公开(公告)号：US5093156A

公开(公告)日：1992-03-03

申请号：US558703

申请日：1990-07-26

申请人： Seiichi Uemura ,  Yoshio Sohda ,  Yasuji Ido ,  Yukinori Kude ,  Takefumi Kohno ,  Toshio Hirai ,  Makoto Sasaki ,  Masayuki Niino

发明人： Seiichi Uemura ,  Yoshio Sohda ,  Yasuji Ido ,  Yukinori Kude ,  Takefumi Kohno ,  Toshio Hirai ,  Makoto Sasaki ,  Masayuki Niino

IPC分类号： C01B31/02 ,  C04B41/52 ,  C04B41/89 ,  C23C16/26 ,  C23C30/00

CPC分类号： C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C23C16/26 ,  C23C30/00 ,  C04B2111/00405

摘要： A carbon material having oxidation resistance is prepared by forming a fi coating constituted mainly by carbon on the surface of a carbon/carbon composite by chemical vapor deposition, then forming on said first coating a second coating of a ceramic or both a ceramic and carbon by chemical vapor deposition, and changing at least one of thermal physical properties or mechanical physical properties of carbon in said first coating continuously or step-wise.

公开(公告)号：US5045356A

公开(公告)日：1991-09-03

申请号：US329977

申请日：1989-03-29

申请人： Seiichi Uemura ,  Yoshio Sohda ,  Yasuji Ido ,  Toshio Hirai ,  Makoto Sasaki ,  Masayuki Niino

发明人： Seiichi Uemura ,  Yoshio Sohda ,  Yasuji Ido ,  Toshio Hirai ,  Makoto Sasaki ,  Masayuki Niino

IPC分类号： C01B31/02 ,  C04B35/83 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89

CPC分类号： C04B41/009 ,  C04B35/83 ,  C04B41/526 ,  C04B41/89 ,  Y10S427/10

摘要： A carbon/carbon composite having oxidation resistance is produced by filling the voids of a carbon/carbon composite comprising 10-70% by volume of carbon fibers and 5-90% by volume of a carbonaceous matrix and having a void percentage of 10-55%, with at least one of carbon and a ceramic by chemical vapor infiltration and then coating the deposit surface with a ceramic or both ceramic and carbon by chemical vapor deposition.

公开(公告)号：US4393097A

公开(公告)日：1983-07-12

申请号：US170168

申请日：1980-07-18

申请人： Toshio Hirai ,  Takashi Goto

发明人： Toshio Hirai ,  Takashi Goto

IPC分类号： C01B21/082 ,  C04B41/50 ,  C04B41/87 ,  C23C16/22 ,  C23C16/30 ,  C23C16/34 ,  C23C16/36 ,  C23C16/56 ,  H01B1/18 ,  B05D1/12 ,  B32B9/04 ,  C23C11/00

CPC分类号： C04B41/009 ,  C04B41/5066 ,  C04B41/87 ,  C23C16/22 ,  C23C16/36 ,  H01B1/18 ,  Y10T428/2918 ,  Y10T428/30

摘要： Electrically conductive Si.sub.3 N.sub.4 -C series amorphous material having excellent thermal and mechanical characteristics is produced in a massive size by chemical vapor deposition.

摘要翻译： 通过化学气相沉积以大规模生产具有优异的热和机械特性的导电Si 3 N 4 -C系列非晶材料。

公开(公告)号：US4340568A

公开(公告)日：1982-07-20

申请号：US115728

申请日：1980-01-28

申请人： Toshio Hirai ,  Koichi Niihara

发明人： Toshio Hirai ,  Koichi Niihara

IPC分类号： C01B21/068 ,  C04B35/584 ,  C23C16/34 ,  C23C16/44 ,  C23C16/455 ,  C30B25/02 ,  C30B28/14 ,  C30B29/38 ,  H01M2/08 ,  C30B35/00

CPC分类号： C23C16/45563 ,  C04B35/584 ,  C23C16/345 ,  C23C16/455 ,  C23C16/45576 ,  C30B25/02 ,  C30B29/38 ,  C30B29/605 ,  H01M2/08 ,  Y10S117/902 ,  Y10S117/915

摘要： A super hard-highly pure silicon nitride includes a preferentially oriented crystalline silicon nitride having a grain size of 1-50 .mu.m and a micro Vickers hardness of 5,000 kg/mm.sup.2 under a load of 100 g, a finely grained crystalline silicon nitride having an average grain size of less than 1 .mu.m and a micro Vickers hardness of 3,500 kg/mm.sup.2 under a load of 100 g, and an amorphous silicon nitride having a micro Vickers hardness of 2,200 kg/mm.sup.2 under a load of 100 g, and is produced by blowing a nitrogen depositing source and a silicon depositing source on a substrate heated at 500.degree.-1,900.degree. C. with a blowpipe composed of a pipe assembly wherein a first pipe for the nitrogen depositing source is surrounded with a second pipe for the silicon depositing source and the distance from an opening end of the first pipe to the substrate is shorter than the distance from an opening end of the second pipe to the substrate.

