WET ATOMIZER
    26.
    发明公开
    WET ATOMIZER 审中-公开

    公开(公告)号:US20230398505A1

    公开(公告)日:2023-12-14

    申请号:US18326718

    申请日:2023-05-31

    摘要: Provided is a wet atomizer capable of stably increasing a pressure in a pressurizing chamber and performing highly reproducible raw material process. A wet atomizer includes a motor; a power transmission device that converts a rotational motion of the motor into a reciprocating motion; a high-pressure cylinder; a plunger that reciprocates inside the high-pressure cylinder by the power transmission device to pressurize raw materials; a drive controller that controls the reciprocating motion of the plunger; a nozzle that atomizes pressurized raw material; a first check valve disposed downstream of the nozzle; and a first elastic member that presses the first check valve.

    FACILITY AND METHOD FOR DISTRIBUTING A GAS MIXTURE FOR DOPING SILICON WAFERS

    公开(公告)号:US20230285911A1

    公开(公告)日:2023-09-14

    申请号:US18008375

    申请日:2021-05-27

    摘要: Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for providing a first measurement signal, the control unit (5) being connected to the sensor (8) and configured to produce a first control signal from the first measurement signal, the flow regulator members (41, 42) being configured to adjust the first and second flow rate setpoints (D1, D2) in response to said first control signal.