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    Volatile Group 2 Metal Precursors
    2.
    发明申请
    Volatile Group 2 Metal Precursors 有权
    挥发性组2金属前体

    公开(公告)号：US20110120875A1

    公开(公告)日：2011-05-26

    申请号：US12785041

    申请日：2010-05-21

    申请人： John Anthony Thomas Norman

    发明人： John Anthony Thomas Norman

    IPC分类号： H01B1/12 ,  C07F3/00 ,  C25D5/00

    CPC分类号： C07F3/003

    摘要： A compound comprising one or more polyfunctionalized pyrrolyl anions coordinated to a metal selected from the group consisting of barium, strontium, magnesium, radium or calcium or mixtures thereof. Alternatively, one anion can be substituted with and a second non-pyrrolyl anion.Synthesis of the novel compounds and their use to form BST films is also contemplated.

    摘要翻译： 包含与选自钡，锶，镁，镭或钙的金属或其混合物配位的一种或多种多官能化的吡咯基阴离子的化合物。 或者，一个阴离子可以被第二个非吡咯基阴离子取代。 还考虑了新型化合物的合成及其用于形成BST膜的用途。

    Metal Precursor Solutions For Chemical Vapor Deposition
    3.
    发明申请
    Metal Precursor Solutions For Chemical Vapor Deposition 审中-公开
    用于化学气相沉积的金属前体溶液

    公开(公告)号：US20080254218A1

    公开(公告)日：2008-10-16

    申请号：US12058200

    申请日：2008-03-28

    申请人： Xinjian Lei ,  Liam Quinn ,  John Anthony Thomas Norman ,  William Franklin Burgoyne ,  Gauri Sankar Lal ,  Michael Ulman ,  Daniel P. Spence

    发明人： Xinjian Lei ,  Liam Quinn ,  John Anthony Thomas Norman ,  William Franklin Burgoyne ,  Gauri Sankar Lal ,  Michael Ulman ,  Daniel P. Spence

    IPC分类号： C23C18/44

    CPC分类号： C23C16/18 ,  C23C16/16

    摘要： Metal source containing precursor liquid solutions for chemical vapor deposition processes, including atomic layer deposition, for fabricating conformal metal-containing films on substrates are described. More specifically, the metal source precursor liquid solutions are comprised of (i) at least one metal complex selected from β-diketonates, β-ketoiminates, β-diiminates, alkyl metal, metal carbonyl, alkyl metal carbonyl, aryl metal, aryl metal carbonyl, cyclopentadienyl metal, cyclopentadienyl metal isonitrile, cyclopentadienyl metal nitrile, cyclopentadienyl metal carbonyl, metal alkoxide, metal ether alkoxide, and metal amides wherein the ligand can be monodentate, bidentate and multidentate coordinating to the metal atom and the metal is selected from group 2 to 14 elements, and (ii) a solvent selected from organic amides including linear amides and cyclic amides for such metal source containing precursors.

    摘要翻译： 描述了用于在衬底上制造保形的含金属膜的用于化学气相沉积工艺的包含原子层沉积的前体液体溶液的金属源。 更具体地说，金属源前体液体溶液包括（i）至少一种选自β-二酮酸酯，β-酮亚胺酸酯，β-二亚胺，烷基金属，金属羰基，烷基金属羰基，芳基金属，芳基金属羰基 ，环戊二烯基金属，环戊二烯基金属异腈，环戊二烯基金属腈，环戊二烯基金属羰基，金属醇盐，金属醚醇盐和金属酰胺，其中配体可以是单齿，双齿和多齿配位的金属原子，金属选自组2 14元素，和（ii）选自有机酰胺的溶剂，包括用于这种含金属源的前体的线性酰胺和环状酰胺。

    Volatile metal β-ketoiminate complexes
    5.
    发明授权
    Volatile metal β-ketoiminate complexes 有权
    挥发性金属β-酮亚胺络合物

    公开(公告)号：US07034169B1

    公开(公告)日：2006-04-25

    申请号：US11111455

    申请日：2005-04-21

    申请人： John Anthony Thomas Norman

    发明人： John Anthony Thomas Norman

    IPC分类号： C07F1/08 ,  C23C16/00 ,  B32B15/04

    CPC分类号： C23C16/18 ,  C07F1/005 ,  C07F7/0803 ,  Y10T428/31678

    摘要： Metal complexes, containing copper, silver, gold, cobalt, ruthenium, rhodium, platinum, palladium, nickel, osmium, and/or indium, and methods for making and using same are described herein. In certain embodiments, the metal complexes described herein may be used as precursors to deposit metal or metal-containing films on a substrate through, for example, atomic layer deposition or chemical vapor deposition conditions.

    摘要翻译： 包含铜，银，金，钴，钌，铑，铂，钯，镍，锇和/或铟的金属络合物及其制备和使用方法在此描述。 在某些实施方案中，本文所述的金属络合物可用作通过例如原子层沉积或化学气相沉积条件在基底上沉积金属或含金属膜的前体。

    Liquid precursor mixtures for deposition of multicomponent metal containing materials
    6.
    发明授权
    Liquid precursor mixtures for deposition of multicomponent metal containing materials 失效
    用于沉积多组分含金属材料的液体前体混合物

