公开(公告)号：US08365107B2

公开(公告)日：2013-01-29

申请号：US12521651

申请日：2008-01-16

申请人： Jacek Tyminski ,  Raluca Popescu ,  Tomoyuki Matsuyama

发明人： Jacek Tyminski ,  Raluca Popescu ,  Tomoyuki Matsuyama

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/144 ,  G03F1/68 ,  G06F17/50 ,  G06F17/5081

摘要： A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns for an integrated circuit is compared against the simulated, corrected reticle design. A determination is made as to whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ1) is less than a predetermined criteria (ε1). The technique further includes completing the model the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.

摘要翻译： 提供了一种建模技术。 建模技术包括将工具参数输入到模型中，并将基本模型参数输入到模型中。 该技术还包括使用工具参数和基本模型参数生成模拟，校正的掩模版设计。 将集成电路的测试图案的图像与模拟的校正的掩模版设计进行比较。 确定模拟，校正的掩模版设计与测试图案的图像（δ1）的曝光结果之间的差是否小于预定标准（＆amp; 1）。 该技术还包括完成模型，模拟，校正的掩模版设计与测试图案的图像的曝光结果之间的差小于预定标准。

公开(公告)号：US08174456B2

公开(公告)日：2012-05-08

申请号：US12746450

申请日：2008-12-04

申请人： Go Omori ,  Tomoyuki Matsuyama ,  Hitoshi Maeno ,  Satoshi Adachi

发明人： Go Omori ,  Tomoyuki Matsuyama ,  Hitoshi Maeno ,  Satoshi Adachi

IPC分类号： H01Q3/00

CPC分类号： H01Q3/08 ,  G01S3/42 ,  G01S3/44 ,  H01Q1/125

摘要： An antenna pointing control apparatus and method that reduce a pointing error of an antenna having a two-axis gimbal structure. An antenna installed on a ship hull is controlled to point toward a satellite by an antenna pointing control apparatus having a two-axis mechanism. Movement of the ship hull are recognized every prescribed cycle time, a satellite bearing is measured, and a pointing error of a directional antenna with respect to a satellite is detected. If it is determined that the satellite will not pass within a prescribed region A about an extension line of an azimuth angle (AZ) axis of the ship's hull, then a two-axis control is executed. However, if the satellite will pass within the prescribed region A, then a virtual three-axis control is executed.

摘要翻译： 一种减少具有双轴万向架结构的天线的指向误差的天线指向控制装置和方法。 通过具有双轴机构的天线指示控制装置控制安装在船体上的天线指向卫星。 在每个规定的周期时间识别船体的运动，测量卫星轴承，并且检测定向天线相对于卫星的指向误差。 如果确定卫星不会在关于船体的方位角（AZ）轴的延伸线的规定区域A内通过，则执行两轴控制。 然而，如果卫星在规定区域A内通过，则执行虚拟三轴控制。

公开(公告)号：US07515247B2

公开(公告)日：2009-04-07

申请号：US11979516

申请日：2007-11-05

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US07230682B2

公开(公告)日：2007-06-12

申请号：US10901209

申请日：2004-07-29

申请人： Yasuo Shimizu ,  Shigeru Hirukawa ,  Kousuke Suzuki ,  Tomoyuki Matsuyama

发明人： Yasuo Shimizu ,  Shigeru Hirukawa ,  Kousuke Suzuki ,  Tomoyuki Matsuyama

IPC分类号： G03B27/32 ,  G03B27/68

CPC分类号： G03B21/18 ,  G03B27/42 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/706

摘要： An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.

摘要翻译： 一种通过投影光学系统在物体上形成图案的曝光方法，包括确定调整投影光学系统的图像形成特性的调整装置的最佳调节量，以优化待形成的图案下的图像形成特性和图案的曝光条件 关于与投影光学系统的波前像差相关的信息，对应于图案和曝光条件的Zernike感光度图，表示调节装置的调整量与Zernike多项式中的项的系数的变化之间的关系的波前像差变化表，以及 基于调整装置的调整量，通过调整装置调整图像形成特性的投影光学系统，根据所确定的最佳调整量，在曝光条件下将图案曝光在物体上。

