公开(公告)号：US06825475B2

公开(公告)日：2004-11-30

申请号：US10247104

申请日：2002-09-19

申请人： Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

发明人： Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

IPC分类号： H01J3710

CPC分类号： H01J37/1475

摘要： A deflection system is presented for use in a lens arrangement of a charged particle beam column for inspecting a sample. The system comprises a magnetic deflector operable to create a magnetic field, and a pole piece assembly at least partly accommodated within the magnetic field. The pole piece assembly has a portion made of a soft magnetic material and is formed with an opening for a charged particle beam propagation therethrough. The deflection system allows for conducting the magnetic field created by the magnetic deflector through the pole piece assembly towards the opening in the pole piece assembly. This enables to increase the magnetic field value in the vicinity of the sample at the optical axis of the lens arrangement at a given electric current through the excitation coils of the magnetic deflector, without a need to increase a working distance.

摘要翻译： 呈现偏转系统用于带电粒子束柱的透镜布置，用于检查样品。 该系统包括可操作以产生磁场的磁偏转器和至少部分地容纳在磁场内的极片组件。 极片组件具有由软磁材料制成的部分，并且形成有用于带电粒子束传播的开口。 偏转系统允许通过磁极组件朝磁极组件的开口传导由磁偏转器产生的磁场。 这样就能够使透镜装置的光轴附近的样品在通过磁导流板的激励线圈的给定电流上增加磁场值，而不需要增加工作距离。

公开(公告)号：US06747279B2

公开(公告)日：2004-06-08

申请号：US10182437

申请日：2002-10-03

申请人： Pavel Adamec

发明人： Pavel Adamec

IPC分类号： H01J3710

CPC分类号： H01J37/1471 ,  H01J37/141 ,  H01J37/28

摘要： An improved objective lens for a charged particle beam device is constituted by, among other things, a magnetic lens that creates a first magnetic field for focussing the charged particle beam onto the specimen. Furthermore, a deflector is integrated into the magnetic lens by providing at least one additional coil arrangement that creates a second magnetic field used to deflect the charged particle beam. Thereby, the second magnetic field is guided through at least one of the pole pieces of the magnetic lens. The present invention also provides an improved column for a charged particle beam device including the improved objective lens.

摘要翻译： 用于带电粒子束装置的改进的物镜由除其他之外的磁性透镜构成，该磁透镜产生用于将带电粒子束聚焦到样本上的第一磁场。 此外，偏转器通过提供至少一个额外的线圈装置而被集成到磁性透镜中，该线圈装置产生用于偏转带电粒子束的第二磁场。 由此，第二磁场被引导通过磁性透镜的极片中的至少一个。 本发明还提供了一种用于包括改进的物镜的带电粒子束装置的改进的列。

公开(公告)号：US06452175B1

公开(公告)日：2002-09-17

申请号：US09293482

申请日：1999-04-15

申请人： Pavel Adamec

发明人： Pavel Adamec

IPC分类号： H01J3720

CPC分类号： H01J37/1478 ,  H01J37/28 ,  H01J2237/1506

摘要： A charged particle beam column comprises: a particle source; an objective lens; a pre-lens deflection unit for deflecting a beam of charged particles away from the optical axis on such a path that the combined action of the objective lens and the pre-lens deflection unit directs the beam of charged particles towards the optical axis to hit the specimen surface from a first direction; and an in-lens deflection unit arranged in the vicinity of the objective lens for redirecting the deflected beam of charged particles on such a path that the combined action of the objective lens and the in-lens deflection unit redirects the beam of charged particles towards the optical axis to hit the specimen surface under said large beam landing angle from a second direction substantially opposite to said first direction.

摘要翻译： 带电粒子束柱包括：粒子源; 物镜; 一个预透镜偏转单元，用于在物镜和预透镜偏转单元的组合作用将带电粒子束朝向光轴引导以撞击光轴之前将带电粒子束偏离光轴偏转的路径， 样品表面从第一个方向; 以及布置在物镜附近的镜片内偏转单元，用于将偏转的带电粒子束重定向到物镜和镜片间偏转单元的组合作用将带电粒子束朝向 光轴从与所述第一方向大致相反的第二方向在所述大光束着落角下撞击所述样品表面。

