Water-and-oil repellent treatment of textile
    34.
    发明授权
    Water-and-oil repellent treatment of textile 有权
    防水和拒油处理纺织品

    公开(公告)号:US07758656B2

    公开(公告)日:2010-07-20

    申请号:US10258067

    申请日:2001-04-16

    IPC分类号: D06M15/00 B05D7/00

    摘要: A textile having excellent water- and oil-repellency can be obtained by a method of preparing a treated textile, having steps of: (1) preparing a treatment liquid comprising a water- and oil-repellent agent, (2) adjusting pH of the treatment liquid to at most 7, preferably at most 3, (3) applying the treatment liquid to a textile, (4) treating the textile with steam, and (5) washing the textile with water and dehydrating the textile, wherein the water- and oil-repellent agent is at least one fluorine-containing compound selected from the group consisting of a fluorine-containing polymer and a fluorine-containing low molecular weight compound, and the water- and oil-repellent agent or the treatment liquid contains an organic salt.

    摘要翻译: 通过制备处理过的纺织品的方法可以获得具有优异的拒水拒油性的织物,其具有以下步骤:(1)制备包含拒水拒油剂的处理液,(2)调节 (3)将处理液施加到纺织品上,(4)用蒸汽处理织物,和(5)用水洗涤织物并使织物脱水,其中, 防油剂为选自含氟聚合物和含氟低分子化合物中的至少一种含氟化合物,防水防油剂或处理液含有有机物 盐。

    METHOD AND SYSTEM FOR ETCHING A HAFNIUM CONTAINING MATERIAL
    36.
    发明申请
    METHOD AND SYSTEM FOR ETCHING A HAFNIUM CONTAINING MATERIAL 审中-公开
    用于蚀刻含铪材料的方法和系统

    公开(公告)号:US20080217294A1

    公开(公告)日:2008-09-11

    申请号:US11684072

    申请日:2007-03-09

    IPC分类号: B44C1/22 G06F19/00

    摘要: A method of etching a hafnium containing layer includes disposing a substrate having the hafnium containing layer in a plasma processing system, wherein a mask layer defining a pattern therein overlies the hafnium containing layer. A process gas including a HBr gas is introduced to the plasma processing system, and a plasma is formed from the process gas in the plasma processing system. The hafnium containing layer is exposed to the plasma in order to treat the hafnium containing layer. The hafnium containing layer is then wet etched using a dilute HF wet etch process.

    摘要翻译: 蚀刻含铪层的方法包括将具有含铪层的基板设置在等离子体处理系统中,其中限定图案的掩模层覆盖在含铪层上。 将包括HBr气体的工艺气体引入等离子体处理系统中,并且从等离子体处理系统中的处理气体形成等离子体。 将含铪层暴露于等离子体以处理含铪层。 然后使用稀的HF湿蚀刻工艺对含铪层进行湿法蚀刻。

    PARTICLE MONITOR SYSTEM AND SUBSTRATE PROCESSING APPARATUS
    37.
    发明申请
    PARTICLE MONITOR SYSTEM AND SUBSTRATE PROCESSING APPARATUS 有权
    颗粒监测系统和基板处理装置

    公开(公告)号:US20080212093A1

    公开(公告)日:2008-09-04

    申请号:US12015156

    申请日:2008-01-16

    IPC分类号: G01N21/00

    摘要: A particle monitor system that can detect fine particles in a substrate processing apparatus. The substrate processing apparatus has a chamber in which a substrate is housed and subjected to processing, a dry pump that exhausts gas out of the chamber, and a bypass line that communicates the chamber and the dry pump together. The particle monitor system has a laser light oscillator that irradiates laser light toward a space in which the particles may be present, and a laser power measurement device that is disposed on an optical path of the laser light having passed through the space and measures the energy of the laser light.

    摘要翻译: 一种能够检测基板处理装置中的微粒子的粒子监视器系统。 基板处理装置具有容纳基板并经受处理的室,将气体排出室的干燥泵和将室与干燥泵连通的旁通管。 粒子监视器系统具有将激光照射到可能存在粒子的空间的激光振荡器,以及设置在穿过该空间的激光的光路上并测量能量的激光功率测量装置 的激光。

    Zoom lens system
    38.
    发明授权
    Zoom lens system 失效
    变焦镜头系统

    公开(公告)号:US07177096B2

    公开(公告)日:2007-02-13

    申请号:US11242946

    申请日:2005-10-05

    申请人: Takashi Enomoto

    发明人: Takashi Enomoto

    IPC分类号: G02B15/14

    CPC分类号: G02B15/177

    摘要: A zoom lens system includes a negative first lens group and a positive second lens group.The negative first lens group includes a negative lens element and a positive lens element.The positive second lens group includes a positive lens element, a negative lens element, and a positive lens element. At least the object-side positive lens element and the negative lens element are cemented together.The zoom lens system of the present invention satisfies the following conditions: 1.5

    摘要翻译: 变焦透镜系统包括负第一透镜组和正第二透镜组。 负第一透镜组包括负透镜元件和正透镜元件。 正的第二透镜组包括正透镜元件,负透镜元件和正透镜元件。 至少物体侧正透镜元件和负透镜元件粘合在一起。 本发明的变焦透镜系统满足以下条件:<?in-line-formula description =“In-line Formulas”end =“lead”?> 1.5 <3.0(1)<?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line -formulae description =“在线公式”end =“lead”?> 1 (m (3)(3)(3)(3)式中,f 2G第二透镜组的焦距; 在短焦距端子处的正第二透镜组的横向放大率; 在长焦距的末端,正的第二透镜组的横向放大率; 整个变焦镜头系统在焦距长焦距下的焦距; 和f :焦距在短焦距处的整个变焦透镜系统的焦距。

    Image display device and method of manufacturing the same
    39.
    发明申请
    Image display device and method of manufacturing the same 审中-公开
    图像显示装置及其制造方法

    公开(公告)号:US20060250565A1

    公开(公告)日:2006-11-09

    申请号:US11480852

    申请日:2006-07-06

    IPC分类号: G02F1/1339

    CPC分类号: H01J29/86 H01J9/261

    摘要: A first substrate and a second substrate located opposite each other with a gap therebetween are sealed at a predetermined position by a sealing portion and which seals the front and rear substrates in a given position and defines a sealed space between the front and rear substrates. The sealing portion has a ground layer formed on an inner surface of at least one of the first substrate and the second substrate, and a sealing layer made of an electrically conductive sealant and formed on the ground layer, the ground layer having a thickness of 5 to 22 μm.

    摘要翻译: 第一基板和第二基板之间具有间隙彼此相对定位,在预定位置通过密封部分密封,并且在给定位置密封前基板和后基板,并且限定前基板和后基板之间的密封空间。 密封部分具有形成在第一基板和第二基板中的至少一个的内表面上的接地层和形成在接地层上的由导电密封剂制成的密封层,接地层的厚度为5 到22岁