摘要翻译： 超硬度高的氮化硅包括在100g负载下具有1-50μm的晶粒尺寸和5000Kg / mm 2的微维氏硬度的优先取向的结晶氮化硅，具有 平均粒度小于1μm，微维氏硬度为3500kg / mm2，负荷为100g时，微观维氏硬度为2200kg / mm2的非晶氮化硅，负荷为100g，为 通过在由管组件构成的吹管中将氮沉积源和硅沉积源吹到加热到500℃-100℃的基板上，其中用于氮沉积源的第一管被第二管用于硅 沉积源和从第一管的开口端到基板的距离比从第二管的开口端到基板的距离短。

公开(公告)号：US4312923A

公开(公告)日：1982-01-26

申请号：US120090

申请日：1980-02-11

申请人： Toshio Hirai ,  Koichi Nihara

发明人： Toshio Hirai ,  Koichi Nihara

IPC分类号： C01B21/068 ,  C04B35/584 ,  C23C16/34 ,  C23C16/44 ,  C23C16/455 ,  C30B25/02 ,  C30B28/14 ,  C30B29/38 ,  H01M2/08 ,  C30B29/00

CPC分类号： C23C16/45563 ,  C04B35/584 ,  C23C16/345 ,  C23C16/455 ,  C23C16/45576 ,  C30B25/02 ,  C30B29/38 ,  C30B29/605 ,  H01M2/08 ,  Y10S117/902 ,  Y10S117/915

摘要： A super hard-highly pure silicon nitride includes a preferentially oriented crystalline silicon nitride having a grain size of 1-50 .mu.m and a micro Vickers hardness of 3,000 kg/mm.sup.2 under a load of 100 g, a finely grained crystalline silicon nitride having an average grain size of less than 1 .mu.m and a micro Vickers hardness of 3,500 kg/mm.sup.2 under a load of 100 g, and an amorphous silicon nitride having a micro Vickers hardness of 2,200 kg/mm.sup.2 under a load of 100 g, and is produced by blowing a nitrogen depositing source and a silicon depositing source on a substrate heated at 500.degree.-1,900.degree. C. with a blowpipe composed of a pipe assembly wherein a first pipe for the nitrogen depositing source is surrounded with a second pipe for the silicon depositing source and the distance from an opening end of the first pipe to the substrate is shorter than the distance from an opening end of the second pipe to the substrate.

摘要翻译： 超硬度高的氮化硅包括在负载为100g的情况下，晶粒尺寸为1-50μm和微维氏硬度为3,000kg / mm 2的优先取向的结晶氮化硅，具有 平均粒度小于1μm，微维氏硬度为3500kg / mm2，负荷为100g时，微观维氏硬度为2200kg / mm2的非晶氮化硅，负荷为100g，为 通过在由管组件构成的吹管中将氮沉积源和硅沉积源吹到加热到500℃-100℃的基板上，其中用于氮沉积源的第一管被第二管用于硅 沉积源和从第一管的开口端到基板的距离比从第二管的开口端到基板的距离短。

公开(公告)号：US06891140B2

公开(公告)日：2005-05-10

申请号：US10312492

申请日：2001-01-31

申请人： Motoyasu Sato ,  Sadatsugu Takayama ,  Masatoshi Mizuno ,  Seizo Obata ,  Tadashi Shimada ,  Toshio Hirai

发明人： Motoyasu Sato ,  Sadatsugu Takayama ,  Masatoshi Mizuno ,  Seizo Obata ,  Tadashi Shimada ,  Toshio Hirai

IPC分类号： C04B33/32 ,  C04B35/185 ,  C04B35/64 ,  F27B5/00 ,  F27B5/08 ,  F27B5/14 ,  F27B5/16 ,  F27B9/06 ,  F27B9/08 ,  F27B9/16 ,  F27B9/24 ,  F27B9/36 ,  F27B21/00 ,  F27D99/00 ,  H05B6/78

