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    Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
    1.
    发明申请
    Optical gratings, lithography tools including such optical gratings and methods for using same for alignment 失效
    光栅，包括这种光栅的光刻工具和用于对准的方法

    公开(公告)号：US20080094629A1

    公开(公告)日：2008-04-24

    申请号：US11584461

    申请日：2006-10-20

    申请人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

    发明人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

    IPC分类号： G01B11/00

    CPC分类号： G03F9/7049 ,  G03F9/7003

    摘要： Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.

    摘要翻译： 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中，调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中，使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外，光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅，其被配置为产生表现出灵敏度的一部分干涉图案，该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。

    Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
    2.
    发明授权
    Optical gratings, lithography tools including such optical gratings and methods for using same for alignment 失效
    光栅，包括这种光栅的光刻工具和用于对准的方法

    公开(公告)号：US07612882B2

    公开(公告)日：2009-11-03

    申请号：US11584461

    申请日：2006-10-20

    申请人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

    发明人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

    IPC分类号： G01B11/00 ,  G01B11/14

    CPC分类号： G03F9/7049 ,  G03F9/7003

    摘要： Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.

    摘要翻译： 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中，调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中，使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外，光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅，其被配置为产生表现出灵敏度的一部分干涉图案，该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。

    Surface enhanced raman spectroscopy with periodically deformed sers-active structure
    6.
    发明申请
    Surface enhanced raman spectroscopy with periodically deformed sers-active structure 有权
    表面增强拉曼光谱与周期性变形的主动结构

    公开(公告)号：US20080270042A1

    公开(公告)日：2008-10-30

    申请号：US11796455

    申请日：2007-04-26

    申请人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang ,  Zhaoning Yu ,  R. Stanley Williams

    发明人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang ,  Zhaoning Yu ,  R. Stanley Williams

    IPC分类号： G01J3/44

    CPC分类号： G01N21/658

    摘要： An apparatus and related methods for facilitating surface-enhanced Raman spectroscopy (SERS) is described. A SERS-active structure near which a plurality of analyte molecules is disposed is periodically deformed at an actuation frequency. A synchronous measuring device synchronized with the actuation frequency receives Raman radiation scattered from the analyte molecules and generates therefrom at least one Raman signal measurement.

    摘要翻译： 描述了用于促进表面增强拉曼光谱（SERS）的装置和相关方法。 多个分析物分子附近的SERS-活性结构以致动频率周期性地变形。 与致动频率同步的同步测量装置接收从分析物分子散射的拉曼辐射，并由此产生至少一个拉曼信号测量。

    Contact lithography apparatus and method
    8.
    发明授权
    Contact lithography apparatus and method 失效
    接触光刻设备和方法

    公开(公告)号：US07768628B2

    公开(公告)日：2010-08-03

    申请号：US11548823

    申请日：2006-10-12

    申请人： Wei Wu ,  Shih-Yuan Wang ,  Duncan R. Stewart ,  R. Stanley Williams ,  Zhaoning Yu ,  Inkyu Park

    发明人： Wei Wu ,  Shih-Yuan Wang ,  Duncan R. Stewart ,  R. Stanley Williams ,  Zhaoning Yu ,  Inkyu Park

    IPC分类号： G03B27/02 ,  G03B27/42 ,  G03B27/58 ,  G03B27/20 ,  G03B27/22 ,  H01L21/00

    CPC分类号： G03F7/7035

    摘要： A contact lithography apparatus and a method use one or both of spacers and a mesa to facilitate pattern transfer. The apparatus and the method include one or both of a spacer that provides a spaced apart orientation of lithographic elements, such as a patterning tool and a substrate, when in mutual contact with the spacer and a mesa between the patterning tool and the substrate. The mesa supports a contact surface of one or both of the mold and the substrate. One or both of the spacers and the mesa may be non-uniform. One or more of the patterning tool, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.

    摘要翻译： 接触式光刻设备和方法使用间隔物和台面中的一个或两个以便于图案转印。 该装置和方法包括当与间隔物相互接触并且在图案形成工具和衬底之间的台面时提供间隔开的光刻元件取向的间隔物中的一个或两个，诸如图案形成工具和衬底。 台面支撑模具和基板之一或两者的接触表面。 间隔物和台面中的一个或两个可能是不均匀的。 图案形成工具，衬底和间隔件中的一个或多个可变形，使得其变形有利于图案转印。

    Contact lithography apparatus and method
    9.
    发明申请
    Contact lithography apparatus and method 失效
    接触光刻设备和方法

    公开(公告)号：US20080087636A1

    公开(公告)日：2008-04-17

    申请号：US11548823

    申请日：2006-10-12

    申请人： Wei Wu ,  Shih-Yuan Wang ,  Duncan R. Stewart ,  R. Stanley Williams ,  Zhaoning Yu ,  Inkyu Park

    发明人： Wei Wu ,  Shih-Yuan Wang ,  Duncan R. Stewart ,  R. Stanley Williams ,  Zhaoning Yu ,  Inkyu Park

    IPC分类号： B44C1/22 ,  B29D11/00

    CPC分类号： G03F7/7035

    摘要： A contact lithography apparatus and a method use one or both of spacers and a mesa to facilitate pattern transfer. The apparatus and the method include one or both of a spacer that provides a spaced apart orientation of lithographic elements, such as a patterning tool and a substrate, when in mutual contact with the spacer and a mesa between the patterning tool and the substrate. The mesa supports a contact surface of one or both of the mold and the substrate. One or both of the spacers and the mesa may be non-uniform. One or more of the patterning tool, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.

    摘要翻译： 接触式光刻设备和方法使用间隔物和台面中的一个或两个以便于图案转印。 该装置和方法包括当与间隔物相互接触并且在图案形成工具和衬底之间的台面时提供间隔开的光刻元件取向的间隔物中的一个或两个，诸如图案形成工具和衬底。 台面支撑模具和基板之一或两者的接触表面。 间隔物和台面中的一个或两个可能是不均匀的。 图案形成工具，衬底和间隔件中的一个或多个可变形，使得其变形有利于图案转印。