操作，因此液滴在每个液体接收器中积聚，也不存在每个液体接收器中的液滴通过基板周边的作用在空气中散射的风险，因此 分散的液体将再次附着到基底的表面上。

公开(公告)号：US20070184178A1

公开(公告)日：2007-08-09

申请号：US10584265

申请日：2004-12-24

申请人： Taro Yamamoto ,  Kousuke Yoshihara ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

发明人： Taro Yamamoto ,  Kousuke Yoshihara ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

IPC分类号： B05C11/00 ,  B05B7/06 ,  B05D1/02 ,  B05B3/00

CPC分类号： G03F7/3028 ,  G03F7/3021

摘要： The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.

摘要翻译： 显影液的温度根据抗蚀剂的种类或抗蚀剂图案而变化。 当扫描具有与衬底的有效面积的宽度匹配的长度的狭缝形喷射口的显影剂喷嘴时，施加显影溶液。 在将其上涂覆有显影液的基板离开预定时间后，在扫描稀释剂喷嘴的同时供给稀释剂，从而基本上停止显影反应并使溶解的抗蚀剂组分扩散。 可以通过控制显影液温度来快速溶解所需量的抗蚀剂，同时可以通过在预定时间内提供稀释剂而使溶解的抗蚀剂组分显示出不利影响之前，可以停止显影，从而获得具有均匀线的图案 宽度和提高吞吐量。

公开(公告)号：US08920922B2

公开(公告)日：2014-12-30

申请号：US12307332

申请日：2007-07-03

申请人： Taro Yamamoto ,  Junichi Kojima

发明人： Taro Yamamoto ,  Junichi Kojima

IPC分类号： D02G3/00 ,  F16J15/20 ,  D03D15/08 ,  D04B1/18 ,  D01F6/94

CPC分类号： D01F6/94 ,  Y10T428/2913 ,  Y10T428/2915 ,  Y10T442/3024 ,  Y10T442/413

摘要： Disclosed is a polyurethane urea elastic fiber containing 5-40% by weight of a polyurethane compound, wherein the compression deformation starting temperature determined by thermomechanical analysis (TMA) is not less than 150° C. but not more than 180° C. and time for thermal cutting at 180° C. is not less than 30 seconds.

摘要翻译： 公开了含有5-40重量％的聚氨酯化合物的聚氨酯脲弹性纤维，其中通过热机械分析（TMA）测定的压缩变形开始温度不低于150℃，但不超过180℃，时间 在180℃下进行热切割不小于30秒。

公开(公告)号：US20130213257A1

公开(公告)日：2013-08-22

申请号：US13877278

申请日：2011-09-08

申请人： Taro Yamamoto ,  Yusuke Fujiwara

发明人： Taro Yamamoto ,  Yusuke Fujiwara

IPC分类号： H01L21/677

CPC分类号： H01L21/677 ,  B61B3/02 ,  H01L21/6773 ,  H01L21/67733

摘要： A transport vehicle that reduces shaking of a transport article includes a travelling unit, a transport unit, a fall prevention member, and a shaking reduction member. The travelling unit travels along a rail provided on a ceiling. The transport unit transports a transport article. The fall prevention member is rotatably supported such that it can rotate between a fall prevention position and a retracted position. The fall prevention member is, at the fall prevention position, below the transport article. A pushing portion of the shaking reduction member pushes against a side surface of the transport article with a pushing surface thereof in conjunction with the rotating of the fall prevention member from the retracted position to the fall prevention position. A lever portion of the shaking reduction member has one end supporting the pushing portion and the other end rotatably supported in a manner coaxial with the fall prevention member).

摘要翻译： 减少运输物品晃动的运送车辆包括行驶单元，运送单元，防跌落构件和减震构件。 旅行单位沿着设在天花板上的轨道行进。 运输单位运输运输物品。 防坠落构件被可旋转地支撑，使得其能够在防坠落位置和缩回位置之间旋转。 防坠落成员在防坠落位置处在运输物品的下面。 摇动减速部件的推动部分随着其推动表面与防倒下部件从缩回位置的旋转到防止摔倒位置一起推动输送物品的侧表面。 减震构件的杠杆部分具有支撑推动部分的一端，而另一端以与防坠落构件同轴的方式可旋转地支撑）。

公开(公告)号：US08398319B2

公开(公告)日：2013-03-19

申请号：US12718104

申请日：2010-03-05

申请人： Hiroshi Arima ,  Yuichi Yoshida ,  Taro Yamamoto ,  Kousuke Yoshihara

发明人： Hiroshi Arima ,  Yuichi Yoshida ,  Taro Yamamoto ,  Kousuke Yoshihara

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  H01L21/6715

摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.

摘要翻译： 一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。 雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。 雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。 可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。

公开(公告)号：US08216389B2

公开(公告)日：2012-07-10

申请号：US12400419

申请日：2009-03-09

申请人： Kousuke Yoshihara ,  Yuichi Yoshida ,  Taro Yamamoto

发明人： Kousuke Yoshihara ,  Yuichi Yoshida ,  Taro Yamamoto

IPC分类号： B08B7/00 ,  B08B3/02

CPC分类号： G03F7/168 ,  B08B3/024 ,  G03F7/3021 ,  H01L21/67051

摘要： A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.