公开(公告)号：US20060055834A1

公开(公告)日：2006-03-16

申请号：US11140103

申请日：2005-05-31

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G02F1/1335

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US06639651B2

公开(公告)日：2003-10-28

申请号：US10014136

申请日：2001-12-13

申请人： Tomoyuki Matsuyama

发明人： Tomoyuki Matsuyama

IPC分类号： G03B2768

CPC分类号： G03B27/68 ,  G03F7/70308 ,  G03F7/706

摘要： A fabrication method for a projection optical system is capable of easily determining the corrected surface form as a desired continuous surface provided to a correcting member for correcting residual aberration. The fabrication includes: a measurement step of measuring aberration remaining in the projection optical system; a hypothesis step of hypothesizing a corrected surface form to be provided to the correcting member based on predetermined functions; a calculation step of calculating wavefront information of a light beam which passes through each of a plurality of regions on the correcting member having the corrected surface form hypothesized in the hypothesis step; and an evaluation step of evaluating the remaining aberration in the projection optical system when the hypothesized corrected surface form hypothesized in the hypothesis step is provided to the correcting member based on the measurement result in the measurement step and on the wavefront information calculated in the calculation step.

公开(公告)号：US06198576B1

公开(公告)日：2001-03-06

申请号：US09116644

申请日：1998-07-16

申请人： Tomoyuki Matsuyama

发明人： Tomoyuki Matsuyama

IPC分类号： G02B300

CPC分类号： G03F7/70241 ,  G03F7/70358 ,  G03F7/70833

摘要： Projection optical systems are provided for use in an exposure apparatus that have a numerical aperture greater than 0.63, a reduced field curvature of pupil at the aperture stop and are able to maintain imaging performance. Further, the present invention avoids degradation in the imaging performance when the numerical aperture is changed.

摘要翻译： 投影光学系统被提供用于具有大于0.63的数值孔径的曝光装置，在孔径光阑处减小的瞳孔曲率，并且能够保持成像性能。 此外，本发明避免了数值孔径变化时成像性能的劣化。

公开(公告)号：US5920379A

公开(公告)日：1999-07-06

申请号：US138302

申请日：1998-08-21

申请人： Tomoyuki Matsuyama

发明人： Tomoyuki Matsuyama

IPC分类号： G02B13/14 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54 ,  G02B9/60

CPC分类号： G03F7/70241 ,  G02B13/14

摘要： A projection exposure system, which is used to transfer a pattern from a reticle or mask onto a substrate, incorporates a projection optical system that is capable of maintaining the same performance as that which can be found in an ideal environment, even when the actual use environment (e.g. atmospheric pressure and temperature) is not ideal. In addition, the projection optical system is able to recover the same performance as in an ideal environment through relatively minor adjustment of its projection optical system even when atmospheric pressure significantly changes due to, e.g., a change in location and altitude where the system is used.

摘要翻译： 用于将图案从掩模版或掩模转印到基板上的投影曝光系统包括能够保持与在理想环境中可以发现的性能相同的性能的投影光学系统，即使在实际使用中 环境（例如大气压力和温度）并不理想。 此外，投影光学系统能够通过对投影光学系统进行相当小的调整而恢复与理想环境相同的性能，即使当大气压力由于例如使用系统的位置和高度的变化而显着改变时 。

公开(公告)号：US5852490A

公开(公告)日：1998-12-22

申请号：US724167

申请日：1996-09-30

申请人： Tomoyuki Matsuyama

发明人： Tomoyuki Matsuyama

IPC分类号： G02B13/14 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70241 ,  G02B13/14

摘要： A projection exposure system, which is used to transfer a pattern from a reticle or mask onto a substrate, incorporates a projection optical system that is capable of maintaining the same performance as that which can be found in an ideal environment, even when the actual use environment (e.g. atmospheric pressure and temperature) is not ideal. In addition, the projection optical system is able to recover the same performance as in an ideal environment through relatively minor adjustment of its projection optical system even when atmospheric pressure significantly changes due to, e.g., a change in location and altitude where the system is used.

公开(公告)号：US09551938B2

公开(公告)日：2017-01-24

申请号：US13366829

申请日：2012-02-06

申请人： Tomoyuki Matsuyama ,  Naonori Kita

发明人： Tomoyuki Matsuyama ,  Naonori Kita

IPC分类号： G03B27/68 ,  G03F7/20

CPC分类号： G03F7/70116 ,  G03F7/70125 ,  G03F7/705 ,  G03F7/70625

摘要： Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.

摘要翻译： 公开了一种光源优化方法，其中将作为SMO的结果获得的光源形状设置为目标，SMO是用于优化掩模图案和照明光源的优化计算方法，空间光调制器被控制为使得 与目标的偏差在可接受的范围内，照明光源的形状被设定， 使用从具有设定光源形状的照明光源发射的照明光，在晶片上形成作为SMO的结果获得的图案的图像，使用通过检测获得的检测结果将OPE评价为图像形成性能 由此形成的图案的图像; 光源形状优化。