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97 条记录 (耗时 0.026 秒)

    Dot-etching solution
    31.
    发明授权
    Dot-etching solution 失效
    点刻蚀溶液

    公开(公告)号：US4124516A

    公开(公告)日：1978-11-07

    申请号：US817475

    申请日：1977-07-20

    申请人： Fumiaki Shinozaki ,  Tomoaki Ikeda ,  Yasuo Washizawa ,  Sho Nakao

    发明人： Fumiaki Shinozaki ,  Tomoaki Ikeda ,  Yasuo Washizawa ,  Sho Nakao

    IPC分类号： G03C5/38 ,  B41C1/02 ,  C23F1/20 ,  G03F7/00 ,  C09K13/04

    CPC分类号： B41C1/025 ,  C23F1/20

    摘要： A dot-etching solution for dot-etching a halftone image of a metal composed mainly of aluminum, the dot-etching solution comprising(1) water,(2) (a) phosphorous acid or (b) phosphorous acid and phosphoric acid,(3) at least one of a bismuth compound and an antimony compound, and(4) at least one compound selected from hydrogen chloride, an alkali metal chloride, calcium chloride and magnesium chloride.

    摘要翻译： 用于对主要由铝构成的金属的半色调图像进行点蚀刻的点蚀刻溶液，所述点蚀刻溶液包含（1）水，（2）（A）磷酸或（B）磷酸和磷酸（ 3）至少一种双胺化合物和抗微生物化合物，和（4）至少一种选自氯化物，碱金属氯化物，氯化钙和氯化镁的化合物。

    Light-sensitive photopolymerizable composition
    32.
    发明授权
    Light-sensitive photopolymerizable composition 失效
    光敏光聚合组合物

    公开(公告)号：US4386153A

    公开(公告)日：1983-05-31

    申请号：US240433

    申请日：1981-03-04

    申请人： Fumiaki Shinozaki ,  Yasuo Washizawa ,  Tomoaki Ikeda ,  Sho Nakao ,  Syunichi Kondoh

    发明人： Fumiaki Shinozaki ,  Yasuo Washizawa ,  Tomoaki Ikeda ,  Sho Nakao ,  Syunichi Kondoh

    IPC分类号： C08F2/00 ,  C08F2/50 ,  G03F7/031 ,  H01L21/027 ,  G03C1/68

    CPC分类号： G03F7/031 ,  Y10S430/12 ,  Y10S430/124

    摘要： A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the following general formula (d) and 2-[4-(substituted amino)cinnamoyl]naphthalenes represented by the following general formula (e): ##STR1## wherein R and R', which may be the same or different, each represents a methyl group or an ethyl group, and R.sup.0 represents a hydrogen atom, a hydroxy group, a --CR.sup.1 R.sup.2 R.sup.3 group, where R.sup.1, R.sup.2 and R.sup.3, which may be the same or different, each represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, or an --OR.sup.4 group, where R.sup.4 represents an alkyl group having 1 to 5 carbon atoms.

    摘要翻译： 一种包含可加成聚合的烯属不饱和双键的化合物和光聚合引发剂的感光性组合物，其包含（1）选自由以下的化合物组成的组中的至少一种化合物：苯并蒽酮，取代的苯并蒽酮（其取代基包括卤素原子， 至5个碳原子和具有1至5个碳原子的烷氧基），1,2-苯并蒽醌和取代的苯并蒽醌（其取代基包括卤素原子，具有1至5个碳原子的烷基和具有1至5个碳原子的烷氧基）和 （2）选自由以下通式（a）表示的4,4'-二取代氨基 - 二苯甲酮，由以下通式（b）表示的对取代氨基 - 苯甲醛衍生物， ，由以下通式（c）表示的2-（对取代氨基 - 苯基）-1,3-二氧戊环，4,4'-双（取代氨基）-N-亚苄基苯胺r （d）和由下列通式（e）表示的2- [4-（取代氨基）肉桂酰基]萘表示：（a）图像（c）（c） （e）其中R和R'可以相同或不同，表示甲基或乙基，R 0表示氢原子，羟基，-CR 1 R 2 R 3 基团，其中可以相同或不同的R 1，R 2和R 3各自表示氢原子或具有1至3个碳原子的烷基或-OR 4基团，其中R 4表示具有1至5个碳原子的烷基 原子

    Process for producing a material having a vapor-deposited metal layer, and process for producing a recording material
    34.
    发明授权
    Process for producing a material having a vapor-deposited metal layer, and process for producing a recording material 失效
    用于制备具有气相沉积金属层的材料的方法，以及用于制备记录材料的方法

