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88 条记录 (耗时 0.042 秒)

    Endoscope apparatus
    21.
    发明授权
    Endoscope apparatus 有权
    内窥镜装置

    公开(公告)号：US08221313B2

    公开(公告)日：2012-07-17

    申请号：US12180655

    申请日：2008-07-28

    申请人： Kenji Noda ,  Masatsugu Oyama

    发明人： Kenji Noda ,  Masatsugu Oyama

    IPC分类号： A61B1/12

    CPC分类号： A61B1/015

    摘要： A gas supply source for supplying gas and a channel along which the gas is supplied can be easily switched by providing an instrument channel for passing an endoscope treating tool, a gas and water supply channel for supplying carbon dioxide etc. to the inside of a body, a gas supply source for a visceral cavity capable of supplying gas at a predetermined pressure, a gas supply source for a lumen capable of supplying gas at an optional pressure, and a switch device for switching from any of and an instrument channel and a gas and water supply channel to any of the gas supply source for a visceral cavity and the gas supply source for a lumen.

    摘要翻译： 用于供应气体的气体供应源和供应气体的通道可以通过提供用于将内窥镜处理工具，用于将二氧化碳等供应的气体和水供应通道提供给身体内部的仪器通道来容易地切换 用于能够以预定压力供应气体的内脏气体供应源，用于能够以任选压力供应气体的内腔的气体供应源，以及用于从仪器通道和气体中的任何一个切换的开关装置 以及用于内脏的任何气体供应源和用于管腔的气体供应源的供水通道。

    Developing method and method for fabricating semiconductor device using the developing method
    23.
    发明授权
    Developing method and method for fabricating semiconductor device using the developing method 有权
    使用显影方法制造半导体器件的显影方法和方法

    公开(公告)号：US07883840B2

    公开(公告)日：2011-02-08

    申请号：US11646420

    申请日：2006-12-28

    申请人： Hidekazu Kitahara ,  Kenji Noda ,  Kenichi Asahi ,  Naohiko Ujimaru ,  Hirofumi Fukumoto

    发明人： Hidekazu Kitahara ,  Kenji Noda ,  Kenichi Asahi ,  Naohiko Ujimaru ,  Hirofumi Fukumoto

    IPC分类号： G03F7/32

    CPC分类号： G03F7/3021

    摘要： In a developing method, a developer is supplied onto a resist film provided on a substrate, made of a resist and having an upper surface on which design patterns having different mask opening ratios are exposed and a development reaction is caused to proceed on the resist film with the supplied developer. After the development, the substrate is rotated so that the developer and the resist dissolved in the developer are removed. Then, a rinsing solution is supplied onto the resist film subjected to development and the substrate is rotated, thereby washing out the developer and the resist dissolved in the developer. The rotation speed of the substrate in removing the developer is a half or less of the rotation speed of the substrate in the rinsing step of washing out the resist.

    摘要翻译： 在显影方法中，将显影剂供给到设置在由抗蚀剂制成的基板上的抗蚀剂膜上，并且具有上表面，在该上表面上露出具有不同掩模开口率的设计图案并且使曝光反应在抗蚀剂膜上进行 与供应的开发商。 显影后，旋转基板，使得溶解在显影剂中的显影剂和抗蚀剂被去除。 然后，将冲洗溶液供给到经过显影的抗蚀剂膜上，并且基板旋转，从而洗出显影剂和抗蚀剂溶解在显影剂中。 基板在除去显影剂时的旋转速度是冲洗抗蚀剂的漂洗步骤中的基板旋转速度的一半或更少。

    CURABLE COMPOSITION
    24.
    发明申请
    CURABLE COMPOSITION 审中-公开
    可固化组合物

    公开(公告)号：US20100222449A1

    公开(公告)日：2010-09-02

    申请号：US12161241

    申请日：2007-01-18

    申请人： Kenji Noda ,  Sadao Yukimoto

    发明人： Kenji Noda ,  Sadao Yukimoto

    IPC分类号： C08F30/08

    CPC分类号： C09K3/1018 ,  C08K5/0025 ,  C08L33/16 ,  C08L43/04 ,  C08L71/02 ,  C08L101/10 ,  C08L2666/02 ,  C08L2666/14

    摘要： Disclosed is a curable composition having good storage stability which enables to obtain a cured product wherein surface tackiness after curing is almost eliminated within a short time. A cured product of such a curable composition hardly suffer from surface dirt over a long time. No crack or discoloration occurs in the surface of such a cured product even when it is used outdoors for a long time. Specifically disclosed is a curable composition containing a vinyl polymer (A) having at least one crosslinkable silyl group and a photopolymerization initiator (B).

