DETECTOR SUPPLEMENT DEVICE FOR SPECTROSCOPY SETUP

    公开(公告)号:US20180350556A1

    公开(公告)日:2018-12-06

    申请号:US15779235

    申请日:2016-11-25

    摘要: A detector supplement device for integration in a spectroscopy setup with the spectroscopy setup including a vacuum chamber, a light source, a sample irradiating a reflected photon beam and a charged particle beam in the same direction of propagation into a radiation detector which is able to detect ultrafast electric currents originating from charged particles. The detector supplement device includes a Rogowski coil placeable inside the vacuum chamber between the sample and radiation detector. The charged particle beam is guided through the hollow core of the Rogowski coil allowing synchronized measurements of electrical currents due to the charged particle beam correlated to the reflected photon beam, while irradiation of the reflected photon beam and the charged particle beam takes place in the same direction of propagation.

    Sample surface inspection apparatus and method
    2.
    发明授权
    Sample surface inspection apparatus and method 有权
    样品表面检查装置及方法

    公开(公告)号:US08674317B2

    公开(公告)日:2014-03-18

    申请号:US13289486

    申请日:2011-11-04

    IPC分类号: G21K7/00

    摘要: The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.

    摘要翻译: 本发明提供了一种表面检查方法和装置,用于检查表面上涂覆有电阻膜的样品的表面,并且将光束照射到其上涂覆有电阻膜的表面,从而进行 样品表面。 在本发明的表面检查方法中,首先将具有任意确定的厚度t1的电阻膜涂覆在样品的表面上。 此后,将具有任意确定的厚度t1的电阻膜的一部分溶解在溶剂中,从而将电阻膜的厚度减小到期望的水平。 这能够精确地控制电阻膜的电阻值并抑制要检测的图像的失真。

    Sample surface inspection apparatus and method
    3.
    发明授权
    Sample surface inspection apparatus and method 有权
    样品表面检查装置及方法

    公开(公告)号:US08076654B2

    公开(公告)日:2011-12-13

    申请号:US12153397

    申请日:2008-05-19

    IPC分类号: G21K7/00

    摘要: The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.

    摘要翻译: 本发明提供了一种表面检查方法和装置,用于检查表面上涂覆有电阻膜的样品的表面,并且将光束照射到其上涂覆有电阻膜的表面,从而进行 样品表面。 在本发明的表面检查方法中,首先将具有任意确定的厚度t1的电阻膜涂覆在样品的表面上。 此后,将具有任意确定的厚度t1的电阻膜的一部分溶解在溶剂中,从而将电阻膜的厚度减小到期望的水平。 这能够精确地控制电阻膜的电阻值并抑制要检测的图像的失真。

    Charged particle beam apparatus and method for operating the same
    4.
    发明授权
    Charged particle beam apparatus and method for operating the same 有权
    带电粒子束装置及其操作方法

    公开(公告)号:US07274018B2

    公开(公告)日:2007-09-25

    申请号:US11396751

    申请日:2006-04-03

    IPC分类号: H01J37/28

    摘要: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

    摘要翻译: 提供一种带电粒子束装置,其包括用于产生带电粒子的一次束的带电粒子源,用于准直所述带电粒子的一次束的孔径装置,其中所述孔口装置适于在所述主束的准直之间切换,导致 适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置 颗粒,用于聚焦所述冷凝的主光束的物镜,用于检测次级带电粒子的扇形检测器。 此外,描述了束装置的几种不同的操作模式,允许串行成像以及平行成像。

    Method and system for ultrafast photoelectron microscope
    5.
    发明授权
    Method and system for ultrafast photoelectron microscope 有权
    超快光电子显微镜的方法和系统