    公开(公告)号：US4268541A

    公开(公告)日：1981-05-19

    申请号：US81221

    申请日：1979-10-02

    申请人： Tomoaki Ikeda ,  Satoshi Yoshida ,  Hideaki Takeuchi ,  Fumiaki Shinozaki ,  Keishiro Kido

    发明人： Tomoaki Ikeda ,  Satoshi Yoshida ,  Hideaki Takeuchi ,  Fumiaki Shinozaki ,  Keishiro Kido

    IPC分类号： B05D7/24 ,  G03F1/00 ,  H01F41/14 ,  B05D1/36 ,  B05D7/04

    CPC分类号： B05D1/60 ,  B05D7/24 ,  H01F41/14

    摘要： A process for producing a sheet-like material having a vapor-deposited metallic layer thereon, which comprises vapor depositing a layer of a metal, a layer of different metals in contact with each other, a layer of a metal alloy, a layer of a metal and a metal compound in contact with each other or a layer of a metal compound as the metallic layer on a support of a polymeric material having a glass transition temperature of at least about 0.degree. C., a composite of said polymeric material and paper, woven or non-woven cloth, or paper using at least one member selected from the group consisting of metals, metal alloys and metal compounds as an evaporating material in the vapor depositing, and then forming a layer of an organic material on the metallic layer by vapor deposition using an evaporable organic material as an evaporating material in the vapor depositing.

    摘要翻译： 一种用于制造其上具有气相沉积金属层的片状材料的方法，其包括气相沉积金属层，彼此接触的不同金属层，金属合金层， 金属和金属化合物彼此接触或金属化合物层作为金属层在玻璃化转变温度为至少约0℃的聚合材料的载体上，所述聚合材料和纸的复合物 ，织造或无纺布，或使用在气相沉积中使用选自金属，金属合金和金属化合物作为蒸发材料的组中的至少一种的材料，然后在金属层上形成有机材料层 通过使用蒸发有机材料作为气相沉积中的蒸发材料进行气相沉积。

    Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
    35.
    发明授权
    Spectrally sensitized positive light-sensitive o-quinone diazide containing composition 失效
    光谱敏感的正亮度的O-QUINONE DIAZIDE包含组合物

    公开(公告)号：US4105450A

    公开(公告)日：1978-08-08

    申请号：US689874

    申请日：1976-05-25

    申请人： Fumiaki Shinozaki ,  Tomoaki Ikeda

    发明人： Fumiaki Shinozaki ,  Tomoaki Ikeda

    IPC分类号： G03F7/022 ,  G03F7/08 ,  G03C1/54

    CPC分类号： G03F7/0226

    摘要： A positive light-sensitive composition containing: (a) a quinonediazide type, positive light-sensitive substance and (1) (b) at least one compound selected from the group consisting of those compounds represented by the following general formulae (I) ##STR1## wherein X.sub.1 and X.sub.2 each represents an oxygen atom or a sulfur atom; R.sub.1 and R.sub.2 each represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a cycloalkyl group; (2) those compounds represented by the general formula (II) ##STR2## wherein R.sub.3 represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a cycloalkyl group; and R.sub.4 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and (3) o-benzoic acid sulfimide.

    Negative image forming process in o-quinone diazide layer utilizing laser beam
    36.
    发明授权
    Negative image forming process in o-quinone diazide layer utilizing laser beam 失效
    利用激光束在邻醌二叠层中的负成像过程

    公开(公告)号：US4544627A

    公开(公告)日：1985-10-01

    申请号：US548132

    申请日：1983-11-03

    申请人： Yonosuke Takahashi ,  Hiromichi Tachikawa ,  Fumiaki Shinozaki ,  Tomoaki Ikeda

    发明人： Yonosuke Takahashi ,  Hiromichi Tachikawa ,  Fumiaki Shinozaki ,  Tomoaki Ikeda

    IPC分类号： G03C1/72 ,  G03C5/00 ,  G03C5/16 ,  G03C5/56 ,  G03F7/022 ,  G03F7/20 ,  H01L21/027 ,  G03F7/26

    CPC分类号： G03F7/0226 ,  Y10S430/146

    摘要： A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide compound and (ii) a second compound, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas convert to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.

    摘要翻译： 一种负性图像形成方法，其包括将包含其上包含（i）邻醌二叠氮化合物和（ii）第二化合物）的敏感层的载体均匀曝光于能够将o- 醌二叠氮化合物与相应的茚羧酸化合物反应，然后在所述曝光的感光材料成像曝光的同时使曝光区域的茚羧酸化合物转化为相应的茚化合物并用碱性显影液显影， 以将未曝光区域溶解到激光束，其中所述第二化合物通过将茚羧酸转化为相应的茚化合物而降低了显影溶液中的激光曝光区域的溶解速率，从而产生所述图像。