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41 条记录 (耗时 0.028 秒)

    Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope
    33.
    发明授权
    Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope 有权
    静电电荷测量方法，焦点调整方法和扫描电子显微镜

    公开(公告)号：US08178836B2

    公开(公告)日：2012-05-15

    申请号：US12792808

    申请日：2010-06-03

    申请人： Tatsuaki Ishijima ,  Katsuhiro Sasada ,  Ritsuo Fukaya

    发明人： Tatsuaki Ishijima ,  Katsuhiro Sasada ,  Ritsuo Fukaya

    IPC分类号： G01N23/00 ,  H01J37/26 ,  G21K7/00

    CPC分类号： G01N23/225 ,  H01J2237/004 ,  H01J2237/216 ,  H01J2237/24564 ,  H01J2237/28

    摘要： A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.

    摘要翻译： 公开了一种方法和装置，用于当通过扫描电子束测量样品的静电电荷量或通过扫描电子束时，基于电子束扫描，基于静电电荷存储来抑制静电电荷量或散焦的误差。 静电电荷测量方法，焦点调节方法或用于测量静电电荷量或控制对样品的施加电压的扫描电子显微镜，在将电子束的扫描位置移动到样品上的同时，将能量过滤器的施加电压改变 。

    Charged particle beam apparatus
    34.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US08071961B2

    公开(公告)日：2011-12-06

    申请号：US11802452

    申请日：2007-05-23

    申请人： Hiroaki Mito ,  Katsuhiro Sasada ,  Kazuo Kato ,  Tomohiro Kudo ,  Tomonori Saeki

    发明人： Hiroaki Mito ,  Katsuhiro Sasada ,  Kazuo Kato ,  Tomohiro Kudo ,  Tomonori Saeki

    IPC分类号： H01J37/18

    CPC分类号： H01J37/185 ,  H01J37/20 ,  H01J2237/18 ,  H01J2237/2001 ,  H01J2237/204 ,  H01J2237/2817 ,  H01L21/67028 ,  H01L21/67213 ,  H01L21/67248

    摘要： A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized.

    摘要翻译： 提供了样品测量方法和带电粒子束装置，其去除了附着在电子显微镜的样品室中的样品的污染物，以消除对后续制造工艺的不利影响。 为了达到这个目标，在通过使用带电粒子束进行样品测量或检查之后，在下一个半导体制造过程之前去除样品上的污染物。 这允许去除样品室中附着在样品上的污染物，因此可以使在测量和检查之后的半导体制造过程中可能发生的故障或缺陷被最小化。

    Scanning electron microscope
    37.
    发明授权
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US07514683B2

    公开(公告)日：2009-04-07

    申请号：US11655275

    申请日：2007-01-19

    申请人： Kazuma Tanii ,  Yuji Kasai ,  Katsuhiro Sasada ,  Eiichi Seya

    发明人： Kazuma Tanii ,  Yuji Kasai ,  Katsuhiro Sasada ,  Eiichi Seya

    IPC分类号： H01J37/28

    CPC分类号： G01N23/2251 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/216 ,  H01J2237/24564

    摘要： Disclosed is a scanning electron microscope capable of performing speedy focusing by automatically measuring an electrostatic voltage of a surface of a wafer inside a specimen chamber in an accurate, and easy speedy manner, the wafer assuming different electrostatic voltages inside and outside the specimen chamber. The scanning electron microscope that controls optical systems measures an electrostatic voltage of the specimen according to an electrostatic capacitance between the both parts of the divided electrode plate, by dividing an electrode plate into two parts and switching potentials of electrodes obtained by the division with each other, an electrostatic voltage of the specimen based on an electrostatic capacitance between the both parts of the divided electrode plate. The electrode plate is used for applying a retarding voltage and arranged over a specimen.

    摘要翻译： 公开了一种扫描电子显微镜，其能够以准确且容易的方式自动测量样品室内的晶片表面的静电电压，从而在晶片内部和外部具有不同的静电电压来进行快速聚焦。 控制光学系统的扫描电子显微镜通过将电极板分成两部分并通过彼此分割获得的电极的切换电位来测量根据分隔电极板的两个部分之间的静电电容的样品的静电电压 基于分割电极板的两个部分之间的静电电容的试样的静电电压。 电极板用于施加延迟电压并且布置在试样上。

    Electrostatic Charge Measurement Method, Focus Adjustment Method, And Scanning Electron Microscope
    38.
    发明申请
    Electrostatic Charge Measurement Method, Focus Adjustment Method, And Scanning Electron Microscope 有权
    静电电荷测量方法，聚焦调整方法和扫描电子显微镜

    公开(公告)号：US20080203298A1

    公开(公告)日：2008-08-28

    申请号：US12038641

    申请日：2008-02-27

    申请人： Tatsuaki ISHIJIMA ,  Katsuhiro Sasada ,  Ritsuo Fukaya

    发明人： Tatsuaki ISHIJIMA ,  Katsuhiro Sasada ,  Ritsuo Fukaya

    IPC分类号： G01N23/00

    CPC分类号： G01N23/225 ,  H01J2237/004 ,  H01J2237/216 ,  H01J2237/24564 ,  H01J2237/28

    摘要： The present invention aims to provide a method and a device of capable of suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam.In order to achieve the above object, according to one aspect of the present invention, an electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample by changing the application voltage to the energy filter while moving the scanning location of the electron beam on the sample is proposed.

    摘要翻译： 本发明的目的在于提供一种方法和装置，其能够基于通过电子束扫描在测量样品的静电电荷量时的静电电荷存储或通过扫描测量聚焦调节量来抑制静电电荷量或散焦的误差 电子束。 为了实现上述目的，根据本发明的一个方面，提供了一种静电电荷测量方法，焦点调节方法或扫描电子显微镜，用于测量静电荷量或通过改变样品的方式控制样品的施加电压 提出了将电子束的扫描位置移动到样品上的能量过滤器的施加电压。

    CHARGED PARTICLE BEAM APPARATUS
    40.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20070120068A1

    公开(公告)日：2007-05-31

    申请号：US11305109

    申请日：2005-12-19

    申请人： Hiroaki Mito ,  Katsuhiro Sasada ,  Kazuo Kato ,  Tomohiro Kudo ,  Tomonori Saeki

    发明人： Hiroaki Mito ,  Katsuhiro Sasada ,  Kazuo Kato ,  Tomohiro Kudo ,  Tomonori Saeki

    IPC分类号： H01J37/18

    CPC分类号： H01J37/185 ,  H01J37/20 ,  H01J2237/18 ,  H01J2237/2001 ,  H01J2237/204 ,  H01J2237/2817 ,  H01L21/67028 ,  H01L21/67213 ,  H01L21/67248

    摘要： A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized.

    摘要翻译： 提供了样品测量方法和带电粒子束装置，其去除了附着在电子显微镜的样品室中的样品的污染物，以消除对后续制造工艺的不利影响。 为了达到这个目标，在通过使用带电粒子束进行样品测量或检查之后，在下一个半导体制造过程之前去除样品上的污染物。 这允许去除样品室中附着在样品上的污染物，因此可以使在测量和检查之后的半导体制造过程中可能发生的故障或缺陷被最小化。