公开(公告)号：US20130115819A1

公开(公告)日：2013-05-09

申请号：US13519103

申请日：2010-09-26

Applicant: Cong Liu ,  Qiang Zhou ,  Long Qu ,  Zhiyue Xu ,  Yabin Liu

Inventor： Cong Liu ,  Qiang Zhou ,  Long Qu ,  Zhiyue Xu ,  Yabin Liu

IPC: H01R31/06

CPC classification number: H01R31/06 ,  G06F2213/0038 ,  H01R12/721 ,  H01R31/065

Abstract: An adapter card is used to convert the PCI Express X1 slot to CompactPCI Express X1 slot which is compatible with PICMG EXP.0 R1.0 specification in the commercial and industrial control computer. The adapter card includes the impedance controlled circuit board, the connecting circuit board, the PCI Express port, the CPCI Express signal socket, the CPCI power socket, the double row hole socket, the double row bent needle plug, the linking block and a dam-board. The adapter card expands the application of PCI Express X1 slots by a large margin and make it compatible with CPCI Express X1 card.

Abstract translation: 适配器卡用于将PCI Express X1插槽转换为与商业和工业控制计算机中的PICMG EXP.0 R1.0规范兼容的CompactPCI Express X1插槽。 适配卡包括阻抗控制电路板，连接电路板，PCI Express端口，CPCI Express信号插座，CPCI电源插座，双排孔插座，双列弯针插头，连接块和坝 -板。 适配器卡扩展了PCI Express X1插槽的应用程序，使其与CPCI Express X1卡兼容。

公开(公告)号：US20120301823A1

公开(公告)日：2012-11-29

申请号：US13482559

申请日：2012-05-29

Applicant: Gregory P. Prokopowicz ,  Gerhard Pohlers ,  Mingqi Li ,  Chunyi Wu ,  Cong Liu ,  Cheng-bai Xu

Inventor： Gregory P. Prokopowicz ,  Gerhard Pohlers ,  Mingqi Li ,  Chunyi Wu ,  Cong Liu ,  Cheng-bai Xu

IPC: C08F224/00 ,  G03F7/004

CPC classification number: C08F214/186 ,  C08F214/18 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0397 ,  C08F2220/283 ,  C08F2220/185 ,  C08F220/32

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract translation: 共聚物包含式（I）的可溶于碱的单体的聚合产物：其中R a是H，F，C 1-10烷基或C 1-10氟烷基，L 1是m价的C 2-30亚烷基，C 3-30亚环烷基 ，C 6-30亚芳基，C 3-30亚烷基，X 1独立地为包含二 - 二酮，二酯 - 酮，二 - 二酯的基础可溶性有机基团，或包含至少一种 前面的; 和可与式（I）的碱溶性单体共聚的另外的单体。

公开(公告)号：US20120077120A1

公开(公告)日：2012-03-29

申请号：US13232318

申请日：2011-09-14

Applicant: Gregory P. PROKOPOWICZ ,  Gerhard Pohlers ,  Cong Liu ,  Chunyi Wu ,  Cheng-Bae Xu ,  Joon Seok Oh

Inventor： Gregory P. PROKOPOWICZ ,  Gerhard Pohlers ,  Cong Liu ,  Chunyi Wu ,  Cheng-Bae Xu ,  Joon Seok Oh

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382

Abstract: New photoresist compositions are provided that comprise a component that comprises two or more amide groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a multi-amide component that can function to decrease undesired photogenrated-acid diffusion out of unexposed regions of a photoresist coating layer

Abstract translation: 提供新的光致抗蚀剂组合物，其包含包含两个或多个酰胺基团的组分。 本发明优选的光致抗蚀剂可以包含具有光酸不稳定基团的树脂; 光致酸发生剂化合物; 以及可以起到减少光致抗蚀剂涂层的未曝光区域中不期望的光致酸扩散的作用的多酰胺组分

公开(公告)号：US20110269074A1

公开(公告)日：2011-11-03

申请号：US13077947

申请日：2011-03-31

Applicant: Emad Aqad ,  Cong Liu ,  Cheng-Bai Xu ,  Mingqi Li

Inventor： Emad Aqad ,  Cong Liu ,  Cheng-Bai Xu ,  Mingqi Li

IPC: G03F7/20 ,  C08F12/30

Abstract: New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.

