公开(公告)号：US20160285063A1

公开(公告)日：2016-09-29

申请号：US15073684

申请日：2016-03-18

Applicant: SAMSUNG SDI CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seungrim YANG ,  Byungmin LEE ,  Bokyung JUNG ,  Myungkook PARK ,  Eon-Mi LEE ,  Sungsoo HAN ,  Hana KIM ,  Jungsue JANG ,  Minho CHO ,  Hyoungwoo CHOI

IPC: H01M2/16 ,  H01M10/052

CPC classification number: H01M2/1686 ,  H01M2/1646 ,  H01M2/1653 ,  H01M2/166 ,  H01M10/052

Abstract: A separator for a rechargeable lithium battery and a rechargeable lithium battery including the same, the separator including a substrate, and a heat-resistant porous layer on at least one side of the substrate, the heat-resistant porous layer including a crosslinked binder and a non-crosslinked binder, wherein the crosslinked binder has a cross-linked structure of at least one crosslinkable compound, the at least one crosslinkable compound including a multi-functional urethane-based compound, and the crosslinked binder and the non-crosslinked binder are included in a weight ratio of about 3:7 to about 8:2.

Abstract translation: 一种用于可再充电锂电池的隔板和包括该可再充电锂电池的可再充电锂电池，所述隔板包括基板，以及在所述基板的至少一侧上的耐热多孔层，所述耐热多孔层包括交联粘合剂和 非交联粘合剂，其中所述交联粘合剂具有至少一种可交联化合物的交联结构，所述至少一种可交联化合物包含多官能氨基甲酸酯基化合物，并且所述交联粘合剂和所述非交联粘合剂包括 重量比为约3:7至约8:2。

公开(公告)号：US20250021003A1

公开(公告)日：2025-01-16

申请号：US18537601

申请日：2023-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK ,  Chanjae AHN ,  Jaejun LEE ,  Sungwon CHOI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

公开(公告)号：US20240337928A1

公开(公告)日：2024-10-10

申请号：US18613810

申请日：2024-03-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Haengdeog KOH ,  Hyeran KIM ,  Youngmin NAM ,  Giyoung SONG ,  Changheon LEE ,  Aram JEON ,  Jungha CHAE ,  Songse YI ,  Sukkoo HONG

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition.




A description of Formula 1 is provided herein.

公开(公告)号：US20240255847A1

公开(公告)日：2024-08-01

申请号：US18404865

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Sunyoung LEE ,  Minyoung HA

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/039

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:






For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.

公开(公告)号：US20240201588A1

公开(公告)日：2024-06-20

申请号：US18192316

申请日：2023-03-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Beomseok KIM ,  Kyuhyun IM ,  Yoonhyun KWAK ,  Hyeran KIM

IPC: G03F7/004 ,  C07C65/10 ,  C07C309/12 ,  C07C311/09 ,  C07C391/02 ,  C07C395/00 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C65/10 ,  C07C309/12 ,  C07C311/09 ,  C07C391/02 ,  C07C395/00 ,  G03F7/0382 ,  G03F7/0397 ,  C07C2603/74

Abstract: Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:




wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.

公开(公告)号：US20240199540A1

公开(公告)日：2024-06-20

申请号：US18312825

申请日：2023-05-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Hana KIM ,  Kyuhyun IM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Hyeran KIM ,  Changheon LEE

IPC: C07C323/09 ,  G03F7/004 ,  G03F7/20

CPC classification number: C07C323/09 ,  G03F7/0042 ,  G03F7/2004 ,  G03F7/2059 ,  C07C2601/16

Abstract: Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same:






wherein A11, L11, L12, a11, a12, R11 to R13, b13, n11, n12, and M+ in Formula 1 are defined as described in the specification.

公开(公告)号：US20230161245A1

公开(公告)日：2023-05-25

申请号：US18047030

申请日：2022-10-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Eunkyung LEE ,  Aram JEON

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  C08F220/1807

Abstract: Provided are a photoacid generator, a photoresist composition including the same, and a method of forming a pattern by using the photoacid generator. The photoacid generator includes a copolymer of a monomer that generates an acid upon exposure to light and an acid-labile monomer of which solubility with respect to a developing solvent is changed by decomposition by an acid, wherein the copolymer is represented by Formula 1:






wherein, in Formula 1, x, y, L, A−, B+, R1, R2, and R3 are each the same as described in the detailed description.

公开(公告)号：US20220140441A1

公开(公告)日：2022-05-05

申请号：US17435086

申请日：2019-07-26

Applicant: SAMSUNG SDI CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Minho CHO ,  Rae Sung KIM ,  Hana KIM ,  Myungkook PARK ,  Seung Rim YANG ,  Byungmin LEE ,  Jungsue JANG ,  Bokyung JUNG

IPC: H01M50/457 ,  H01M50/434 ,  H01M50/426 ,  H01M50/446

Abstract: The present disclosure relates to a separator for a lithium secondary battery, and a lithium secondary battery including same, the separator including: a porous substrate, and a heat-resistant layer on at least one surface of the porous substrate, wherein the heat-resistant layer includes a first coating layer including alumina, and a second coating layer including magnesium hydroxide, and the first coating layer and the second coating layer are consecutively disposed in a stacked form on the porous substrate.

公开(公告)号：US20220084939A1

公开(公告)日：2022-03-17

申请号：US17223144

申请日：2021-04-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaejin LEE ,  Hana KIM ,  Jaewha PARK ,  Dongchan LIM

IPC: H01L23/522 ,  H01L23/528 ,  H01L23/532 ,  H01L21/768

Abstract: A wiring structure includes a filling metal, a cover metal including cobalt (Co) on the filling metal, the cover metal having a first portion along a side surface and along a lower surface of the filling metal, and a second portion along an upper surface of the filling metal, a barrier metal on an outer surface of the first portion of the cover metal, and a capping metal on an outer surface of the second portion of the cover metal, the capping metal including a cobalt (Co) alloy, wherein the filling metal has higher conductivity than the cover metal and the barrier metal.