公开(公告)号：US06727980B2

公开(公告)日：2004-04-27

申请号：US09846304

申请日：2001-05-02

申请人： Kazuya Ota ,  Akikazu Tanimoto ,  Tsuneyuki Hagiwara ,  Hideki Komatsuda ,  Takashi Mori

发明人： Kazuya Ota ,  Akikazu Tanimoto ,  Tsuneyuki Hagiwara ,  Hideki Komatsuda ,  Takashi Mori

IPC分类号： G03B2752

CPC分类号： G03F7/706 ,  G03F7/70258

摘要： A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source so as to imprint a mask pattern on a substrate base. The apparatus uses a wide bandwidth light source for the exposure light source that produces exposure light and non-exposure light having wavelengths different from those in the exposure light, and optical adjustments for optical components in at least a portion of the illumination optics are performed by using non-exposure light

摘要翻译： 用于进行曝光装置的光学调节的方法是基于具有用于产生用于曝光的照明光的光源的曝光装置和用于从曝光光源产生的照明光照射掩模以照射掩模的照明光学器件， 图案在基底上。 该装置使用用于产生具有与曝光光中的波长不同的波长的曝光光和非曝光光的曝光光源的宽带宽光源，并且在照明光学装置的至少一部分中的光学部件的光学调整由 使用非曝光灯

公开(公告)号：US06485153B2

公开(公告)日：2002-11-26

申请号：US09320710

申请日：1999-05-27

申请人： Kazuya Ota

发明人： Kazuya Ota

IPC分类号： G02B510

CPC分类号： G03F9/7026 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/707 ,  G03F7/70708 ,  G03F9/7003

摘要： An exposure apparatus is provided wherein an illumination beam emitted from a mask is projected onto a substrate, through a projection optical system having a reflecting optical element that includes a reflecting region for reflecting the illumination beam at a position spaced from an optical axis of the projection optical system, and a space portion that is provided on the side of the optical axis with respect to the reflecting region. The apparatus further includes a position detecting device for detecting position information of the substrate, at least part of which is located in the space of the reflecting optical element.

摘要翻译： 提供了一种曝光装置，其中从掩模发射的照明光束通过具有反射光学元件的投影光学系统投射到基板上，所述投影光学系统包括反射区域，用于将照明光束反射在与投影的光轴间隔开的位置 光学系统和设置在相对于反射区域的光轴侧的空间部分。 该装置还包括位置检测装置，用于检测基板的位置信息，其中至少一部分位于反射光学元件的空间中。

公开(公告)号：US06483569B2

公开(公告)日：2002-11-19

申请号：US09817065

申请日：2001-03-27

申请人： Kazuya Ota

发明人： Kazuya Ota

IPC分类号： G03B2752

CPC分类号： G03F7/70875 ,  G03F7/707 ,  G03F7/7075

摘要： While a current photosensitive substrate is being exposed on a substrate stage, the next photosensitive substrate for exposure is loaded on a temperature-adjustment plate for a predetermined time to remove a quantity of heat corresponding to a heat accumulation on the substrate stage during exposure. A substrate transporting system carries and loads the next photosensitive substrate, which has been cooled by the temperature-adjustment plate, onto the substrate stage. A pattern image of a mask is exposed and transferred onto the next photosensitive substrate through a projection optical system.

摘要翻译： 在当前的感光基片暴露在基片台上时，下一个用于曝光的感光基片在温度调节板上加载预定的时间以除去在曝光期间与基片台上的热积聚相对应的热量。 基板传送系统将已经被温度调节板冷却的下一个感光基板载入并载载到基板台上。 通过投影光学系统将掩模的图案图像曝光并转印到下一个感光基板上。

公开(公告)号：US5689339A

公开(公告)日：1997-11-18

申请号：US506132

申请日：1995-07-24

申请人： Kazuya Ota ,  Kouichirou Komatsu ,  Hideo Mizutani ,  Nobutaka Magome

发明人： Kazuya Ota ,  Kouichirou Komatsu ,  Hideo Mizutani ,  Nobutaka Magome

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： In an alignment apparatus for aligning a mask and a photosensitive substrate (a semiconductor wafer or glass plate applied with a photoresist), and which is suitably used in a projection exposure apparatus (a stepper or aligner), a proximity exposure apparatus, or the like used in a lithography process in the manufacture of a semiconductor element or a liquid crystal display element, two first beams and two second beams differing from the first beams may be radiated on a diffraction grating-like mask mark and a diffraction grating-like substrate mark, respectively, with the two second beams passing through a transparent region adjacent to the mask mark. By detecting diffracted light components of the two first beams and detecting diffracted light components of the two second beams, a relative position shift between the mask and the substrate can be determined. The alignment apparatus advantageously can reduce mixing of alignment light from a mask and alignment light from a wafer (substrate) to a minimum degree, or can sufficiently separate signals corresponding to these light components in a signal processing stage even when mixing inevitably occurs.

