摘要:
A modem transmission level and modem sensitivity which are communication control information corresponding to the connection form of each destination device are registered in advance in a destination information storage unit so as to be correlated with an abbreviated dialing number of the destination. When a communication instruction using an abbreviated dialing number is received, if a modem transmission level and modem sensitivity are registered in the destination information storage unit as corresponding to the received abbreviated dialing number, the modem is controlled based on those registered modem transmission level and modem sensitivity. If neither a modem transmission level or modem sensitivity is registered as corresponding to the received abbreviated dialing number, the modem is controlled according to a modem transmission level and modem sensitivity that are registered in advance in the apparatus.
摘要:
The invention is to provide a sheet accumulation apparatus enabling to uniformly load tabbed sheets into a train of sheets for load and store the sheets on a tray. The sheet accumulation apparatus has a sheet outlet for successively discharging the sheets, a tray means for loading to hold the sheets thereon, a sheet carrier means for discharging the sheets from the sheet outlet to the side of a downstream, a sheet front end regulating means for colliding the sheets sent by the sheet carrier means against the regulating means at the sheet front ends and regulating them, and a sheet rear regulating means disposed to the tray means for regulating the positions of the sheets from the sheet outlet at the sheet rear ends. The sheet front end regulating means comprises (1) stopper member movable back and forth in the sheet carrying direction; or (2) stopper means of two or more disposed back and forth in the sheet carrying direction and selectively facing the sheet front end regulating means; or (3) stopper means movable in a direction traversing with carrying along the sheet head ends; a shift means for driving the stopper means; and a control means for controlling the shift means.
摘要:
A sheet stacking apparatus having: a sheet discharge tray to move upward and downward; an alignment section including first and second regulating members to align a side edge of a sheet on the tray; a first drive section for moving the tray upward or downward; a second drive section for moving the regulating members in a conveyance width direction; and a control section for controlling the first and the second drive sections so as to: align the side edge of the sheet discharged on the tray on the basis of the position of the first regulating member; when a predetermined amount of the sheets are discharged on the tray, separate the sheets from the first regulating member and the second regulating member by moving the tray or the alignment section and, after that, move the regulating members in the conveyance width direction; and align the side edge of the sheets.
摘要:
An image communication apparatus comprises an email receiving unit for receiving an email; facsimile-forwarding unit for facsimile-forwarding the email received by the email receiving unit; a forwarding-size-upper-limit setting unit for setting a predetermined forwarding size upper limit; and a facsimile-forward limiting unit for limiting the facsimile-forwarding when the forwarding size to be facsimile-forwarded by the facsimile-forwarding unit exceeds the forwarding size upper limit set by the forwarding-upper-limit-size setting unit.
摘要:
A plasma processing apparatus suitable for high-speed and high-definition etching is provided. By applying to a wafer chucking electrode 9 a voltage waveform in which an absolute value of high frequency voltage increases with time and switching between a positive voltage and a negative voltage occurs, a rectangular high frequency voltage is caused to be generated in the wafer 10, with the result that the duty ratio of the rectangular high frequency voltage decreases and that the high energy ion ratio in the energy distribution of ions incident on the wafer increases. Therefore, high efficiency and high accuracy etching becomes possible, providing the advantage that the material selection ratio is improved.
摘要:
A sheet stacking apparatus having: a sheet discharge tray to move upward and downward; an alignment section including first and second regulating members to align a side edge of a sheet on the tray; a first drive section for moving the tray upward or downward; a second drive section for moving the regulating members in a conveyance width direction; and a control section for controlling the first and the second drive sections so as to: align the side edge of the sheet discharged on the tray on the basis of the position of the first regulating member; when a predetermined amount of the sheets are discharged on the tray, separate the sheets from the first regulating member and the second regulating member by moving the tray or the alignment section and, after that, move the regulating members in the conveyance width direction; and align the side edge of the sheets.
摘要:
A semiconductor device provided with: a first interconnection layer provided on a semiconductor substrate; an interlevel insulation film provided over the first interconnection layer; a barrier layer provided between the first interconnection layer and the interlevel insulation film; and a second interconnection layer of gold provided as an uppermost interconnection layer on the interlevel insulation film. The barrier layer is formed in a region of the first interconnection layer including an interlevel connection opening region of the interlevel insulation, and the region is greater than the interlevel connection opening region. The second interconnection layer is electrically connected to the first interconnection layer via the barrier layer in the interlevel connection opening.
摘要:
The plasma processing apparatus wherein the means for applying a high frequency voltage, which becomes a voltage waveform in which a positive constant voltage and a negative constant voltage alternate with each other at given cycles, is constituted by a DC power source and a switching circuit (a chopper circuit).
摘要:
A luminous lamination structure includes a first layer made of n-type nitride semiconductor and a second layer made of p-type nitride semiconductor and disposed over the first layer wherein a luminous region is defined between the first and second layers. The second layer is removed to expose the first layer in a first area which is a partial surface of the first layer. A p-side electrode is disposed on a surface of the second layer and electrically connected to the second layer. An insulating film covers the p-side electrode. An n-side electrode electrically connected to the first layer is disposed in the first area. A reflection film disposed on the insulating film extends to the n-side electrode and electrically connected to the n-side electrode. The reflection film is made of silver containing alloy or silver.
摘要:
A plasma processing apparatus suitable for high-speed and high-definition etching is provided. By applying to a wafer chucking electrode 9 a voltage waveform in which an absolute value of high frequency voltage increases with time and switching between a positive voltage and a negative voltage occurs, a rectangular high frequency voltage is caused to be generated in the wafer 10, with the result that the duty ratio of the rectangular high frequency voltage decreases and that the high energy ion ratio in the energy distribution of ions incident on the wafer increases. Therefore, high efficiency and high accuracy etching becomes possible, providing the advantage that the material selection ratio is improved.