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141 条记录 (耗时 0.022 秒)

    Film forming method
    34.
    发明授权
    Film forming method 有权
    成膜方法

    公开(公告)号：US07931945B2

    公开(公告)日：2011-04-26

    申请号：US11782013

    申请日：2007-07-24

    申请人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

    发明人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

    IPC分类号： H05H1/24

    CPC分类号： G01N1/24 ,  C23C16/4405 ,  C23C16/4412 ,  G01N15/06 ,  G01N2015/0693 ,  H01L21/67069 ,  H01L21/67115 ,  H01L21/67253 ,  H01L21/68742 ,  Y10T137/8593 ,  Y10T137/87652 ,  Y10T137/8766

    摘要： The present invention provides a particle measuring system which is provided in a processing system 40 which generates an atmosphere obtained by exhausting air or a gas in a processing chamber 48 by a vacuum pump 98 and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe 90 which connects an exhaust opening 86 of the processing chamber 48 with the vacuum pump 98, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.

    摘要翻译： 本发明提供一种粒子测量系统，其设置在处理系统40中，该处理系统40产生通过真空泵98排出处理室48中的空气或气体而获得的气氛，并将与半导体制造有关的工艺应用于晶片W 附着在排气管90上，排气管90将处理室48的排气口86与真空泵98连接，并测量废气中的颗粒数量及其测量方法，该系统和方法提供处理 系统和清洁方法，其通过基于废气中的颗粒数量确定终点并执行不需要的膜的清洁来终止蚀刻工艺。

    OBJECT DETECTING APPARATUS
    36.
    发明申请
    OBJECT DETECTING APPARATUS 有权
    对象检测装置

    公开(公告)号：US20100201355A1

    公开(公告)日：2010-08-12

    申请号：US12557923

    申请日：2009-09-11

    申请人： Shoji YAMAGUCHI ,  Mario FUSE ,  Tsukasa MATSUDA ,  Kunihiro TAKAHASHI ,  Hiroyoshi INOUE ,  Eizo KURIHARA ,  Seigo MAKIDA

    发明人： Shoji YAMAGUCHI ,  Mario FUSE ,  Tsukasa MATSUDA ,  Kunihiro TAKAHASHI ,  Hiroyoshi INOUE ,  Eizo KURIHARA ,  Seigo MAKIDA

    IPC分类号： G01R33/12

    CPC分类号： G01R33/0029 ,  G01V3/08 ,  G01V3/10 ,  G01V15/00

    摘要： An object detecting apparatus that detects an object including a magnetic body including: a detection signal acquiring unit that acquires a detection signal based on a magnetic signal; a disturbance source detection signal storage unit that stores a detection signal of a disturbance source that generates a disturbance component with respect to the detection signal; a determining unit that determines whether the detection signal acquired by the detection signal acquiring unit contains the disturbance component; an amplitude correction unit that corrects an amplitude of the disturbance source detection signal and generates an amplitude-corrected disturbance source detection signal; a disturbance component suppression unit that generates a determination signal by suppressing the disturbance component contained in the detection signal; and an object determination unit that determines whether the object is the object to be detected based on the determination signal.

    摘要翻译： 一种检测包括磁体的物体的物体检测装置，包括：检测信号获取单元，其基于磁信号获取检测信号; 干扰源检测信号存储单元，其存储相对于所述检测信号产生干扰成分的干扰源的检测信号; 确定单元，确定由检测信号获取单元获取的检测信号是否包含干扰分量; 幅度校正单元，其校正所述干扰源检测信号的幅度并产生振幅校正的干扰源检测信号; 干扰分量抑制单元，其通过抑制检测信号中包含的干扰分量来产生确定信号; 以及对象确定单元，其基于所述确定信号来确定所述对象是否是所述被检测对象。

    FLAT DETECTOR AND MEDIUM DETECTOR
    38.
    发明申请
    FLAT DETECTOR AND MEDIUM DETECTOR 有权
    平板检测器和中等检测器

