公开(公告)号：US20070240646A1

公开(公告)日：2007-10-18

申请号：US11783689

申请日：2007-04-11

Applicant: Jong-Jin Jun

Inventor： Jong-Jin Jun

IPC: C23F1/00 ,  C23C16/00

CPC classification number: H01L21/68742 ,  H01J37/32431

Abstract: The present invention relates to a substrate treatment apparatus, and more particularly, to a substrate treatment apparatus, wherein lift pins can be installed while the levels of the lift pins are easily adjusted using a tool such as a wrench. A substrate treatment apparatus of the present invention comprises a chamber; a pin plate provided inside or outside the chamber; a driving means for lifting or lowering the pin plate; and at least one lift pin that penetrates through the pin plate so that the lift pin is coupled to the pin plate, and has a tool insertion recess formed at a lower end of the lift pin.

Abstract translation: 本发明涉及一种基板处理装置，更具体地，涉及一种基板处理装置，其中可以使用诸如扳手的工具容易地调节提升销的水平面而安装提升销。 本发明的基板处理装置包括：室; 设置在室内或室外的销板; 用于提升或降低销板的驱动装置; 以及至少一个提升销，其穿过所述销板，使得所述提升销联接到所述销板，并且具有形成在所述提升销的下端处的工具插入凹部。

公开(公告)号：US20060048709A1

公开(公告)日：2006-03-09

申请号：US11219956

申请日：2005-09-06

Applicant: Young Lee ,  Jun Choi ,  Hyun Ahn ,  Chan-Ho Kang ,  Hyun-Woo Baek ,  Young-Joo Hwang

Inventor： Young Lee ,  Jun Choi ,  Hyun Ahn ,  Chan-Ho Kang ,  Hyun-Woo Baek ,  Young-Joo Hwang

IPC: C23C16/00

CPC classification number: C23C16/4585

Abstract: Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular to an upper end of the driving shaft. The baffle comprises a baffle plate coupled to the upper end of the driving shaft, and a shielding portion coupled to a lower surface of the baffle plate. The substrate supporting member is a foldable substrate supporting member. The baffle and the substrate supporting member are driven up and down at the same time by the driving shaft. As a result, it is possible to protect the substrate supporting member from plasma, and to prevent interference between the baffle and the outer lifting bar during operation of the plasma processing apparatus.

公开(公告)号：US08273211B2

公开(公告)日：2012-09-25

申请号：US12246563

申请日：2008-10-07

Applicant: Gwang Ho Hur ,  Jun Young Choi ,  Cheol Won Lee ,  Hyun Hwan Ahn ,  Young Joo Hwang ,  Chun Sik Kim

Inventor： Gwang Ho Hur ,  Jun Young Choi ,  Cheol Won Lee ,  Hyun Hwan Ahn ,  Young Joo Hwang ,  Chun Sik Kim

IPC: H01L21/3065

CPC classification number: H01J37/3244

Abstract: Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.

Abstract translation: 这里公开了使用其中产生的等离子体进行预定处理的平板显示器制造装置。 在这种平板显示器制造装置中，处理气体以均匀扩散的状态供应到室中，以在室的对称内部空间内产生均匀的等离子体。 因此，平板显示器制造装置可以适当地控制等离子体的流量，从而能够对大规模基板进行均匀的处理。 在平板显示器制造装置中，其基板基座设置有垂直和水平屏蔽构件的组合，从而完全防止等离子体的侵蚀，从而延长使用寿命。

公开(公告)号：US08205653B2

公开(公告)日：2012-06-26

申请号：US12260652

申请日：2008-10-29

Applicant: Dong Gun Kim ,  Bong Hwan Choi

Inventor： Dong Gun Kim ,  Bong Hwan Choi

IPC: B29C65/00 ,  B29C65/08 ,  B32B37/00 ,  B32B38/04 ,  B32B41/00 ,  G05G15/00 ,  B65C9/40 ,  B23K37/00 ,  B30B5/02 ,  B30B5/04 ,  B30B15/34

CPC classification number: G02F1/133 ,  G02F1/1303 ,  Y10T156/107 ,  Y10T156/1744

Abstract: A substrate bonding apparatus and method are provided. The substrate bonding apparatus may include a first support member that receives a first substrate, a second support member that receives a second substrate opposite the first support member, and a support pin located at the outside of the first substrate fixed to the first support member. The support pin may be connected to the first support member, and a distance adjustment device may move the support pin upward or downward to adjust the distance between the first support member and the second support member.

