公开(公告)号：US20070114475A1

公开(公告)日：2007-05-24

申请号：US11460610

申请日：2006-07-27

Applicant: Li Qian ,  Jing Qi ,  Jie Tang ,  Liang Liu ,  Zhao-Fu Hu ,  Pi-Jin Chen ,  Shou-Shan Fan

Inventor： Li Qian ,  Jing Qi ,  Jie Tang ,  Liang Liu ,  Zhao-Fu Hu ,  Pi-Jin Chen ,  Shou-Shan Fan

IPC: G21F3/00

CPC classification number: H01J27/04

Abstract: An ion generator (10) generally includes: a shielding shell (11), a cathode device (16), and an annular anode (14). The shielding shell has a first end (113), an opposite second end (115) and a main body (111) therebetween. The first end has an electron-input hole (13). The second end has an ion-output hole (15). The main body has a gas inlet (170) for introducing an ionizable gas (170). The cathode device faces the electron-input hole for emitting electrons to enter the shielding shell so as to ionize the ionizable gas thereby generating ions. The cathode device includes a conductive base (160) and at least one field emitter (161) thereon. The annular anode is arranged in the shielding shell. The anode is aligned with the ion-output hole.

Abstract translation: 离子发生器（10）通常包括：屏蔽壳（11），阴极装置（16）和环形阳极（14）。 屏蔽壳具有第一端（113），相对的第二端（115）和它们之间的主体（111）。 第一端具有电子输入孔（13）。 第二端具有离子输出孔（15）。 主体具有用于引入可电离气体（170）的气体入口（170）。 阴极器件面向用于发射电子的电子输入孔进入屏蔽壳，从而电离可电离气体，从而产生离子。 阴极器件包括导电基底（160）和至少一个场致发射体（161）。 环形阳极布置在屏蔽壳体中。 阳极与离子输出孔对准。

公开(公告)号：US06661178B1

公开(公告)日：2003-12-09

申请号：US09723221

申请日：2000-11-28

Applicant: Michel J. Bertrand ,  Olivier Peraldi

Inventor： Michel J. Bertrand ,  Olivier Peraldi

IPC: H01J724

CPC classification number: H01J49/102 ,  H01J27/04

Abstract: The metastable atom bombardment source provides a charged particle free beam of metastable species that can be used to bombard and ionize organic and inorganic substances in a gas phase. The metastable atoms are produced by inducing a discharge in a gas (rare gases or small molecules). The discharge is curved between the cathode and anode, with the cathode located in a medium pressure zone and the anode located off-axis in a low pressure zone. A nozzle located between the cathode and the anode provides a collimated beam of metastable atoms of low kinetic energy that is directed at an ion volume containing the substances to be analyzed. By selecting the energy of the metastable state, selective fragmentation of molecules, particularly large molecular weight molecules, can be carried out.

Abstract translation: 亚稳态原子轰击源提供了一种可带电粒子的亚稳态物质束，可用于轰击和离子化气相中的有机和无机物质。 亚稳态原子通过在气体（稀有气体或小分子）中的排放而产生。 放电在阴极和阳极之间弯曲，阴极位于中压区域，阳极位于低压区域的轴外。 位于阴极和阳极之间的喷嘴提供准直的低动能的亚稳态原子束，其指向含有待分析物质的离子体积。 通过选择亚稳态的能量，可以进行分子，特别是大分子量分子的选择性碎裂。

公开(公告)号：US06576909B2

公开(公告)日：2003-06-10

申请号：US09796194

申请日：2001-02-28

Applicant: Gary A. Donaldson ,  Donald W. D. Rakowski ,  Nick G. Selva

Inventor： Gary A. Donaldson ,  Donald W. D. Rakowski ,  Nick G. Selva

IPC: H01J3736

CPC classification number: H01J27/04 ,  H01J37/08 ,  H01J2237/31701

Abstract: An ion generator chamber, for an implantation apparatus, having its interior walls surfaces knurled or roughened so that any of the materials used in the chamber cannot deposit onto the interior wall surfaces in a size sufficiently large enough to adversely affect the operation of the chamber, if the deposits peel off the interior walls of the chamber. By limiting the size of any deposits on interior chamber walls, the invention extends the average life of the filaments used in the chamber as well as extending the average time between any necessary cleaning of the inner chamber walls thereby extending the operating life of the chamber.

