公开(公告)号：US20080020580A1

公开(公告)日：2008-01-24

申请号：US11828217

申请日：2007-07-25

申请人： Zhijian Lu ,  Thomas Wolf ,  Scott Jessen

发明人： Zhijian Lu ,  Thomas Wolf ,  Scott Jessen

IPC分类号： H01L21/04

CPC分类号： H01L21/76808 ,  H01L21/31144

摘要： The present invention provides a method for manufacturing an interconnect and a method for manufacturing an integrated circuit including the interconnect. The method of manufacturing an interconnect, among other steps, includes forming a via (160) in a substrate (130) and then forming a base getter material (210) in the via (160). The method further includes forming a photoresist layer (410) over the base getter material (210), the photoresist layer (410) having an opening (420) therein positioned over the via (160), and etching a trench (510) into the substrate (130) using the opening (420) in the photoresist layer (410).

公开(公告)号：US20070274481A1

公开(公告)日：2007-11-29

申请号：US10566952

申请日：2004-07-30

申请人： Xiaozheng Guo ,  Zhijian Lu ,  Xin Zhang ,  Qingchen Chu ,  Youkun Chen

发明人： Xiaozheng Guo ,  Zhijian Lu ,  Xin Zhang ,  Qingchen Chu ,  Youkun Chen

IPC分类号： H04L12/14

CPC分类号： G06Q40/04 ,  H04L12/14 ,  H04L12/66

摘要： A method for realizing charging includes setting up mapping relation between service attribute and charging rule, acquiring service attribute of the to-be-charged service when it is demanded to charge the to-be-charged service, acquiring charging rule of the to-be-charged service according to service attribute of the to-be-charged service, and charging the to-be-charged service according to the acquired charging rule. Also disclosed is a charging system having an acquiring charging rule module and charging processing module. When it is demanded to develop new services or modify charging rules of original services, it can be fulfilled by modifying the service information provided for charging processing module accordingly, thus charging requirements of various services can be satisfied. Charging processing module of charging system is independent of services, so that cost of charging system is reduced, and stability, reliability and versatility of charging system are improved.

摘要翻译： 实现充电的方法包括建立服务属性与收费规则之间的映射关系，当要求对待收费服务收费时获取收费服务的服务属性，获取待收费业务的收费规则 根据收费服务的服务属性进行收费服务，并根据获取的收费规则向收费服务收费。 还公开了一种具有获取计费规则模块和计费处理模块的计费系统。 当要求开发新服务或修改原始服务的计费规则时，可以通过相应地修改提供给计费处理模块的服务信息来实现，从而满足各种服务的收费要求。 充电系统的充电处理模块独立于服务，从而降低了充电系统的成本，提高了充电系统的稳定性，可靠性和通用性。

公开(公告)号：US20060194447A1

公开(公告)日：2006-08-31

申请号：US11382939

申请日：2006-05-12

申请人： Ju-Ai Ruan ,  Qi-Zhong Hong ,  Zhijian Lu

发明人： Ju-Ai Ruan ,  Qi-Zhong Hong ,  Zhijian Lu

IPC分类号： H01L21/31

CPC分类号： H01L21/0217 ,  H01L21/02115 ,  H01L21/0234 ,  H01L21/3105 ,  H01L21/3148 ,  H01L21/318 ,  H01L21/76826 ,  H01L21/76829 ,  H01L21/76834 ,  H01L23/3171 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of manufacturing an etch stop layer 18, 20, 21 on a semiconductor wafer 2 and the etch stop layer 18, 20, 21 produced by the method. The method includes depositing a dielectric layer 18, 20, 21 and applying a plasma treatment to the semiconductor wafer 2. Also, an etch stop layer 18, 20, 21 on a semiconductor wafer 2 having a modified surface and an amine deficient bulk.

