公开(公告)号：US20050211004A1

公开(公告)日：2005-09-29

申请号：US10806400

申请日：2004-03-23

Applicant: Steven Fink

Inventor： Steven Fink

IPC: G01B3/00 ,  G01B3/50 ,  G01M99/00 ,  G01M19/00

CPC classification number: G01B3/50

Abstract: A go no-go gauge and method for verifying whether a process kit part used within a plasma chamber of a plasma processing tool has accumulated excessive wear or deposits. The gauge includes a component for verifying whether a dimension of a process kit part feature violates a prescribed size tolerance, the violation indicating that the process kit part has accumulated excessive wear or deposits.

Abstract translation: 用于验证等离子体处理工具的等离子体室内使用的处理组件部件是否累积了过多的磨损或沉积物的脱模仪和方法。 仪表包括用于验证过程套件零件特征的尺寸是否违反规定的尺寸公差的部件，表示处理套件部件累积过多磨损或沉积的违规。

公开(公告)号：US20050011447A1

公开(公告)日：2005-01-20

申请号：US10889220

申请日：2004-07-13

Applicant: Steven Fink

Inventor： Steven Fink

IPC: C23C16/00 ,  C23C16/44 ,  C23C16/455 ,  C23C16/509 ,  H01J37/32

CPC classification number: C23C16/45565 ,  C23C16/5096 ,  H01J37/3244

Abstract: A gas delivery system for a plasma apparatus including a first plate having a gas inlet, and a second plate having a plurality of holes. The second plate is coupled to the first plate and spaced apart from the second to form a plenum chamber. A baffle honeycomb core is disposed between the first plate and the second plate in side the plenum chamber. The honeycomb core can be comprised of one or more spaced apart honeycomb panels. A surface of one of the honeycomb panels or a surface of the first panel can be contoured to control the pressure distribution of a gas in the plenum chamber. The gas delivery assembly for a plasma apparatus also includes a first plate having a gas inlet and a second plate coupled to the first plate to form a plenum chamber therebetween. The second plate includes a gas injection plate having a plurality of holes. The gas injection plate has a contoured surface such that a length of each of the plurality of holes varies depending on location of the holes on the contoured surface.

Abstract translation: 一种用于等离子体装置的气体输送系统，包括具有气体入口的第一板和具有多个孔的第二板。 第二板联接到第一板并与第二板间隔开以形成增压室。 挡板蜂窝芯设置在第一板和第二板之间的增压室的侧面。 蜂窝芯可以由一个或多个间隔开的蜂窝板组成。 蜂窝板中的一个的表面或第一面板的表面可以被轮廓化以控制在增压室中的气体的压力分布。 用于等离子体装置的气体输送组件还包括具有气体入口的第一板和联接到第一板的第二板，以在它们之间形成增压室。 第二板包括具有多个孔的气体注入板。 气体注射板具有轮廓表面，使得多个孔中的每一个的长度根据轮廓表面上的孔的位置而变化。

公开(公告)号：US20110239505A1

公开(公告)日：2011-10-06

申请号：US13065217

申请日：2011-03-15

Applicant: Steven Fink

Inventor： Steven Fink

IPC: G09F15/00

CPC classification number: G09F15/0068

Abstract: A multi-panel display has at least two foamboard panels with a foam core and outer layers, and a web hinge connecting adjacent foamboard panels. The web hinge is secured to the respective edges of the adjacent panels with a web extending therebetween, the web offset from the outer layers of the panels to adapt the panels for bidirectional folding movement. One web hinge is a strip of flexible sheet material having marginal edges, received in slits in the foam cores of adjacent panels. The edges may be secured at time of manufacture or inserted by the user to connect selected panels. The web hinges may have an I-shape secured to edges of adjacent panels, or may have U-shaped flanges embracing edges of adjacent panels, with a web connecting the flanges.

