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公开(公告)号：US08902560B2
公开(公告)日：2014-12-02
申请号：US12262990
申请日：2008-10-31
IPC分类号： H01L21/683 , H01T23/00
CPC分类号： H01L21/6831
摘要： An electrostatic chuck and method for clamping a workpiece is provided. The ESC comprises a clamping plate having a clamping surface, and one or more electrodes. An electric potential applied to the one or more electrodes selectively clamps the workpiece to the clamping surface. A punch is operably coupled to the clamping plate and an electrical ground, wherein the punch comprises a trigger mechanism and a punch tip. The punch tip translates between extended and retracted positions, wherein a point of the punch tip is proud of the clamping surface when the punch tip is in the extended position. The punch tip is configured to translate toward the clamping surface upon clamping the workpiece to the clamping plate. Upon reaching the retracted position, the trigger mechanism imparts an impact force to the punch tip, forcing the punch tip into the workpiece and providing an electrical ground connection to the workpiece.
摘要翻译： 提供一种用于夹持工件的静电卡盘和方法。 ESC包括具有夹紧表面的夹板和一个或多个电极。 施加到一个或多个电极的电位选择性地将工件夹紧到夹紧表面。 冲头可操作地联接到夹板和电接地，其中冲头包括扳机机构和冲头。 冲头顶端在延伸位置和缩回位置之间平移，其中当冲头顶端处于延伸位置时，冲头尖端的点对夹紧表面感到骄傲。 冲压头被配置成在将工件夹紧到夹紧板上时朝向夹紧表面平移。 在到达缩回位置时，触发机构向冲头提供冲击力，迫使冲头尖端进入工件并提供与工件的电接地连接。
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公开(公告)号：US20140034846A1
公开(公告)日：2014-02-06
申请号：US13566013
申请日：2012-08-03
IPC分类号： G21K5/08
CPC分类号： H01J37/18 , H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2002 , H01J2237/2007 , H01J2237/201 , H01J2237/204 , H01J2237/31705 , H01L21/02002 , H01L21/67109 , H01L21/67201 , H01L21/67213 , H01L21/67742 , H01L21/67766
摘要： An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.
摘要翻译： 离子注入系统向位于冷却卡盘上的处理室的真空环境中的工件提供离子。 处理室内的预冷站具有构造成将工件冷却到第一温度的冷冻工件支撑件，并且处理室内的后加热站具有被配置为将工件加热到第二温度的加热工件支撑件。 第一温度低于处理温度，第二温度大于外部温度。 工件传送臂还被构造成在卡盘，加载锁定室，预冷站和后加热站之间的两个或更多个之间同时传送两个或更多个工件。
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公开(公告)号：US20120267546A1
公开(公告)日：2012-10-25
申请号：US13089830
申请日：2011-04-19
CPC分类号： B01D8/00 , H01J37/18 , H01J37/3171 , H01J2237/1825
摘要： A cold trap filter and method is provided for filtering chemical species from a vacuum system of an ion implantation system. A canister is in fluid communication with an exhaust of a high vacuum pump and an intake of a roughing pump used for evacuating an ion source chamber. One or more paddles are positioned within the canister, wherein each paddle has a cooling line in fluid communication with a coolant source. The coolant source passes a coolant through the cooling line, thus cooling the one or more paddles to a predetermined temperature associated with a condensation or deposition point of the chemical species, therein condensing or depositing the chemical species on the paddles while not interfering with a vacuum capacity of the high vacuum and roughing pumps. The paddles can also be electrically biased to electrostatically attract the chemical species to the paddles in one or more biasing steps.
摘要翻译： 提供了一种冷阱过滤器和方法，用于从离子注入系统的真空系统中过滤化学物质。 罐与高真空泵的废气和用于抽空离子源室的粗抽泵的进气口流体连通。 一个或多个桨叶位于罐内，其中每个桨叶具有与冷却剂源流体连通的冷却管线。 冷却剂源将冷却剂通过冷却管线，从而将一个或多个桨叶冷却到与化学物质的冷凝或沉积点相关联的预定温度，其中将化学物质冷凝或沉积在桨上，同时不干扰真空 高真空和粗抽泵的容量。 桨也可以被电偏置以在一个或多个偏压步骤中静电地将化学物质吸引到桨叶。
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24.发明申请ACTIVE DEW POINT SENSING AND LOAD LOCK VENTING TO PREVENT CONDENSATION ON WORKPIECES 审中-公开活动的DEW点感测和负载锁定，以防止工作上的冷凝公开(公告)号：US20110291030A1
公开(公告)日：2011-12-01
申请号：US13116580
申请日：2011-05-26
申请人： William D. Lee
发明人： William D. Lee
CPC分类号： H01J37/3171 , H01J37/185 , H01J2237/006 , H01J2237/184 , H01J2237/2001 , H01J2237/24585
摘要： A system, apparatus, and method is provided for preventing condensation on a workpiece in an end station of an ion implantation system. A workpiece is cooled in a first environment, and is transferred to a load lock chamber that is in selective fluid communication with the end station and a second environment, respectively. A workpiece temperature monitoring device is configured to measure a temperature of the workpiece in the load lock chamber. An external monitoring device measures a temperature and relative humidity in the second environment, and a controller is configured to determine a temperature of the workpiece at which condensation will not form on the workpiece when the workpiece is transferred from the load lock chamber to the second environment.