Abstract translation: 提供新的聚合物，其包含（i）一种或多种共价连接的光酸产生剂部分和（ii）一种或多种光致酸不稳定基团，其中所述一种或多种光酸产生剂部分是一种或多种光酸不稳定基团的组分。 本发明优选的聚合物适用于在短波长例如亚200nm，特别是193nm下成像的光致抗蚀剂。

公开(公告)号：US20110269070A1

公开(公告)日：2011-11-03

申请号：US13077943

申请日：2011-03-31

Applicant: Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

Inventor： Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

IPC: G03F7/004 ,  G03F7/20 ,  C07C61/12

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/19 ,  C07D313/00 ,  C07D315/00 ,  C07D327/00 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, photoacid generators that comprise 1) a SO3− moiety; 2) one or more fluorinated carbons; and 3) one or more of the fluorinated carbons either directly or indirectly substituted by an ester keto group.

Abstract translation: 提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。 在特定方面，光酸产生剂包含1）SO 3部分; 2）一个或多个氟化碳; 和3）直接或间接被酯酮基取代的一个或多个氟化碳。

公开(公告)号：US20110223535A1

公开(公告)日：2011-09-15

申请号：US13013780

申请日：2011-01-25

Applicant: Cong Liu ,  Chunyi Wu ,  Gerhard Pohlers ,  Gregory P. Prokopowicz ,  Cheng-Bai Xu

Inventor： Cong Liu ,  Chunyi Wu ,  Gerhard Pohlers ,  Gregory P. Prokopowicz ,  Cheng-Bai Xu

IPC: G03F7/004 ,  G03F7/20 ,  C07C271/16

CPC classification number: C07C271/16 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/32

Abstract: New nitrogen-containing compounds are provided that comprise multiple hydroxyl moieties and photoresist compositions that comprise such nitrogen-containing compounds. Preferred nitrogen-containing compounds comprise 1) multiple hydroxyl substituents (i.e. 2 or more) and 2) one or more photoacid-labile groups.

Abstract translation: 提供新的含氮化合物，其包含多个羟基部分和包含这种含氮化合物的光致抗蚀剂组合物。 优选的含氮化合物包括1）多个羟基取代基（即2个或更多个）和2）一个或多个光致酸不稳定基团。

公开(公告)号：US20110033801A1

公开(公告)日：2011-02-10

申请号：US12782397

申请日：2010-05-18

Applicant: Anthony Zampini ,  Gerald B. Wayton ,  Vipul Jain ,  Cong Liu ,  Suzanne Coley ,  Owendi Ongayi

Inventor： Anthony Zampini ,  Gerald B. Wayton ,  Vipul Jain ,  Cong Liu ,  Suzanne Coley ,  Owendi Ongayi

IPC: G03F7/004 ,  C09D177/00 ,  G03F7/20

CPC classification number: G03F7/11 ,  C09D167/02 ,  G03F7/0045 ,  G03F7/091 ,  H01L21/0271

Abstract: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.

Abstract translation: 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。

公开(公告)号：US07702070B2

公开(公告)日：2010-04-20

申请号：US12204491

申请日：2008-09-04

Applicant: Kejun Kang ,  Ziran Zhao ,  Hua Peng ,  Zhiqiang Chen ,  Yuanjing Li ,  Yinong Liu ,  Li Zhang ,  Yaohong Liu ,  Zhizhong Liang ,  Dongmao Li ,  Cong Liu ,  Huabin Tan ,  Yongpeng Liu ,  Xinhui Duan ,  Xueyou Zhou

Inventor： Kejun Kang ,  Ziran Zhao ,  Hua Peng ,  Zhiqiang Chen ,  Yuanjing Li ,  Yinong Liu ,  Li Zhang ,  Yaohong Liu ,  Zhizhong Liang ,  Dongmao Li ,  Cong Liu ,  Huabin Tan ,  Yongpeng Liu ,  Xinhui Duan ,  Xueyou Zhou

