公开(公告)号：US07612882B2

公开(公告)日：2009-11-03

申请号：US11584461

申请日：2006-10-20

申请人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

发明人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

IPC分类号： G01B11/00 ,  G01B11/14

CPC分类号： G03F9/7049 ,  G03F9/7003

摘要： Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.

摘要翻译： 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中，调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中，使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外，光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅，其被配置为产生表现出灵敏度的一部分干涉图案，该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。

公开(公告)号：US07433811B2

公开(公告)日：2008-10-07

申请号：US10838859

申请日：2004-05-04

申请人： Jun Gao ,  Michael J. Sailor ,  Sangeeta Bhatia ,  Christopher Flaim

发明人： Jun Gao ,  Michael J. Sailor ,  Sangeeta Bhatia ,  Christopher Flaim

IPC分类号： G06F17/50 ,  C23C20/00

CPC分类号： B81C1/00515 ,  B81C2201/0114 ,  B81C2201/0115 ,  C25F3/12 ,  C25F3/14 ,  H01L21/3063

摘要： The invention is directed to methods for direct patterning of silicon. The invention provides the ability to fabricate complex surfaces in silicon with three dimensional features of high resolution and complex detail. The invention is suitable, for example, for use in soft lithography as embodiments of the invention can quickly create a master for use in soft lithography. In an embodiment of the invention, electrochemical etching of silicon, such as a silicon wafer, for example, is conducted while at least a portion of the silicon surface is exposed to an optical pattern. The etching creates porous silicon in the substrate, and removal of the porous silicon layer leaves a three-dimensional structure correlating to the optical pattern.

摘要翻译： 本发明涉及直接图案化硅的方法。 本发明提供了在硅中制造具有高分辨率和复杂细节的三维特征的复杂表面的能力。 本发明适用于例如在软光刻中使用，因为本发明的实施例可以快速地创建用于软光刻的母版。 在本发明的一个实施例中，例如硅的电化学蚀刻被进行，同时硅表面的至少一部分暴露于光学图案。 蚀刻在衬底中产生多孔硅，并且去除多孔硅层留下与光学图案相关的三维结构。

公开(公告)号：US20080095407A1

公开(公告)日：2008-04-24

申请号：US11584074

申请日：2006-10-20

申请人： Duncan Stewart ,  Carl Picciotto ,  Jun Gao

发明人： Duncan Stewart ,  Carl Picciotto ,  Jun Gao

IPC分类号： G06K9/00 ,  G06K9/36

CPC分类号： G06K9/3216 ,  G06K2009/3225 ,  G06K2209/19 ,  G06T7/33 ,  G06T2207/30148

摘要： A method for determining an offset vector. The method includes obtaining an image of a first feature. An image of a second feature is also obtained. Also, a combination image of the first feature and the second feature is obtained. A plurality of composite images is utilized to determine an accurate offset vector between the first feature and the second feature in the combination image. The plurality of composite images is based on the image of the first feature and the image of the second feature.

摘要翻译： 一种用于确定偏移矢量的方法。 该方法包括获得第一特征的图像。 还获得第二特征的图像。 此外，获得第一特征和第二特征的组合图像。 使用多个合成图像来确定组合图像中第一特征和第二特征之间的精确偏移矢量。 多个合成图像基于第一特征的图像和第二特征的图像。

公开(公告)号：US20080090312A1

公开(公告)日：2008-04-17

申请号：US11550372

申请日：2006-10-17

申请人： Inkyu Park ,  Wei Wu ,  Jun Gao ,  Carl E. Picciotto

发明人： Inkyu Park ,  Wei Wu ,  Jun Gao ,  Carl E. Picciotto

IPC分类号： H01L21/66

CPC分类号： G03F9/7038 ,  G03F9/7088 ,  G03F9/7092 ,  G03F9/7096

摘要： A contact lithography alignment system and method use nanoscale displacement sensing and estimation (nDSE) to maintain an alignment and compensate for a disturbance of one or more objects during contact lithography. A method of maintaining an alignment includes establishing an initial alignment of one or more objects and employing nDSE-based feedback control of relative positions of more or more of the objects to maintain the alignment during contact lithography. A method of disturbance compensation includes acquiring a first image, acquiring a second image, estimating an alignment error using nDSE applied to the first and second image, and adjusting a relative position to reduce the alignment error. A contact lithography system includes an optical sensor, a feedback processor providing nDSE and a position controller that adjusts relative positions of one or more objects to reduce an alignment error determined using the nDSE.

