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36 条记录 (耗时 0.03 秒)

    Apparatus for the manipulation and/or adjustment of an optical element
    31.
    发明申请
    Apparatus for the manipulation and/or adjustment of an optical element 审中-公开
    用于操纵和/或调节光学元件的装置

    公开(公告)号：US20090002670A1

    公开(公告)日：2009-01-01

    申请号：US12221045

    申请日：2008-07-30

    申请人： Frank Melzer ,  Markus Weiss ,  Guenther Dengel ,  Volker Stein

    发明人： Frank Melzer ,  Markus Weiss ,  Guenther Dengel ,  Volker Stein

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70825 ,  G02B7/005 ,  G02B7/1827 ,  G03F7/70258

    摘要： The invention relates to an apparatus for the manipulation and/or adjustment of an optical element with respect to a structure, the optical element being connected to the structure by means of a number of setting members, and the setting members having as active adjusting elements screw elements or piezoceramic elements, which in each case produce an active force along one degree of freedom and by means of which the optical element is connected to the structure in such a way that it can be set in up to six degrees of freedom.

    摘要翻译： 本发明涉及一种用于相对于结构操作和/或调节光学元件的装置，所述光学元件借助于多个固定构件连接到所述结构，并且所述固定构件具有作为主动调节元件的螺钉 元件或压电陶瓷元件，其在每种情况下沿着一个自由度产生主动力，并且通过该元件或光学元件将光学元件连接到结构，使得其可以被设置为高达六个自由度。

    Lighting system, particularly for use in extreme ultraviolet (euv) lithography
    35.
    发明申请
    Lighting system, particularly for use in extreme ultraviolet (euv) lithography 失效
    照明系统，特别适用于极紫外（euv）光刻

    公开(公告)号：US20050174650A1

    公开(公告)日：2005-08-11

    申请号：US10512100

    申请日：2003-04-04

    申请人： Frank Melzer ,  Wolfgang Singer

    发明人： Frank Melzer ,  Wolfgang Singer

    IPC分类号： G02B17/00 ,  G02B26/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/10

    CPC分类号： G03F7/70075 ,  G02B26/0816 ,  G03F7/70141 ,  G03F7/702

    摘要： A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ≦193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt. The location and/or angles of the second screen elements of the second optical element can be adjusted individually and independently of one another in order to realize another assignment of the first screen elements of the first optical element to the second screen elements of the second optical element by displacing and/or tilting the first and second screen elements.

    摘要翻译： 一种特别用于极紫外（EUV）光刻的照明系统，包括用于制造波长<= 193nm的半导体元件的投影透镜，其具有光源，物平面，出射光瞳，具有第一光学元件的第一光学元件 用于产生光通道的屏幕元件，以及具有第二屏元件的第二光学元件。 第二光学元件的屏幕元件被分配给由第一光学元件的第一屏幕元件之一形成的每个光通道。 第一光学元件和第二光学元件的屏幕元件可以被配置或布置成使得它们为每个光通道产生从光源到物平面的连续光束路线。 可以调节第一光学元件的第一屏元件的角度以便改变倾斜。 第二光学元件的第二屏幕元件的位置和/或角度可以彼此独立地且独立地进行调整，以便实现第一光学元件的第一屏幕元件与第二光学元件的第二屏幕元件的另一分配 元件通过移位和/或倾斜第一和第二屏元件。