Abstract translation: 多面板显示器具有至少两个具有泡沫芯和外层的泡沫板，以及连接相邻发泡板的腹板铰链。 腹板铰链被固定到相邻面板的相应边缘，其中在其间延伸有腹板，腹板从面板的外层偏移以适应面板进行双向折叠运动。 一个网状铰链是具有边缘的柔性片材条，容纳在相邻板的泡沫芯中的狭缝中。 边缘可以在制造时被固定，或者由用户插入以连接所选择的面板。 腹板铰链可以具有固定到相邻面板的边缘的I形形状，或者可以具有包围相邻面板的边缘的U形凸缘，其中连接凸缘的腹板。

公开(公告)号：USD577778S1

公开(公告)日：2008-09-30

申请号：US29299196

申请日：2007-12-20

Applicant: Steven Fink ,  Neil Hamilton ,  Michael Hoeting ,  Yannick Poirier ,  Craig Johnson

Designer： Steven Fink ,  Neil Hamilton ,  Michael Hoeting ,  Yannick Poirier ,  Craig Johnson

公开(公告)号：US20070170155A1

公开(公告)日：2007-07-26

申请号：US11335683

申请日：2006-01-20

Applicant: Steven Fink

Inventor： Steven Fink

IPC: B23K9/00

CPC classification number: H01J37/32082 ,  H01J37/32009 ,  H01J37/32431 ,  H01J37/32532 ,  H01J2237/334

Abstract: A plasma reactor includes a plasma processing chamber which can, for example, play the role of a vacuum chamber and an electrode disposed inside the plasma processing chamber. The plasma reactor further includes a plasma control structure imbedded entirely within the electrode. The plasma control structure is configured and arranged to alter characteristics of a plasma generated inside the processing chamber.

Abstract translation: 等离子体反应器包括等离子体处理室，其可以例如起真空室的作用和设置在等离子体处理室内的电极。 等离子体反应器还包括完全嵌入电极内的等离子体控制结构。 等离子体控制结构被配置和布置成改变在处理室内产生的等离子体的特性。

公开(公告)号：US20070131650A1

公开(公告)日：2007-06-14

申请号：US11654564

申请日：2007-01-18

Applicant: Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

Inventor： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

IPC: B44C1/22

CPC classification number: H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

Abstract: A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.

Abstract translation: 一种用于通过多个温度控制系统控制暴露于等离子体的壁内或其他表面内的等离子体室的温度的装置和方法。 可以通过独立地控制壁或其它表面的段的温度来控制等离子体室内的等离子体处理。

公开(公告)号：US20060144520A1

公开(公告)日：2006-07-06

申请号：US10522189

申请日：2003-09-22

Applicant: Steven Fink

Inventor： Steven Fink

IPC: B08B6/00 ,  C23F1/00 ,  C23C16/00

CPC classification number: H01L21/67028 ,  B08B7/0035 ,  C23C16/4405 ,  H01J37/32862 ,  H01J37/32972 ,  H01L21/67242 ,  H01L21/67253

Abstract: A viewing port for a processing chamber is provided that includes a viewing window cleaning apparatus, a viewing window, and a mounting, where the viewing window cleaning apparatus is coupled to the mounting and disposed between the viewing window and the process chamber, and is configured to form a cleaning plasma in a cleaning plasma region of the mounting. In addition, the mounting can be configured to reduce a number of by-products from a process chamber on the viewing window by preventing them from propagating to the window.

Abstract translation: 提供了一种用于处理室的观察口，其包括观察窗清洁装置，观察窗和安装件，其中观察窗清洁装置联接到安装件并且设置在观察窗和处理室之间，并且被配置 以在安装件的清洁等离子体区域中形成清洁等离子体。 此外，安装可以被配置为通过防止它们传播到窗口来减少来自观察窗口上的处理室的副产物的数量。

公开(公告)号：US20050150458A1

公开(公告)日：2005-07-14

申请号：US11059626

申请日：2005-02-17

Applicant: Steven Fink

Inventor： Steven Fink

IPC: H05H1/46 ,  B01J3/00 ,  B01J19/08 ,  C23C16/00 ,  C23C16/44 ,  C23C16/458 ,  H01J37/32 ,  H01L21/00 ,  H01L21/3065

CPC classification number: H01L21/67126 ,  C23C16/4585 ,  H01J37/32458 ,  H01J37/32743 ,  H01J2237/184 ,  H01L21/67069