公开(公告)号：US06545269B1

公开(公告)日：2003-04-08

申请号：US09550171

申请日：2000-04-14

Applicant: Didier Pierrejean ,  Bruno Galland

Inventor： Didier Pierrejean ,  Bruno Galland

IPC: H01J4900

CPC classification number: H01J27/04 ,  H01J43/246 ,  H01J49/08 ,  H01J49/147

Abstract: In accordance with the invention, the ion source of a time-of-flight mass spectrometer includes an electron gun having an electron source and at least one electrode for conditioning the flow of electrons, followed by at least one microchannel wafer for generating a pulsed secondary electron beam containing a greater number of electrons from a pulsed primary electron beam. The secondary electron beam enters a gas ionization area of an ion gun which produces a flow of ions which is then passed through the flight tube in order to be analyzed by an ion detector. This provides a high-performance ion source which is compact, sensitive and easy to integrate.

Abstract translation: 根据本发明，飞行时间质谱仪的离子源包括具有电子源的电子枪和用于调节电子流的至少一个电极，随后是用于产生脉冲次级的至少一个微通道晶片 电子束包含来自脉冲一次电子束的更多数量的电子。 二次电子束进入离子枪的气体离子化区域，其产生离子流，然后将其流过飞行管，以便通过离子检测器进行分析。 这提供了一种高性能的离子源，它是紧凑，灵敏和容易集成的。

公开(公告)号：US6135128A

公开(公告)日：2000-10-24

申请号：US49642

申请日：1998-03-27

Applicant: Michael A. Graf ,  Victor M. Benveniste

Inventor： Michael A. Graf ,  Victor M. Benveniste

IPC: H01J27/02 ,  C23C14/48 ,  H01J27/04 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265 ,  B08B3/12 ,  C23F1/02 ,  G01N21/01 ,  H01J27/00

CPC classification number: H01J37/3171 ,  H01J27/04 ,  H01J37/08 ,  H01J2237/022 ,  H01J2237/061

Abstract: A method and system for in-process cleaning of an ion source (12) is provided. The ion source (12) comprises (i) a plasma chamber (22) formed by chamber walls (112, 114, 116) that bound an ionization zone (120); (ii) a source of ionizable dopant gas (66) and a first mechanism (68) for introducing said ionizable dopant gas into said plasma chamber; (iii) a source of cleaning gas (182) and a second mechanism (184) for introducing said cleaning gas into said plasma chamber; and (iv) an exciter (130) at least partially disposed within said chamber for imparting energy to said ionizable dopant gas and said cleaning gas to create a plasma within said plasma chamber. The plasma comprises disassociated and ionized constituents of said dopant gas and disassociated and ionized constituents of said cleaning gas. The disassociated and ionized constituents of said cleaning gas react with said disassociated and ionized constituents of said dopant gas to prevent formation of deposits of elements contained within said ionizable dopant gas on surfaces of said chamber walls. The cleaning gas may be, for example, nitrogen trifluoride (NF.sub.3), and the ionizable dopant gas may be, for example, either phosphine (PH.sub.3) or arsine (AsH.sub.3). Mass flow controllers control the ratio of cleaning gas to ionizable dopant gas introduced into said plasma chamber, which is greater than 0:1 and preferably at least 3:1.

