MANAGEMENT COMPUTER
    21.
    发明申请
    MANAGEMENT COMPUTER 有权
    管理计算机

    公开(公告)号:US20110060878A1

    公开(公告)日:2011-03-10

    申请号:US12611540

    申请日:2009-11-03

    IPC分类号: G06F12/00 G06F12/02

    摘要: The management computer allocates a volume of an external storage device to a host so as to satisfy performance requirements specified from the host. The management computer selects a path that is formed including a first port of the storage device and a second port of the external storage device and that satisfies the performance requirements from the host, and then sets the priority. The management computer sets to the host the use authorization of a primary port and a secondary port that constitute a selected path and the use authorization of a second logical volume.

    摘要翻译: 管理计算机向主机分配一卷外部存储设备,以满足从主机指定的性能要求。 管理计算机选择形成的包括存储装置的第一端口和外部存储装置的第二端口并且满足来自主机的性能要求的路径,然后设置优先级。 管理计算机向主机设置构成所选路径的主端口和辅助端口的使用授权以及第二逻辑卷的使用授权。

    SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING SUBSTRATE CLEANING PROGRAM RECORDED THEREIN
    23.
    发明申请
    SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING SUBSTRATE CLEANING PROGRAM RECORDED THEREIN 审中-公开
    基板清洁装置,基板清洁方法和具有记录的基板清洁程序的计算机可读记录介质

    公开(公告)号:US20120260947A1

    公开(公告)日:2012-10-18

    申请号:US13444377

    申请日:2012-04-11

    申请人: Satoshi KANEKO

    发明人: Satoshi KANEKO

    IPC分类号: B08B7/04 B08B5/04 B08B3/02

    摘要: Provided are a substrate cleaning apparatus, a substrate cleaning method, and a substrate cleaning program that preferably cleans the substrate without causing damage on the surface of the substrate. The substrate cleaning apparatus includes a liquid layer holding unit including a substrate cleaning nozzle that holds a liquid layer of the cleaning solution, a substrate heating unit that heats the surface of the substrate higher than the boiling point of the cleaning solution, and a moving up/down mechanism that approaches a substrate cleaning nozzle to the substrate. The moving up/down mechanism is controlled to boil the liquid layer held in the substrate cleaning nozzle by the heat of the surface of the substrate heated by the substrate heating unit to form a vapor layer between the surface of the substrate and the liquid layer to clean the surface of the substrate.

    摘要翻译: 提供了一种基板清洗装置,基板清洗方法以及基板清洗程序,其优选地清洁基板而不会在基板的表面上造成损坏。 基板清洗装置包括液体保持单元,该液体保持单元包括保持清洗液液层的基板清洗喷嘴,将基板表面加热到高于清洗液的沸点的基板加热单元, /向下机构,其接近基板清洁喷嘴到基板。 控制移动上/下机构,由衬底加热单元加热的衬底表面的热量使保持在衬底清洁喷嘴中的液体层沸腾,从而在衬底的表面和液体层之间形成蒸气层, 清洁基材的表面。

    METHOD OF CONSTRUCTING REPLICATION ENVIRONMENT AND STORAGE SYSTEM
    25.
    发明申请
    METHOD OF CONSTRUCTING REPLICATION ENVIRONMENT AND STORAGE SYSTEM 有权
    构建复制环境和存储系统的方法

    公开(公告)号:US20100077162A1

    公开(公告)日:2010-03-25

    申请号:US12272305

    申请日:2008-11-17

    摘要: A management computer collects a usage condition of a volume from a host computer and a storage apparatus at each site, consolidates management thereof, and prevents a volume from duplicating among applications as a copy source. This makes it possible to select a used volume in an application as a copy source without excess or deficiency and to create a copy pair configuration definition without duplication or incompatibility. If a replication environment is constructed in a large-scale storage system, the consolidated management of a usage condition of a volume collected from the host computer and the storage apparatus at each site makes it possible to create a copy pair configuration definition by a task constituted by a plurality of applications.

    摘要翻译: 管理计算机从每个站点的主计算机和存储装置收集卷的使用条件,合并其管理,并防止卷在作为复制源的应用之间复制。 这使得可以在应用程序中选择所使用的卷作为复制源而不会出现过多或不足,并创建副本配置定义,而不会造成重复或不兼容。 如果在大规模存储系统中构建复制环境,则从主机和每个站点的存储设备收集的卷的使用条件的统一管理使得可以通过构成的任务来创建副本配置定义 通过多个应用程序。

    LIQUID TREATMENT APPARATUS AND METHOD
    26.
    发明申请
    LIQUID TREATMENT APPARATUS AND METHOD 有权
    液体处理装置及方法

    公开(公告)号:US20120160275A1

    公开(公告)日:2012-06-28

    申请号:US13337547

    申请日:2011-12-27

    IPC分类号: B08B3/04

    摘要: Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.

    摘要翻译: 公开了一种液体处理装置,其包括位于基板保持单元保持的基板下方的喷嘴。 喷嘴能够喷射液体和气体的混合物的两种流体。 喷嘴包括用于喷射液体的多个喷液通道和用于喷射气体的多个气体喷射通道,并且还包括各自对应于一个喷液通道的多个液体喷射口。 液体喷射口排列在从基板的周边部分下方的位置向内延伸的水平线上。 液体喷射口被配置为沿喷射方向朝向基板的下表面喷射液体,并且喷射方向以相对于平面旋转的旋转驱动单元旋转的基板的旋转方向以倾斜角度倾斜 包括基底的下表面。

    APPARATUS AND METHOD FOR CHANGING THE SIZE OF DISPLAYED CONTENTS
    27.
    发明申请
    APPARATUS AND METHOD FOR CHANGING THE SIZE OF DISPLAYED CONTENTS 审中-公开
    改变显示内容大小的装置和方法

    公开(公告)号:US20120092380A1

    公开(公告)日:2012-04-19

    申请号:US13306663

    申请日:2011-11-29

    申请人: Satoshi KANEKO

    发明人: Satoshi KANEKO

    IPC分类号: G09G5/00

    CPC分类号: F16D3/185 F16D2300/06

    摘要: A data processing apparatus comprises an operation member which is operated to change a display form of displayed contents and a processing unit which is responsive to an operation of the operation member to change the display form of the displayed contents of an active window.

    摘要翻译: 数据处理装置包括操作以改变显示内容的显示形式的操作构件和响应于操作构件的操作以改变活动窗口的显示内容的显示形式的处理单元。