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公开(公告)号：US09017600B2
公开(公告)日：2015-04-28
申请号：US13849918
申请日：2013-03-25
申请人： Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwartz
发明人： Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwartz
CPC分类号： C23C14/3414 , B22F1/0003 , B22F3/16 , B22F3/162 , B22F3/24 , B22F5/006 , B22F2003/248 , B22F2301/20 , B22F2998/00 , B22F2998/10 , C21D8/0221 , C21D8/0247 , C22C1/045 , C22C27/04 , C22F1/18 , C23C14/14 , C23C14/3478 , C23C14/3485 , C23C14/35 , C23C14/46 , B22F3/172 , B22F3/20 , B22F3/04 , B22F3/10
摘要： In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.
摘要翻译： 在各种实施例中，平面溅射靶通过至少通过在模具中压制钼粉末并烧结压粉，加工坯料以形成加工的坯料，热处理加工的坯料，加工加工的坯料以形成 最终坯料，并对最终坯料进行热处理。
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公开(公告)号：US20140299466A1
公开(公告)日：2014-10-09
申请号：US14269836
申请日：2014-05-05
申请人： Prabhat Kumar , Charles Wood , Gary Rozak , Steven A. Miller , Glen Zeman , Rong-Chein Richard Wu
发明人： Prabhat Kumar , Charles Wood , Gary Rozak , Steven A. Miller , Glen Zeman , Rong-Chein Richard Wu
IPC分类号： C23C14/34
CPC分类号： C23C14/3414 , B22F3/1017 , B22F2003/241 , B22F2003/247 , B22F2998/10 , C22C1/045 , B22F3/04 , B22F3/24
摘要： The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.
摘要翻译： 本发明涉及一种通过压制/烧结方法生产高密度难熔金属产品的方法。 本发明还涉及一种用于制造溅射靶和如此制造的溅射靶的方法。
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公开(公告)号：US20110303535A1
公开(公告)日：2011-12-15
申请号：US13173412
申请日：2011-06-30
申请人： Steven A. Miller , Prabhat Kumar , Mark Confroy , Richard McCorry , Gary Rozak , Peter Jepson
发明人： Steven A. Miller , Prabhat Kumar , Mark Confroy , Richard McCorry , Gary Rozak , Peter Jepson
CPC分类号： C23C24/04 , C23C4/02 , C23C14/3407 , C23C14/3414
摘要： In various embodiments, sputtering targets incorporate an intermediate plate having a coefficient of thermal expansion (CTE) between a CTE of the backing plate and a CTE of the target material.
摘要翻译： 在各种实施方案中，溅射靶包括在背板的CTE和目标材料的CTE之间具有热膨胀系数（CTE）的中间板。
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公开(公告)号：US20080171215A1
公开(公告)日：2008-07-17
申请号：US11653816
申请日：2007-01-16
申请人： Prabhat Kumar , Charles Wood , Gary Rozak , Steven A. Miller , Glen Zeman , Rong-Chein Richard Wu
发明人： Prabhat Kumar , Charles Wood , Gary Rozak , Steven A. Miller , Glen Zeman , Rong-Chein Richard Wu
CPC分类号： C23C14/3414 , B22F3/1017 , B22F2003/241 , B22F2003/247 , B22F2998/10 , C22C1/045 , B22F3/04 , B22F3/24
摘要： The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.
摘要翻译： 本发明涉及一种通过压制/烧结方法生产高密度难熔金属产品的方法。 本发明还涉及一种用于制造溅射靶和如此制造的溅射靶的方法。
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公开(公告)号：US09095932B2
公开(公告)日：2015-08-04
申请号：US14293643
申请日：2014-06-02
CPC分类号： B23K31/02 , B23K2101/18 , B23K2101/34 , B23K2103/04 , B23K2103/05 , B23K2103/16 , B23K2103/166 , B32B38/08 , C23C24/04 , Y10T428/12076 , Y10T428/12347
摘要： In various embodiments, protective layers are bonded to a steel layer, overlapped, and at least partially covered by a layer of unmelted metal powder produced by cold spray.
摘要翻译： 在各种实施方案中，保护层结合到钢层上，重叠并且至少部分被一层由冷喷涂制成的未熔化的金属粉末所覆盖。
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公开(公告)号：US20140311669A1
公开(公告)日：2014-10-23
申请号：US14293643
申请日：2014-06-02
CPC分类号： B23K31/02 , B23K2101/18 , B23K2101/34 , B23K2103/04 , B23K2103/05 , B23K2103/16 , B23K2103/166 , B32B38/08 , C23C24/04 , Y10T428/12076 , Y10T428/12347
摘要： In various embodiments, protective layers are bonded to a steel layer, overlapped, and at least partially covered by a layer of unmelted metal powder produced by cold spray.
