公开(公告)号：US07405416B2

公开(公告)日：2008-07-29

申请号：US11067124

申请日：2005-02-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US07154928B2

公开(公告)日：2006-12-26

申请号：US10875662

申请日：2004-06-23

申请人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.

摘要翻译： 在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长 至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲 每个具有至少两个不同选择的中心波长中的一个。

公开(公告)号：US06480275B2

公开(公告)日：2002-11-12

申请号：US09772293

申请日：2001-01-29

申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

IPC分类号： G01J318

CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

摘要翻译： 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

公开(公告)号：US07838854B2

公开(公告)日：2010-11-23

申请号：US12220560

申请日：2008-07-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： H01J35/20

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US20090080476A1

公开(公告)日：2009-03-26

申请号：US11973671

申请日：2007-10-10

申请人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edward Arriola ,  Mike Wyatt ,  Walter Crosby

发明人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edward Arriola ,  Mike Wyatt ,  Walter Crosby

IPC分类号： H01S3/139 ,  H01S3/083

CPC分类号： H01S3/0057 ,  G03F7/70341 ,  G03F7/70583

摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.

摘要翻译： 一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

公开(公告)号：US20080283776A1

公开(公告)日：2008-11-20

申请号：US12220560

申请日：2008-07-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

公开(公告)号：US06586757B2

公开(公告)日：2003-07-01

申请号：US09875719

申请日：2001-06-06

申请人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx late of ,  Richard L. Sandstrom ,  John E. Rauch

发明人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx late of ,  Richard L. Sandstrom ,  John E. Rauch

IPC分类号： H01J3520

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region and exhausted axially through the center of the anode. In another preferred embodiment a laser beam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.

公开(公告)号：US06566668B2

公开(公告)日：2003-05-20

申请号：US09875721

申请日：2001-06-06

申请人： John E. Rauch ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx ,  Richard L. Sandstrom ,  Stephan T. Melnychuk

发明人： John E. Rauch ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx ,  Richard L. Sandstrom ,  Stephan T. Melnychuk

IPC分类号： H05H104

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

公开(公告)号：US06192064B1

公开(公告)日：2001-02-20

申请号：US09470724

申请日：1999-12-22

申请人： John M. Algots ,  Christopher A. Marchi ,  Frederick G. Erie ,  Jesse D. Buck ,  Alexander I. Ershov ,  Palash P. Das ,  Igor V. Fomenkov

发明人： John M. Algots ,  Christopher A. Marchi ,  Frederick G. Erie ,  Jesse D. Buck ,  Alexander I. Ershov ,  Palash P. Das ,  Igor V. Fomenkov

IPC分类号： H01S308

CPC分类号： G03F7/70025 ,  G02B5/1828 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/08009 ,  H01S3/08059 ,  H01S3/08081 ,  H01S3/0812 ,  H01S3/086 ,  H01S3/10 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/225 ,  H01S3/2256

摘要： A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage. Wavelength is controlled by very fine and rapid positioning of an RMAX mirror in a line narrowing module. Bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt. Other preferred embodiments include automatic adjustment of the horizontal position of the laser chamber within the resonance cavity. In preferred embodiments, feedback signals from a wavelength monitor are used to position the RMAX mirror. In other preferred embodiments a separate laser beam reflected off the RMAX mirror on to a photodiode array is used to position the mirror.

摘要翻译： 智能激光器具有使用来自波形计的反馈信号自动计算脉冲能量，波长和带宽的计算机控制。 通过控制放电电压来控制脉冲能量。 通过在线窄模块中的RMAX镜子的非常精细和快速的定位来控制波长。 带宽是通过调整线窄化模块中的光栅的曲率来控制的。 优选实施例包括通过自动调节光束扩展器棱镜所在的棱镜板和自动调整RMAX倾斜来自动反馈水平和垂直光束轮廓。 其它优选实施例包括在谐振腔内自动调整激光室的水平位置。 在优选实施例中，使用来自波长监视器的反馈信号来定位RMAX镜。 在其它优选实施例中，使用从RMAX镜反射到光电二极管阵列上的分离的激光束来定位反射镜。

公开(公告)号：US07471708B2

公开(公告)日：2008-12-30

申请号：US11095293

申请日：2005-03-31

申请人： Herve A. Besaucele ,  Igor V. Fomenkov ,  William N. Partlo ,  Fedor B. Trintchouk ,  Hao Ton That

发明人： Herve A. Besaucele ,  Igor V. Fomenkov ,  William N. Partlo ,  Fedor B. Trintchouk ,  Hao Ton That

IPC分类号： H01S3/13 ,  H01S3/00 ,  H01S3/22

CPC分类号： H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/134

摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

摘要翻译： 公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，电极中的第一个，激光介质气体，第二个电极，电流返回路径和第二端子，形成具有特定头电流感应环路特有的电感的磁头电流感应环路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。