摘要翻译： 提供了一种系统，装置和方法，用于防止离子注入系统的终端中的工件上的冷凝。 工件在第一环境中被冷却，并且被转移到分别与终端站和第二环境选择性流体连通的负载锁定室。 工件温度监控装置被配置为测量加载锁定室中的工件的温度。 外部监视装置测量第二环境中的温度和相对湿度，并且控制器被配置为当工件从负载锁定室转移到第二环境时，确定在工件上不会形成冷凝的工件的温度 。
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公开(公告)号：US20100142113A1
公开(公告)日：2010-06-10
申请号：US12331619
申请日：2008-12-10
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H01L21/6831
摘要： One embodiment of the present invention relates to a method for declamping a semiconductor wafer that is electrically adhered to a surface of an electrostatic chuck by a clamping voltage. In this method, the clamping voltage is deactivated. For a time following the deactivation, a first region of the wafer is lifted an first distance from the surface of the electrostatic chuck while a second region of the wafer remains adhered to the surface of the electrostatic chuck. A predetermined condition is monitored during the time. The second region is lifted from the surface of the electrostatic chuck when the predetermined condition is met.
摘要翻译： 本发明的一个实施例涉及一种用于通过钳位电压电粘合到静电卡盘表面上的半导体晶片的方法。 在这种方法中，钳位电压被去激活。 在停用之后的一段时间，晶片的第一区域从静电卡盘的表面提升第一距离，而晶片的第二区域保持粘附到静电卡盘的表面。 在此期间监视预定条件。 当满足预定条件时，第二区域从静电卡盘的表面提升。
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公开(公告)号：US5890336A
公开(公告)日：1999-04-06
申请号：US19456
申请日：1998-02-05
IPC分类号： E04D5/12
CPC分类号： E04D5/12 , Y10T428/24273
摘要： Roofing assembly having a substrate covered with a base sheet which is perforated with a plurality of uniformly spaced clusters of vertical apertures designed to receive an adhesive to bond the base sheet to the substrate. The roofing assembly possesses improved wind uplift resistance.
摘要翻译： 屋顶组件具有覆盖有基片的基底，该基片穿孔具有多个均匀间隔的垂直孔的簇，设计成接收将基片粘合到基底上的粘合剂。 屋顶组件具有改善的风力提升阻力。
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27.发明申请公开(公告)号：US20130305988A1
公开(公告)日：2013-11-21
申请号：US13475006
申请日：2012-05-18
申请人： William F. DiVergilio , William D. Lee , Mike Cristoforo , Walter Hrynyk , Robert L. Moffett , Tomoya Nakatsugawa
发明人： William F. DiVergilio , William D. Lee , Mike Cristoforo , Walter Hrynyk , Robert L. Moffett , Tomoya Nakatsugawa
CPC分类号： H01J37/32091 , H01J37/3211 , H01J37/32412
摘要： An ion source is disclosed that utilizes a capacitive discharge to produce ignition ions, which are subsequently used to ignite an inductively coupled plasma within a plasma chamber. In some embodiments, a capacitive discharge element is located along a gas feed line at a position that is upstream of a plasma chamber. The capacitive discharge element ignites a capacitive discharge within the gas feed line. The capacitive discharge contains ignition ions that are provided to a downstream plasma chamber. An inductively coupled plasma ignition element, in communication with the plasma chamber, ignites and sustains a high density inductively coupled plasma within the plasma chamber based upon ignition ions from the capacitive discharge. Due to the ignition ions, the inductively coupled plasma element can easily ignite the high density inductively coupled plasma, even at a low pressure.
