公开(公告)号：US20050059241A1

公开(公告)日：2005-03-17

申请号：US10951354

申请日：2004-09-29

申请人： Moris Kori ,  Alfred Mak ,  Jeong Byun ,  Lawrence Lei ,  Hua Chung ,  Ashok Sinha ,  Ming Xi

发明人： Moris Kori ,  Alfred Mak ,  Jeong Byun ,  Lawrence Lei ,  Hua Chung ,  Ashok Sinha ,  Ming Xi

IPC分类号： C23C16/02 ,  C23C16/44 ,  C23C16/455 ,  C30B25/02 ,  C30B25/14 ,  H01L21/285 ,  H01L21/768 ,  H01L21/44

CPC分类号： H01L21/76838 ,  C23C16/0272 ,  C23C16/14 ,  C23C16/4401 ,  C23C16/45525 ,  C23C16/45527 ,  C23C16/45529 ,  C23C16/45534 ,  C23C16/45561 ,  C30B25/02 ,  C30B25/14 ,  C30B29/38 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/76843 ,  H01L21/76876 ,  H01L21/76877

摘要： A method and system to reduce the resistance of refractory metal layers by controlling the presence of fluorine contained therein. The present invention is based upon the discovery that when employing ALD techniques to form refractory metal layers on a substrate, the carrier gas employed impacts the presence of fluorine in the resulting layer. As a result, the method features chemisorbing, onto the substrate, alternating monolayers of a first compound and a second compound, with the second compound having fluorine atoms associated therewith, with each of the first and second compounds being introduced into the processing chamber along with a carrier gas to control a quantity of the fluorine atoms associated with the monolayer of the second compound.

公开(公告)号：US6050446A

公开(公告)日：2000-04-18

申请号：US893410

申请日：1997-07-11

申请人： Lawrence Lei ,  Son Trinh ,  Gwo-Chuan Tzu ,  Mark Johnson

发明人： Lawrence Lei ,  Son Trinh ,  Gwo-Chuan Tzu ,  Mark Johnson

IPC分类号： H01L21/00 ,  B65D43/24

CPC分类号： H01L21/67017

摘要： A lid assembly for a process chamber. The lid assembly includes a hinge having a hinge mount affixed to the chamber and a hinge arm. A pin extends from the hinge mount through an elongated slot in the hinge arm allowing both rotational and longitudinal motion of the hinge arm relative to the hinge mount. A support frame attached to the hinge arm has two side arms that extend perpendicularly from the hinge arms toward the front of the chamber. The lid is pivotally connected to the side arms by a pivot connection aligned with the center of mass of the lid. A detent extends from the lid through a slot in the side arm at a position offset from the pivot connection. The detent and slot serve to limit the allowable rotation of the lid relative to the lid support frame. Thus, the lid is allowed to float over the opening of the chamber as the lid is closed so that the lid may be positioned in parallel alignment relative to the opening of the chamber before being secured to the chamber.

摘要翻译： 用于处理室的盖组件。 盖组件包括铰链，铰链具有固定到腔室的铰链座和铰链臂。 销从铰链座延伸通过铰链臂中的细长槽，允许铰链臂相对于铰链座的旋转和纵向运动。 附接到铰链臂的支撑框架具有从铰链臂朝向腔室的前部垂直延伸的两个侧臂。 盖通过与盖的质心对准的枢转连接件枢转地连接到侧臂。 制动器在从枢轴连接偏离的位置处从盖子延伸穿过侧臂中的狭槽。 制动器和狭槽用于限制盖相对于盖支撑框架的允许旋转。 因此，当盖被关闭时，允许盖在室的开口上浮动，使得盖可以在被固定到室之前相对于室的开口平行对准地定位。

公开(公告)号：US5968276A

公开(公告)日：1999-10-19

申请号：US893859

申请日：1997-07-11

申请人： Lawrence Lei ,  Son Trinh ,  Mark Johnson

发明人： Lawrence Lei ,  Son Trinh ,  Mark Johnson

IPC分类号： H01L21/205 ,  C23C16/44 ,  C23C16/455 ,  H01L21/285 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45572

摘要： The present invention provides a method and apparatus for improving thermal management of gas being delivered to a chemical vapor deposition chamber. Thermal management is accomplished using a heat transfer fluid in thermal communication with the deposition gas passageways delivering the gases to the chamber for deposition. The gas injection manifold includes gas passageways and coolant liquid passageways, wherein the gas passageways extend through a constant voltage gradient gas feedthrough and the coolant liquid passageways extend through a gas input manifold coupled to the inlet end of the constant voltage gradient gas feedthrough. This arrangement provides for increase coolant liquid flow and allows maintenance or disassembly of the constant voltage gradient gas feedthrough without breaking the seal on the coolant liquid system.

摘要翻译： 本发明提供一种用于改善被输送到化学气相沉积室的气体的热管理的方法和装置。 使用与沉积气体通道热连通的传热流体将气体输送到室以进行沉积来实现热管理。 气体注入歧管包括气体通道和冷却剂液体通道，其中气体通道延伸通过恒定电压梯度气体馈通，并且冷却剂液体通道延伸通过耦合到恒定电压梯度气体馈通的入口端的气体输入歧管。 这种布置提供了增加冷却剂液体流量并允许恒定电压梯度气体馈通的维护或拆卸而不破坏冷却剂液体系统上的密封。