Abstract translation: 提供了一种用于在过程中清洁离子源（12）的方法和系统。 离子源（12）包括（i）由结合电离区（120）的室壁（112,114,116）形成的等离子体室（22）; （ii）可电离掺杂剂气体源（66）和用于将所述可电离掺杂剂气体引入所述等离子体室的第一机构（68） （iii）用于将所述清洁气体引入所述等离子体室的清洁气体源（182）和第二机构（184）; 和（iv）至少部分地设置在所述腔室内的激励器（130），用于向所述可电离掺杂剂气体和所述清洁气体赋予能量以在所述等离子体腔室内产生等离子体。 所述等离子体包括所述掺杂气体的分离和离子化成分以及所述清洁气体的解离和离子化成分。 所述清洁气体的分离和离子化的组分与所述掺杂剂气体的所述分离和离子化的组分反应，以防止在所述室壁的表面上形成包含在所述可电离掺杂剂气体内的元素沉积物。 清洁气体可以是例如三氟化氮（NF 3），并且可电离掺杂剂气体可以是例如磷化氢（PH 3）或胂（AsH 3）。 质量流量控制器控制导入所述等离子体室的清洁气体与可离子化掺杂剂气体的比例大于0:1，优选至少3:1。

公开(公告)号：US6124675A

公开(公告)日：2000-09-26

申请号：US88079

申请日：1998-06-01

Applicant: Michel J. Bertrand ,  Denis Faubert ,  Olivier Peraldi ,  Andre L'Heureux

Inventor： Michel J. Bertrand ,  Denis Faubert ,  Olivier Peraldi ,  Andre L'Heureux

IPC: H01J49/14 ,  H01J49/04 ,  H01J49/16 ,  H01J7/24

CPC classification number: H01J49/102 ,  H01J27/04

Abstract: The metastable atom bombardment source provides a charged particle free beam of metastable species that can be used to bombard and ionize organic and inorganic substances in a gas phase. The metastable atoms are produced by inducing a discharge in a gas (rare gases or small molecules). The discharge is curved between the cathode and anode, with the cathode located in a medium pressure zone and the anode located off-axis in a low pressure zone; A nozzle located between the cathode and the anode provides a collimated beam of metastable atoms of low kinetic energy that is directed at an ion volume containing the substances to be analyzed.

Abstract translation: 亚稳态原子轰击源提供了一种可带电粒子的亚稳态物质束，可用于轰击和离子化气相中的有机和无机物质。 亚稳态原子通过在气体（稀有气体或小分子）中的排放而产生。 放电在阴极和阳极之间弯曲，阴极位于中压区域，阳极位于低压区域的轴外; 位于阴极和阳极之间的喷嘴提供准直的低动能的亚稳态原子束，其指向含有待分析物质的离子体积。

公开(公告)号：US5898269A

公开(公告)日：1999-04-27

申请号：US863493

申请日：1997-05-27

Applicant: Aaron W. Baum ,  James Edward Schneider, Jr.

Inventor： Aaron W. Baum ,  James Edward Schneider, Jr.

IPC: H01J37/06 ,  G03F7/20 ,  H01J1/34 ,  H01J3/02 ,  H01J7/18 ,  H01J27/04 ,  H01J37/073 ,  H01J40/06

CPC classification number: G03F7/70375 ,  H01J27/04 ,  H01J3/021 ,  H01J37/073 ,  H01J2201/3423 ,  H01J2237/045 ,  H01J2237/06333 ,  H01J2237/28 ,  H01J2237/31754

Abstract: An electron beam source includes a cathode having an electron emission surface including an active area for emission of electrons and a cathode shield assembly including a conductive shield disposed in proximity to the electron emission surface of the cathode. The shield has an opening aligned with the active area. The electron beam source further includes a device for stimulating emission of electrons from the active area of the cathode, electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the cathode at high vacuum. The cathode may be a negative electron affinity photocathode formed on a light-transmissive substrate. The shield protects non-emitting areas of the emission surface from contamination and inhibits cathode materials from contaminating components of the electron beam source. The cathode may be moved relative to the opening in the shield so as to align an new active area with the opening. Getter materials and sources of activation material may be incorporated into the shield assembly.