摘要翻译： 公开了一种利用电容放电来产生点火离子的离子源，其随后用于点燃等离子体室内的感应耦合等离子体。 在一些实施例中，电容放电元件沿着位于等离子体室上游的位置处的气体馈送线定位。 电容放电元件点燃气体馈送线中的电容放电。 电容放电包含提供给下游等离子体室的点火离子。 基于来自电容放电的点火离子，与等离子体室连通的电感耦合等离子体点火元件在等离子体室内点燃和维持高密度感应耦合等离子体。 由于点火离子，即使在低压下，电感耦合等离子体元件也可以容易地点燃高密度电感耦合等离子体。
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公开(公告)号：US08450701B2
公开(公告)日：2013-05-28
申请号：US13089830
申请日：2011-04-19
CPC分类号： B01D8/00 , H01J37/18 , H01J37/3171 , H01J2237/1825
摘要： A cold trap filter and method is provided for filtering chemical species from a vacuum system of an ion implantation system. A canister is in fluid communication with an exhaust of a high vacuum pump and an intake of a roughing pump used for evacuating an ion source chamber. One or more paddles are positioned within the canister, wherein each paddle has a cooling line in fluid communication with a coolant source. The coolant source passes a coolant through the cooling line, thus cooling the one or more paddles to a predetermined temperature associated with a condensation or deposition point of the chemical species, therein condensing or depositing the chemical species on the paddles while not interfering with a vacuum capacity of the high vacuum and roughing pumps. The paddles can also be electrically biased to electrostatically attract the chemical species to the paddles in one or more biasing steps.
摘要翻译： 提供了一种冷阱过滤器和方法，用于从离子注入系统的真空系统中过滤化学物质。 罐与高真空泵的废气和用于抽空离子源室的粗抽泵的进气口流体连通。 一个或多个桨叶位于罐内，其中每个桨叶具有与冷却剂源流体连通的冷却管线。 冷却剂源将冷却剂通过冷却管线，从而将一个或多个桨叶冷却到与化学物质的冷凝或沉积点相关联的预定温度，其中将化学物质冷凝或沉积在桨上，同时不干扰真空 高真空和粗抽泵的容量。 桨也可以被电偏置以在一个或多个偏压步骤中静电地将化学物质吸引到桨叶。
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公开(公告)号：US08241425B2
公开(公告)日：2012-08-14
申请号：US12358788
申请日：2009-01-23
CPC分类号： H01L21/6831 , H01L21/67109 , Y10T279/11
摘要： The present invention is directed to an apparatus and method of forming a thermos layer surrounding a chuck for holding a wafer during ion implantation. The thermos layer is located below a clamping surface, and comprises a vacuum gap and an outer casing encapsulating the vacuum gap. The thermos layer provides a barrier blocking condensation to the outside of the chuck within a process chamber by substantially preventing heat transfer between the chuck when it is cooled and the warmer environment within the process chamber.
摘要翻译： 本发明涉及一种在离子注入期间形成用于保持晶片的卡盘周围的热水层的装置和方法。 热水层位于夹紧表面下方，并且包括真空间隙和封装真空间隙的外壳。 热水器层通过基本上防止卡盘在冷却时的热传递和处理室内的较暖环境之间在处理室内向卡盘的外部提供阻挡阻塞冷凝。
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公开(公告)号：US20110292562A1
公开(公告)日：2011-12-01
申请号：US13116732
申请日：2011-05-26
申请人： William D. Lee , Ashwin W. Purohit
发明人： William D. Lee , Ashwin W. Purohit
IPC分类号： H01L21/687 , H01R43/00
CPC分类号： H01L21/6831 , B23B31/28 , H01L21/67103 , H01L21/6833 , Y10T29/49117 , Y10T279/23
摘要： An apparatus and method are provided for selecting materials for forming an electrostatic clamp. The electrostatic clamp has a backing plate having a first coefficient of thermal expansion, wherein the backing plate provides structural support and rigidity to the electrostatic clamp. The electrostatic clamp further has a clamping plate having a clamping surface associated with contact with a workpiece, wherein the clamping plate has a second coefficient of thermal expansion associated therewith. The clamping plate is bonded, attached or grown to the backing plate, wherein minimal deflection of the clamping plate is evident across a predetermined temperature range. The first coefficient of thermal expansion and second coefficient of thermal expansion, for example, are substantially similar, and vary by no greater than a factor of three.
摘要翻译： 提供了用于选择用于形成静电夹的材料的装置和方法。 静电夹具具有第一热膨胀系数的背板，其中背板为静电夹具提供结构支撑和刚性。 静电夹具还具有夹持板，该夹板具有与工件接触的夹紧表面，其中夹持板具有与之相关联的第二热膨胀系数。 夹板被粘合，附接或生长到背板，其中夹板的最小偏转在预定温度范围内是明显的。 例如，第一热膨胀系数和第二热膨胀系数基本相似，并且变化不大于三分之一。
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