    公开(公告)号:US07154091B2

    公开(公告)日:2006-12-26

    申请号:US11097837

    申请日:2005-04-01

    IPC分类号: H01J37/26 G01N23/04

    摘要: An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

    摘要翻译: 用于表征一个或多个样品的超快系统(和方法)。 该系统包括具有要表征的样品的载物台组件。 该系统具有能够发射持续时间小于1ps的光脉冲的激光源。 该系统具有耦合到激光源的阴极。 在具体实施例中,阴极能够发射持续时间小于1ps的电子脉冲。 该系统具有适于将电子脉冲聚焦到设置在载物台上的样品上的电子透镜组件。 该系统具有适于捕获穿过样品的一个或多个电子的检测器。 通过样品的一个或多个电子代表样品的结构。 检测器提供与通过样品的一个或多个电子相关联的信号(例如,数据信号),其表示样品的结构。 该系统具有耦合到检测器的处理器。 处理器适于处理与通过样本的一个或多个电子相关联的数据信号,以输出与样本的结构相关联的信息。 该系统具有耦合到处理器的输出设备。 输出设备适于输出与样本结构相关联的信息。

    Electron beam inspection method and electron beam inspection apparatus
    8.
    发明授权
    Electron beam inspection method and electron beam inspection apparatus 有权
    电子束检查方法和电子束检查装置

    公开(公告)号:US07863565B2

    公开(公告)日:2011-01-04

    申请号:US12149512

    申请日:2008-05-02

    IPC分类号: H01J37/26 H01J37/29

    摘要: An electron beam inspection apparatus images reflected electrons and cancels negative charging derived from electron-beam irradiation. Ultraviolet rays are irradiated and an irradiated area of ultraviolet rays is displayed as a photoelectron image. The photoelectron image and a reflected-electron image are displayed on a monitor while being superposed on each other, to easily grasp the positional relationship between the images and the difference in size between them. Specifically, the shape of the irradiated area of an electron beam includes the shape of the irradiated area of ultraviolet rays on a display screen. The intensity of the ultraviolet rays in the irradiated area of the electron beam is adjusted while the reflected-electron imaging conditions for the reflected-electron image are sustained. Moreover, an amount-of-ultraviolet ray adjustment mechanism is controlled on the monitor so that an amount of the ultraviolet rays is adjusted while observing a reflected-electron image obtained during ultraviolet irradiation.

    摘要翻译: 电子束检查装置对反射电子进行成像并消除由电子束照射产生的负电荷。 照射紫外线,照射紫外线的区域作为光电子图像显示。 光电子图像和反射电子图像在彼此重叠的状态下显示在监视器上,以容易地掌握图像之间的位置关系和它们之间的尺寸差异。 具体地,电子束的照射区域的形状包括在显示屏上照射的紫外线区域的形状。 调整电子束的照射区域中的紫外线的强度,同时维持反射电子图像的反射电子成像条件。 此外,在监视器上控制紫外线量调节机构,使得在观察紫外线照射期间获得的反射电子图像的同时调节紫外线的量。

    METHOD AND SYSTEM FOR ULTRAFAST PHOTOELECTRON MICROSCOPE
    9.
    发明申请
    METHOD AND SYSTEM FOR ULTRAFAST PHOTOELECTRON MICROSCOPE 有权
    超导光电显微镜的方法与系统

    公开(公告)号:US20090236521A1

    公开(公告)日:2009-09-24

    申请号:US12234567

    申请日:2008-09-19

    IPC分类号: G01N23/04

    摘要: An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

    摘要翻译: 用于表征一个或多个样品的超快系统(和方法)。 该系统包括具有要表征的样品的载物台组件。 该系统具有能够发射持续时间小于1ps的光脉冲的激光源。 该系统具有耦合到激光源的阴极。 在具体实施例中,阴极能够发射持续时间小于1ps的电子脉冲。 该系统具有适于将电子脉冲聚焦到设置在载物台上的样品上的电子透镜组件。 该系统具有适于捕获穿过样品的一个或多个电子的检测器。 通过样品的一个或多个电子代表样品的结构。 检测器提供与通过样品的一个或多个电子相关联的信号(例如,数据信号),其表示样品的结构。 该系统具有耦合到检测器的处理器。 处理器适于处理与通过样本的一个或多个电子相关联的数据信号,以输出与样本的结构相关联的信息。 该系统具有耦合到处理器的输出设备。 输出设备适于输出与样本结构相关联的信息。

    Method and system for ultrafast photoelectron microscope

    公开(公告)号:US07442931B2

    公开(公告)日:2008-10-28

    申请号:US11643008

    申请日:2006-12-19

    IPC分类号: H01J37/26

    摘要: An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.