公开(公告)号：US06750774B2

公开(公告)日：2004-06-15

申请号：US09907749

申请日：2001-07-19

申请人： Kengo Yano ,  Tadashi Onozuka ,  Yuji Ono

发明人： Kengo Yano ,  Tadashi Onozuka ,  Yuji Ono

IPC分类号： G08B2100

CPC分类号： B62J1/12 ,  B62J99/00 ,  B62J2099/002 ,  B62K2207/00

摘要： In view of a possibility that a conventional structure which mounts a pressure-sensitive riding detection sensor on a seat bottom plate and mounts a seat cushion on the riding detection sensor lowers the sensitivity of the riding detection sensor, the present invention arranges the riding detection sensor such that the riding detection sensor can have favorable sensitivity. A lower seat cushion is arranged on a seat bottom plate of a seat, and a seat switch is supported on the lower seat cushion. A seat cushion body which is made thin by the thickness of the lower seat cushion is mounted on the seat switch, and a seat skin covers an upper surface of the seat cushion body.

摘要翻译： 考虑到将座椅底板上的压敏骑乘检测传感器安装在骑乘检测传感器上并将座垫安装在骑乘检测传感器上的传统结构的可能性降低了骑乘检测传感器的灵敏度，本发明安排骑乘检测传感器 使得骑乘检测传感器能够具有良好的灵敏度。 在座椅的座椅底板上设置有下座垫，座椅开关支撑在下座垫上。 通过下座垫的厚度变薄的座垫主体安装在座椅开关上，座椅皮肤覆盖座垫主体的上表面。

公开(公告)号：US06390754B1

公开(公告)日：2002-05-21

申请号：US09080254

申请日：1998-05-18

申请人： Kenichi Yamaga ,  Yuji Ono ,  Masahiro Miyashita ,  Osamu Tanigawa

发明人： Kenichi Yamaga ,  Yuji Ono ,  Masahiro Miyashita ,  Osamu Tanigawa

IPC分类号： B65G4907

摘要： A closed-type cassette is mounted on a cassette stand disposed in a working region at a position corresponding to an opening formed in a wall separating the working region from a loading region. When the cassette is mounted on the cassette stand, a detecting device gives a signal to that effect to a controller. Then, the controller closes a valve to interrupt nitrogen gas supply into the loading region. A lid of the cassette is opened 20 to 30 sec after the interruption of nitrogen gas supply into the loading region and, then, nitrogen gas supply is resumed. The pressure difference between the loading region and the interior of the cassette is decreased by interrupting nitrogen gas supply into the loading region, so that the lid can be easily opened.

公开(公告)号：US5527390A

公开(公告)日：1996-06-18

申请号：US212884

申请日：1994-03-14

申请人： Yuji Ono ,  Katsuhiko Mihara

发明人： Yuji Ono ,  Katsuhiko Mihara

IPC分类号： C23C16/54 ,  H01L21/677 ,  H01L21/687 ,  C23C16/00 ,  B25J11/00 ,  B65G49/07 ,  F27D3/12

CPC分类号： H01L21/67757 ,  C23C16/54 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/14

摘要： A treatment system is disclosed, which has a treatment apparatus for performing a predetermined treatment for a planar workpiece contained in a carrier, and a first air-tight carrier storage chamber for storing the carrier. The treatment apparatus has an air-tight second carrier storage chamber. An inert gas supply pipe and an exhaust pipe are connected to each of the treatment apparatus, the first carrier storage chamber, and the second carrier storage chamber. An open/close valve and an open/close device are connected to each of the inert gas supply pipes and the exhaust pipes.

摘要翻译： 公开了一种处理系统，其具有用于对包含在载体中的平面工件进行预定处理的处理装置和用于存储载体的第一气密载体储存室。 处理装置具有气密的第二载体储存室。 惰性气体供给管和排气管连接到处理装置，第一载体储存室和第二载体储存室中的每一个。 每个惰性气体供给管和排气管都连接开/关阀和打开/关闭装置。

