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公开(公告)号：US11518088B2
公开(公告)日：2022-12-06
申请号：US17604870
申请日：2020-04-20
Applicant: UNIVERSITEIT VAN AMSTERDAM
Inventor： Suhas Nawada
IPC: B29C64/286 , B29C64/129 , B33Y10/00 , B33Y30/00
Abstract: The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location. This provides a fast 3D printing assembly allowing high resolution details.
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公开(公告)号：US20220098232A1
公开(公告)日：2022-03-31
申请号：US17494149
申请日：2021-10-05
Inventor： Gaston Julia Johannes Richelle , Dieuwertje Emma Streefkerk , Jan Herman Van Maarseveen , Peter Timmerman
Abstract: The invention relates to methods for preparing a compound comprising a peptide attached to a molecular scaffold whereby multiple peptide loops are formed, to compounds that can be obtained with such methods and uses thereof.
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公开(公告)号：US11268021B2
公开(公告)日：2022-03-08
申请号：US16331704
申请日：2017-09-08
Applicant: UNIVERSITEIT VAN AMSTERDAM
Inventor： Katerina Newell , Benjamin Bruhn , Benjamin Brenny
Abstract: Multi-chromatic photoluminescent, oxide-capped semiconductor nanocrystals and methods for forming such semiconductor nanocrystals. The method includes exposing one or more oxide-capped semiconductors, preferably type IV semiconductor nanocrystals, to electron beam radiation, wherein the radiation has an energy between 1 and 30 keV, the radiation introducing color centers in the oxide that exhibit photoluminescence in at least the green band of the visible spectrum.
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公开(公告)号：US20180225550A1
公开(公告)日：2018-08-09
申请号：US15579917
申请日：2016-06-03
Applicant: UNIVERSITEIT VAN AMSTERDAM
Inventor： Jorn-Henrik JACOBSEN , Johannes Christianus VAN GEMERT , Reinier VAN DEN BOOMGAARD , Zhongyu LOU , Arnoldus Wilhelmus Maria SMEULDERS
CPC classification number: G06K9/6262 , G06K9/4619 , G06K9/6256 , G06K9/6273 , G06N3/04 , G06N3/0454 , G06N3/084 , G06N3/088 , G06N20/00
Abstract: The invention provides a method for recognition of information in digital image data, said method comprising a learning phase on a data set of example digital images having known information, and characteristics of categories are computed automatically from each example digital image and compared to its known category, said method comprises training a convolutional neural network comprising network parameters using said data set, in which via deep learning each layer of said convolutional neural network is represented by a linear decomposition of all filters as learned in each layer into basis functions.
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公开(公告)号：US09924865B2
公开(公告)日：2018-03-27
申请号：US15100228
申请日：2014-11-28
Applicant: UNIVERSITEIT VAN AMSTERDAM , SIGHTCORP B.V.
Inventor： Fares Alnajar , Roberto Valenti , Theo Gevers
Abstract: Some embodiments are directed to a system and a method for estimating gaze from a set of eye measurement points that are indicative of a gaze pattern of a user viewing a scene. Some other embodiments are directed to obtaining sets of eye measurement points from different users viewing the same scene. In another embodiment, the different sets of eye measurement points are mapped to a common coordinate system for reciprocal calibration In yet another embodiment, a scene transformation for mapping the common coordinate system to a coordinate system associated with the scene can be calculated by matching eye measurement points from the common coordinate system to interest points of the scene. The scene transformation is thereby calculated more accurately than individually calculated scene transformations, thereby providing a more accurate estimate of the gaze points.
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Patent Agency Ranking
公开(公告)号：US09743997B2
公开(公告)日：2017-08-29
申请号：US14447088
申请日：2014-07-30
Inventor： Cornelis Antonius Grimbergen , Gerard Johan Den Heeten
CPC classification number: A61B90/17 , A61B6/0414 , A61B6/502 , A61B90/03 , A61B2090/033 , A61B2090/034 , A61B2090/036 , A61B2560/0406 , A61B2562/164 , A61B2576/02 , H05G1/02
Abstract: A mammography apparatus is provided for detecting malignant cells in a breast, comprising an x-ray source and an x-ray detector that cooperates with the x-ray source for providing an x-ray image of said breast, and further comprising a paddle for flattening the breast by pressing it against said x-ray detector, and comprising a contact area measuring device for measuring a contact area between the breast and the paddle, wherein the contact area measuring device is embodied with at least a first laminate of an electrically insulating material and an electrically low resistance material, which first laminate is provided on a side of the paddle facing the breast, and wherein the electrically low resistance material is sandwiched between the paddle and the insulating material.
