公开(公告)号：US07430104B2

公开(公告)日：2008-09-30

申请号：US10449539

申请日：2003-05-29

Applicant: Alon Litman ,  Igor Krivts

Inventor： Alon Litman ,  Igor Krivts

IPC: H01L21/683 ,  H05F3/00

CPC classification number: H01L21/6833 ,  H01L21/6831 ,  Y10T279/1208

Abstract: An electrostatic chuck is configured for electrostatically securing a wafer while limiting charge on the wafer and physical contact between the electrostatic chuck and the wafer. The electrostatic chuck has a pair of electrodes and at least one support pin electrically isolated from the electrodes. The top portion of the support pin protrudes above the top surface of the electrodes. The support pin can be such that the top portion of the support pin is adjustable with respect to the top surfaces of the electrodes.

Abstract translation: 静电卡盘构造成静电固定晶片，同时限制晶片上的电荷和静电卡盘与晶片之间的物理接触。 静电卡盘具有一对电极和至少一个与电极电隔离的支撑销。 支撑销的顶部突出在电极的顶表面上方。 支撑销可以使得支撑销的顶部相对于电极的顶表面是可调节的。

公开(公告)号：US20060126261A1

公开(公告)日：2006-06-15

申请号：US11119316

申请日：2005-04-28

Applicant: Igor Petrov ,  Igor Krivts (Krayvitz) ,  Eitan Kidron ,  Guy Eitan ,  Igal Ben-Dayan

Inventor： Igor Petrov ,  Igor Krivts (Krayvitz) ,  Eitan Kidron ,  Guy Eitan ,  Igal Ben-Dayan

IPC: H01T23/00

CPC classification number: H01L21/6833 ,  H02N13/00

Abstract: Wafer supporting apparatus, including an electrostatic chuck for supporting the wafer. The apparatus further includes an electrostatic shield which is positioned in proximity to the chuck and the wafer, and a voltage source which is coupled to apply an electric field between the chuck and the wafer. The voltage source applies one or more potentials to the electrostatic shield so as to prevent penetration of particles to the wafer.

Abstract translation: 晶片支撑装置，包括用于支撑晶片的静电卡盘。 该装置还包括位于卡盘和晶片附近的静电屏蔽，以及耦合以在卡盘和晶片之间施加电场的电压源。 电压源对静电屏蔽施加一个或多个电位，以防止颗粒渗透到晶片。

公开(公告)号：US07112803B2

公开(公告)日：2006-09-26

申请号：US10897635

申请日：2004-07-23

Applicant: Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

Inventor： Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

IPC: H01J37/10 ,  H01J37/147

CPC classification number: H01J37/147 ,  H01J37/026 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/1405 ,  H01J2237/1526

Abstract: A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit formed by a core part for carrying excitation coils and a polepieces part. The polepieces of the magnetic deflector are in electrical communication with the electrode of the lens arrangement and are electrically insulated from the other part of the magnetic circuit.

Abstract translation: 提出了一种用于将带电粒子束朝向和远离样品引导的方法和系统。 该系统包括透镜装置，其具有形成有用于带电粒子束通过的光束开口的电极; 和磁偏转器。 磁偏转器具有由用于承载励磁线圈的芯部和极靴部分形成的磁路。 磁偏转器的极点与透镜装置的电极电连通，并且与磁路的另一部分电绝缘。

公开(公告)号：US06899765B2

公开(公告)日：2005-05-31

申请号：US10113605

申请日：2002-03-29

Applicant: Igor Krivts ,  Eyal Kotik ,  Eitan Pinhasi ,  Hagay Cafri

Inventor： Igor Krivts ,  Eyal Kotik ,  Eitan Pinhasi ,  Hagay Cafri

IPC: H01L21/00 ,  C23C16/00 ,  B65G49/007

CPC classification number: H01L21/67126 ,  Y10S414/139

Abstract: A process chamber for processing or inspecting a substrate such as a semiconductor wafer and the like includes a internal chamber employing dynamic seals at the interface of relatively moving elements. In one embodiment, the internal chamber has a first element, such as a lid or cover, and a second element, such as the body of the chamber. The first element and the second element meet at the interface. The internal chamber may further include a substrate support, mounted inside the internal chamber, supporting a substrate. A first movement system may produce at least one type of relative movement between the first element and the second element. A second movement system may produce second relative movement between the second element and the substrate support. The resulting structure allows movement of the chamber, while maintaining pressure inside the chamber.