公开(公告)号：US5273244A

公开(公告)日：1993-12-28

申请号：US785506

申请日：1991-10-30

申请人： Yuji Ono

发明人： Yuji Ono

IPC分类号： H01L21/677 ,  H01L21/00

CPC分类号： H01L21/67766 ,  H01L21/67781

摘要： A plate-like members conveying apparatus includes a rotating shaft and five support arms for supporting semiconductor wafers. The arms are vertically stacked at equal intervals and parallel to each other. The middle arm is fixed between two intermediate arms. Above and below the intermediate arms, two outer arms are located. The intermediate arms are coupled to an intermediate arm pinion coaxially fixed to the rotating shaft. The outer arms are coupled to an outer arm pinion coaxially fixed to the rotating shaft and having twice diameter of the intermediate arm pinion. These two pinions are rotated together upon the rotation of the rotating shaft. By the rotation of the intermediate arm pinion, the intermediate arms are moved to opposite direction each other. By the rotation of the outer arm pinion, the outer arms are moved to opposite direction each other by a distance twice a distance between the intermediate arms. Thus, the interval between the adjacent two arms is changed while keeping the five arms at equal intervals.

摘要翻译： 板状构件输送装置包括旋转轴和用于支撑半导体晶片的五个支撑臂。 臂以相等的间隔垂直堆叠并且彼此平行。 中臂固定在两个中间臂之间。 在中间臂的上方和下方，设有两个外臂。 中间臂联接到同轴固定在旋转轴上的中间臂小齿轮。 外臂联接到同轴固定在旋转轴上并具有中间臂小齿轮两倍直径的外臂小齿轮。 这两个小齿轮在旋转轴的旋转时一起旋转。 通过中间臂小齿轮的旋转，中间臂彼此相反地移动。 通过外臂小齿轮的旋转，外臂彼此相反移动距离为中间臂之间的距离的两倍。 因此，在保持五个臂等间隔的同时改变相邻的两个臂之间的间隔。

公开(公告)号：US5055036A

公开(公告)日：1991-10-08

申请号：US661103

申请日：1991-02-26

申请人： Takanobu Asano ,  Hiroyuki Iwai ,  Yuji Ono

发明人： Takanobu Asano ,  Hiroyuki Iwai ,  Yuji Ono

IPC分类号： C30B35/00 ,  F27B17/00 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/67757 ,  C30B35/005 ,  F27B17/0025 ,  H01L21/67781 ,  H01L21/68707

摘要： A wafer boats supporting wafers is loaded into and unloaded from a reaction tube with a lid therebelow in a vertical heat treatment apparatus, while holding the wafer boat vertical with respect to the lid. An arm is provided in a space below the reaction tube, for transferring wafer boats along a path, while holding the wafer boats vertical and in a substantially horizontal plane. Three stations are formed in the path. At the first station, unprocessed wafers are mounted on a first wafer boat located, while wafers mounted on a first wafer boat is being heat-treated in said reaction tube. Then, the first wafer boat is transferred from the first station to the third station, and is held at the third station. While the first wafer boat is held at the third station, the second wafer boat is lowered to the second station to unload the second wafer boat from the reaction tube, and then is transferred to the first station. Thereafter, the heat-treated wafers are removed from the second wafer boat located at the first station. Next, the first wafer boat is transferred from the third station to the second station, while the second wafer boat is located at the first station, and then is mounted onto the lid, thereby to load the first wafer boat into the reaction tube.

摘要翻译： 在垂直热处理装置中，将晶片舟片装载在具有盖的反应管中并从其卸载，同时将晶片舟皿相对于盖垂直。 在反应管下面的空间中设置有一个臂，用于沿着路径传送晶片舟，同时将晶片舟垂直并且在基本水平的平面中。 路上形成了三个站。 在第一站处，未加工的晶片安装在位于第一晶片舟的位置上，而安装在第一晶片舟皿上的晶片在所述反应管中进行热处理。 然后，将第一晶片舟从第一站传送到第三站，并保持在第三站。 当第一晶片舟被保持在第三站时，第二晶片舟被降低到第二站，以将第二晶片舟从反应管卸载，然后被传送到第一站。 此后，将热处理的晶片从位于第一工位的第二晶片舟皿移除。 接下来，将第一晶片舟从第三站传送到第二站，而第二晶片舟位于第一站，然后安装到盖上，从而将第一晶片舟装载到反应管中。

公开(公告)号：US5001137A

公开(公告)日：1991-03-19

申请号：US407010

申请日：1989-09-14

申请人： Takanori Oe ,  Yuji Ono ,  Kazuyuki Kawasaki ,  Tohru Nakajima

发明人： Takanori Oe ,  Yuji Ono ,  Kazuyuki Kawasaki ,  Tohru Nakajima

IPC分类号： C07D213/64 ,  C07D213/643 ,  C07D213/70 ,  C07D213/74 ,  C07D213/75 ,  C07D401/04 ,  C07D401/06 ,  C07D401/14 ,  C07D405/04 ,  C07D405/06 ,  C07D409/04 ,  C07D409/06 ,  C07D409/14 ,  C07D417/06 ,  C07D417/14