IPC: G01N23/04

CPC classification number: G01V5/005

Abstract: A device for inspecting contraband in an aviation cargo containers includes: a turntable located at an object inspecting position and configured to carry the object to be inspected and bring the object into rotation; an object conveying system; a scanning system including a radiation source and a detector which can synchronously move in the vertical direction; a turntable drive/control system which drives and controls rotation of said turntable so that the turntable can continuously rotate about its rotation axis or rotate to any predetermined angular position; a scanning drive/control system which drives and controls the radiation source and the detector into synchronous movement in the vertical direction so that the radiation source and the detector can continuously move in the vertical direction or move to any predetermined vertical position. The device of the present invention can scan the object and form images in various scanning modes to meet different needs.

Abstract translation: 一种用于检查航空货物集装箱中的违禁品的装置，包括：位于物体检查位置的转盘，其构造成承载被检查物体并使物体旋转; 物体输送系统; 包括能够沿垂直方向同步移动的辐射源和检测器的扫描系统; 转盘驱动/控制系统，其驱动和控制所述转台的旋转，使得转盘可以围绕其旋转轴线连续旋转或旋转到任何预定的角位置; 扫描驱动/控制系统，其将辐射源和检测器驱动并控制在垂直方向上的同步运动，使得辐射源和检测器可以在垂直方向上连续移动或移动到任何预定的垂直位置。 本发明的装置可以扫描对象并以各种扫描模式形成图像以满足不同的需要。

公开(公告)号：US20080165934A1

公开(公告)日：2008-07-10

申请号：US11960805

申请日：2007-12-20

Applicant: Peng Hua ,  Zhizhong Liang ,  Jinyu Zhang ,  Xueyou Zhou ,  Cong Liu

Inventor： Peng Hua ,  Zhizhong Liang ,  Jinyu Zhang ,  Xueyou Zhou ,  Cong Liu

IPC: H05G1/00

CPC classification number: B65G47/80

Abstract: A composite rotary-delivery worktable for use in an air container detection system, which is attached to a scanning passage of an air container diction system, said composite rotary-delivery worktable comprising a delivery assembly for carrying and delivering said air container; and a rotary assembly rotatable with a rotation axis, wherein said delivery assembly is attached to said rotary assembly such that said delivery assembly is rotatable with said rotary assembly when said rotary assembly rotates. The composite rotary-delivery worktable of this invention enables large-scale air containers to not only pass the scanning passage but also rotate freely within the scanning passage. This makes it possible to keep the scanning system fixed and stationary, thereby increasing the working reliability of the scanning system and reducing the design difficulty and complexity of the scanning system.

Abstract translation: 一种用于空气容器检测系统的复合旋转输送工作台，其安装在空气容器系统的扫描通道上，所述复合旋转输送工作台包括用于承载和输送所述空气容器的输送组件; 以及旋转组件，其可旋转地旋转，其中所述输送组件附接到所述旋转组件，使得当所述旋转组件旋转时，所述输送组件可随所述旋转组件旋转。 本发明的复合旋转输送工作台使得大型空气容器不仅能够通过扫描通道，而且可以在扫描通道内自由旋转。 这样可以使扫描系统保持固定和固定，从而提高扫描系统的工作可靠性，降低扫描系统的设计难度和复杂性。

公开(公告)号：US11106137B2

公开(公告)日：2021-08-31

申请号：US13297258

申请日：2011-11-15

Applicant: Deyan Wang ,  Cong Liu ,  Mingqi Li ,  Joon Seok Oh ,  Cheng-Bai Xu ,  Doris H. Kang ,  Clark H. Cummins ,  Matthias S. Ober

Inventor： Deyan Wang ,  Cong Liu ,  Mingqi Li ,  Joon Seok Oh ,  Cheng-Bai Xu ,  Doris H. Kang ,  Clark H. Cummins ,  Matthias S. Ober

IPC: G03F7/20 ,  G03F7/004 ,  G03F7/039

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.