摘要翻译： 在半导体晶片2上制造蚀刻停止层18,20,21的方法和通过该方法制造的蚀刻停止层18,20,21。 该方法包括沉积电介质层18,20,21并对半导体晶片2施加等离子体处理。 而且，具有改性表面和胺缺乏体积的半导体晶片2上的蚀刻停止层18,20,21。

公开(公告)号：US07090967B2

公开(公告)日：2006-08-15

申请号：US10248232

申请日：2002-12-30

申请人： Zhijian Lu ,  Chieh-Yu Lin

发明人： Zhijian Lu ,  Chieh-Yu Lin

IPC分类号： G03F7/26

CPC分类号： G03F7/40 ,  H01L21/0273 ,  H01L21/31144 ,  H01L21/32139

摘要： A method of transferring a pattern onto a substrate, in the fabrication of ICs, is disclosed. The substrate is coated with a photoresist layer, wherein the photoresist layer is selectively exposed and developed, producing sidewalls that exhibit roughness. The roughness is smoothened out by coating the photoresist layer with a coating layer.

摘要翻译： 公开了一种在IC的制造中将图案转印到基板上的方法。 衬底涂覆有光致抗蚀剂层，其中光致抗蚀剂层被选择性地暴露和显影，产生表现出粗糙度的侧壁。 通过用涂层涂覆光致抗蚀剂层，使粗糙度平滑化。

公开(公告)号：US06420101B1

公开(公告)日：2002-07-16

申请号：US09598376

申请日：2000-06-21

申请人： Zhijian Lu ,  Alan Thomas ,  Alois Gutmann ,  Kuang Jung Chen ,  Margaret C. Lawson

发明人： Zhijian Lu ,  Alan Thomas ,  Alois Gutmann ,  Kuang Jung Chen ,  Margaret C. Lawson

IPC分类号： G03F720

CPC分类号： H01L21/0274 ,  G03F7/2022 ,  G03F7/2037 ,  G03F7/2039 ,  Y10S430/168

摘要： In the exposure and development of available deep ultraviolet (DUV) sensitive photoresist it has been observed that following the standard prior art methods of exposure and development results in a high density of undesirable pieces of components of the photoresist material, Blob Defects, remaining on the semiconductor substrate (body). A method of exposing and developing the photoresist material which results in a reduced incidence of these Blob Defects consists of introducing a low level uniform flood exposure of light in addition to the commonly used exposure to patterned light, followed by standard development. The flood exposure is in the range of 5 to 50% of the dose-to-clear for a non-patterned exposure.

摘要翻译： 在可用的深紫外（DUV）敏感光刻胶的曝光和显影中，已经观察到遵循现有技术的标准曝光和显影方法导致光致抗蚀剂材料的不希望的部件的高密度，残留在 半导体衬底（主体）。 曝光和显影光致抗蚀剂材料的方法导致这些斑点缺陷的发生率降低，除了通常使用的图案光曝光之外，还引入低等级的均匀泛光曝光，随后进行标准开发。 对于非图案化曝光，洪水暴露在5至50％的剂量清除范围内。

公开(公告)号：US5965565A

公开(公告)日：1999-10-12

申请号：US988816

申请日：1997-12-11

申请人： Meng H. Chen ,  Zhijian Lu ,  Ravi Nargund ,  Arthur A. Patchett ,  James R. Tata ,  Lihu Yang ,  Mu Tsu Wu

发明人： Meng H. Chen ,  Zhijian Lu ,  Ravi Nargund ,  Arthur A. Patchett ,  James R. Tata ,  Lihu Yang ,  Mu Tsu Wu

IPC分类号： C07D401/06 ,  C07D413/14 ,  C07D471/10 ,  C07D495/10 ,  C07D209/04 ,  A61K31/445 ,  C07D211/00

CPC分类号： C07D401/06 ,  C07D413/14 ,  C07D471/10 ,  C07D495/10

摘要： The present invention is directed to certain piperidines, pyrrolidines, and hexahydro-1H-azepines of the general structural formula: ##STR1## wherein B is selected from: ##STR2## and R.sup.1, R.sup.1a, R.sup.2a, R.sup.3a, R.sup.3b, R.sup.4, R.sup.4a, R.sup.4b, R.sup.4c, R.sup.5, D, X, Y, n, x and y are as defined herein. These compounds promote the release of growth hormone in humans and animals. This property can be utilized to promote the growth of food animals to render the production of edible meat products more efficient, and in humans, to treat physiological or medical conditions characterized by a deficiency in growth hormone secretion, such as short stature in growth hormone deficient children, and to treat medical conditions which are improved by the anabolic effects of growth hormone. Growth hormone releasing compositions containing such compounds as the active ingredient thereof are also disclosed.