    公开(公告)号：US06238734B1

    公开(公告)日：2001-05-29

    申请号：US09350074

    申请日：1999-07-08

    申请人： Yoshihide Senzaki ,  David Allen Roberts ,  John Anthony Thomas Norman

    发明人： Yoshihide Senzaki ,  David Allen Roberts ,  John Anthony Thomas Norman

    IPC分类号： C23C1618

    CPC分类号： C23C18/1216 ,  C23C16/34 ,  C23C16/40 ,  C23C16/401 ,  C23C16/405 ,  C23C18/1225 ,  C23C18/1254 ,  C23C18/1258

    摘要： The present invention is a composition for deposition of a mixed metal or metal compound layer, comprising a solventless mixture of at least two metal-ligand complex precursors, wherein the mixture is liquid at ambient conditions and the ligands are the same and are selected from the group consisting of alkyls, alkoxides, halides, hydrides, amides, imides, azides cyclopentadienyls, carbonyls, and their fluorine, oxygen and nitrogen substituted analogs. The present invention is also a process for deposition of a multiple metal or metal compound layer on a substrate of an electronic material, comprising: a) providing a solventless mixture of two or more metal-ligand complex precursors which constitute a liquid at ambient conditions, wherein the ligands are the same and are selected from the group consisting of alkyls, alkoxides, halides, hydrides, amides, imides, azides, nitrates, cyclopentadienyls, carbonyls, and their fluorine, oxygen and nitrogen substituted analogs; b) delivering the solventless mixture by direct liquid injection to a flash vaporization zone to vaporize the solventless mixture; c) contacting the substrate under deposition conditions with a resulting vapor of the solventless mixture, and c) depositing a multiple metal or metal compound layer on the substrate from the solventless mixture.

    摘要翻译： 本发明是用于沉积混合金属或金属化合物层的组合物，其包含至少两种金属 - 配体复合物前体的无溶剂混合物，其中所述混合物在环境条件下为液体，并且所述配体相同，并且选自 由烷基，醇盐，卤化物，氢化物，酰胺，酰亚胺，叠氮化物环戊二烯基，羰基以及它们的氟，氧和氮取代的类似物组成的组。 本发明还是一种在电子材料的基底上沉积多个金属或金属化合物层的方法，包括：a）在环境条件下提供构成液体的两种或更多种金属 - 配体复合物前体的无溶剂混合物， 卤化物，氢化物，酰胺，酰亚胺，叠氮化物，硝酸盐，环戊二烯基，羰基以及它们的氟，氧和氮取代的类似物;其中配体是相同的并且选自烷基，醇盐，卤化物， b）通过直接液体注入将无溶剂混合物输送到闪蒸区域以蒸发无溶剂混合物; c）在沉积条件下使所述衬底与无溶剂混合物的所得蒸气接触，以及c）从所述无溶剂混合物在所述衬底上沉积多个金属或金属化合物层。

    Liquid composition containing aminoether for deposition of metal-containing films
    9.
    发明授权
    Liquid composition containing aminoether for deposition of metal-containing films 有权
    含有含有金属的膜的氨基醚的液体组合物

    公开(公告)号：US08507704B2

    公开(公告)日：2013-08-13

    申请号：US12871284

    申请日：2010-08-30

    申请人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Daniel P. Spence ,  John Anthony Thomas Norman ,  Laura M. Matz

    发明人： Sergei Vladimirovich Ivanov ,  Xinjian Lei ,  Daniel P. Spence ,  John Anthony Thomas Norman ,  Laura M. Matz

    IPC分类号： C07F5/00 ,  C07F5/06 ,  C07F9/00 ,  C07F13/00 ,  C07F7/00 ,  C07F11/00 ,  C07F1/00 ,  C07F3/00 ,  C07F15/00 ,  C07C49/92

    CPC分类号： C09D1/00 ,  C23C16/18 ,  C23C16/404 ,  C23C16/448

    摘要： A formulation, comprising: a) at least one metal-ligand complex, wherein one or more ligands are selected from the group consisting of β-diketonates, β-ketoiminates, β-ketoesterates, β-diiminates, alkyls, carbonyls, alkyl carbonyls, cyclopentadienyls, pyrrolyls, alkoxides, amidinates, imidazolyls, and mixtures thereof; and the metal is selected from Group 2 to 16 elements of the Periodic Table of the Elements; and, b) at least one aminoether selected from the group consisting of R1R2NR3OR4NR5R6, R1OR4NR5R6, O(CH2CH2)2NR1, R1R2NR3N(CH2CH2)2O, R1R2NR3OR4N(CH2CH2)2O, O(CH2CH2)2NR1OR2N(CH2CH2)2O, and mixtures thereof, wherein R1-6 are independently selected from group consisting of C1-10 linear alkyl, C1-10 branched alkyl, C1-10 cyclic alkyl, C6-C10 aromatic, C1-10 alkylamine, C1-10 alkylaminoalkyl, C1-10 ether, C4-C10 cyclic ether, C4-C10 cyclic aminoether, and mixture thereof.

    摘要翻译： 一种制剂，其包含：a）至少一种金属 - 配体配合物，其中一个或多个配体选自β-二酮酸酯，β-酮亚胺酸酯，β-酮酯酸酯，β-二亚胺酯，烷基，羰基，烷基羰基， 环戊二烯基，吡咯烷基，烷氧基化物，脒基，咪唑啉及其混合物; 金属选自元素周期表第2〜16族元素; 和（b）至少一种选自下组的氨基醚：R1R2NR3OR4NR5R6，R1OR4NR5R6，O（CH2CH2）2NR1，R1R2NR3N（CH2CH2）2O，R1R2NR3OR4N（CH2CH2）2O，O（CH2CH2）2NR1OR2N（CH2CH2） 其中R1-6独立地选自C1-10直链烷基，C1-10支链烷基，C1-10环烷基，C6-C10芳族，C1-10烷基胺，C1-10烷基氨基烷基，C1-10醚，C4 -C 10环醚，C 4 -C 10环氨基醚及其混合物。