Abstract translation: 用于处理或检查诸如半导体晶片等的基板的处理室包括在相对移动的元件的界面处采用动态密封的内部室。 在一个实施例中，内部腔室具有诸如盖子或盖子的第一元件和诸如腔室的主体的第二元件。 第一个元素和第二个元素在界面上相遇。 内部室还可以包括安装在内部室内部的基板支撑件，支撑基板。 第一运动系统可以在第一元件和第二元件之间产生至少一种类型的相对运动。 第二运动系统可以在第二元件和衬底支撑件之间产生第二相对运动。 所得到的结构允许腔室的移动，同时保持腔室内的压力。

公开(公告)号：US07428850B2

公开(公告)日：2008-09-30

申请号：US11359100

申请日：2006-02-22

Applicant: Ron Naftali ,  Yoram Uziel ,  Ran Vered ,  Eitan Pinhasi ,  Igor Krivts (Krayvitz)

Inventor： Ron Naftali ,  Yoram Uziel ,  Ran Vered ,  Eitan Pinhasi ,  Igor Krivts (Krayvitz)

IPC: G01M19/00

CPC classification number: H01L21/67748 ,  G03F1/84 ,  H01J2237/162 ,  H01J2237/204 ,  H01J2237/2817 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67751

Abstract: A substrate inspection system includes two or more inspection modules supported on a plate. A chamber is supported beneath the plate by a translation system, which is configured to provide horizontal displacement of the chamber under the plate to permit loading and unloading of a substrate to/from the chamber. Thus, when the chamber is in a loading/unloading position it is at least partially uncovered from the plate. The translation system may be further configured to provide vertical displacement of the chamber with respect to the plate so as to position an upper surface of a wall of the chamber in close proximity to a lower surface of the plate when the chamber is in an inspection position. In such a position, the upper surface of the wall of the chamber and the lower surface of the plate may be separated by an air gap.

Abstract translation: 基板检查系统包括支撑在板上的两个或更多个检查模块。 通过平移系统在平板下方支撑室，该平移系统构造成提供室下方的水平位移，以允许将衬底装载到腔室或从腔室卸载。 因此，当腔室处于装载/卸载位置时，其至少部分地从板上未被覆盖。 翻译系统可以被进一步配置成提供腔室相对于板的垂直位移，以便当腔室处于检查位置时将腔室的壁的上表面定位成紧邻板的下表面 。 在这样的位置，室的壁的上表面和板的下表面可以由气隙分开。

公开(公告)号：US07317606B2

公开(公告)日：2008-01-08

申请号：US11119316

申请日：2005-04-28

Applicant: Igor Petrov ,  Igor Krivts (Krayvitz) ,  Eitan Kidron ,  Guy Eitan ,  Igal Ben-Dayan

Inventor： Igor Petrov ,  Igor Krivts (Krayvitz) ,  Eitan Kidron ,  Guy Eitan ,  Igal Ben-Dayan

IPC: H02N13/00

CPC classification number: H01L21/6833 ,  H02N13/00

Abstract: Wafer supporting apparatus, including an electrostatic chuck for supporting the wafer. The apparatus further includes an electrostatic shield which is positioned in proximity to the chuck and the wafer, and a voltage source which is coupled to apply an electric field between the chuck and the wafer. The voltage source applies one or more potentials to the electrostatic shield so as to prevent penetration of particles to the wafer.