Abstract translation: 电子束源包括具有电子发射表面的阴极，该电子发射表面包括用于发射电子的有源区和包括设置在阴极的电子发射表面附近的导电屏蔽的阴极屏蔽组件。 屏蔽罩具有与活动区域对齐的开口。 电子束源还包括用于刺激来自阴极的有源区域的电子的发射的装置，用于将电子形成电子束的电子光学器件和用于将阴极保持在高真空的真空外壳。 阴极可以是形成在透光基板上的负电子亲和光电阴极。 屏蔽保护发射表面的不发射区域免受污染，并阻止阴极材料污染电子束源的部件。 阴极可以相对于屏蔽件中的开口移动，以将新的有效区域与开口对准。 吸气材料和活化材料源可以并入屏蔽组件中。

公开(公告)号：US5852345A

公开(公告)日：1998-12-22

申请号：US904494

申请日：1997-08-01

Applicant: Anthony J. Armini

Inventor： Anthony J. Armini

IPC: H01J27/04 ,  H01J27/08 ,  H01J7/24

CPC classification number: H01J27/04 ,  H01J27/08 ,  H01J2237/31701

Abstract: The present invention comprises an ion source apparatus for producing an ion beam from a solid material of arsenic or phosphorus. The ion source includes a plasma chamber having an inlet orifice and an outlet orifice wherein a non-toxic carrier gas is inputted into the plasma chamber. A means for generating a gas plasma is arranged within the plasma chamber and an electrically insulated platform is also arranged within the plasma chamber. A heatable wafer of solid source material of a metal phosphide or arsenide is attached to the platform, for conversion upon heating, into an ion beam.

Abstract translation: 本发明包括用于从砷或磷的固体材料制造离子束的离子源装置。 离子源包括具有入口孔和出口孔的等离子体室，其中无毒载气输入到等离子体室中。 在等离子体室内布置有用于产生气体等离子体的装置，并且等离子体室内还布置有电绝缘平台。 金属磷化物或砷化物的固体源材料的可加热晶片被附接到平台上，用于加热时转换成离子束。

公开(公告)号：US3898496A

公开(公告)日：1975-08-05

申请号：US49717674

申请日：1974-08-12

Applicant: US ENERGY

Inventor： HUDSON ED D ,  MALLORY MERRIT L

IPC: H01J27/04 ,  H05H13/00 ,  H01J61/06 ,  H01J61/16

CPC classification number: H05H13/00 ,  H01J27/04

Abstract: A simple method for producing a high intensity metal ion beam from a high-powered Penning-type ion source in a cyclotron is provided. A small amount of an inert support gas maintains the usual plasma arc, except it is necessary for the support gas to have a heavy mass, e.g., xenon or krypton as opposed to neon. A plate, fabricated from the metal (or anything that can be sputtered) to be ionized, is mounted on the back wall of the ion source arc chamber and is bombarded by returning energetic lowcharged gas ions that failed to successfully cross the initial rf accelerating gap between the ion source and rf accelerating slit. Some of the atoms that are dislodged from the plate by the returning gas ions become ionized in the plasma arc column and are extracted as a useful beam of heavy ions.

Abstract translation: 提供了一种用于从回旋加速器中的大功率Penning型离子源产生高强度金属离子束的简单方法。 少量的惰性支持气体保持通常的等离子体电弧，除了必需的支撑气体具有重质量，例如与氖相反的氙或氪。 由金属制成的板（或任何可被溅射的物体）被电离，安装在离子源电弧室的后壁上，并通过返回能够成功地穿过初始射流的能量低的低电荷气体离子来轰击 加速离子源和rf加速缝之间的间隙。 通过返回的气体离子从板上移出的一些原子在等离子体电弧柱中离子化，并被提取为有效的重离子束。

公开(公告)号：US3274435A

公开(公告)日：1966-09-20

申请号：US904660

申请日：1960-02-16

Applicant: GEN DYNAMICS CORP

Inventor： KERST DONALD W

IPC: H01J27/04 ,  H05H1/22

CPC classification number: H01J27/04 ,  H05H1/22