摘要翻译： 本发明涉及一般结构式的某些哌啶，吡咯烷和六氢-1H-吖庚因：其中B选自：和R1，R1a，R2a，R3a，R3b，R4，R4a，R4b，R4c，R5， D，X，Y，n，x和y如本文所定义。 这些化合物促进人和动物中生长激素的释放。 这种性质可以用于促进食用动物的生长，使食用肉制品的生产更有效，并且在人类中，用于治疗以生长激素分泌不足为特征的生理或医学病症，例如生长激素缺乏的身材矮小 儿童，并且治疗通过生长激素的合成代谢作用改善的医疗状况。 还公开了含有这些化合物作为其活性成分的生长激素释放组合物。

公开(公告)号：US09828369B2

公开(公告)日：2017-11-28

申请号：US15508562

申请日：2015-08-31

申请人： Merck Sharp & Dohme Corp. ,  Jason Imbriglio ,  Clare London ,  Zhijian Lu ,  James Tata ,  Yusheng Xiong ,  Ming You ,  Hye Won Youm

发明人： Jason Imbriglio ,  Clare London ,  Zhijian Lu ,  James Tata ,  Yusheng Xiong ,  Ming You ,  Hyewon Youm

IPC分类号： C07D217/02 ,  C07D401/04 ,  C07D401/12 ,  C07D401/14 ,  C07D405/12 ,  C07D417/12 ,  C07D413/12

CPC分类号： C07D417/12 ,  A61K45/06 ,  A61P9/10 ,  C07D217/02 ,  C07D217/12 ,  C07D401/04 ,  C07D401/12 ,  C07D401/14 ,  C07D405/12 ,  C07D413/12

摘要： The present invention relates to a compound represented by formula I: and pharmaceutically acceptable salts thereof. The compounds of formula I are inhibitors of diacylglyceride O-acyltransferase 2 (“DGAT2”) and may be useful in the treatment, prevention and suppression of diseases mediated by DGAT2. The compounds of the present invention may be useful in the treatment of hepatic steatosis, diabetes mellitus, obesity, hyperlipidemia, hypercholesterolemia, atherosclerosis, cardio-renal diseases such as chronic kidney diseases and heart failure and related diseases and conditions.

公开(公告)号：US20170275274A1

公开(公告)日：2017-09-28

申请号：US15508562

申请日：2015-08-31

申请人： Jason IMBRIGLIO ,  Clare LONDON ,  Zhijian LU ,  James TATA ,  Yusheng XIONG ,  Ming YOU ,  Hye Won YOUM ,  Merck Sharp & Dohme Corp.

发明人： Jason Imbriglio ,  Clare London ,  Zhijian Lu ,  James Tata ,  Yusheng Xiong ,  Ming You ,  Hyewon Youm

IPC分类号： C07D417/12 ,  C07D217/02 ,  C07D401/04 ,  C07D405/12 ,  C07D401/14 ,  C07D413/12 ,  C07D401/12

CPC分类号： C07D417/12 ,  A61K45/06 ,  A61P9/10 ,  C07D217/02 ,  C07D217/12 ,  C07D401/04 ,  C07D401/12 ,  C07D401/14 ,  C07D405/12 ,  C07D413/12

摘要： The present invention relates to a compound represented by formula I: and pharmaceutically acceptable salts thereof. The compounds of formula I are inhibitors of diacylglyceride O-acyltransferase 2 (“DGAT2”) and may be useful in the treatment, prevention and suppression of diseases mediated by DGAT2. The compounds of the present invention may be useful in the treatment of hepatic steatosis, diabetes mellitus, obesity, hyperlipidemia, hypercholesterolemia, atherosclerosis, cardio-renal diseases such as chronic kidney diseases and heart failure and related diseases and conditions.