公开(公告)号：US20130270439A1

公开(公告)日：2013-10-17

申请号：US13543608

申请日：2012-07-06

申请人： Pavel Adamec

发明人： Pavel Adamec

IPC分类号： H01J37/244 ,  H01J37/26 ,  H01J37/22

CPC分类号： H01J37/244 ,  H01J2237/2441 ,  H01J2237/2449 ,  H01J2237/24592

摘要： A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap, a particle optics configured for separating the signal beam in a first portion of the signal beam and in at least one second portion of the signal beam, configured for focusing the first portion of the signal beam, and configured for deflecting and focusing the at least one second portion of the signal beam, wherein the particle optics includes a first electrode and at least one second electrode. Therein, the first electrode is an inner electrode and the at least one second electrode is provided radially outward of the first electrode.

摘要翻译： 描述了用于检测信号光束的二次带电粒子检测装置。 所述装置包括具有至少两个具有主动检测区域的检测元件的检测器装置，其中所述主动检测区域被间隙分开，所述粒子光学器件被配置用于在所述信号束的第一部分中和在至少一个 所述信号光束的第二部分被配置用于聚焦所述信号光束的所述第一部分，并且被配置为偏转和聚焦所述信号光束的所述至少一个第二部分，其中所述粒子光学器件包括第一电极和至少一个第二电极。 其中，第一电极是内电极，并且至少一个第二电极设置在第一电极的径向外侧。

公开(公告)号：US07982179B2

公开(公告)日：2011-07-19

申请号：US12366465

申请日：2009-02-05

申请人： Pavel Adamec ,  Fang Zhou

发明人： Pavel Adamec ,  Fang Zhou

IPC分类号： H01J23/00 ,  G12B13/00

CPC分类号： H01J37/244 ,  H01J37/261 ,  H01J2237/2443 ,  H01J2237/24507 ,  H01J2237/2826

摘要： A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.

摘要翻译： 描述带电粒子束装置。 带电粒子束装置包括适于发射初级带电粒子束的发射器，适于保持试样的试样位置，从而从初级带电粒子束的冲击中释放辅助和/或反向散射的带电粒子，检测单元适于 用于检测二次粒子和/或二次粒子的光束引导单元，以及用于将初级带电粒子束引导到检测单元的光束引导单元，用于将一次带电粒子束撞击在检测单元上。

公开(公告)号：US07932495B2

公开(公告)日：2011-04-26

申请号：US12202833

申请日：2008-09-02

申请人： Pavel Adamec

发明人： Pavel Adamec

IPC分类号： G21K7/00 ,  H01J37/08

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/24465 ,  H01J2237/24495 ,  H01J2237/24592

摘要： A charged particle beam device is provided including a particle source emitting a primary particle beam, a secondary particle beam generated by the impingement of the primary particle beam on the sample, a detection unit for detecting the secondary particle beam, the detector having at least two detector channels, and a distribution deflecting device for deflecting the secondary particle beam in a chronological sequence. Further, a detection assembly for a fast wafer inspection system is provided including a distribution deflecting device for distributing a secondary particle beam in a chronological sequence and a detector for detecting the secondary particle beam, the detector having multiple detector channels. Further, a method of operating a particle beam device with chronological resolution is provided.

摘要翻译： 提供一种带电粒子束装置，包括发射一次粒子束的粒子源，通过一次粒子束撞击在样本上产生的二次粒子束，用于检测二次粒子束的检测单元，该检测器具有至少两个 检测器通道和用于按时间顺序偏转次级粒子束的分布偏转装置。 此外，提供了一种用于快速晶片检查系统的检测组件，其包括用于按时间顺序分布二次粒子束的分布偏转装置和用于检测二次粒子束的检测器，该检测器具有多个检测器通道。 此外，提供了按照时间分辨率操作粒子束装置的方法。

公开(公告)号：US07274018B2

公开(公告)日：2007-09-25

申请号：US11396751

申请日：2006-04-03

申请人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

发明人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

IPC分类号： H01J37/28

CPC分类号： H01J37/285 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/049 ,  H01J2237/2855 ,  H01J2237/2857

摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

摘要翻译： 提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致 适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置 颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。 此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

