公开(公告)号：US08680289B2

公开(公告)日：2014-03-25

申请号：US13363918

申请日：2012-02-01

申请人： John Anthony Thomas Norman ,  Melanie K. Perez ,  Xinjian Lei ,  Daniel P. Spence ,  Sergei Vladimirovich Ivanov ,  Wade Hampton Bailey, III

发明人： John Anthony Thomas Norman ,  Melanie K. Perez ,  Xinjian Lei ,  Daniel P. Spence ,  Sergei Vladimirovich Ivanov ,  Wade Hampton Bailey, III

IPC分类号： C07F15/00 ,  C23C16/18

CPC分类号： C07F17/02 ,  C07F5/00 ,  C07F5/003 ,  C07F7/003 ,  C07F7/28 ,  C07F15/02 ,  C07F15/04 ,  C07F15/06 ,  C07F17/00

摘要： Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated.

摘要翻译： 描述了金属咪唑盐络合物，其中描述了用大体积基团官能化的咪唑配体及其阴离子配对物，即咪唑盐。 包括一种或多种这样的多烷基化咪唑酸盐阴离子配位到金属或一种以上选自碱金属，过渡金属，镧系元素金属，锕系金属，主要金属（包括硫族化物）的金属中。 或者，除了其它不同的阴离子之外，多种不同的咪唑阴离子可以与金属配位以制备新的络合物。 还考虑了新化合物的合成及其用于形成含薄金属膜的用途。

公开(公告)号：US08507704B2

公开(公告)日：2013-08-13

申请号：US12871284

申请日：2010-08-30

申请人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Daniel P. Spence ,  John Anthony Thomas Norman ,  Laura M. Matz

发明人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Daniel P. Spence ,  John Anthony Thomas Norman ,  Laura M. Matz

IPC分类号： C07F5/00 ,  C07F5/06 ,  C07F9/00 ,  C07F13/00 ,  C07F7/00 ,  C07F11/00 ,  C07F1/00 ,  C07F3/00 ,  C07F15/00 ,  C07C49/92

CPC分类号： C09D1/00 ,  C23C16/18 ,  C23C16/404 ,  C23C16/448

摘要： A formulation, comprising: a) at least one metal-ligand complex, wherein one or more ligands are selected from the group consisting of β-diketonates, β-ketoiminates, β-ketoesterates, β-diiminates, alkyls, carbonyls, alkyl carbonyls, cyclopentadienyls, pyrrolyls, alkoxides, amidinates, imidazolyls, and mixtures thereof; and the metal is selected from Group 2 to 16 elements of the Periodic Table of the Elements; and, b) at least one aminoether selected from the group consisting of R1R2NR3OR4NR5R6, R1OR4NR5R6, O(CH2CH2)2NR1, R1R2NR3N(CH2CH2)2O, R1R2NR3OR4N(CH2CH2)2O, O(CH2CH2)2NR1OR2N(CH2CH2)2O, and mixtures thereof, wherein R1-6 are independently selected from group consisting of C1-10 linear alkyl, C1-10 branched alkyl, C1-10 cyclic alkyl, C6-C10 aromatic, C1-10 alkylamine, C1-10 alkylaminoalkyl, C1-10 ether, C4-C10 cyclic ether, C4-C10 cyclic aminoether, and mixture thereof.

摘要翻译： 一种制剂，其包含：a）至少一种金属 - 配体配合物，其中一个或多个配体选自β-二酮酸酯，β-酮亚胺酸酯，β-酮酯酸酯，β-二亚胺酯，烷基，羰基，烷基羰基， 环戊二烯基，吡咯烷基，烷氧基化物，脒基，咪唑啉及其混合物; 金属选自元素周期表第2〜16族元素; 和（b）至少一种选自下组的氨基醚：R1R2NR3OR4NR5R6，R1OR4NR5R6，O（CH2CH2）2NR1，R1R2NR3N（CH2CH2）2O，R1R2NR3OR4N（CH2CH2）2O，O（CH2CH2）2NR1OR2N（CH2CH2） 其中R1-6独立地选自C1-10直链烷基，C1-10支链烷基，C1-10环烷基，C6-C10芳族，C1-10烷基胺，C1-10烷基氨基烷基，C1-10醚，C4 -C 10环醚，C 4 -C 10环氨基醚及其混合物。

公开(公告)号：US08471049B2

公开(公告)日：2013-06-25

申请号：US12629416

申请日：2009-12-02

申请人： Xinjian Lei ,  Daniel P. Spence ,  Moo-Sung Kim ,  Iain Buchanan ,  Laura M. Matz ,  Sergei Vladimirovich Ivanov