公开(公告)号：US20110033451A1

公开(公告)日：2011-02-10

申请号：US12827199

申请日：2010-06-30

申请人： Beatriz M. Carreno ,  Mary Collins ,  Jill F. Wright ,  Neil M. Wolfman ,  Maya Arai ,  Kenneth Jacobs ,  Zhijian Lu ,  Yongjing Guo ,  Yongchang Qiu

发明人： Beatriz M. Carreno ,  Mary Collins ,  Jill F. Wright ,  Neil M. Wolfman ,  Maya Arai ,  Kenneth Jacobs ,  Zhijian Lu ,  Yongjing Guo ,  Yongchang Qiu

IPC分类号： A61K39/395 ,  A61K33/24 ,  A61K38/02 ,  A61K31/7088 ,  A61P11/06 ,  A61P29/00 ,  A61P19/02 ,  A61P17/06

CPC分类号： C07K16/244 ,  A61K38/00 ,  A61K2039/505 ,  A61K2039/55527 ,  C07K14/54 ,  C07K14/7155 ,  C07K16/2866 ,  C07K2317/76 ,  C07K2319/30 ,  C12N15/1138 ,  G01N33/6869

摘要： The present invention provides isolated and purified polynucleotides and polypeptides related to the IL-17F signaling pathway. The invention also provides antibodies to IL-17F homodimers and IL-17A/IL-17F heterodimers, and methods of isolating and purifying members of the IL-17 family, including IL-17A/IL-17F heterodimers, from a natural source. The present invention also is directed to novel methods for diagnosing, prognosing, monitoring the progress of, and treating and/or preventing disorders related to IL-17F signaling, i.e., IL-17F-associated disorders, including, but not limited to, inflammatory disorders, such as autoimmune diseases (e.g., arthritis (including rheumatoid arthritis), psoriasis, systemic lupus erythematosus, and multiple sclerosis), respiratory diseases (e.g., COPD, cystic fibrosis, asthma, allergy), transplant rejection (including solid organ transplant rejection), and inflammatory bowel diseases or disorders (IBDs, e.g., ulcerative colitis, Crohn's disease). The present invention is further directed to novel therapeutics and therapeutic targets, and to methods of screening and assessing test compounds for the intervention (treatment) and prevention of disorders related to IL-17F signaling.

摘要翻译： 本发明提供与IL-17F信号通路相关的分离和纯化的多核苷酸和多肽。 本发明还提供了对IL-17F同源二聚体和IL-17A / IL-17F异二聚体的抗体，以及从天然来源分离和纯化IL-17家族成员（包括IL-17A / IL-17F异源二聚体）的方法。 本发明还涉及用于诊断，预后，监测与IL-17F信号传导相关的疾病的进展和/或预防的新方法，即IL-17F相关疾病，包括但不限于炎性 诸如自身免疫性疾病（例如关节炎（包括类风湿性关节炎），牛皮癣，系统性红斑狼疮和多发性硬化症），呼吸系统疾病（例如COPD，囊性纤维化，哮喘，过敏），移植排斥（包括实体器官移植排斥 ）和炎症性肠病或疾病（IBD，例如溃疡性结肠炎，克罗恩病）。 本发明还涉及新的治疗和治疗靶标，以及筛选和评估用于干预（治疗）的试验化合物和预防与IL-17F信号传导相关的紊乱的方法。

公开(公告)号：US07838204B2

公开(公告)日：2010-11-23

申请号：US12623529

申请日：2009-11-23

申请人： Zhijian Lu

发明人： Zhijian Lu

IPC分类号： G03F1/00

CPC分类号： G03F7/0007 ,  G02B1/12 ,  G02B5/0215 ,  G02B5/0221 ,  G02B5/0231 ,  G02B5/0268 ,  G02B5/0278 ,  G02B6/0051 ,  G02F1/133606 ,  G03F1/00

摘要： A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.