公开(公告)号：US20140218705A1

公开(公告)日：2014-08-07

申请号：US14236742

申请日：2012-07-31

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70091

摘要： An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.

摘要翻译： 本发明的目的是提供一种能够以均匀的照度分布实现照明的照明装置，同时减少光量损失。 用于照明照明目标表面的照明装置具有：偏转构件，其构造成在穿过光路的预定面上沿着预定方向形成周期性图案的照度分布; 以及光学积分器系统，其具有排列在所述预定面上的多个波前分割面，并且被配置为使用来自所述偏转构件的光束形成二次光源; 偏转构件以整数倍或单位分数乘以多个波前分割面的阵列周期的周期性图案形成照度分布。

公开(公告)号：US20130128248A1

公开(公告)日：2013-05-23

申请号：US13639037

申请日：2011-03-31

申请人： Hideki Komatsuda ,  Yoshio Kawabe

发明人： Hideki Komatsuda ,  Yoshio Kawabe

IPC分类号： G02B19/00 ,  G03F7/20

CPC分类号： G02B19/0023 ,  G02B19/0047 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/702

摘要： An optical apparatus capable of illuminating an irradiation surface under a required illumination condition capable of achieving a high light efficiency while keeping a small light loss due to, for example, the overlap error of illuminating fields. The optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.

摘要翻译： 一种能够在能够实现高光效的所需照明条件下照射照射面的光学装置，同时由于例如照明场的重叠误差而保持小的光损失。 在与第一方向相交的第二方向上比第一方向交叉的第二方向长的情况下，来自光源的光照射第一区域的光学装置包括集光器部件，其配置在光 源极和第一区域，并且聚集来自光源的光以在预定平面中形成第二区域，第二区域在与第三方向相交的第四方向上与第三方向相交更长; 以及第一飞眼光学构件，其设置在包括第二区域的预定平面内，并且具有将聚光器光学构件的光引导到第一区域的多个第一光学元件。

公开(公告)号：US08081296B2

公开(公告)日：2011-12-20

申请号：US12170933

申请日：2008-07-10

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/72 ,  G03B27/58 ,  G03B27/54

CPC分类号： G03F7/702 ,  G03F7/70066

摘要： An illumination optical apparatus of the present invention includes an illumination optical system having a plurality of reflection mirrors arranged to guide illumination light flux to an irradiated plane. A first partial field stop is arranged in an optical path of the illumination optical system to form a first profile line of an illumination region that is to be formed on the irradiated plane. A second partial field stop is arranged between the illumination optical system and the irradiated plane to form a second profile line of the illumination region. The illumination optical system includes a relay optical system for substantially optically conjugating the position of the first partial field stop and the position of the second partial field stop.

摘要翻译： 本发明的照明光学装置包括具有多个反射镜的照明光学系统，所述多个反射镜布置成将照射光束引导到照射平面。 在照明光学系统的光路中布置第一局部场停止件，以形成要在被照射的平面上形成的照明区域的第一轮廓线。 在照明光学系统和照射平面之间设置第二部分场光阑，以形成照明区域的第二轮廓线。 照明光学系统包括用于基本上光学地共轭第一局部场停止位置和第二局部场停止位置的中继光学系统。

公开(公告)号：US07800734B2

公开(公告)日：2010-09-21

申请号：US11660927

申请日：2005-09-21

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/54 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G02B27/143 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0927 ,  G03F7/70075 ,  G03F7/702

摘要： An illumination apparatus for illuminating a surface (M) to be irradiated with illumination light emitted from a light source (2) comprises a reflection type fly-eye optical systems (12, 14) disposed between the light source (2) and the surface (M) to be irradiated and constituted by a plurality of reflection partial optical systems for wavefront-dividing a light beam from the light source (2) and superposing divided portions of the light beam onto each other on the surface (M) to be irradiated and a reflection type optical system (10) disposed between the light source (2) and the reflection type fly-eye optical systems (12, 14) for guiding the illumination light to the reflection type fly-eye optical systems (12, 14). The reflection type optical system (10) has a reflecting surface at least partly constructed by a diffusing surface.