摘要翻译： 在各种实施方案中，保护层结合到钢层上，重叠并且至少部分被一层由冷喷涂制成的未熔化的金属粉末所覆盖。
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公开(公告)号：US20130156967A1
公开(公告)日：2013-06-20
申请号：US13713632
申请日：2012-12-13
申请人： Christopher Michaluk , William Loewenthal , Gary Rozak , Marc Abouaf , Patrick Hogan , Steven A. Miller
发明人： Christopher Michaluk , William Loewenthal , Gary Rozak , Marc Abouaf , Patrick Hogan , Steven A. Miller
IPC分类号： C23C14/34
CPC分类号： C23C14/3414 , C23C14/3407 , C23C24/04
摘要： In various embodiments, used sputtering targets are refurbished at least in part by maintaining a large obliquity angle between the spray-deposition gun and the depressed surface contour of the target during spray deposition of the target material.
摘要翻译： 在各种实施例中，使用的溅射靶材至少部分地通过在喷射沉积目标材料期间在喷涂沉积枪和靶的凹陷表面轮廓之间保持大的倾斜角来进行翻新。
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公开(公告)号：US20120145316A1
公开(公告)日：2012-06-14
申请号：US13343113
申请日：2012-01-04
CPC分类号： B23K31/02 , B23K2101/18 , B23K2101/34 , B23K2103/04 , B23K2103/05 , B23K2103/16 , B23K2103/166 , B32B38/08 , C23C24/04 , Y10T428/12076 , Y10T428/12347
摘要： In various embodiments, protective layers are bonded to a steel layer and connected by a layer of unmelted metal powder produced by cold spray.
摘要翻译： 在各种实施例中，保护层与钢层结合并通过冷喷制成的未熔化金属粉末层连接。
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公开(公告)号：US6106614A
公开(公告)日：2000-08-22
申请号：US173434
申请日：1998-10-15
IPC分类号： B22F9/08 , C30B11/00 , C30B29/66 , C30B30/08 , H01L31/0352 , H01L31/18 , C30B17/00 , B22F9/06
CPC分类号： C30B29/06 , B22F9/08 , C30B11/00 , C30B29/60 , C30B30/08 , H01L31/0352 , H01L31/035281 , H01L31/18 , H01L31/1804 , H01L31/184 , B22F2998/00 , B22F2999/00 , Y02E10/544 , Y02E10/547 , Y02P70/521 , Y10S117/902 , Y10T117/10 , Y10T117/1008 , Y10T117/1024 , Y10T117/1092 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993
摘要： An apparatus and a method for producing single crystal semiconductor particulate in near spherical shape and the particulate product so formed is accomplished by producing uniform, monosized, near spherical droplets; identifying the position of an undercooled droplet in a nucleation zone; and seeding the identified droplet in the nucleation zone to initiate single crystal growth in the droplet.
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30.发明授权Apparatus and method for viewing an industrial process such as a molten metal atomization process 失效用于观察诸如熔融金属雾化工艺的工业过程的装置和方法
公开(公告)号：US5520371A
公开(公告)日：1996-05-28
申请号：US231076
申请日：1994-04-22
CPC分类号： B22F9/082 , G01J5/041 , B22F2999/00
摘要： An apparatus, system and method for viewing an industrial process in an obscuring environment, such as molten metal atomization, is disclosed. An enclosure defining a chamber for containing a particulate form from atomized liquid metal has a nozzle for atomizing liquid metal mounted thereon in communication with the chamber whereby particles recirculate throughout the chamber. The nozzle being comprised of a cylindrical plenum means and a melt guide tube extending axially therethrough to an exit orifice. The plenum means is configured to provide a jet of atomizing gas converging in an atomizing zone extending from the exit orifice. A viewing means extends through the enclosure to a viewing orifice adjacent the atomization zone, the viewing means being configured to extend a field of view through the chamber to the atomization zone. A purging gas flow is provided in the viewing means to minimize atomized particles from contacting the window, and an image of the atomization zone is generated by viewing through the window.
摘要翻译： 公开了一种用于在模糊环境中观察工业过程的装置，系统和方法，例如熔融金属雾化。 限定用于从雾化液体金属容纳颗粒形式的室的外壳具有用于雾化安装在其上的与该室连通的液态金属的喷嘴，由此颗粒在整个室中再循环。 喷嘴由圆柱形增压装置和轴向穿过其延伸到出口的熔体引导管组成。 增压装置构造成提供在从出口延伸的雾化区中会聚的雾化气体射流。 观察装置通过外壳延伸到邻近雾化区的观察孔，观察装置构造成将视野通过室延伸到雾化区。 在观察装置中提供净化气体流，以将雾化的颗粒与窗口接触最小化，并且通过观察窗口产生雾化区域的图像。
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