摘要翻译： 一种基板清洗方法，其特征在于，包括：在基板保持件持续旋转的同时，将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置， 气体从气体喷嘴排出到基板的中心部分，以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域 并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

公开(公告)号：US08154106B2

公开(公告)日：2012-04-10

申请号：US11562648

申请日：2006-11-22

申请人： Seiki Ishida ,  Taro Yamamoto

发明人： Seiki Ishida ,  Taro Yamamoto

IPC分类号： H01L29/08 ,  H01L23/58

CPC分类号： G03F7/70341 ,  G03F7/70525 ,  G03F7/70991 ,  H01L21/0257

摘要： A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of reducing difference in property among resist films formed on substrates.The coating and developing system includes: a cleaning unit for cleaning a surface of a substrate coated with a resist film; a carrying means for taking out the substrate from the cleaning unit and carrying the substrate to an exposure system that carries out an immersion exposure process; and a controller for controlling the carrying means such that a time interval between a wetting time point when the surface of the substrate is wetted with the cleaning liquid by the cleaning unit and a delivery time point when the substrate is delivered to the exposure system is equal to a predetermined set time interval. The set time interval is determined such that the substrate is subjected to the immersion exposure process after contact angle drop rate at which contact angle between the cleaning liquid and a surface of the substrate drops has dropped from an initial level at the wetting time point when the surface of the substrate is wetted with the cleaning liquid to a level far lower than the initial level.

摘要翻译： 一种用于在基板上形成抗蚀剂膜的涂覆和显影系统，其中通过用液体抗蚀剂涂覆基板并在抗蚀剂膜已经通过在基板表面上形成液体层的浸渍曝光进行处理之后显影抗蚀剂膜， 降低在基板上形成的抗蚀剂膜之间的性能差异。 该涂覆和显影系统包括：用于清洁涂覆有抗蚀剂膜的基材的表面的清洁单元; 用于从所述清洁单元取出所述基板并将所述基板运送到进行浸没曝光处理的曝光系统的承载装置; 以及控制器，用于控制所述承载装置，使得当所述基板的表面被所述清洁单元与所述清洁液体接触的润湿时间点与所述基板被输送到所述曝光系统时的传送时间点之间的时间间隔相等 到预定的设定时间间隔。 确定设定时间间隔，使得在清洗液与基材表面之间的接触角下降的接触角下降率在浸润时间点的浸润时间点的初始水平下，使基板经受浸渍曝光处理 衬底的表面被清洗液体润湿至远低于初始水平的水平。

公开(公告)号：US08133663B2

公开(公告)日：2012-03-13

申请号：US11782233

申请日：2007-07-24

申请人： Taro Yamamoto ,  Hitoshi Kosugi ,  Yoshiaki Yamada ,  Yasuhito Saiga

发明人： Taro Yamamoto ,  Hitoshi Kosugi ,  Yoshiaki Yamada ,  Yasuhito Saiga

IPC分类号： G03F7/26

CPC分类号： G03F7/38 ,  G03F7/2041 ,  G03F7/70341

摘要： A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.

摘要翻译： 图案形成方法包括在基板的表面上依次形成抗蚀剂膜或依次形成抗蚀剂膜和保护膜; 然后，在曝光期间进行浸渍曝光，其中包括将抗蚀剂膜或抗蚀剂膜和形成在基板上的保护膜浸入液体中，从而在抗蚀剂膜上形成预定的曝光图案; 并通过使用显影液进行曝光图案的显影处理，由此形成预定的抗蚀剂图案。 在浸没曝光之后和显影处理之前，该方法还包括进行将抗蚀剂膜或用作基板表面的保护膜的表面转动成亲水性的亲水处理，以允许基板表面被 开发液体整体。

公开(公告)号：US08037890B2

公开(公告)日：2011-10-18

申请号：US11509737

申请日：2006-08-25

申请人： Taro Yamamoto ,  Hideharu Kyouda ,  Tetsu Kawasaki ,  Satoru Shimura

发明人： Taro Yamamoto ,  Hideharu Kyouda ,  Tetsu Kawasaki ,  Satoru Shimura

IPC分类号： B08B3/00

CPC分类号： H01L21/67051

摘要： A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.

摘要翻译： 基板清洁装置和基板清洗方法减少了残留在基板上的液滴，以防止由于基板上残留液滴或水痕而导致的加热过程对基板的不规则加热。 将清洗液通过清洗液注入喷嘴注入到基板的表面上，使清洗液注入的区域从基板的中心部朝向圆周方向移动。 在衬底表面上的相对于衬底的旋转方向倾倒有清洁液体的区域之后的区域处，径向向外喷射气体。 气体迫使在基板表面流动的清洗液体的液膜在圆周方向和径向向外的方向上流动。