CPC分类号： C07D213/64 ,  C07D213/643 ,  C07D213/70 ,  C07D213/74 ,  C07D213/75 ,  C07D401/04 ,  C07D401/06 ,  C07D401/14 ,  C07D405/04 ,  C07D405/06 ,  C07D409/04 ,  C07D409/06 ,  C07D409/14 ,  C07D417/06 ,  C07D417/14

摘要： A novel pyridine compound of the formula ##STR1## wherein each symbol is as defined in the specification, or a salt thereof which exhibit inhibitory activity or prolylendopeptidase and a pharmaceutical use thereof are disclosed.

公开(公告)号：US08809207B2

公开(公告)日：2014-08-19

申请号：US14000643

申请日：2012-02-20

申请人： Hiraku Ishikawa ,  Teruyuki Hayashi ,  Takaaki Matsuoka ,  Yuji Ono

发明人： Hiraku Ishikawa ,  Teruyuki Hayashi ,  Takaaki Matsuoka ,  Yuji Ono

IPC分类号： H01L21/00

CPC分类号： H01L21/30604 ,  H01L21/0217 ,  H01L21/02274 ,  H01L21/0337 ,  H01L21/308 ,  H01L21/31111 ,  H01L21/32139 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719

摘要： A pattern-forming method for forming a predetermined pattern serving as a mask when etching film on a substrate includes the steps of: an organic film pattern-forming step for forming an organic film pattern on a film to be processed; forming a silicon nitride film on the organic film pattern; etching the silicon nitride film so that the silicon nitride film remains only on the lateral wall sections of the organic film pattern; and removing the organic film, thereby forming the predetermined silicon nitride film pattern on the film to be processed on a substrate. With the temperature of the substrate maintained at no more than 100° C., the film-forming step excites a processings gas and generates a plasma, performs plasma processing with the plasma, and forms a silicon nitride film having stress of no more than 100 MPa.

摘要翻译： 当在基板上刻蚀膜时，用于形成用作掩模的预定图案的图案形成方法包括以下步骤：在待处理的膜上形成有机膜图案的有机膜图案形成步骤; 在有机膜图案上形成氮化硅膜; 蚀刻氮化硅膜，使得氮化硅膜仅保留在有机膜图案的侧壁部分上; 除去有机膜，从而在基板上形成预定的氮化硅膜图案。 在基板的温度保持不超过100℃的条件下，成膜步骤激发处理气体并产生等离子体，用等离子体进行等离子体处理，形成压力不超过100的氮化硅膜 MPa。

公开(公告)号：US20120001102A1

公开(公告)日：2012-01-05

申请号：US12864382

申请日：2009-01-21

申请人： Yasuhiro Chiba ,  Kohei Yamamoto ,  Hiroshi Takada ,  Kota Koizumi ,  Yasushi Yagi ,  Shingo Watanabe ,  Yuji Ono ,  Hiroshi Kaneko ,  Koyu Hasegawa

发明人： Yasuhiro Chiba ,  Kohei Yamamoto ,  Hiroshi Takada ,  Kota Koizumi ,  Yasushi Yagi ,  Shingo Watanabe ,  Yuji Ono ,  Hiroshi Kaneko ,  Koyu Hasegawa

IPC分类号： F16K31/122

CPC分类号： F16K41/10 ,  F16K31/126 ,  F16K31/1268

摘要： A highly clean and high temperature valve apparatus includes a valve driving unit and a valve casing connected to a bonnet supporting a valve stem slidably. A stem portion has one end positioned in a circumferential wall closed at its two ends by upper and lower covers, and supports one end of the valve stem with its other end extending through the lower cover. The stem portion has its ends supported respectively by first and second bellows for closing an axial through hole of the lower cover tightly. A first pipe communicates with a first space isolated by the first bellows, and a second pipe communicates with a second space isolated by the first bellows. The fluid quantities in the first and second spaces are increased or decreased relative to each other, thereby to drive the stem portion supported in a floating state by the first and second bellows.

