SEMICONDUCTOR DEVICE
    21.
    发明申请

    公开(公告)号:US20230115743A1

    公开(公告)日:2023-04-13

    申请号:US17834987

    申请日:2022-06-08

    Abstract: A semiconductor device may include first and second active regions on a substrate, first and second active patterns on the first and second active regions, first and second source/drain patterns on the first and second active patterns, first and second silicide patterns on the first and second source/drain patterns, and first and second active contacts coupled to the first and second source/drain patterns. A lowermost portion of the first active contact is at a level higher than that of a lowermost portion of the second active contact. A thickness of the first silicide pattern is greater than that of the second silicide pattern.

    CONDUIT STRUCTURE OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE INCLUDING THE SAME

    公开(公告)号:US20190320050A1

    公开(公告)日:2019-10-17

    申请号:US16387059

    申请日:2019-04-17

    Abstract: A conduit structure of an electronic device and an electronic device are provided. The conduit structure includes an inner structure including a front surface and a rear surface, wherein the front surface includes a first region configured to receive a display and a second region, which is a remaining area of the front surface of the inner structure; a receiver hole configured to penetrate the second region and to connect a receiver receiving space and an external space of the inner structure; a first through-hole configured to penetrate the first region and to connect the receiver receiving space and the front surface of the inner structure; a second through-hole, which is spaced apart from the first through-hole, configured to penetrate the first region and to connect the rear surface of the inner structure; and a flow path configured to connect the first through-hole and the second through-hole at the front surface of the inner structure.

    SEMICONDUCTOR DEVICES
    28.
    发明申请

    公开(公告)号:US20220406888A1

    公开(公告)日:2022-12-22

    申请号:US17574074

    申请日:2022-01-12

    Abstract: A semiconductor device is provided. The semiconductor device includes: an active pattern provided on a substrate having an upper surface; an insulation pattern provided above the substrate and contacting an upper surface of the active pattern; channels spaced apart from each other along a direction perpendicular to the upper surface of the substrate, each of the channels including a material provided in the active pattern; and a gate structure contacting an upper surface of the insulation pattern, an upper surface of the channels, a lower surface of the channels, and sidewalls of the channels opposite to each other. A first distance between an upper surface of the active pattern and a lowermost one of the channels is greater than a second distance between an upper surface of one of the channels and a lower surface of an adjacent channel.

    METHOD AND APPARATUS FOR PREDICTING ANALYTE CONCENTRATION

    公开(公告)号:US20210076995A1

    公开(公告)日:2021-03-18

    申请号:US17102587

    申请日:2020-11-24

    Abstract: A method for predicting a concentration of an in vivo analyte includes obtaining a plurality of in vivo spectra of the in vivo analyte, determining a learning section for a concentration predicting algorithm for the analyte based on an unchanged section, during which the concentration of the analyte is not substantially changed, and a plurality of the in vivo spectra, and predicting the concentration of the in vivo analyte by using the concentration predicting algorithm based on a learned result of the learning section and an intrinsic spectrum of the in vivo analyte.

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