发明人： Xinjian Lei ,  Daniel P. Spence ,  Moo-Sung Kim ,  Iain Buchanan ,  Laura M. Matz ,  Sergei Vladimirovich Ivanov

IPC分类号： C07F7/28 ,  C23C16/00

CPC分类号： C23C16/455 ,  C07F7/003 ,  C23C16/18 ,  C23C16/40

摘要： Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: wherein M comprises a metal chosen from Ti, Zr, and Hf; R and R1 are each independently selected from an alkyl group comprising from 1 to 10 carbon atoms; R2 is an alkyl group comprising from 1 to 10 carbon atoms; R3 is chosen from hydrogen or an alkyl group comprising from 1 to 3 carbon atoms; R4 is an alkyl group comprising from 1 to 6 carbon atoms and wherein R2 and R4 are different alkyl groups. Also described herein are methods for making Group 4 metal-containing precursors and methods for depositing films using the Group 4 metal-containing precursors.

摘要翻译： 本文描述的是含有第4族金属的前体，包含第4族金属的前体的组合物，以及用于在基材上制造含适形金属的膜的沉积工艺。 一方面，含4族金属的前体由下式I表示：其中M包括选自Ti，Zr和Hf的金属; R和R 1各自独立地选自包含1至10个碳原子的烷基; R 2是包含1至10个碳原子的烷基; R3选自氢或包含1至3个碳原子的烷基; R4是包含1至6个碳原子的烷基，其中R2和R4是不同的烷基。 本文还描述了制备含有第4族金属的前体的方法以及使用含有第4族金属的前体沉积膜的方法。

公开(公告)号：US20110212629A1

公开(公告)日：2011-09-01

申请号：US12871284

申请日：2010-08-30

申请人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Daniel P. Spence ,  John Anthony Thomas Norman ,  Laura M. Matz

发明人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Daniel P. Spence ,  John Anthony Thomas Norman ,  Laura M. Matz

IPC分类号： H01L21/31 ,  C09D7/12

CPC分类号： C09D1/00 ,  C23C16/18 ,  C23C16/404 ,  C23C16/448

摘要： A formulation, comprising: a) at least one metal-ligand complex, wherein one or more ligands are selected from the group consisting of β-diketonates, β-ketoiminates, β-ketoesterates, β-diiminates, alkyls, carbonyls, alkyl carbonyls, cyclopentadienyls, pyrrolyls, alkoxides, amidinates, imidazolyls, and mixtures thereof; and the metal is selected from Group 2 to 16 elements of the Periodic Table of the Elements; and, b) at least one aminoether selected from the group consisting of R1R2NR3OR4NR5R6, R1OR4NR5R6, O(CH2CH2)2NR1, R1R2NR3N(CH2CH2)2O, R1R2NR3OR4N(CH2CH2)2O, O(CH2CH2)2NR1OR2N(CH2CH2)2O, and mixtures thereof, wherein R1-6 are independently selected from group consisting of C1-10 linear alkyl, C1-10 branched alkyl, C1-10 cyclic alkyl, C6-C10 aromatic, C1-10 alkylamine, C1-10 alkylaminoalkyl, C1-10 ether, C4-C10 cyclic ether, C4-C10 cyclic aminoether, and mixture thereof.

摘要翻译： 一种制剂，其包含：a）至少一种金属 - 配体配合物，其中一个或多个配体选自由β-葡萄糖酮酮，酮基酮，酮基酯，β-二亚胺，烷基，羰基 ，烷基羰基，环戊二烯基，吡咯啉，烷氧基，脒基，咪唑并及其混合物; 金属选自元素周期表第2〜16族元素; 和（b）至少一种选自下组的氨基醚：R1R2NR3OR4NR5R6，R1OR4NR5R6，O（CH2CH2）2NR1，R1R2NR3N，CH2R2， 其中R1-6独立地选自C1-10直链烷基，C1-10支链烷基，C1-10环烷基，C6-C10芳族，C1-10烷基胺，C1-10烷基氨基烷基，C1-10醚，C4 -C 10环醚，C 4 -C 10环氨基醚及其混合物。

公开(公告)号：US20100178228A1

公开(公告)日：2010-07-15

申请号：US12653716

申请日：2009-12-16

申请人： Anthony Rocco Cartolano ,  Sergei Vladimirovich Ivanov ,  Cheryl Irene Teich ,  John Hiroshi Yamamoto

发明人： Anthony Rocco Cartolano ,  Sergei Vladimirovich Ivanov ,  Cheryl Irene Teich ,  John Hiroshi Yamamoto

IPC分类号： C01B6/21 ,  C01B6/15

CPC分类号： C01B6/21

摘要： A method for preparing M2B12H12, wherein M is an alkali metal, from an alkali metal borohydride and an amine borane. The method includes a step of allowing the alkali metal borohydride to react with excess amine borane in contact with a complexing agent.

