Abstract:
There are provided a data processing method and a touch sensing apparatus. The data processing method includes (a) obtaining a plurality of pieces of sensing data according to one or more touch inputs; (b) selecting one or more pieces of temporary reference data having the minimum difference value between adjacent other pieces of sensing data; (c) calculating difference values between the one or more pieces of temporary reference data; (d) calculating an N number of difference values between the N number of pieces of sensing data obtained from the nodes included in the Kth row and an N number of pieces of sensing data obtained from nodes included in the K-1th row; and (e) determining the temporary reference data having a relatively small representative value as reference sensing data of the Kth row.
Abstract:
There are provided a touch screen panel and a touch screen apparatus. The touch screen panel includes a plurality of first electrodes formed on a substrate and extending in a first axis direction; and a plurality of second electrodes formed on the substrate and extending in a second axis direction perpendicular to the first axis direction, wherein a plurality of first slits are provided in a diagonal direction with respect to the first axis direction and the second axis direction between the plurality of first electrodes and the plurality of second electrodes, and at least one second slit is formed within each of the plurality of second electrodes.
Abstract:
There are provided a touch sensing apparatus and method. The touch sensing apparatus includes a sensing circuit unit detecting a plurality of signals from a plurality of changes in capacitance generated in a plurality of electrodes provided in a panel unit; and a signal processing unit comparing, with predetermined reference levels, levels of at least two signals generated from changes in capacitance in at least two electrodes spaced apart from one another by a predetermined distance or greater, from among the plurality of electrodes, wherein, when the levels of the at least two signals are greater than the predetermined reference levels, the plurality of changes in capacitance are determined to be generated due to noise.
Abstract:
A sampling frequency offset estimation apparatus of an orthogonal frequency division multiplexing (OFDM) system includes a first differential operation unit performing complex conjugate multiplication of scattered pilots of complex symbols subjected to a fast Fourier transform (FFT) in an OFDM receiver, an interpolation unit repeating an operation of obtaining a median complex symbol between two consecutive symbols among complex symbols having first phase difference information from the first differential operation unit by a predetermined number, a second differential operation unit performing complex conjugate multiplication of two consecutive median complex symbols among median complex symbols from the interpolation unit, and a sampling frequency offset estimation unit estimating sampling frequency offset using complex symbols having second phase difference information from the second differential operation unit.
Abstract:
An image forming apparatus to supply a file transmission and reception list, and a control method thereof. The image forming apparatus may include a storing part and a controlling part to store a list of transmission and reception for transmitted and received files using an FTP (File Transfer Protocol). The file transmission and reception list may include a user name, a date of file transmission and reception, a file name, a file size, an address of a file transmitter recipient, and a user ID or password to log in an FTP server transmitting and receiving the file through the image forming apparatus.
Abstract:
Methods of fabricating integrated circuit memory cells and integrated circuit memory cells are disclosed. An integrated circuit memory cell can be fabricated by forming an ohmic layer on an upper surface of a conductive structure and extending away from the structure along at least a portion of a sidewall of an opening in an insulation layer. An electrode layer is formed on the ohmic layer. A variable resistivity material is formed on the insulation layer and electrically connected to the electrode layer.
Abstract:
A mobile terminal including an input unit configured to receive an instruction from a first user to perform a video call communication with at least a second user, a display unit, a voice recognition module configured to recognize input voice statements conducted during the video call communication between the first and second users, and a controller configured to perform the video call communication between the first and second users based on the instruction from the first user, to control the display unit to display images of the first and second users, to detect a voice statement from the first user designating the second user by examining the voice statements recognized by the voice recognition module, and to emphatically display the image of the second user compared with the image of the first user based on the detected voice statement from the first user.
Abstract:
Provided is an apparatus for estimating a delay spread of a multi-path fading channel in an Orthogonal Frequency Division Multiplexing (OFDM) system. The apparatus is applied to an OFDM receiver including a channel equalization unit compensating channel distortion by estimating channel distortion at pilot locations with respect to output signals of an FFT unit.
Abstract:
A method of forming a metal layer on the conductive region of a semiconductor device includes concurrently supplying a mixture gas including a hydrogen gas and a metal chloride compound gas, and a purge gas into a chamber having a sealed space for a predetermined time, thereby forming a first metal layer on the semiconductor substrate, using a plasma enhanced chemical vapor deposition (PECVD) method. The hydrogen gas and metal chloride gases are thereafter alternately supplied for a predetermined time while the purge gas is continuously supplied into the chamber, thereby forming a second metal layer on the first metal layer, using a PECVD method. Deterioration of semiconductor devices due to high heat by a conventional CVD method can be prevented using a PECVD method as a low temperature process, thereby improving a production yield.
Abstract:
A method of forming a metal layer on the conductive region of a semiconductor device includes concurrently supplying a mixture gas including a hydrogen gas and a metal chloride compound gas, and a purge gas into a chamber having a sealed space for a predetermined time, thereby forming a first metal layer on the semiconductor substrate, using a plasma enhanced chemical vapor deposition (PECVD) method. The hydrogen gas and metal chloride gases are thereafter alternately supplied for a predetermined time while the purge gas is continuously supplied into the chamber, thereby forming a second metal layer on the first metal layer, using a PECVD method. Deterioration of semiconductor devices due to high heat by a conventional CVD method can be prevented using a PECVD method as a low temperature process, thereby improving a production yield.