Abstract translation: 提供了一种基板接合装置和方法。 基板接合装置可以包括接收第一基板的第一支撑构件，接收与第一支撑构件相对的第二基板的第二支撑构件和位于固定到第一支撑构件的第一基板的外侧的支撑销。 支撑销可以连接到第一支撑构件，并且距离调节装置可以将支撑销向上或向下移动以调节第一支撑构件和第二支撑构件之间的距离。

公开(公告)号：US07921895B2

公开(公告)日：2011-04-12

申请号：US11802915

申请日：2007-05-25

Applicant: Seok-Hee Shim

Inventor： Seok-Hee Shim

IPC: B29C65/18 ,  B32B37/14 ,  B23K37/04 ,  H05K3/36

CPC classification number: H01L21/6831 ,  H01L21/67092 ,  H01L21/6875 ,  Y10S29/90 ,  Y10T29/49126 ,  Y10T29/49133 ,  Y10T29/53265 ,  Y10T279/34

Abstract: An adhesive chuck, and an apparatus and method for assembling substrates using the same are disclosed. The apparatus comprises a chamber, a first adhesive chuck inside the chamber and having a plurality of adhesive protrusions to adhere to a first substrate conveyed from an outside into the chamber via an intermolecular attractive force, and a driving unit to move the first substrate adhered to the first adhesive chuck and a second substrate toward each other to be compressed and assembled to each other. The apparatus can achieve adhesion and separation of a substrate with minimal power consumption, enhancing an operating efficiency. Additionally, the adhesive chuck can overcome a problem of spot generation on a display panel caused by remaining static electricity. Furthermore, since the adhesive chuck is almost free from a problem of electric instability, it can exhibit high stability and efficiency and can be fabricated at lower costs.

Abstract translation: 公开了一种粘合卡盘，以及用于组装使用其的基板的装置和方法。 该装置包括腔室，腔室内的第一粘合卡盘，并且具有多个粘合突起，以通过分子间吸引力粘附到从外部输送到腔室中的第一基底;以及驱动单元，用于将第一基底粘附到 第一粘合剂卡盘和彼此朝向彼此压缩和组装的第二基板。 该设备可以以最小的功耗实现基板的粘合和分离，从而提高了操作效率。 此外，粘合卡盘可以克服由剩余静电引起的显示面板上的斑点产生的问题。 此外，由于粘合卡盘几乎没有电不稳定性的问题，因此可以表现出高的稳定性和效率，并且可以以较低的成本制造。

公开(公告)号：US07699957B2

公开(公告)日：2010-04-20

申请号：US11711612

申请日：2007-02-28

Applicant: Seoung-Wook Lee ,  Young-Joo Hwang

Inventor： Seoung-Wook Lee ,  Young-Joo Hwang

IPC: C23F1/00 ,  C23C16/00

CPC classification number: C23C16/54 ,  C23C16/5096 ,  H01J2237/0206 ,  Y10S156/914 ,  Y10S414/135

Abstract: Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transferring a substrate and opening and closing openings of the chambers. Each of the gate valves includes a valve housing provided between the chambers such that the valve housing contacts side surfaces of the chambers by interposing sealing members therebetween, and forming a designated closed space therein; a valve including a sealing plate contacting an inner surface of the valve housing on the side of the processing chamber, and a back plate contacting the inner surface of the valve housing on the side of the transfer chamber; a valve driving unit connected to the valve for moving the valve in the vertical direction; and a ground member formed on the surface of the valve for electrically connecting the valve and the valve housing when the valve contacts the inner surface of the valve housing.

Abstract translation: 公开了一种等离子体处理装置，其中在传送室中不产生寄生等离子体。 等离子体处理装置具有装载锁定室，传送室，处理室和安装在用于传送基板的室之间的闸阀和打开和关闭室的开口的闸阀。 每个闸阀包括设置在室之间的阀壳体，使得阀壳体通过在其间插入密封构件而接触室的侧表面，并在其中形成指定的封闭空间; 阀，其包括与处理室侧面上的阀壳体的内表面接触的密封板和在传送室侧面与阀壳体的内表面接触的后板; 连接到阀的阀驱动单元，用于沿垂直方向移动阀; 以及形成在所述阀的表面上的接地构件，用于当所述阀接触所述阀壳体的内表面时电气连接所述阀和所述阀壳体。

