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公开(公告)号：US20100158459A1
公开(公告)日：2010-06-24
申请号：US12343872
申请日：2008-12-24
Applicant: Daniel Homa
Inventor： Daniel Homa
CPC classification number: B29D11/00721 , C03B37/012 , C03B2201/04 , C03C13/045 , C03C2201/23 , G02B6/02
Abstract: A fiber optic construction is described combining low OH (preferably
Abstract translation: 描述了结合低OH（优选<1ppm）材料的光纤结构，用于具有受控Do / d比的芯和包层元件，以提供用于高温环境的延长的预期寿命光纤。
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22.发明申请COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 审中-公开二氧化硅铜玻璃及其制造方法及使用其的氙气灯公开(公告)号：US20100109509A1
公开(公告)日：2010-05-06
申请号：US12595605
申请日：2008-04-28
Applicant: Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
Inventor： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
CPC classification number: C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use.The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。
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公开(公告)号：US07538052B2
公开(公告)日：2009-05-26
申请号：US11957855
申请日：2007-12-17
Applicant: Yasutomi Iwahashi , Akio Koike
Inventor： Yasutomi Iwahashi , Akio Koike
IPC: C03C3/06 , C03B20/00 , C03B19/06 , C03B37/018
CPC classification number: C03B19/1415 , C03B19/1461 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/54
Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。
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公开(公告)号：US07524780B2
公开(公告)日：2009-04-28
申请号：US11046435
申请日：2005-01-28
Applicant: Laura J. Ball , Bruno P. M. Baney , Dana C. Bookbinder , Keith L. House , Rostislav R. Khrapko , Lisa A. Moore , Susan L. Schiefelbein
Inventor： Laura J. Ball , Bruno P. M. Baney , Dana C. Bookbinder , Keith L. House , Rostislav R. Khrapko , Lisa A. Moore , Susan L. Schiefelbein
CPC classification number: C03C3/06 , C03B37/01211 , C03B37/01228 , C03B37/01426 , C03B37/01807 , C03B37/01861 , C03B37/01892 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/28 , C03B2201/31 , C03B2201/32 , C03B2201/50 , C03B2201/54 , C03B2203/26 , C03B2207/30 , C03B2207/90 , C03C25/602 , C03C25/607 , C03C25/68 , C03C2201/11 , C03C2201/23 , C03C2201/50 , C03C2203/50 , G02B6/02
Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
Abstract translation: 公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。 石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。 含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。 石英玻璃制品可以进一步加工以形成完整的光纤预型件。 当预成型件被拉入光纤时，表现出低的衰减。
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公开(公告)号：US20090056381A1
公开(公告)日：2009-03-05
申请号：US12139853
申请日：2008-06-16
Applicant: Michael A. Mueller , Michael Thomas Murtagh
Inventor： Michael A. Mueller , Michael Thomas Murtagh
CPC classification number: C03C3/06 , C03C4/0085 , C03C2201/22 , C03C2201/23 , C03C2203/54 , G03F7/70958
Abstract: A method of making a fused silica article having a combined concentration of protium and deuterium in a range from about 1×1016 molecules/cm3 up to about 6×1019 molecules/cm3. In some embodiments, deuterium is present in an amount greater than its natural isotopic abundance. The method includes the steps of providing a fused silica boule, diffusing at least one of protium and deuterium into the boule, and annealing the boule to form the fused silica article. A method of diffusing hydrogen into fused silica and a fused silica article loaded with hydrogen formed by the method are also described.
Abstract translation: 制备具有约1×10 16分子/ cm 3至多约6×1019分子/ cm 3范围内的ium和氘的组合浓度的熔融二氧化硅制品的方法。 在一些实施方案中，氘的存在量大于其天然同位素丰度。 该方法包括以下步骤：提供熔融二氧化硅焦耳，将钚和氘中的至少一种扩散到该原子核中，以及对该坯进行退火以形成熔融二氧化硅制品。 还描述了将氢扩散到熔融二氧化硅中的方法和通过该方法形成的负载有氢的熔融二氧化硅制品。
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Patent Agency Ranking
26.发明申请Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component 有权用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料公开(公告)号：US20090004088A1
公开(公告)日：2009-01-01
申请号：US12148338
申请日：2008-04-18
Applicant: Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
Inventor： Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
CPC classification number: C03B25/02 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/42 , C03C2203/52 , Y02P40/57
Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).
Abstract translation: 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。
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公开(公告)号：US20080287279A1
公开(公告)日：2008-11-20
申请号：US12151172
申请日：2008-05-05
Applicant: Dana Craig Bookbinder , Richard Michael Fiacco , Kenneth Edward Hrdina , Rostislav Radievich Khrapko
Inventor： Dana Craig Bookbinder , Richard Michael Fiacco , Kenneth Edward Hrdina , Rostislav Radievich Khrapko
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/21 , C03B2201/22 , C03B2201/23 , C03B2201/31 , C03C2201/22 , C03C2201/23 , C03C2203/54
Abstract: A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.
Abstract translation: 熔融石英玻璃和熔融二氧化硅制品，其具有高达约50ppm的OH和OD中的至少一种的组合浓度。 熔融二氧化硅玻璃通过在含有干燥剂的惰性气氛中干燥熔融二氧化硅烟灰坯料或预型体而形成，然后通过在包含惰性气体的气氛中加热干燥的烟灰坯料从干燥的烟灰坯中除去残留的干燥剂， 的氧气。
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公开(公告)号：US07419924B2
公开(公告)日：2008-09-02
申请号：US11589875
申请日：2006-10-31
Applicant: Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
Inventor： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42
Abstract: It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero.A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.
Abstract translation: 提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。 含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti
3 +浓度为70质量ppm以下，其特征在于具有至多1200℃的假想温度，0〜100℃的热膨胀系数为0±150ppb /℃。 并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。 一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。 -
公开(公告)号：US07410922B2
公开(公告)日：2008-08-12
申请号：US11172872
申请日：2005-07-05
Applicant: Yasutomi Iwahashi , Akio Koike
Inventor： Yasutomi Iwahashi , Akio Koike
CPC classification number: C03C4/0085 , C03C3/06 , C03C2201/23 , C03C2201/42
Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.
Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至多600ppm的OH基浓度和0±200ppb /℃的热膨胀系数 0至100℃
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30.发明申请公开(公告)号：US20080119346A1
公开(公告)日：2008-05-22
申请号：US11896948
申请日：2007-09-06
Applicant: Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
Inventor： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
CPC classification number: G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
Abstract translation: 一种合成石英玻璃基板，其具有（i）OH浓度为1-100ppm，氢分子浓度为1×10 16×10 9分子/ cm 3， （ⅱ）其波长193.4nm处的内部透射的面内变化，其最高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器 。
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