CPC分类号： C04B33/32 ,  B32B2315/02 ,  C04B33/36 ,  C04B35/10 ,  C04B35/185 ,  C04B35/64 ,  C04B2235/3272 ,  C04B2235/5224 ,  C04B2235/667 ,  C04B2235/77 ,  C04B2235/9607 ,  C04B2237/341 ,  C04B2237/343 ,  F27B5/00 ,  F27B5/08 ,  F27B5/14 ,  F27B9/062 ,  F27B9/084 ,  F27B9/16 ,  F27B9/2407 ,  F27B9/36 ,  F27B21/00 ,  F27B2005/166 ,  F27D99/0006 ,  F27D2099/0028 ,  Y02P40/65

摘要： A sintering furnace for sintering an object to be sintered formed of ceramics, fine ceramic materials, etc. to produce a sintered object and a method therefor. An insulating wall (28) and an inner shell (25) define a sintering chamber (16) for sintering an object to be sintered (10). Thermal equilibrium is maintained between the inner shell (25) and the object to be sintered (10), and the object to be sintered (10) is completely pseudo-adiabatically isolated to achieve more uniform and small energy consuming sintering. The thickness of the insulating wall (28) increases gradually from an inlet (20) toward an outlet (21). The object to be sintered (10) is fed by a carriage provided in a sintering furnace from the inlet (20) to the outlet (21) in the sintering chamber (16). Thereby, a temperature distribution corresponding to a plurality of processes can be easily formed in one furnace to sinter continuously the object to be sintered (10) in the furnace.

摘要翻译： 一种用于烧结由陶瓷，细陶瓷材料等形成的待烧结物体以制造烧结体的烧结炉及其方法。 绝缘壁（28）和内壳（25）限定了用于烧结待烧物体（10）的烧结室（16）。 在内壳25和待烧结物体10之间保持热平衡，并且被烧结物体10完全被假绝热隔离，以实现更均匀且耗能小的烧结。 绝缘壁（28）的厚度从入口（20）朝向出口（21）逐渐增加。 待烧结的物体（10）由设置在烧结炉中的载体从入口（20）输送到烧结室（16）中的出口（21）。 因此，可以容易地在一个炉中形成对应于多个处理的温度分布，以连续地烧结炉中的待烧结物体（10）。

公开(公告)号：US06542876B1

公开(公告)日：2003-04-01

申请号：US09535297

申请日：2000-03-24

申请人： Toshihiro Kikuchi ,  Yoshihiro Someno ,  Toshio Hirai ,  Yoshiyuki Kawazoe ,  Hiroshi Mizuseki

发明人： Toshihiro Kikuchi ,  Yoshihiro Someno ,  Toshio Hirai ,  Yoshiyuki Kawazoe ,  Hiroshi Mizuseki

IPC分类号： G06N300

CPC分类号： G02B5/285 ,  G06N3/126

摘要： A method of producing multilayered optical filters by using a genetic algorithm that determines an optimal combination of refractive indexes and thicknesses for each layer of the filter is described. The method generates initial values for the component and places the values within a matrix P, where P=(X1, X2, X3, . . . , Xi, . . . , Xs) and Xi is an elementary matrix that includes the refractive index and thickness of each layer i. The method may generate mutated patterns by increasing or decreasing the thicknesses and refractive indexes of the initial pattern. It may also perform a cross-over process, selecting patterns from grouping of mutated patterns. Alternately, the method may perform a process where selected patterns having optical characteristics closest to the desired characteristics from the initial, mutated or crossover patters are chosen. The genetic algorithm utilizing the above processes repeats until the optical characteristics fall within the desired range.

摘要翻译： 描述了通过使用确定滤波器每层的折射率和厚度的最佳组合的遗传算法来生产多层滤光器的方法。 该方法生成组件的初始值，并将值置于矩阵P中，其中P =（X1，X2，X3，...，Xi，...，Xs），并且Xi是包括折射率的基本矩阵 和每层i的厚度。 该方法可以通过增加或减少初始图案的厚度和折射率来产生突变图案。 它还可以执行交叉过程，从突变模式的分组中选择模式。 或者，该方法可以执行其中选择具有最接近于初始，突变或交叉图案的所需特征的光学特性的选定图案的处理。 使用上述处理的遗传算法重复，直到光学特性落入所需范围内。

公开(公告)号：US6115180A

公开(公告)日：2000-09-05

申请号：US336418

申请日：1999-06-17

申请人： Toshio Hirai ,  Hiroshi Masumoto ,  Xinrong Wang ,  Yoshihiro Someno

发明人： Toshio Hirai ,  Hiroshi Masumoto ,  Xinrong Wang ,  Yoshihiro Someno

IPC分类号： G02B5/28

CPC分类号： G02B5/288

摘要： Described herein is an optical multilayered-film filter which provides less interference and a good optical characteristic and is high in productivity. The optical multilayered-film filter wherein dielectric thin films are stacked on each other in a multilayer form in a single direction, comprises a refractive-index inclined laminated portion in which refractive indices of dielectric thin-film layers are successively inclined and changed in a laminating direction, and an alternately-laminated portion in which a dielectric thin-film layer having a high refractive index and a dielectric thin-film layer having a low refractive index are alternately laminated on each other.