    摘要翻译： 公开了一种具有良好储存稳定性的固化性组合物，其能够获得固化产物，其中在短时间内几乎消除了固化后的表面粘性。 这种固化性组合物的固化物几乎不会长时间遭受表面污垢。 即使长时间在户外使用，也不会在这种固化物的表面发生裂纹或变色。 具体公开了含有具有至少一个交联性甲硅烷基的乙烯基聚合物（A）和光聚合引发剂（B）的固化性组合物。

    Apparatus for supplying gas at two different pressures
    25.
    发明授权
    Apparatus for supplying gas at two different pressures 有权
    用于在两种不同压力下供应气体的装置

    公开(公告)号：US07569027B2

    公开(公告)日：2009-08-04

    申请号：US11091997

    申请日：2005-03-29

    申请人： Takefumi Uesugi ,  Daisuke Sano ,  Atsuhiko Kasahi ,  Kenji Noda

    发明人： Takefumi Uesugi ,  Daisuke Sano ,  Atsuhiko Kasahi ,  Kenji Noda

    IPC分类号： A61M37/00

    CPC分类号： A61M13/003 ,  A61B50/13 ,  A61M2202/0225 ,  A61M2205/18 ,  A61M2205/3331 ,  A61M2205/3334 ,  A61M2205/3344 ,  A61M2205/502 ,  A61M2205/583 ,  A61M2205/6027 ,  A61M2205/6045 ,  A61M2205/6081 ,  Y10T137/598 ,  A61M2202/0007

    摘要： A gas supply apparatus is provided and has first and second fittings and first and second tubes. The first fitting is provided to discharge a gas of a first pressure therethrough, while the second fitting is provided to discharge a gas of a second pressure therethrough. The first tube has one end to which a first connector connectable to the first fitting is attached and supplies the first-pressure gas to a first body cavity of a subject. The second tube has one end to which a second connector connectable to the second fitting is attached and supplies the second-pressure gas to a second body cavity of the subject. The apparatus may comprise an erroneous-connection preventing device preventing an erroneous connection including at least one of a connection of the first connector to the second fitting and a further connection of the second connector to the first fitting.

    摘要翻译： 提供一种气体供应装置，并具有第一和第二配件以及第一和第二管。 提供第一配件以通过其排出第一压力的气体，同时提供第二配件以排出通过其中的第二压力的气体。 第一管具有连接到第一配件的第一连接器的一端，并将第一压力气体供应到被检体的第一体腔。 第二管具有连接到第二配件的第二连接器的一端，并且将第二压力气体供应到受试者的第二体腔。 该装置可以包括错误连接防止装置，其防止包括第一连接器与第二配件的连接中的至少一个的错误连接以及第二连接器与第一配件的进一步连接。

    Wiring structure and method of semiconductor integrated circuit
    26.
    发明授权
    Wiring structure and method of semiconductor integrated circuit 有权
    半导体集成电路的接线结构和方法

    公开(公告)号：US07558997B2

    公开(公告)日：2009-07-07

    申请号：US11544751

    申请日：2006-10-10

    申请人： Kenji Noda

    发明人： Kenji Noda

    IPC分类号： G01R31/28

    CPC分类号： G01R31/318552

    摘要： To provide wiring structure and method capable of supplying a scan clock signal for each clock domain without requesting a user to add a test circuit. The wiring structure of a semiconductor integrated circuit according to an embodiment of the present invention includes: a fixed layer where a common line independent of a user circuit is formed; and a customized layer which is formed on the fixed layer and in which a line dependent on the user circuit is formed. The fixed layer is provided with a scan clock line supplying a scan clock signal for scan test to the selecting circuit, and a clock line supplying an output signal of the selecting circuit to a flip-flop of a scan path, and the customized layer is provided with a user clock line supplying a user clock signal to the selecting circuit.

