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公开(公告)号：US06210726B1
公开(公告)日：2001-04-03
申请号：US09187006
申请日：1998-11-06
申请人： Siegfried Schiller , Klaus Goedicke , Fred Fietzke , Olaf Zywitzki , Mats Sjöstrand , Björn Ljungberg , Tomas Hilding , Viveka Alfredsson
发明人： Siegfried Schiller , Klaus Goedicke , Fred Fietzke , Olaf Zywitzki , Mats Sjöstrand , Björn Ljungberg , Tomas Hilding , Viveka Alfredsson
IPC分类号： B32B702
CPC分类号： C23C14/081 , C23C14/352 , Y10T407/27 , Y10T428/24975 , Y10T428/25 , Y10T428/252 , Y10T428/265
摘要： The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of a refractory compound of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grain size of less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C., preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu&kgr;&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [(440)]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.
摘要翻译： 本发明描述了一种用于金属加工的涂层切割工具。 该涂层由一层或多层难熔化合物形成，其中至少一层细粒结晶的γ相氧化铝Al 2 O 3具有小于0.1μm的粒度。 在二氧化硅脉冲DMS技术（双重磁控管溅射）中，在450℃至700℃，优选550℃至650℃的范围内的衬底温度下沉积Al 2 O 3层，具体取决于 待涂层的工具体。 通过X射线衍射鉴定γ相氧化铝。 当使用Cukappaalpha辐射时，在2θ角45.8°和66.8°处发生的（400）和（440）平面的反射识别γ相Al 2 O 3。 氧化铝层在[（440）]方向上也非常强烈地纹理化。 Al2O3层实际上没有裂纹和卤素杂质。 此外，Al2O3层使刀具的切削刃具有非常光滑的表面光洁度。
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公开(公告)号：US6146019A
公开(公告)日：2000-11-14
申请号：US322584
申请日：1999-05-28
CPC分类号： F16C33/12 , C23C14/16 , C23C14/30 , C23C14/541 , F16C33/122 , F16C33/14 , F16C2204/20 , Y10S384/912 , Y10T29/49647 , Y10T29/49705
摘要： A plain bearing is described, the overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 .mu.m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of R.sub.z =3 to 7 .mu.m. The method of producing such plain bearings is based on electron beam vapour deposition, wherein a backing member with a roughness of R.sub.z .ltoreq.2 .mu.m is used and vapor deposition of the overlay is effected at a pressure
摘要翻译： 描述了滑动轴承，其覆盖层（3）与通过电镀和常规电子束气相沉积方法施加的覆盖层相比具有显着改善的耐磨性性能。 覆盖层（3）的表面包括圆形凸起部分（4）和凹陷部分（6），其中相对于水平截面（7），凸起部分（4）覆盖一定比例的表面积 30％至50％，基于滑动轴承的整个表面积，截面（7）处于由凸起部分（4）组成的表面积的总比例并且在垂直截面中获得的高度 等于由凹陷部分（6）组成的总相应比例。 圆形隆起部分在平面图中呈现出3至8μm的直径D，其中在俯视图中不是圆形的凸起部分（4）和凹陷部分（6）的情况下，该值与最大值 直径。 表面粗糙度Rz = 3〜7μm。 制造这种滑动轴承的方法是基于电子束气相沉积，其中使用Rz≤2μm的粗糙度的背衬构件，并且在压力<0.1Pa下进行覆盖层的气相沉积。
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公开(公告)号：US6132563A
公开(公告)日：2000-10-17
申请号：US894645
申请日：1997-09-30
CPC分类号： H01J37/3405 , C23C14/0042 , C23C14/352 , C23C14/54
摘要： In magnetron-type reactive sputtering the properties of the deposited layer are to remain constant throughout the entire use of a target, independey of the state of erosion, even after an exchange of targets. The method is also to be applicable for magnetron sputtering sources having a target consisting of several components with different partial discharge powers.Before sputtering of the substrates, the magnetic field strength associated with each partial target is set without reactive gas. Thereafter, a predetermined set of values of characteristic parameters is set by control of the reactive gas flow. During the subsequent sputtering the set of values predetermined for each partial target is kept constant by the controllable reactive gas flow. The first two steps are repeated at certain intervals in dependence of time the targets are used.Optical coatings or corrosion protection coatings may be fabricated by reactive sputtering in accordance with this method.
摘要翻译： PCT No.PCT / DE96 / 00121 Sec。 371日期：1997年9月30日 102（e）1997年9月30日PCT PCT 1996年1月23日PCT公布。 公开号WO96 / 26302 PCT。 日期1996年8月29日在磁控管型反应溅射中，即使在目标交换之后，沉积层的性质也将在目标的整个使用过程中保持不变，独立于侵蚀状态。 该方法也适用于具有由具有不同局部放电功率的多个部件组成的靶的磁控溅射源。 在溅射基板之前，与每个部分目标相关的磁场强度设定为没有反应气体。 此后，通过控制反应气流来设定特定参数值的预定值。 在随后的溅射期间，通过可控的反应气流保持对于每个部分目标预定的一组值。 根据使用目标的时间，以特定的间隔重复前两个步骤。 可以根据该方法通过反应溅射制造光学涂层或防腐蚀涂层。
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公开(公告)号：US6019876A
公开(公告)日：2000-02-01
申请号：US80088
申请日：1998-05-15
申请人： Klaus Goedicke , Michael Junghahnel , Torsten Winkler , Artur Lang , Dieter Meyer , Manfred Muller , Hans-Herrmann Schneider , Rainer C. Schneider
发明人： Klaus Goedicke , Michael Junghahnel , Torsten Winkler , Artur Lang , Dieter Meyer , Manfred Muller , Hans-Herrmann Schneider , Rainer C. Schneider
CPC分类号： G11B5/851 , G11B5/8404
摘要： A method and apparatus for depositing an underlayer and/or a magnetic thin film layer on a data storage disk are described. The sputtering power is supplied in the form of pulses during the application of the underlayer and/or magnetic storage to periodically ignite the plasma and increase the charge-carrier density in the sputtering chamber. The repetition frequency and parameters for the pulses and pauses between pulses are adjusted to achieve a desired nominal value for the coercive field strength of the magnetic layer. Preferably the repetition frequency of the power switching is from 10 to 80 kHz and the ratio of pulse length to pulse pause is within 5:1 to 1:5.
