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138 条记录 (耗时 0.026 秒)

    HIGH PERFORMANCE TOOL COATING FOR PRESS HARDENING OF COATED AND UNCOATED ULTRAHIGH STRENGTH STEEL SHEET METALS
    32.
    发明申请
    HIGH PERFORMANCE TOOL COATING FOR PRESS HARDENING OF COATED AND UNCOATED ULTRAHIGH STRENGTH STEEL SHEET METALS 有权

    公开(公告)号：US20220106677A1

    公开(公告)日：2022-04-07

    申请号：US17427872

    申请日：2020-02-03

    申请人： Oerlikon Surface Solutions AG, Pfäffikon

    发明人： Ali KHATIBI ,  Hamid BOLVARDI ,  Etienne BILLOT ,  Nikolas SCHAAL ,  Pascal SCHABACK ,  Mirjam ARNDT

    IPC分类号： C23C14/06 ,  B21D22/02 ,  C23C14/35 ,  C23C14/00 ,  C23C14/16 ,  C23C28/04

    摘要： Coated tool for hot stamping of coated or uncoated sheet metals, in particular for hot stamping of AlSi- or Zn-coated sheet metals[KM2], comprising a coated substrate surface to be in contact with the coated or uncoated metal sheet, wherein the coating in the coated substrate surface is a multi-layer coating comprising one or more inferior layers and one or more superior layers, where the inferior layers are deposited closer to the substrate surface than the superior layers, whereas: —the inferior layers are designed for providing load bearing capacity, —the superior layers are designed for providing galling resistance, —at least one superior layer (layer 5) is deposited having a multi-nanolayer structure formed by sublayers of the type A, B and C, said three kind of sublayers being nanolayers deposited alternate one on each other forming a sequence of the type . . . A/B/C/A/B/C/A . . . , wherein at least two sequences of one A nanolayer, one B nanolayer and one C nanolayer are deposited forming the multi-nanolayer structure wherein: —the nanolayer of type A is composed in at least 90 at.-% of chromium and nitrogen, —the nanolayer of type B is composed in at least 90 at.-% of titanium, aluminum and nitrogen, —the nanolayer of type C is composed I at least 90 at.-% of vanadium carbon and nitrogen, and —the layer thickness of the at least one superior layer (layer 5) is not lower than 0.5 μm and not higher than 15 μm.

    Al-Cr-Based Ceramic Coatings with Increased Thermal Stability
    35.
    发明申请
    Al-Cr-Based Ceramic Coatings with Increased Thermal Stability 审中-公开

    公开(公告)号：US20200299823A1

    公开(公告)日：2020-09-24

    申请号：US16765685

    申请日：2018-11-23

    申请人： Oerlikon Surface Solutions AG, Pfäffikon

    发明人： Robert Raab ,  Christian Martin Koller ,  Paul Heinz Mayrhofer ,  Mirjam Arndt ,  Jürgen Ramm

    IPC分类号： C23C14/18 ,  C23C14/06 ,  C23C28/04 ,  C23C14/00 ,  C23C14/32 ,  F01D5/28

    摘要： The present invention relates to a method for producing a multilayer film comprising aluminum, chromium, oxygen and nitrogen, in a vacuum coating chamber, the multilayer film comprising layers of type A and layers of type B deposited alternate one of each other, wherein during deposition of the multilayer film at least one target comprising aluminum and chromium is operated as cathode by means of a PVD technique and used in this manner as material source for supplying aluminum and chromium, and an oxygen gas flow and a nitrogen gas flow are introduced as reactive gases in the vacuum chamber for reacting with aluminum and chromium, thereby supplying oxygen and nitrogen for forming the multilayer film, characterized in that: —The A layers are deposited as oxynitride layers of Al—Cr—O—N by using nitrogen and oxygen as reactive gas at the same time, —The B layers are deposited as nitride layers of Al—Cr—N by reducing the oxygen gas flow and by increasing the nitrogen gas flow in order to use only nitrogen as reactive gas for the formation of the Al—Cr—N layer, and wherein the relation between oxygen content and nitrogen content in the multilayer film correspond to a ratio in atomic percentage having a value between and including 1.8 and 4.

    TICN Having Reduced Growth Defects by Means of HIPIMS
    39.
    发明申请
    TICN Having Reduced Growth Defects by Means of HIPIMS 审中-公开

    公开(公告)号：US20190136363A1

    公开(公告)日：2019-05-09

    申请号：US16095369

    申请日：2017-04-21

    申请人： Oerlikon Surface Solutions AG, Pfäffikon

    发明人： Denis Kurapov ,  Siegfried Krassnitzer

    IPC分类号： C23C14/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/34 ,  C23C14/35 ,  H01J37/34

    摘要： The invention relates to method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of HiPIMS, wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HiPIMS process in a coating chamber, wherein, to reduce growth defects during the deposition of the at least one TiCN layer, the reactive atmosphere comprises one inert gas, preferably argon, and at least nitrogen gas as the reactive gas,wherein, to reduce growth defects during deposition of the at least one TiCN layer, the reactive atmosphere additionally contains, as a second reactive gas, a gas containing carbon, preferable CH4, used as the source of carbon to produce the TiCN layer wherein, while depositing the TiCN layer, a bipolar bias voltage is applied to the substrate to be coated, or at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HiPIMS process with the reactive atmosphere having only nitrogen gas as the reactive gas, wherein the Ti targets are preferably operated by means of a first power supply device or a first power supply unit and the graphite targets are operated with pulsed power by means of a second power supply device or a second power supply unit.