摘要翻译： 这里描述了一种光学多层膜滤光器，其提供较小的干涉和良好的光学特性，并且生产率高。 电介质薄膜以单层方式以多层形式彼此堆叠的光学多层膜滤光器包括折射率倾斜层叠部分，其中电介质薄膜层的折射率依次倾斜并且在层叠中变化 方向，并且具有折射率高的电介质薄膜层和具有低折射率的电介质薄膜层的交替层叠部分彼此交替层叠。

公开(公告)号：US5439853A

公开(公告)日：1995-08-08

申请号：US64179

申请日：1993-05-25

申请人： Mamoru Omori ,  Toshio Hirai

发明人： Mamoru Omori ,  Toshio Hirai

IPC分类号： C04B35/18 ,  C04B35/44 ,  C04B35/50 ,  C04B35/565 ,  C04B35/584 ,  C04B35/51

CPC分类号： C04B35/50 ,  C04B35/18 ,  C04B35/44 ,  C04B35/565 ,  C04B35/584

摘要： In order to provide a mixed oxide ceramic sintered body having no defect such as void and pore, and high strength, toughness and reliability, a mixed oxide of rare earth oxide-alumina oxide added with silica is fired with a non-oxide mixture of SiC and/or Si.sub.3 N.sub.4. In the production method, the crystal grain size of the sintered body is controlled to not more than 30 .mu.m, and abnormal grain growth and occurrence of pore can be restrained to easily produce a practically usable mixed oxide ceramic sintered body having excellent toughness inherent to oxide sintered body and excellent high-temperature strength inherent to SiC and Si.sub.3 N.sub.4 and uniform structure.

摘要翻译： PCT No.PCT / JP92 / 01237 Sec。 371日期：1993年5月25日 102（e）日期1993年5月25日PCT提交1992年9月28日PCT公布。 公开号WO93 / 06060 日本1 9 9 3年1月4日。为了提供无空隙，无孔等缺陷的混合氧化物陶瓷烧结体，强度，韧性和可靠性高，加入二氧化硅的稀土氧化物 - 氧化铝的混合氧化物用 SiC和/或Si 3 N 4的非氧化物混合物。 在制造方法中，将烧结体的结晶粒径控制在30μm以下，可以抑制异常的晶粒生长和孔的产生，容易地制造具有优异韧性的实用的混合氧化物陶瓷烧结体 氧化物烧结体和SiC和Si3N4固有的优异的高温强度和均匀的结构。

公开(公告)号：US5340959A

公开(公告)日：1994-08-23

申请号：US030056

申请日：1993-03-23

申请人： Kiyoshi Sawada ,  Toshio Hirai

发明人： Kiyoshi Sawada ,  Toshio Hirai

IPC分类号： B23H7/30 ,  B23H1/04

CPC分类号： B23H7/30

摘要： An electric discharge machine designed to prevent an impactive high-speed motion generated upon actuation of an electrode actuator from propagating to a quill, as well as to enable the rapid retreat of a tool electrode by the electrode actuator to be performed efficiently. The tool electrode is attached to a quill through an elastic supporting element and a piezoelectric actuator, with the elastic supporting element disposed on the side of the quill. The elastic supporting element has an elasticity whose degree is set so as not to adversely affect normal positioning of the tool electrode, and the piezoelectric actuator facilitates rapid retreat of the tool electrode. A support body includes a counter weight having a weight large enough to absorb the component of the impactive high-speed motion of the electrode actuator which acts toward the quill.

摘要翻译： 一种放电机，设计用于防止在致动电极致动器时产生的冲击性高速运动传播到套筒，并且能够有效地执行由电极致动器快速退回工具电极。 工具电极通过弹性支撑元件和压电致动器附接到套筒上，弹性支撑元件设置在套筒的侧面上。 弹性支撑元件具有设定为不会对工具电极的正常定位产生不利影响的弹性，并且压电致动器有利于工具电极的快速退回。 支撑体包括配重，所述配重具有足够大的重量以吸收电极致动器的冲击性高速运动的部件，所述高速运动朝向针筒。