    公开(公告)号：US20100116722A1

    公开(公告)日：2010-05-13

    申请号：US12434163

    申请日：2009-05-01

    申请人： Eizo KURIHARA ,  Tsukasa MATSUDA ,  Kunihiro TAKAHASHI ,  Hiroyoshi INOUE ,  Mario FUSE ,  Shoji YAMAGUCHI

    发明人： Eizo KURIHARA ,  Tsukasa MATSUDA ,  Kunihiro TAKAHASHI ,  Hiroyoshi INOUE ,  Mario FUSE ,  Shoji YAMAGUCHI

    IPC分类号： B07C5/34 ,  G01N27/72

    CPC分类号： G01N27/725

    摘要： a flat detector includes a first flat member and a second flat member both made of a nonmagnetic nonmetal, a first conductive wiring that generates an alternating magnetic field, the first conductive wing being disposed on a surface of the first flat member facing toward the second flat member, a first layer made of a nonmagnetic metal and disposed at least on a surface of the first flat member, a second conductive wiring that detects a signal generated by magnetization reversal of a magnetic material, the magnetization reversal being caused by the alternating magnetic field generated by the first conductive wiring, the second conductive wiring being disposed on a surface of the second flat member facing toward the first flat member, and a second layer made of a nonmagnetic metal and disposed at least on a surface of the second flat member.

    摘要翻译： 扁平检测器包括由非磁性非金属制成的第一平坦构件和第二平坦构件，产生交变磁场的第一导电布线，所述第一导电翼设置在面向第二平面的第一平坦构件的表面上 构件，由非磁性金属制成的第一层并且至少设置在所述第一平坦构件的表面上;第二导电布线，其检测由磁性材料的磁化反转产生的信号，所述磁化反转是由交变磁场引起的 由所述第一导电布线产生，所述第二导电布线设置在所述第二平坦构件的面向所述第一平坦构件的表面上，所述第二层由非磁性金属制成并且至少设置在所述第二平坦构件的表面上。

    Plasma enhanced atomic layer deposition system
    39.
    发明授权
    Plasma enhanced atomic layer deposition system 有权
    等离子体增强原子层沉积系统

    公开(公告)号：US07651568B2

    公开(公告)日：2010-01-26

    申请号：US11090256

    申请日：2005-03-28

    申请人： Tadahiro Ishizaka ,  Tsukasa Matsuda ,  Frank M. Cerio, Jr. ,  Kaoru Yamamoto

    发明人： Tadahiro Ishizaka ,  Tsukasa Matsuda ,  Frank M. Cerio, Jr. ,  Kaoru Yamamoto

    IPC分类号： C23C16/505 ,  C23C16/503 ,  H01L21/306

    CPC分类号： C23C16/4409 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45542 ,  C23C16/45544 ,  C23C16/5096

    摘要： A plasma enhanced atomic layer deposition (PEALD) system includes a first chamber component coupled to a second chamber component to provide a processing chamber defining an isolated processing space within the processing chamber. A substrate holder is provided within the processing chamber and configured to support a substrate, a first process material supply system is configured to supply a first process material to the processing chamber and a second process material supply system is configured to supply a second process material to the processing chamber. A power source is configured to couple electromagnetic power to the processing chamber, and a sealing assembly interposed between the first and second chamber components. The sealing assembly includes a plurality of sealing members configured to reduce the amount of external contaminants permeating through an interface of the first and second components into the isolated processing space of the processing chamber, wherein the film is formed on the substrate by alternatingly introducing the first process material and the second process material.

    摘要翻译： 等离子体增强原子层沉积（PEALD）系统包括耦合到第二室部件的第一室部件，以提供限定处理室内的隔离处理空间的处理室。 衬底保持器设置在处理室内并被配置为支撑衬底，第一处理材料供应系统被配置为将第一处理材料供应到处理室，第二处理材料供应系统被配置为将第二处理材料供应到 处理室。 电源被配置为将电磁功率耦合到处理室，以及插入在第一和第二室部件之间的密封组件。 密封组件包括多个密封构件，其被配置为将渗透通过第一和第二组件的界面的外部污染物的量减少到处理室的隔离处理空间中，其中通过交替地引入第一 工艺材料和第二工艺材料。