摘要翻译： 从碱金属硼氢化物和胺硼烷制备M2B12H12（其中M为碱金属）的方法。 该方法包括使碱金属硼氢化物与与络合剂接触的过量胺硼烷反应的步骤。

公开(公告)号：US08642797B2

公开(公告)日：2014-02-04

申请号：US13030227

申请日：2011-02-18

申请人： Sergei Vladimirovich Ivanov ,  Wade Hampton Bailey, III ,  Xinjian Lei ,  Daniel P. Spence

发明人： Sergei Vladimirovich Ivanov ,  Wade Hampton Bailey, III ,  Xinjian Lei ,  Daniel P. Spence

IPC分类号： C07F7/00 ,  C07F11/00 ,  C07F15/00 ,  C23C16/00

CPC分类号： C23C16/45553 ,  C07F7/003 ,  C23C16/405

摘要： Volatile metal amidate metal complexes are exemplified by bis(N-(tert-butyl)ethylamidate)bis(ethylmethylamido) titanium; (N-(tert-butyl)(tert-butyl)amidate)tris(ethylmethylamido) titanium; bis(N-(tert-butyl)(tert-butyl)amidate)bis(dimethylamido) titanium and (N-(tert-butyl)(tert-butyl)amidate)tris(dimethylamido) titanium. The term “volatile” refers to any precursor of this invention having vapor pressure above 0.5 torr at temperature less than 200° C. Metal-containing film depositions using these metal amidate ligands are also described.

摘要翻译： 挥发性金属酰胺化物金属络合物的实例是双（N-（叔丁基）乙基氨基乙酸酯）双（乙基甲基氨基）钛; （N-（叔丁基）（叔丁基）酰胺酯）三（乙基甲基氨基）钛; 双（N-（叔丁基）（叔丁基）酰胺酯）双（二甲基氨基）钛和（N-（叔丁基）（叔丁基）酰胺酯）三（二甲基氨基）钛。 术语“挥发性”是指在低于200℃的温度下蒸气压高于0.5托的本发明任何前体。还描述了使用这些金属酰胺化物配体的含金属膜沉积。

公开(公告)号：US20120121806A1

公开(公告)日：2012-05-17

申请号：US13152885

申请日：2011-06-03

申请人： John Anthony Thomas Norman ,  Melanie K. Perez ,  Xinjian Lei ,  Daniel P. Spence ,  Sergei Vladimirovich Ivanov ,  Wade Hampton Bailey, III

发明人： John Anthony Thomas Norman ,  Melanie K. Perez ,  Xinjian Lei ,  Daniel P. Spence ,  Sergei Vladimirovich Ivanov ,  Wade Hampton Bailey, III

IPC分类号： C07F7/28 ,  C07F13/00 ,  B05D3/12 ,  C23C16/50 ,  C23C16/44 ,  C07F15/02 ,  C07F5/00

CPC分类号： C07F17/02 ,  C07F5/00 ,  C07F5/003 ,  C07F7/003 ,  C07F7/28 ,  C07F15/02 ,  C07F15/04 ,  C07F15/06 ,  C07F17/00

摘要： Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated.

摘要翻译： 描述了金属咪唑盐络合物，其中描述了用大体积基团官能化的咪唑配体及其阴离子配对物，即咪唑盐。 包括一种或多种这样的多烷基化咪唑酸盐阴离子配位到金属或一种以上选自碱金属，过渡金属，镧系元素金属，锕系金属，主要金属（包括硫族化物）的金属中。 或者，除了其它不同的阴离子之外，多种不同的咪唑阴离子可以与金属配位以制备新的络合物。 还考虑了新化合物的合成及其用于形成含薄金属膜的用途。

公开(公告)号：US20110256314A1

公开(公告)日：2011-10-20

申请号：US12904461

申请日：2010-10-14

申请人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Hansong Cheng ,  Daniel P. Spence ,  Moo-Sung Kim

发明人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Hansong Cheng ,  Daniel P. Spence ,  Moo-Sung Kim