Abstract: A plasma processing system and a method for processing a substrate with a plasma processing system. An aspect of the invention provides a plasma processing system that comprises a chamber, including a processing region and an opening, a plasma generating system, constructed and arranged to produce a plasma during a plasma process in the processing region, a chuck, constructed and arranged to support a substrate within the chamber in the processing region, a ring member arranged in the chamber and a moving assembly, constructed and arranged to move the ring member, wherein the ring member is mounted on a periphery of the chuck such that when the substrate is being processed the ring member seals the opening.

Abstract translation: 等离子体处理系统和使用等离子体处理系统处理衬底的方法。 本发明的一个方面提供了一种等离子体处理系统，其包括一个包括处理区域和开口的室，等离子体产生系统，其被构造和布置成在处理区域中的等离子体处理过程中产生等离子体，构造和布置的卡盘 以支撑处理区域内的腔室内的衬底，设置在腔室中的环构件和构造和布置成移动环构件的移动组件，其中环构件安装在卡盘的周边上，使得当衬底 正在处理的环件密封开口。

公开(公告)号：US20050132829A1

公开(公告)日：2005-06-23

申请号：US10743057

申请日：2003-12-23

Applicant: Steven Fink

Inventor： Steven Fink

IPC: F16D71/04 ,  F16H21/12 ,  H01L21/00 ,  H01L21/68 ,  H01L21/687

CPC classification number: H01L21/67069 ,  H01L21/68 ,  H01L21/68792 ,  Y10T74/1836

Abstract: A multi-stop mechanism for providing multiple stop positions between first and second objects that are movable into and out of contact with one another. The multi-stop mechanism of the present invention includes a housing which secures the multi stop mechanism to the first object and/or the second object, a rotatble shaft rotatably mounted to the housing, and plurality of stops located on the rotatable shaft. When the shaft is rotated within the housing, the stops are rotated to different positions relative to the housing. As such, the rotatable shaft positions one of the stops to contact the first or second object that the multi-stop mechanism is not attached to.

Abstract translation: 一种用于在第一和第二物体之间提供多个停止位置的多功能机构，其可移动进入或离开彼此接触。 本发明的多重机构包括将多重停止机构固定到第一物体和/或第二物体的壳体，可旋转地安装到壳体的旋转轴以及位于可旋转轴上的多个止动件。 当轴在壳体内旋转时，止动件相对于壳体旋转到不同的位置。 这样，可旋转轴将止动件之一定位成与多个止动机构未附接到的第一或第二物体接触。

公开(公告)号：US20050066902A1

公开(公告)日：2005-03-31

申请号：US10823724

申请日：2004-04-14

Applicant: Steven Fink

Inventor： Steven Fink

IPC: H01J37/32 ,  H01L21/00 ,  H01L21/687 ,  C23C16/00

CPC classification number: H01L21/68742 ,  H01J37/32082 ,  H01J37/32568 ,  H01L21/67069

Abstract: A plasma reactor including a process chamber, a holding structure constructed arranged to hold a plasma source assembly and a support structure constructed and arranged to support a chuck assembly. The holding structure at least partially constitutes a wall of said vacuum chamber. The support structure supporting or holding the chuck assembly can be coupled to a lift mechanism which can raise or lower the chuck assembly relative to the plasma source assembly. The lift mechanism can be disposed above or below the process chamber.

Abstract translation: 一种等离子体反应器，包括处理室，构造成保持等离子体源组件的保持结构和构造和布置成支撑卡盘组件的支撑结构。 保持结构至少部分地构成所述真空室的壁。 支撑或保持卡盘组件的支撑结构可以联接到提升机构，该提升机构可相对于等离子体源组件升高或降低卡盘组件。 提升机构可以设置在处理室的上方或下方。