摘要翻译： 高度清洁和高温的阀门装置包括阀驱动单元和阀壳，其可滑动地连接到支撑阀杆的阀盖。 杆部分具有位于周向壁的一端，其两端通过上盖和下盖封闭，并且支撑阀杆的一端，其另一端延伸穿过下盖。 杆部分的端部分别由第一和第二波纹管支撑，用于紧密地封闭下盖的轴向通孔。 第一管与由第一波纹管隔离的第一空间连通，第二管与由第一波纹管隔离的第二空间连通。 第一和第二空间中的流体量相对于彼此增加或减小，从而驱动由第一和第二波纹管以浮动状态支撑的杆部。

公开(公告)号：US20110240223A1

公开(公告)日：2011-10-06

申请号：US13129167

申请日：2009-11-11

申请人： Shinji Matsubayashi ,  Satoru Kawakami ,  Yasuhiro Tobe ,  Masaru Nishimura ,  Yasushi Yagi ,  Teruyuki Hayashi ,  Yuji Ono ,  Fumio Shimo

发明人： Shinji Matsubayashi ,  Satoru Kawakami ,  Yasuhiro Tobe ,  Masaru Nishimura ,  Yasushi Yagi ,  Teruyuki Hayashi ,  Yuji Ono ,  Fumio Shimo

IPC分类号： B08B13/00 ,  B05C13/00

CPC分类号： H01L51/56 ,  H01L21/67173 ,  H01L21/6723

摘要： There is provided a substrate processing system having high maintainability by widening a gap between various processing apparatuses connected with side surfaces of transfer modules and capable of achieving sufficient productivity by avoiding deterioration in throughput. The substrate processing system for manufacturing an organic EL device by forming a multiple number of layers including, e.g., an organic layer on a substrate includes at least one transfer module configured to be evacuable and arranged along a straight transfer route. Within the transfer module, a multiple number of loading/unloading areas for loading/unloading the substrate with respect to a processing apparatus and at least one stocking area positioned between the loading/unloading areas are alternately arranged along the transfer route in series, and the processing apparatus is connected with a side surface of the transfer module at a position facing each of the loading/unloading areas.

摘要翻译： 提供了一种具有高可维护性的基板处理系统，通过扩大与传送模块的侧表面连接的各种处理设备之间的间隙，并且能够通过避免吞吐量的恶化来实现足够的生产率。 用于通过在衬底上形成包括例如有机层的多个层来制造有机EL器件的衬底处理系统包括至少一个被配置为可沿着直线传送路线排空和布置的传送模块。 在传送模块内，沿着传送路径交替布置多个用于相对于处理装置加载/卸载基板的装载/卸载区域和位于装载/卸载区域之间的至少一个放料区域， 处理设备在面向每个装载/卸载区域的位置处与传送模块的侧表面连接。

公开(公告)号：US20100126417A1

公开(公告)日：2010-05-27

申请号：US12593753

申请日：2008-03-25

申请人： Koyu Hasegawa ,  Yuji Ono

发明人： Koyu Hasegawa ,  Yuji Ono

IPC分类号： C23C16/52 ,  C23C16/00

CPC分类号： C23C16/4481 ,  H01L51/0008 ,  H01L51/56 ,  H05B33/10

摘要： A deposition apparatus includes a deposition source unit, a transport mechanism for transporting a vaporized film forming material and a blowing device for blowing off the transported film forming material. The deposition source unit includes a vapor deposition source assembly, a housing and a water cooling jacket. The vapor deposition source assembly includes a gas supply mechanism, a gas inlet and a first material evaporating chamber formed as one body. A heater of the housing heats a film forming material in the first material evaporating chamber and the carrier gas flowing in a plurality of gas passages. The vaporized film forming material is transported by an argon gas. The water cooling jacket is installed apart from an outer peripheral surface of the housing at a certain distance and cools the deposition source unit.

摘要翻译： 沉积装置包括沉积源单元，用于输送蒸发的成膜材料的输送机构和用于吹出传送的成膜材料的吹塑装置。 沉积源单元包括气相沉积源组件，壳体和水冷套。 气相沉积源组件包括气体供应机构，气体入口和形成为一体的第一材料蒸发室。 外壳的加热器加热第一材料蒸发室中的成膜材料和在多个气体通道中流动的载气。 蒸发的成膜材料通过氩气输送。 水冷却套筒以一定距离与壳体的外周表面分开安装，并冷却沉积源单元。