公开(公告)号：US07253417B2

公开(公告)日：2007-08-07

申请号：US10539179

申请日：2003-12-12

申请人： Jürgen Frosien ,  Pavel Adamec

发明人： Jürgen Frosien ,  Pavel Adamec

IPC分类号： H01J3/07 ,  H01J29/51

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177

摘要： The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

摘要翻译： 本发明提供了一种用于带电粒子多光束系统的光学系统。 光学系统包括静电透镜部件和磁性透镜部件。 这些部件用于将多个带电粒子束聚焦在分开的开口中，用于至少多个穿过光学系统的带电粒子束中的每一个。

公开(公告)号：US06943507B2

公开(公告)日：2005-09-13

申请号：US10474464

申请日：2002-04-08

申请人： Dieter Winkler ,  Pavel Adamec

发明人： Dieter Winkler ,  Pavel Adamec

IPC分类号： H01J37/073 ,  H01J37/304 ,  H01J29/52

CPC分类号： H01J37/073 ,  H01J37/304 ,  H01J2237/06316 ,  H01J2237/0635 ,  H01J2237/31774

摘要： The invention provides a focussing electron beam device with a single or an array of field emitter beam sources to generate electron beams with field emitter beam sources, at least one anode capable of accelerating the electrons of the electron beams towards a specimen, focussing components capable of focussing the electron beams onto the specimen and a control circuit that a) senses for deviations of the actual current values of the electron beams from desired current values; b) controls first voltages V1 to adjust the actual current values of the electron beams to the desired current values and c) controls second voltages V2 to adjust the actual focus positions of the electron beams to the desired focus positions. The voltage control circuit adjusts the actual current values of the electron beams to the desired current values and makes it possible to adjust the current values of an array of electron beams to a single value. Furthermore, a focussing electron beam device is disclosed with an array of field emitter beam sources integrated onto a substrate, which makes it possible to have arrays of field emitter beam sources with thousands or even millions of field emitter beam sources. With the integration of the control circuits for each field emitter beam source it is possible to adjust the current values and focus positions of each electron beam individually. Furthermore, methods are disclosed describing the operation of a single field emitter beam source or an array of field emitter beam sources.

摘要翻译： 本发明提供一种聚焦电子束装置，其具有单个或阵列的场致发射束源，以产生具有场致发射束源的电子束，至少一个阳极，能够将电子束的电子加速朝向检体， 将电子束聚焦到样本上，以及控制电路，其a）感测电子束的实际电流值与期望电流值的偏差; b）控制第一电压V 1以将电子束的实际电流值调整到期望的电流值，并且c）控制第二电压V 2以将电子束的实际焦点位置调整到期望的焦点位置。 电压控制电路将电子束的实际电流值调整到期望的电流值，并且可以将电子束阵列的电流值调整为单个值。 此外，公开了一种聚焦电子束器件，其集成在衬底上的场发射器束源的阵列，这使得可以具有数千甚至数百万场发射器束源的场发射器束源的阵列。 通过对每个场发射器束源的控制电路的集成，可以单独地调整每个电子束的电流值和聚焦位置。 此外，公开了描述单个场发射器束源或场发射器束源的阵列的操作的方法。

公开(公告)号：US06614026B1

公开(公告)日：2003-09-02

申请号：US09292710

申请日：1999-04-15

申请人： Pavel Adamec

发明人： Pavel Adamec

IPC分类号： H01J37145

CPC分类号： H01J37/28 ,  H01J37/1478 ,  H01J2237/1506

摘要： A column for directing a beam of charged particles with a finite energy spread onto a specimen surface under an oblique beam landing angle comprises: a particle source; an objective lens; a deflection unit for deflecting the beam of charged particles away from the optical axis such that the beam.of charged particles traverses the objective lens off-axis, thereby causing a chromatic aberration, a compensation unit adapted to disperse the beam of charged particles, thereby substantially compensating said chromatic aberration in the plane of the specimen surface, whereby the combined action of the objective lens and the deflection unit directs the beam of charged particles to hit the specimen surface under said large beam landing angle.

摘要翻译： 用于将有限能量的带电粒子束引导到倾斜束着陆角的样品表面上的列包括：粒子源; 物镜; 偏转单元，用于使带电粒子束偏离光轴，使得带电粒子的束离轴偏离物镜，从而产生色差，适于分散带电粒子束的补偿单元，从而 基本上补偿了样品表面的平面中的色差，由此物镜和偏转单元的组合作用引导带电粒子束在所述大光束着落角度下撞击试样表面。