摘要翻译： 接触光刻对准系统和方法使用纳米尺度位移感测和估计（nDSE）来保持对准并补偿接触光刻期间一个或多个物体的干扰。 保持对准的方法包括建立一个或多个对象的初始对准，并且采用基于nDSE的多个对象的相对位置的反馈控制来保持接触光刻期间的对准。 干扰补偿的方法包括获取第一图像，获取第二图像，使用施加到第一和第二图像的nDSE来估计对准误差，以及调整相对位置以减小对准误差。 接触光刻系统包括光学传感器，提供nDSE的反馈处理器和调整一个或多个对象的相对位置以减少使用nDSE确定的对准误差的位置控制器。

公开(公告)号：US20080067721A1

公开(公告)日：2008-03-20

申请号：US11521235

申请日：2006-09-14

申请人： Zhaoning Yu ,  Wei Wu ,  Carl E. Picciotto ,  Jun Gao

发明人： Zhaoning Yu ,  Wei Wu ,  Carl E. Picciotto ,  Jun Gao

IPC分类号： B29C43/00 ,  B29C33/38

CPC分类号： B29C33/42 ,  B29C33/3842 ,  B29C43/003 ,  B29C43/021 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084 ,  Y10S977/887

摘要： A nanoimprint mold includes a substrate having at least one substantially non-transferable feature and at least one transferable feature defined at different portions thereon. Methods for forming the same are also disclosed.

摘要翻译： 纳米压印模具包括具有至少一个基本上不可转移的特征的基底和在其上的不同部分限定的至少一个可转移特征。 还公开了其形成方法。

公开(公告)号：US20080028360A1

公开(公告)日：2008-01-31

申请号：US11496368

申请日：2006-07-31

申请人： Carl E. Picciotto ,  Jun Gao ,  Wei Wu ,  Zhaoning Yu

发明人： Carl E. Picciotto ,  Jun Gao ,  Wei Wu ,  Zhaoning Yu

IPC分类号： G06F17/50 ,  G03F9/00

CPC分类号： G03F9/7092 ,  G03F9/7038 ,  G03F9/7042 ,  G03F9/7088

摘要： Methods of performing lithography include calculating a displacement vector for a lithography tool using an image of a portion of the lithography tool and a portion of a substrate and an additional image of a portion of an additional lithography tool and a portion of the substrate. Methods of aligning objects include positioning a second object proximate a first object and acquiring a first image illustrating a feature on a surface of the second object and a feature on a surface of the first object. An additional object is positioned proximate the first object, and an additional image is acquired that illustrates a feature on a surface of the additional object and the feature on the surface of the first object. The additional image is compared with the first image. Imprint molds include at least one non-marking reference feature on an imprinting surface of a mode base.

摘要翻译： 进行光刻的方法包括使用光刻工具的一部分的图像和基板的一部分以及附加光刻工具的一部分和基板的一部分的附加图像来计算光刻工具的位移矢量。 对准对象的方法包括定位靠近第一对象的第二对象并且获取示出第二对象的表面上的特征的第一图像和第一对象的表面上的特征。 附加对象被定位在第一对象附近，并且获取附加图像，其示出附加对象的表面上的特征和第一对象的表面上的特征。 将附加图像与第一图像进行比较。 压印模具包括在模式底座的压印表面上的至少一个非标记参考特征。

公开(公告)号：US20070060702A1

公开(公告)日：2007-03-15

申请号：US10566248

申请日：2004-07-08

申请人： Jun Gao ,  Xiang-Ming Kong ,  Klaus-Dieter Hungenberg ,  Jurgen Schmidt-Thummes

发明人： Jun Gao ,  Xiang-Ming Kong ,  Klaus-Dieter Hungenberg ,  Jurgen Schmidt-Thummes

IPC分类号： C08G18/63

CPC分类号： C08F2/22

摘要： An aqueous polymer dispersion is prepared by free radical aqueous emulsion polymerization of at least one ethylenically unsaturated compound (monomer) in the presence of at least one dispersant and at least one water-soluble and one oil-soluble free radical initiator by a process in which the polymerization temperature increases from the starting reaction temperature TS to the end reaction temperature TE in the course of the polymerization reaction.