摘要翻译： 在用于对准掩模和感光基板（涂有光致抗蚀剂的半导体晶片或玻璃板）的对准装置中，适用于投影曝光装置（步进机或对准器）中的接近曝光装置等 用于制造半导体元件或液晶显示元件的光刻工艺中，可以将不同于第一光束的两个第一光束和两个第二光束照射在衍射光栅状掩模标记和衍射光栅样基板标记 分别与两个第二光束通过与掩模标记相邻的透明区域。 通过检测两个第一光束的衍射光分量并检测两个第二光束的衍射光分量，可以确定掩模和基板之间的相对位置偏移。 对准装置有利地可以减少来自掩模的对准光和来自晶片（衬底）的对准光到最小程度的混合，或者即使当不可避免地发生混合时，也可以在信号处理阶段中充分地分离与这些光分量对应的信号。

公开(公告)号：US5602644A

公开(公告)日：1997-02-11

申请号：US548626

申请日：1995-10-26

申请人： Kazuya Ota

发明人： Kazuya Ota

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7065 ,  G03F9/7026

摘要： Two-colored illumination light emitted from first and second laser beam sources illuminates a reticle mark and a wafer mark. Diffraction light from the reticle mark and the wafer mark is received by two photoelectric detection elements, respectively. The one photoelectric element receives single-colored diffraction light from light of the first light source through a color filter to generate a reticle beat signal. The other photoelectric element receives two-colored light to generate a wafer beat signal. A phase difference between the reticle beat signal and the wafer beat signal when shutting off the second laser beam source is aligned with a phase difference between the two signals produced when turning on the second laser beam source and decreasing the power of the first laser light source.

摘要翻译： 从第一和第二激光束源发射的双色照明光照射标线标记和晶片标记。 来自光罩标记和晶片标记的衍射光分别由两个光电检测元件接收。 一个光电元件通过滤色器从第一光源的光接收单色衍射光，以产生光罩拍子信号。 另一光电元件接收双色光以产生晶片差拍信号。 当关闭第二激光束源时，标线片差拍信号和晶片差拍信号之间的相位差与在打开第二激光束源时产生的两个信号之间的相位差对准，并且降低第一激光光源的功率 。

公开(公告)号：US5506684A

公开(公告)日：1996-04-09

申请号：US481215

申请日：1995-06-07

申请人： Kazuya Ota ,  Kouichirou Komatsu

发明人： Kazuya Ota ,  Kouichirou Komatsu

IPC分类号： G01B11/26 ,  G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01B9/02

CPC分类号： G03F9/7088 ,  G01B11/26 ,  G03F7/70358 ,  G03F7/70691 ,  G03F7/70858 ,  G03F9/7026 ,  G03F9/7076

摘要： A scanning exposure apparatus has a mask (reticle) and a photosensitive substrate (a wafer) in an imaging relationship across a projection optical system. A mask stage and a wafer stage are moved simultaneously in first (X) direction with a speed ratio corresponding to the magnification of projection, so that a shot area of the photosensitive substrate is scan-exposed to an original pattern of the mask.The mask is provided, over the scanning range of the original pattern, with mask gratings, each composed of plural grating elements arranged at a predetermined pitch along the first (X) direction. The photosensitive substrate is provided with substrate gratings corresponding to said mask gratings. The positional aberration between said mask gratings and the substrate gratings is detected, through the projection optical system, by positional aberration detecting means.At the scanning exposure, either of the mask stage and the substrate stage is driven in the first (X) direction at a constant speed, by first drive control means. The other stage is controlled by second drive control means in such a manner that the relative positional aberration detected by the positional aberration detecting means in the course of movement of the stage, driven by the first drive control means, remains at a predetermined value.

摘要翻译： 扫描曝光装置具有穿过投影光学系统的成像关系的掩模（掩模版）和感光基板（晶片）。 掩模台和晶片台以第一（X）方向以与投影倍率对应的速度比同时移动，使得感光基板的照射区域被扫描曝光到掩模的原始图案。 在原始图案的扫描范围上设置掩模，每个掩模光栅由沿着第一（X）方向以预定间距排列的多个光栅元件组成。 感光基板设置有对应于所述掩模光栅的衬底光栅。 通过投影光学系统，通过位置像差检测装置检测所述掩模光栅与基板光栅之间的位置像差。 在扫描曝光下，通过第一驱动控制装置以一定的速度在第一（X）方向上驱动掩模级和衬底级中的任一个。 另一级由第二驱动控制装置控制，使得由第一驱动控制装置驱动的级的移动过程中由位置像差检测装置检测的相对位置像差保持在预定值。