IPC分类号： C23C16/18

CPC分类号： C23C16/45553 ,  C07F7/003 ,  C23C16/405

摘要： A method for forming metal-containing films by atomic layer deposition using precursors of the formula: M(OR1)(OR2)(R3C(O)C(R4)C(O)XR5y)2 wherein M is Group 4 metals; wherein R1 and R2 can be same or different selected from the group consisting of a linear or branched C1-10 alkyl and a C6-12 aryl; R3 can be selected from the group consisting of linear or branched C1-10 alkyls, preferably C1-3 alkyls and a C6-12 aryl; R4 is selected from the group consisting of hydrogen, C1-10 alkyls, and a C6-12 aryl, preferably hydrogen; R5 is selected from the group consisting of C1-10 linear or branched alkyls, and a C6-12 aryl, preferably a methyl or ethyl group; X═O or N wherein when X═O, y=1 and R1, 2 and 5 are the same, when X═N, y=2 and each R5 can be the same or different.

摘要翻译： 使用下式的M（OR1）（OR2）（R3C（O）C（R4）C（O）XR5y）2的前体通过原子层沉积形成含金属膜的方法，其中M是第4族金属; 其中R1和R2可以相同或不同，选自直链或支链C 1-10烷基和C 6-12芳基; R 3可以选自直链或支链C 1-10烷基，优选C 1-3烷基和C 6-12芳基; R 4选自氢，C 1-10烷基和C 6-12芳基，优选氢; R5选自C1-10直链或支链烷基，和C6-12芳基，优选甲基或乙基; X = O或N，其中当X = O，y = 1且R 1，2和5相同时，当X = N，y = 2，并且每个R 5可以相同或不同时。

公开(公告)号：US20100143607A1

公开(公告)日：2010-06-10

申请号：US12629416

申请日：2009-12-02

申请人： Xinjian Lei ,  Daniel P. Spence ,  Moo-Sung Kim ,  Iain Buchanan ,  Laura M. Matz ,  Sergei Vladimirovich Ivanov

发明人： Xinjian Lei ,  Daniel P. Spence ,  Moo-Sung Kim ,  Iain Buchanan ,  Laura M. Matz ,  Sergei Vladimirovich Ivanov

IPC分类号： C23C16/50 ,  C23C16/44 ,  C23C16/22

CPC分类号： C23C16/455 ,  C07F7/003 ,  C23C16/18 ,  C23C16/40

摘要： Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: wherein M comprises a metal chosen from Ti, Zr, and Hf; R and R1 are each independently selected from an alkyl group comprising from 1 to 10 carbon atoms; R2 is an alkyl group comprising from 1 to 10 carbon atoms; R3 is chosen from hydrogen or an alkyl group comprising from 1 to 3 carbon atoms; R4 is an alkyl group comprising from 1 to 6 carbon atoms and wherein R2 and R4 are different alkyl groups. Also described herein are methods for making Group 4 metal-containing precursors and methods for depositing films using the Group 4 metal-containing precursors.

摘要翻译： 本文描述的是含有第4族金属的前体，包含第4族金属的前体的组合物，以及用于在基材上制造含适形金属的膜的沉积工艺。 一方面，含4族金属的前体由下式I表示：其中M包括选自Ti，Zr和Hf的金属; R和R 1各自独立地选自包含1至10个碳原子的烷基; R 2是包含1至10个碳原子的烷基; R3选自氢或包含1至3个碳原子的烷基; R4是包含1至6个碳原子的烷基，其中R2和R4是不同的烷基。 本文还描述了制备含有第4族金属的前体的方法以及使用含有第4族金属的前体沉积膜的方法。

公开(公告)号：US07718154B2

公开(公告)日：2010-05-18

申请号：US11448006

申请日：2006-06-07

申请人： Sergei Vladimirovich Ivanov ,  Baldomero Casas

发明人： Sergei Vladimirovich Ivanov ,  Baldomero Casas

IPC分类号： C01B35/00 ,  C01B35/10 ,  C01B35/14 ,  C01B6/13

CPC分类号： C01B35/026 ,  C07F5/022

摘要： This idea relates to the synthesis of salts of dodecahydrododecaborate B12H12 (2-). In the proposed process a metal hydride is reacted with an alkyl borate in the presence of a Lewis base to produce Lewis base-borane compex, which is thermally decomposed to produce salts of B12H12 (2-), while alkyl borare is recovered from the reaction by-product and is recycled.

摘要翻译： 这个想法涉及十二氢十二硼酸盐B12H12（2-）的盐的合成。 在所提出的方法中，金属氢化物与硼酸烷基酯在路易斯碱的存在下反应以产生路易斯碱 - 硼烷化合物，其被热分解以产生B12H12（2-）的盐，而从反应中回收烷基硼烷 副产品，并回收利用。