    摘要翻译： 提供能够为每个时钟域提供扫描时钟信号而不请求用户添加测试电路的布线结构和方法。 根据本发明的实施例的半导体集成电路的布线结构包括：形成与用户电路无关的公共线的固定层; 以及定制层，其形成在固定层上，并且形成依赖于用户电路的线。 固定层设置有扫描时钟线，用于向选择电路提供用于扫描测试的扫描时钟信号，以及时钟线，将选择电路的输出信号提供给扫描路径的触发器，并且定制层是 具有向选择电路提供用户时钟信号的用户时钟线。

    Grinding process and apparatus with arrangement for grinding with constant grinding load
    28.
    发明申请
    Grinding process and apparatus with arrangement for grinding with constant grinding load 有权
    磨削工艺和设备，具有磨削负载平稳的磨削

    公开(公告)号：US20060073765A1

    公开(公告)日：2006-04-06

    申请号：US11236825

    申请日：2005-09-28

    申请人： Kenji Noda

    发明人： Kenji Noda

    IPC分类号： B24B51/00 ,  B24B1/00 ,  B24B29/00

    CPC分类号： B24B47/20 ,  B24B7/00 ,  B24B49/16

    摘要： A process of grinding a surface of a workpiece, by a grinding tool rotated about its axis. The process includes a grinding step of grinding the workpiece surface, by pressing at least one of the grinding tool and the workpiece against the other of the grinding tool and the workpiece, such that a constant force is exerted on the other of the grinding tool and the workpiece by the at least one of the grinding tool and the workpiece. Also disclosed is a grinding apparatus including: a moving device operable to move at least one of the grinding tool and the workpiece relative to the other of the grinding tool and the workpiece, at least in an infeed direction that increases a depth of cut of the grinding tool into the workpiece; and a controller which controls the moving device, such that the at least one of the grinding tool and the workpiece is pressed against the other of the grinding tool and the workpiece, with a constant force.

    摘要翻译： 通过围绕其轴线旋转的研磨工具研磨工件的表面的工艺。 该方法包括：通过将磨削工具和工件中的至少一个压靠在研磨工具和工件中的另一个上来研磨工件表面的磨削步骤，使得恒定的力施加在研磨工具的另一个上，并且 所述工件由所述研磨工具中的至少一个和所述工件组成。 还公开了一种磨削装置，其包括：移动装置，其可操作以相对于研磨工具和工件中的另一个移动至少一个研磨工具和工件，至少在进给方向上，该进给方向增加了切削深度 研磨工具进入工件; 以及控制器，其控制所述移动装置，使得所述研磨工具和所述工件中的所述至少一个以恒定的力压在所述研磨工具和所述工件中的另一个上。

    Method and system for displaying medical images
    29.
    发明申请
    Method and system for displaying medical images 审中-公开
    用于显示医学图像的方法和系统

    公开(公告)号：US20060058617A1

    公开(公告)日：2006-03-16

    申请号：US11200945

    申请日：2005-08-10

    申请人： Daisuke Sano ,  Takefumi Uesugi ,  Atsuhiko Kasahi ,  Kenji Noda

    发明人： Daisuke Sano ,  Takefumi Uesugi ,  Atsuhiko Kasahi ,  Kenji Noda

    IPC分类号： A61B5/05

    CPC分类号： A61B1/0005 ,  A61B1/3132 ,  A61B17/3474 ,  A61B2017/00199

    摘要： In a medical image display system, a gas supply unit is configured to supply first gas into a first cavity and second gas into a second cavity. A switching display unit is connected to a display and is configured to determine whether the first gas or the second gas is supplied from the gas supply unit. The switching display unit is configured to switchably display the first medical image and the second medical image on the screen of the display based on the determined result.

    摘要翻译： 在医用图像显示系统中，气体供给单元构造成将第一气体供给到第一空腔，将第二气体供给到第二空腔。 切换显示单元连接到显示器，并且被配置为确定从气体供应单元是否提供第一气体或第二气体。 切换显示单元被配置为基于确定的结果在显示器的屏幕上可切换地显示第一医疗图像和第二医疗图像。