公开(公告)号：US5347356A

公开(公告)日：1994-09-13

申请号：US982129

申请日：1992-11-25

申请人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G01B11/00 ,  G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7049 ,  G01B9/02002 ,  G01B9/02003 ,  G01B9/02097 ,  G03F7/70633 ,  G03F7/70691 ,  G01B2290/30 ,  G01B2290/60 ,  G01B2290/70

摘要： An aligning device for aligning a substrate with a predetermined point on the basis of a detection signal from a photoelectric detector uses interference light generated by light diffracted from a diffraction grating. A calculating device calculates at least one of a crossing angle of two coherent beams irradiating the grating and the rotational error of a crossing line between a plane containing principal rays of the beams and the surface of the substrate, with respect to the direction of arrangement of the grating, based on the phase difference between detection signals of the photoelectric detector corresponding to interference light generated from different portions of the crossing area. The output of the calculating device may be used to adjust the crossing angle and/or to correct the rotational error.

摘要翻译： 基于来自光电检测器的检测信号将基板与预定点对准的对准装置使用由衍射光栅衍射的光产生的干涉光。 计算装置计算照射光栅的两个相干光束的交叉角度与包含光束的主光线和基板表面的平面之间的交叉线的旋转误差中的至少一个相对于 基于光电检测器的检测信号之间的相位差对应于由交叉区域的不同部分产生的干涉光的光栅。 可以使用计算装置的输出来调整交叉角度和/或校正旋转误差。

公开(公告)号：US5153678A

公开(公告)日：1992-10-06

申请号：US575426

申请日：1990-08-30

申请人： Kazuya Ota

发明人： Kazuya Ota

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70425 ,  G03F7/70616 ,  G03F9/7003 ,  G03F9/7049

摘要： A method of determining regularity of a pattern array on a substrate to enable sequential positioning of patterns of the array relative to a reference position includes the step of calculating a reliability degree regarding a measured value of a pattern position, and the step of determining the regularity of the pattern array on the basis of the calculated reliability degree, and a design value and the measured value of the pattern position.

摘要翻译： 一种确定衬底上的图形阵列的规则性以使得能够相对于参考位置顺序定位阵列的图案的方法包括计算关于图案位置的测量值的可靠度的步骤和确定规则性的步骤 基于计算的可靠性程度的图案阵列，以及图案位置的设计值和测量值。

公开(公告)号：US06699630B2

公开(公告)日：2004-03-02

申请号：US10162383

申请日：2002-06-05

申请人： Kazuya Ota

发明人： Kazuya Ota

IPC分类号： G03F900

CPC分类号： G03F7/70066 ,  G03F7/70425 ,  G03F7/70875

摘要： On sequentially transferring patterns formed on a mask onto a plurality of divided areas on a substrate, when a new divided area on the substrate exposed, the substrate is moved from the exposure position of the preceding divided area to the exposure position of the new divided area in consideration of thermal expansion of the substrate at this stage. Thereafter, the mask pattern is transferred onto the predetermined divided area. With this process, exposure is performed with the respective shot areas arranged on the substrate at a desired interval in a cooled state after exposure. This makes it possible to improve the overlay accuracy with respect to the subsequent layer while performing exposure with high overlay accuracy with respect to the preceding layer.

摘要翻译： 在将掩模上形成的图案顺序地转印到基板上的多个分割区域上时，当基板上的新分割区域露出时，基板从前一分割区域的曝光位置移动到新分割区域的曝光位置 考虑到该阶段的基板的热膨胀。 此后，将掩模图案转印到预定的分割区域上。 利用该处理，曝光后，以冷却状态，以所需的间隔布置在基板上的各个照射区域进行曝光。 这使得相对于前一层以高重叠精度进行曝光的同时可以提高相对于后续层的叠加精度。

公开(公告)号：US06641962B2

公开(公告)日：2003-11-04

申请号：US10375012

申请日：2003-02-28

申请人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

发明人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

IPC分类号： G03F900

CPC分类号： G03F9/708 ,  G03F9/70 ,  G03F9/7076 ,  G03F9/7084

摘要： An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

摘要翻译： 根据本发明的曝光方法包括：在基板上形成包括凹凸图案的对准标记的第一步骤; 在所述对准标记和所述基板上的其他区域上形成涂层的第二步骤; 第三步，使所述外套变平; 以及在由所述第三步骤变平的所述涂层上施加感光材料并向其投射掩模图案的第四步骤。 对准标记由所述凹凸图案形成，所述凹凸图案以相对于具有不小于预定值的宽度的相邻凸部之间的预定值小的间距排列。