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89 条记录 (耗时 0.032 秒)

    Luminescence Sensor Using Multi-Layer Substrate Structure
    23.
    发明申请
    Luminescence Sensor Using Multi-Layer Substrate Structure 有权
    使用多层基板结构的发光传感器

    公开(公告)号：US20080197292A1

    公开(公告)日：2008-08-21

    申请号：US11995696

    申请日：2006-07-07

    申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    IPC分类号： G01J1/58 ,  C09K11/00

    CPC分类号： G01N21/76 ,  G01N21/648 ,  G01N33/54306 ,  G01N33/582

    摘要： The present invention provides a luminescence sensor (2), such as e.g. a luminescence biosensor, comprising a multi-layer structure. The multi-layer structure comprises at least a first layer (2a) formed of a first material and a second layer (2b) formed of a second material. The first material has a first binding capacity towards luminophores and the second material has a second binding capacity towards luminophores, the first binding capacity being different from the second binding capacity. The luminescence sensor (2) according to the present invention shows a high sensitivity because it provides preferred binding sites for luminophores at locations where the combined excitation and detection efficiency is the highest.

    摘要翻译： 本发明提供一种发光传感器（2），例如， 发光生物传感器，包括多层结构。 多层结构至少包括由第一材料形成的第一层（2a）和由第二材料形成的第二层（2b）。 第一材料具有朝向发光体的第一结合能力，第二材料具有朝向发光体的第二结合能力，第一结合能力不同于第二结合能力。 根据本发明的发光传感器（2）显示出高灵敏度，因为它在组合的激发和检测效率最高的位置处为发光体提供优选的结合位点。

    Lithographic apparatus, illumination system and debris trapping system
    25.
    发明授权
    Lithographic apparatus, illumination system and debris trapping system 有权
    平版印刷设备，照明系统和碎片捕获系统

    公开(公告)号：US07145132B2

    公开(公告)日：2006-12-05

    申请号：US11020674

    申请日：2004-12-27

    申请人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    发明人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    IPC分类号： H01S1/00 ,  G03B27/52

    CPC分类号： G03F7/70058 ,  G03F7/70916 ,  G03F7/70933

    摘要： A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.

    摘要翻译： 用于捕获由光刻设备中的辐射源产生辐射而释放的碎屑颗粒的碎片捕集系统包括第一和第二组通道。 第一组的每个通道使来自辐射源的辐射能够通过其传播并具有用于捕获碎屑颗粒的内壁。 相对于辐射的传播方向，第二组通道位于第一组的下游。 第二组的每个通道使得来自辐射源的辐射也能够通过其传播，并且具有用于捕获碎屑颗粒的内壁。 气体供应和排气被配置为在第一组和第二组通道之间提供气流，其具有基本上横跨辐射源的辐射的传播方向的净流动方向。

    Debris mitigation system and lithographic apparatus
    26.
    发明授权
    Debris mitigation system and lithographic apparatus 失效
    碎片缓解系统和光刻设备

    公开(公告)号：US08071963B2

    公开(公告)日：2011-12-06

    申请号：US11645809

    申请日：2006-12-27

    申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

    发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

    IPC分类号： G21G5/00

    CPC分类号： G03F7/70916 ,  G03F7/70858 ,  H05G2/003 ,  H05G2/005

    摘要： A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

    摘要翻译： 用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。 该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。 磁体结构被构造和布置成通过污染屏障提供磁场。 当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

    Luminescence sensor operating in reflection mode
    27.
    发明授权
    Luminescence sensor operating in reflection mode 有权
    发光传感器以反射模式工作

    公开(公告)号：US08039814B2

    公开(公告)日：2011-10-18

    申请号：US12158451

    申请日：2006-12-19

    申请人： Maarten Marinus Johannes Wilhelm Van Herpen ,  Derk Jan Wilfred Klunder ,  Hendrik Roelof Stapert

    发明人： Maarten Marinus Johannes Wilhelm Van Herpen ,  Derk Jan Wilfred Klunder ,  Hendrik Roelof Stapert

    IPC分类号： G01N21/64

    CPC分类号： G01N21/648 ,  G01N21/6428

    摘要： A luminescence sensor, such as a luminescence biosensor or a luminescence chemical sensor, includes a substrate having at least one aperture filled with a medium. The aperture has a first lateral dimension larger than the diffraction limit of excitation radiation in the medium, and a second lateral dimension smaller than the diffraction limit of the excitation radiation in the medium. A method is also provided for the detection of luminescence radiation, e.g. fluorescence radiation, generated by at least one optically variable molecule, e.g. fluorophore, in the at least one aperture. Beneficially, the excitation radiation is polarized to suppress the excitation radiation in the apertures. The luminescence sensor and the method are able to detect relatively low concentrations of optically variable molecules, e.g. fluorophores.

    摘要翻译： 诸如发光生物传感器或发光化学传感器的发光传感器包括具有填充有介质的至少一个孔的基板。 该孔具有比介质中的激发辐射的衍射极限大的第一横向尺寸，以及小于介质中的激发辐射的衍射极限的第二横向尺寸。 还提供了一种用于检测发光辐射的方法，例如， 由至少一个光学可变分子产生的荧光辐射，例如。 荧光团，在至少一个孔中。 有利地，激发辐射被极化以抑制孔中的激发辐射。 发光传感器和方法能够检测相对低浓度的光学可变分子，例如， 荧光团

    Anti-reflection coating for an EUV mask
    28.
    发明授权
    Anti-reflection coating for an EUV mask 有权
    防反射涂层用于EUV面罩

    公开(公告)号：US07736820B2

    公开(公告)日：2010-06-15

    申请号：US11418465

    申请日：2006-05-05

    申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

    发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

    IPC分类号： G03F1/00

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

    摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

    摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。