摘要翻译： 描述了用于在数据存储盘上沉积底层和/或磁性薄膜层的方法和装置。 在施加底层和/或磁性存储器期间以脉冲的形式提供溅射功率以周期性地点燃等离子体并且增加溅射室中的电荷 - 载流子密度。 脉冲之间的脉冲和重复频率的重复频率和参数被调整以达到磁层的矫顽磁场强度的期望标称值。 优选地，功率切换的重复频率为10至80kHz，并且脉冲长度与脉冲暂停的比率在5:1至1:5之间。
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公开(公告)号：US5955202A
公开(公告)日：1999-09-21
申请号：US945247
申请日：1997-10-20
CPC分类号： C23C14/044 , C23C14/30 , F16C33/12 , F16C33/14 , F16C2204/20 , Y10S384/912 , Y10T428/31678
摘要： A curved sliding element for a plain bearing and a method of producing same. The sliding element includes a generally semi-circular backing member having a central apex and a concave surface. At least one, and preferably two, intermediate layers are applied to the concave surface of the backing member. A dispersion alloy overlay is applied to the exposed intermediate layer using an electron beam vaporizer. The electron beam vaporizer evenly deposits the dispersion alloy over an angular segment, approximately 70.degree. on either side of the apex, in a such controlled manner that the thickness of the overlay deviates less than 15% across the entire angular segment. The vaporizer is moved during the overlay deposition in a linear path relative to the backing member while maintaining the distance from the linear path of the vaporizer to the apex between 150 to 350 mm. The relative speed between the vaporizer and the backing member can be varied to enhance deposition characteristics, such as by reducing the speed as the backing member nears the vaporizer and increasing the speed as the backing member moves away from the vaporizer. It may also be beneficial to position a screen between the linear path and the backing member. The screen includes a face presented toward the vaporizer which is maintained at a temperature above the melting point of the dispersion alloy.
摘要翻译： PCT No.PCT / DE96 / 00729 Sec。 371日期：1997年10月20日 102（e）1997年10月20日PCT PCT 1996年4月19日PCT公布。 出版物WO96 / 33352 日期1996年10月24日用于滑动轴承的弯曲滑动元件及其制造方法。 滑动元件包括具有中心顶点和凹面的大致半圆形背衬构件。 至少一个，优选两个中间层施加到背衬构件的凹面上。 使用电子束蒸发器将分散合金覆盖层施加到暴露的中间层。 电子束蒸发器以这种受控的方式将分散合金均匀地沉积在顶点的任一侧上的角度段上约70°的角分段，使得覆盖层的厚度在整个角度段上偏离小于15％。 在覆盖沉积期间，蒸发器相对于背衬构件以线性路径移动，同时保持从蒸发器的线性路径到150至350mm之间的顶点的距离。 可以改变蒸发器和背衬构件之间的相对速度以增强沉积特性，例如通过当背衬构件靠近蒸发器时降低速度并且当背衬构件远离蒸发器移动时增加速度。 将屏幕定位在线性路径和背衬构件之间也可能是有益的。 屏幕包括朝向蒸发器呈现的面，其保持在高于分散合金熔点的温度。
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公开(公告)号：US5470388A
公开(公告)日：1995-11-28
申请号：US307663
申请日：1994-11-23
申请人： Klaus Goedicke , Christoph Metzner , Joerg Schmidt , Ullrich Heisig , Siegfried Schiller , Jonathan Reschke
发明人： Klaus Goedicke , Christoph Metzner , Joerg Schmidt , Ullrich Heisig , Siegfried Schiller , Jonathan Reschke
CPC分类号： C23C14/223 , C23C14/22
摘要： Device for the vacuum coating of mass produced products. By means of the ice small parts, such as screws and bolts, as mass produced products are highly productively coated by vacuum deposition or sputtering, also under plasma action. In a container is located a drum rotatable at high speed about its horizontal axis and in which the parts to be coated are fixed to the inner wall by centrifugal force. The surface of the inner wall is geometrically constructed such that the parts to be coated are reliably held and moved with it. The coating devices are located in the drum. A stripping device, whose spacing with respect to the inner wall is adjustable at programmable time intervals, is located in the drum and has an abutment surface directed opposite to the rotation direction.
摘要翻译： PCT No.PCT / DE93 / 00201 Sec。 371日期1994年11月23日 102（e）日期1994年11月23日PCT 1993年3月3日PCT公布。 出版物WO93 / 19217 日期1993年9月30日。批量生产产品的真空镀膜设备。 通过设备的小部件，例如螺钉和螺栓，通过真空沉积或溅射也可以在等离子体作用下大量生产大量生产的产品。 在容器中设置有以其高度绕其水平轴线可高速旋转的滚筒，其中待涂覆的部件通过离心力固定在内壁上。 内壁的表面是几何构造的，使得待涂覆的部件被可靠地保持和移动。 涂层装置位于滚筒中。 相对于内壁的间隔可以以可编程的时间间隔调节的剥离装置位于滚筒中并且具有与旋转方向相反的抵接表面。
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