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公开(公告)号：US20170176879A1
公开(公告)日：2017-06-22
申请号：US15381980
申请日：2016-12-16
Applicant: Stichting VU , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
Inventor： Stefan Michiel WITTE , Kjeld Sijbrand Eduard EIKEMA
IPC: G03F9/00 , G01B15/00 , H05G2/00 , G01N23/205
CPC classification number: G03F9/7042 , G01B15/00 , G01N23/2055 , G03F7/70625 , H05G2/008
Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.
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公开(公告)号：US20160061750A1
公开(公告)日：2016-03-03
申请号：US14838268
申请日：2015-08-27
Applicant: Vrije Universiteit Amsterdam , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
Inventor： Arie Jeffrey DEN BOEF , Simon Gijsbert Josephus MATHIJSSEN , Nitesh PANDEY , Stefan Michiel WITTE , Kjeld EIKEMA
IPC: G01N21/956 , G03F7/20 , G01B11/00
CPC classification number: G01N21/956 , G01B11/00 , G01N2201/12 , G03F7/70141 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03H1/0443 , G03H2001/0033 , G03H2001/0204 , G03H2001/0458
Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.
Abstract translation: 通过光刻工艺在基板（W）上形成计量目标。 包括一个或多个光栅结构的靶（T）在不同条件下被空间相干辐射照射。 从参考辐射（652）干涉的所述目标区域衍射的辐射（650）干扰以在图像检测器（623）处形成干涉图案。 捕获所述干涉图案的一个或多个图像。 从捕获的图像和参考辐射的知识中，在检测器处收集的散射辐射的复杂场。 从复场计算由每个光栅衍射的辐射的合成辐射图像（814）。 从光栅的衍射光谱的相对部分的合成辐射图像（814,814'）获得光栅中的不对称度。 使用合适的目标，可以从测量的不对称性计算光刻过程的覆盖层和其他性能参数。
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39.发明申请NOVEL NICKEL-BASED COMPLEXES AND THEIR USE IN A PROCESS FOR THE TRANSFORMATION OF OLEFINS 有权新型的镍基复合物及其在烯烃转化过程中的应用公开(公告)号：US20150306589A1
公开(公告)日：2015-10-29
申请号：US14694216
申请日：2015-04-23
Applicant: IFP Energies Nouvelles , UNIVERSITEIT VAN AMSTERDAM
Inventor： Pierre BOULENS , Pierre-Alain BREUIL , Joost REEK , Helene OLIVIER-BOURBIGOU
CPC classification number: B01J31/2295 , B01J31/188 , B01J31/24 , B01J2231/20 , B01J2531/847 , B01J2540/30 , C07C2/34 , C07C2531/22 , C07F15/04
Abstract: The invention describes a novel type of nickel-based complex and its preparation method. The invention also concerns the use of said complex in a process for the transformation of olefins.
Abstract translation: 本发明描述了一种新型的镍基络合物及其制备方法。 本发明还涉及所述络合物在烯烃转化方法中的用途。
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40.发明申请NOVEL NICKEL-BASED CATALYTIC COMPOSITION, AND ITS USE IN A PROCESS FOR THE OLIGOMERIZATION OF OLEFINS 有权新型的镍基催化组合物及其在烯烃低级化过程中的应用公开(公告)号：US20150306588A1
公开(公告)日：2015-10-29
申请号：US14694052
申请日：2015-04-23
Applicant: IFP ENERGIES NOUVELLES , UNIVERSITEIT VAN AMSTERDAM
Inventor： Pierre BOULENS , Pierre-Alain BREUIL , Joost REEK , Helene OLIVIER-BOURBIGOU
CPC classification number: B01J31/1845 , B01J31/0267 , B01J31/143 , B01J31/2247 , B01J2231/20 , B01J2531/0213 , B01J2531/847 , C07C2/32 , C07C2/34 , C07C2527/02 , C07C2531/18 , C07C2531/24 , C07F15/045 , C07C11/08
Abstract: The invention describes a nickel-based composition. The invention also concerns the use of said composition as a catalytic composition in an olefin oligomerization process.
Abstract translation: 本发明描述了一种镍基组合物。 本发明还涉及在烯烃低聚方法中使用所述组合物作为催化组合物。
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