Abstract translation: 晶片支撑装置，包括用于支撑晶片的静电卡盘。 该装置还包括位于卡盘和晶片附近的静电屏蔽，以及耦合以在卡盘和晶片之间施加电场的电压源。 电压源对静电屏蔽施加一个或多个电位，以防止颗粒渗透到晶片。

公开(公告)号：US20070022831A1

公开(公告)日：2007-02-01

申请号：US11359100

申请日：2006-02-22

Applicant: Ron Naftali ,  Yoram Uziel ,  Ran Vered ,  Eitan Pinhasi ,  Igor Krivts (Krayvitz)

Inventor： Ron Naftali ,  Yoram Uziel ,  Ran Vered ,  Eitan Pinhasi ,  Igor Krivts (Krayvitz)

IPC: G01M19/00 ,  G21K5/08

CPC classification number: H01L21/67748 ,  G03F1/84 ,  H01J2237/162 ,  H01J2237/204 ,  H01J2237/2817 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67751

Abstract: A substrate inspection system includes two or more inspection modules supported on a plate. A chamber is supported beneath the plate by a translation system, which is configured to provide horizontal displacement of the chamber under the plate to permit loading and unloading of a substrate to/from the chamber. Thus, when the chamber is in a loading/unloading position it is at least partially uncovered from the plate. The translation system may be further configured to provide vertical displacement of the chamber with respect to the plate so as to position an upper surface of a wall of the chamber in close proximity to a lower surface of the plate when the chamber is in an inspection position. In such a position, the upper surface of the wall of the chamber and the lower surface of the plate may be separated by an air gap.

Abstract translation: 基板检查系统包括支撑在板上的两个或更多个检查模块。 通过平移系统在平板下方支撑室，该平移系统构造成提供室下方的水平位移，以允许将衬底装载到腔室或从腔室卸载。 因此，当腔室处于装载/卸载位置时，其至少部分地从板上未被覆盖。 翻译系统可以被进一步配置成提供腔室相对于板的垂直位移，以便当腔室处于检查位置时将腔室的壁的上表面定位成紧邻板的下表面 。 在这样的位置，室的壁的上表面和板的下表面可以由气隙分开。

公开(公告)号：US20060016988A1

公开(公告)日：2006-01-26

申请号：US10897635

申请日：2004-07-23

Applicant: Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

Inventor： Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

IPC: H01J37/28 ,  H01J37/145

CPC classification number: H01J37/147 ,  H01J37/026 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/1405 ,  H01J2237/1526

Abstract: A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit formed by a core part for carrying excitation coils and a polepieces part. The polepieces of the magnetic deflector are in electrical communication with the electrode of the lens arrangement and are electrically insulated from the other part of the magnetic circuit.

公开(公告)号：US06825475B2

公开(公告)日：2004-11-30

申请号：US10247104

申请日：2002-09-19

Applicant: Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

Inventor： Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

IPC: H01J3710

CPC classification number: H01J37/1475

Abstract: A deflection system is presented for use in a lens arrangement of a charged particle beam column for inspecting a sample. The system comprises a magnetic deflector operable to create a magnetic field, and a pole piece assembly at least partly accommodated within the magnetic field. The pole piece assembly has a portion made of a soft magnetic material and is formed with an opening for a charged particle beam propagation therethrough. The deflection system allows for conducting the magnetic field created by the magnetic deflector through the pole piece assembly towards the opening in the pole piece assembly. This enables to increase the magnetic field value in the vicinity of the sample at the optical axis of the lens arrangement at a given electric current through the excitation coils of the magnetic deflector, without a need to increase a working distance.

Abstract translation: 呈现偏转系统用于带电粒子束柱的透镜布置，用于检查样品。 该系统包括可操作以产生磁场的磁偏转器和至少部分地容纳在磁场内的极片组件。 极片组件具有由软磁材料制成的部分，并且形成有用于带电粒子束传播的开口。 偏转系统允许通过磁极组件朝磁极组件的开口传导由磁偏转器产生的磁场。 这样就能够使透镜装置的光轴附近的样品在通过磁导流板的激励线圈的给定电流上增加磁场值，而不需要增加工作距离。