摘要翻译： 用于照射照射从光源（2）发射的照明光的表面（M）的照明装置包括设置在光源（2）和表面（2）之间的反射型飞眼光学系统（12,14） M）照射并由多个反射部分光学系统构成，用于对来自光源（2）的光束进行波前划分，并将光束的分割部分叠加在待照射的表面（M）上，并且 设置在光源（2）和用于将照明光引导到反射型飞眼光学系统（12,14）的反射型飞眼光学系统（12,14）之间的反射型光学系统（10）。 反射型光学系统（10）具有至少部分地由漫射面构成的反射面。

公开(公告)号：US20090135510A1

公开(公告)日：2009-05-28

申请号：US12323274

申请日：2008-11-25

申请人： Takuro Ono ,  Hiroshi Chiba ,  Hideki Komatsuda

发明人： Takuro Ono ,  Hiroshi Chiba ,  Hideki Komatsuda

IPC分类号： G02B17/06

CPC分类号： G03F7/70233 ,  G03F7/702

摘要： A reflective projection optical system comprises a first optical unit having at least one reflecting optical element, and a second optical unit having at least one reflecting optical element. A focal point on the second surface side of the first optical unit approximately agrees with a focal point on the first surface side of the second optical unit. An angle between a normal to the first surface and a principal ray of the illumination beam incident to the first surface is larger than a value of arcsine of a numerical aperture on the first surface side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam incident to the first surface.

摘要翻译： 反射投影光学系统包括具有至少一个反射光学元件的第一光学单元和具有至少一个反射光学元件的第二光学单元。 第一光学单元的第二表面侧上的焦点大致与第二光学单元的第一表面侧上的焦点一致。 入射到第一表面的第一表面的法线与照明光束的主光线之间的角度大于反射投影光学系统的第一表面侧的数值孔径的反正弦值。 投影光学系统中的所有光学元件位于限定入射到第一表面的照明光束的外边缘的光线组的延伸表面的外侧。

公开(公告)号：US07471456B2

公开(公告)日：2008-12-30

申请号：US11647252

申请日：2006-12-29

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G02B27/10 ,  G02B3/02

CPC分类号： G02B17/002 ,  G02B7/16 ,  G02B17/0657 ,  G02B17/0663 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70075 ,  G03F7/702

摘要： An optical integrator of a wavefront dividing type permits an arbitrary distance to be set between an entrance surface and an exit surface, without production of aberration and without reduction in reflectance on reflecting films. The optical integrator has a plurality of first focusing elements (first concave reflector elements 18a) arranged in parallel, a plurality of second focusing elements (second concave reflector elements 20a) arranged in parallel so as to correspond to the first focusing elements, and a relay optical system (19) disposed in an optical path between the first focusing elements and the second focusing elements. The relay optical system refocuses a light beam focused via one of the first focusing elements, on or near a corresponding second focusing element so as to establish an imaging relation of one-to-one correspondence between one of the first focusing elements and one of the second focusing elements.

摘要翻译： 波前分割型的光学积分器允许在入射表面和出射表面之间设置任意距离，而不产生像差并且不会降低反射膜的反射率。 光学积分器具有平行配置的多个第一聚焦元件（第一凹面反射器元件18a），与第一聚焦元件相对应的多个平行布置的第二聚焦元件（第二凹面反射器元件20a）和继电器 光学系统（19），设置在第一聚焦元件和第二聚焦元件之间的光路中。 中继光学系统通过第一聚焦元件中的一个聚焦经过对应的第二聚焦元件上或附近的聚焦光束，以便建立第一聚焦元件之一和其中之一之间一对一对应的成像关系 第二聚焦元件。

公开(公告)号：US06833904B1

公开(公告)日：2004-12-21

申请号：US09697639

申请日：2000-10-27

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B2742

CPC分类号： G03F7/70108 ,  G03F7/70233 ,  G03F7/70358

摘要： A projection system projects a pattern formed on a mask onto a photosensitive substrate. An illumination optical system forms an illumination field at a position on the mask. A drive relatively moves the mask and the photosensitive substrate with respect to the projection system along a predetermined scanning exposure direction. A first illumination adjustment mechanism adjusts an illumination characteristic along the scanning exposure direction. A second illumination adjustment mechanism adjusts an illumination characteristic in a direction crossing the scanning exposure direction. A first telecentricity adjustment mechanism applies an inclined component to telecentricity. A second telecentricity adjustment mechanism adjusts the telecentricity relative to the position of an optical axis.