摘要翻译： 在至少一种分散剂和至少一种水溶性和一种油溶性自由基引发剂的存在下，通过至少一种烯键式不饱和化合物（单体）的自由基水性乳液聚合制备聚合物水分散体，其中 在聚合反应过程中，聚合温度从起始反应温度T S S增加到最终反应温度T E E。

公开(公告)号：US20060047473A1

公开(公告)日：2006-03-02

申请号：US10930614

申请日：2004-08-31

申请人： Carl Picciotto ,  Jun Gao ,  Wei Wu

发明人： Carl Picciotto ,  Jun Gao ,  Wei Wu

IPC分类号： G01B21/02

CPC分类号： G06T7/20 ,  G06T7/70

摘要： A displacement estimation system comprising a data acquisition system and a processing system is provided. The data acquisition system is configured to capture a first frame from a first substrate including a first pattern and a second substrate including a second pattern at a first time and capture a second frame from a third substrate including a third pattern and a fourth substrate including a fourth pattern at a second time subsequent to the first time. The first pattern and the third pattern are substantially identical, and the second pattern and the fourth pattern are substantially identical. The processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame.

摘要翻译： 提供一种包括数据采集系统和处理系统的位移估计系统。 数据采集​​系统被配置为在第一时间从包括第一图案的第一基板和包括第二图案的第二基板捕获第一帧，并从包括第三图案的第三基板和包括第三图案的第四基板捕获第二帧 第四模式在第一次之后的第二时间。 第一图案和第三图案基本相同，第二图案和第四图案基本相同。 处理系统被配置为使用第一帧和第二帧来计算第一图案和第三图案之间的第一位移，并且使用第一帧和第二帧计算第二图案和第四图案之间的第二位移。

公开(公告)号：US20060045313A1

公开(公告)日：2006-03-02

申请号：US10931414

申请日：2004-08-31

申请人： Jun Gao ,  Carl Picciotto

发明人： Jun Gao ,  Carl Picciotto

IPC分类号： G06K9/00

CPC分类号： G01B11/002 ,  G06T7/262 ,  G06T7/37

摘要： A measurement process or system transforms image data corresponding to images of an object to the frequency domain and analyzes the frequency domain data to determine a displacement of the object occurring between first and second images. Analysis in the frequency domain simplifies identification and handling of data expected to be noisy. In particular, frequencies corresponding to modes of vibration, lighting variation, or sensor error characteristic of a measurement system or frequencies corresponding to small magnitude frequency-domain data can be given little or no weighting in analysis that provides the displacement measurement. In one embodiment, Fourier transforms of shifted and unshifted images differ by a phase delay. A least square fit slope of the phase values associated with the phase delay can indicate displacements to accuracies less than 1% of a pixel width, thereby providing nanometer scale precision using imaging systems having a pixel width of about 1 μm.

公开(公告)号：US10081309B2

公开(公告)日：2018-09-25

申请号：US15508377

申请日：2015-09-12

申请人： Jun Gao

发明人： Jun Gao

IPC分类号： B60R11/02 ,  A61L9/12 ,  B60R11/00

CPC分类号： B60R11/02 ,  A61L9/12 ,  A61L2209/15 ,  B60H3/0028 ,  B60R11/00 ,  B60R2011/0008 ,  B60R2011/0052 ,  B60R2011/0059 ,  B60R2011/0064

摘要： The invention is a combined air freshener and portable device mount which diffuses aromatic fragrance compounds contained in the main cavity of the invention and at the same time engages a fastener mounted on a personal device. The fastener can be but is not limited to ferromagnetic, detent based, or hook and loop fasteners. An elastic member wraps around the main cavity wall at the proximal end and provides friction and cushion for the personal device when it is held by the fastener. Helical threading on the main body engages compatible helical threading on a support structure, allowing the invention to be mounted in a variety of locations in a vehicle interior.