公开(公告)号：US20100086382A1

公开(公告)日：2010-04-08

申请号：US12578864

申请日：2009-10-14

Applicant: Young Jong LEE ,  Jun Young Choi ,  Hyoung-Kyu Son ,  Jeog-bin Lee ,  Gyeong-Hoon Kim ,  Hyung-Soo Kim ,  Myung-Woo Han

Inventor： Young Jong LEE ,  Jun Young Choi ,  Hyoung-Kyu Son ,  Jeog-bin Lee ,  Gyeong-Hoon Kim ,  Hyung-Soo Kim ,  Myung-Woo Han

IPC: H01L21/67 ,  G01B5/00

CPC classification number: H01L21/67126 ,  H01L21/6719 ,  Y10T29/53687

Abstract: Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.

公开(公告)号：US07665947B2

公开(公告)日：2010-02-23

申请号：US12129010

申请日：2008-05-29

Applicant: Gwang Ho Hur ,  Jun Young Choi ,  Sang Baek Lee ,  Cheol Won Lee

Inventor： Gwang Ho Hur ,  Jun Young Choi ,  Sang Baek Lee ,  Cheol Won Lee

IPC: H01L21/677

CPC classification number: H01L21/68707 ,  H01L21/67742 ,  Y10S414/139 ,  Y10S414/141

Abstract: A transfer chamber for a flat display device manufacturing apparatus is provided. The transfer chamber may provide a combination of the functions of a transfer and a load-lock chamber. A robot may be provided aside from a center of the transfer chamber, a buffer may be provided and be driven without interference with the robot, and an aligner may be provided to adjust a position of a substrate mounted on the buffer. A sealing member may be provided to seal a hole formed at a predetermined portion of the transfer chamber.

Abstract translation: 提供了一种用于平板显示装置制造装置的传送室。 传送室可以提供转印和装载锁定室的功能的组合。 可以从传送室的中心设置机器人，可以提供缓冲器并且不受机器人的干扰而被驱动，并且可以设置对准器以调整安装在缓冲器上的基板的位置。 可以设置密封构件以密封形成在传送室的预定部分处的孔。

公开(公告)号：US07517429B2

公开(公告)日：2009-04-14

申请号：US11730595

申请日：2007-04-03

Applicant: Chun-Sik Kim

Inventor： Chun-Sik Kim

IPC: C23F1/00 ,  H01L21/306

CPC classification number: H01J37/3244 ,  H01J2237/022

Abstract: The present invention relates to a plasma treatment apparatus, and more particularly, to a plasma treatment apparatus capable of supplying pressure gas while preventing flying of particles accumulated on the bottom of a chamber. The plasma treatment apparatus of the present invention comprises a chamber; an intake/exhaust portion provided to the bottom of the chamber to supply the chamber with pressure gas, the intake/exhaust portion being configured such that an inner diameter thereof is increased upwardly; and a pressure gas source connected to the intake/exhaust portion to supply the pressure gas thereto. The apparatus may further comprise a vacuum source connected to the intake/exhaust portion to exhaust the chamber.

Abstract translation: 等离子体处理装置技术领域本发明涉及等离子体处理装置，更具体地，涉及一种能够在防止积聚在室底部的颗粒飞散的同时供给压力气体的等离子体处理装置。 本发明的等离子体处理装置包括：室; 所述进气/排气部分设置在所述室的底部以向所述室供应压力气体，所述进气/排气部分构造成使其内径向上增加; 以及连接到进气/排气部分以将压力气体供应到其上的压力气体源。 该装置还可以包括连接到进气/排气部分以排出室的真空源。

公开(公告)号：US20080055813A1

公开(公告)日：2008-03-06

申请号：US11892628

申请日：2007-08-24

Applicant: Hyoung-Kyu Son

Inventor： Hyoung-Kyu Son

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833

Abstract: An electrostatic chuck includes both a DC power supply and an AC power supply. DC power is supplied to an electrode of the chuck to generate an electrostatic holding force that holds a substrate on the chuck during substrate processing steps. When it is time to remove the substrate from the chuck, the DC power is cut off, and an AC power is applied to help eliminate any residual charge left on the chuck after the DC power has been cut off.

Abstract translation: 静电卡盘包括直流电源和交流电源。 DC电源被提供给卡盘的电极，以产生在基板处理步骤期间将基板保持在卡盘上的静电保持力。 当要从卡盘中取出基板的时候，直流电源被切断，并且在直流电源被切断之后，施加交流电力以帮助消除卡盘上残留的剩余电荷。