摘要翻译： 投影系统将形成在掩模上的图案投影到感光基板上。 照明光学系统在掩模上的位置处形成照明场。 驱动器相对于投影系统沿着预定的扫描曝光方向相对地移动掩模和感光基板。 第一照明调节机构调整沿扫描曝光方向的照明特性。 第二照明调节机构调整与扫描曝光方向交叉的方向的照明特性。 第一远心调整机构将倾斜部件应用于远心。 第二远心调节机构调节相对于光轴的位置的远心度。

公开(公告)号：US06768537B2

公开(公告)日：2004-07-27

申请号：US10417120

申请日：2003-04-17

申请人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

发明人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

IPC分类号： G03B2748

CPC分类号： G03F7/70941 ,  G03B27/48

摘要： A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.

摘要翻译： 一种投影光学系统，用于在短于200nm的波长区域中使用曝光光将第一平面中的图案的图像形成到第二平面上。 当放置在第一平面中并且具有暗图案和围绕暗图案的光图案的投影图案被投影到第二平面上时，在第二平面中形成暗图案的投影图像的区域中的平均照度为 8或更小，其中在第二平面中暗图案周围的光图案的图像的照度设置为100。

公开(公告)号：US06727980B2

公开(公告)日：2004-04-27

申请号：US09846304

申请日：2001-05-02

申请人： Kazuya Ota ,  Akikazu Tanimoto ,  Tsuneyuki Hagiwara ,  Hideki Komatsuda ,  Takashi Mori

发明人： Kazuya Ota ,  Akikazu Tanimoto ,  Tsuneyuki Hagiwara ,  Hideki Komatsuda ,  Takashi Mori

IPC分类号： G03B2752

CPC分类号： G03F7/706 ,  G03F7/70258

摘要： A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source so as to imprint a mask pattern on a substrate base. The apparatus uses a wide bandwidth light source for the exposure light source that produces exposure light and non-exposure light having wavelengths different from those in the exposure light, and optical adjustments for optical components in at least a portion of the illumination optics are performed by using non-exposure light

摘要翻译： 用于进行曝光装置的光学调节的方法是基于具有用于产生用于曝光的照明光的光源的曝光装置和用于从曝光光源产生的照明光照射掩模以照射掩模的照明光学器件， 图案在基底上。 该装置使用用于产生具有与曝光光中的波长不同的波长的曝光光和非曝光光的曝光光源的宽带宽光源，并且在照明光学装置的至少一部分中的光学部件的光学调整由 使用非曝光灯

公开(公告)号：US06249382B1

公开(公告)日：2001-06-19

申请号：US09340236

申请日：1999-07-01

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G02B2710

CPC分类号： G02B17/0892 ,  G02B17/008 ,  G02B17/08 ,  G02B27/09 ,  G03F7/70066 ,  G03F7/70108

摘要： An illumination optical system and projection exposure apparatus (100) using same. The illumination optical system includes a predetermined conjugate plane (A) optically conjugate with respect to a mask (M) to be illuminated. The system also includes a first optical system arranged between alight source (114) and the conjugate plane and having a first optical axis (AZ1), and a second optical system arranged between the conjugate plane and the mask and having a second optical axis (AZ2). The second optical axis is shifted with respect to the first optical axis, at the conjugate plane. An optical integrator (140, 216) is arranged within the first optical system and is capable of forming a plurality of light source images from light from the light source. The integrator is designed so as to illuminate the conjugate plane. The second optical system includes a condenser optical system (144, 160) designed so as to converge light from the conjugate plane and to illuminate the mask. In a different embodiment of the present invention, the illumination optical system is arranged along a single folded optical axis and includes one or more optical members for deflecting the light so that an off-axis illumination region (IR) at the mask can be realized.

摘要翻译： 一种使用其的照明光学系统和投影曝光装置（100）。 照明光学系统包括相对于要照明的掩模（M）光学共轭的预定共轭面（A）。 该系统还包括布置在光源（114）和共轭平面之间并具有第一光轴（AZ1）的第一光学系统和布置在共轭平面和掩模之间并具有第二光轴（AZ2）的第二光学系统 ）。 第二光轴在共轭平面处相对于第一光轴移动。 光学积分器（140,216）布置在第一光学系统内，并且能够从光源的光形成多个光源图像。 积分器被设计成照亮共轭平面。 第二光学系统包括被设计成会聚来自共轭平面的光并照亮掩模的聚光器光学系统（144,160）。 在本发明的另一实施例中，照明光学系统沿单个折叠光轴布置，并且包括用于偏转光的一个或多个光学部件，从而可以实现掩模处的离轴照明区域（IR）。