公开(公告)号：US06263575B1

公开(公告)日：2001-07-24

申请号：US09584515

申请日：2000-05-31

申请人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

发明人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

IPC分类号： B21D5310

CPC分类号： F16C33/12 ,  C23C14/16 ,  C23C14/30 ,  C23C14/541 ,  F16C33/122 ,  F16C33/14 ,  F16C2204/20 ,  Y10S384/912 ,  Y10T29/49647 ,  Y10T29/49705

摘要： A plain bearing overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 &mgr;m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of Rz=3 to 7 &mgr;m. The method of producing such plain bearings is based on electron beam vapor deposition, wherein a backing member with a roughness of Rz23 2 &mgr;m is used and vapor deposition of the overlay is effected at a pressure

摘要翻译： 与通过电镀和常规电子束气相沉积方法施加的覆盖层相比，其滑动轴承覆盖层（3）的性能显着地提高了耐磨性。 覆盖层（3）的表面包括圆形凸起部分（4）和凹陷部分（6），其中相对于水平截面（7），凸起部分（4）覆盖一定比例的表面积 30％至50％，基于滑动轴承的整个表面积，截面（7）处于由凸起部分（4）组成的表面积的总比例并且在垂直截面中获得的高度 等于由凹陷部分（6）组成的总相应比例。 圆形隆起部分在平面图中呈现3至8μm的直径D，其中在俯视图中不是圆形的凸起部分（4）和凹陷部分（6）的情况下，该值涉及最大直径 。 该表面的粗糙度Rz = 3〜7μm。 制造这种滑动轴承的方法是基于电子束气相沉积，其中使用粗糙度为Rz232μm的背衬构件，并且在压力<0.1Pa下进行覆盖层的气相沉积。

公开(公告)号：US06316061B1

公开(公告)日：2001-11-13

申请号：US09583621

申请日：2000-05-31

申请人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

发明人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

IPC分类号： B05D306

CPC分类号： C23C14/30 ,  C23C14/06 ,  F16C17/02 ,  F16C33/121 ,  F16C33/124 ,  F16C33/14 ,  Y10S384/912

摘要： A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapour deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterised in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

摘要翻译： 半轴承具有背衬构件和至少一个金属覆盖层，其通过电子束气相沉积施加，并且其包含至少一种精细分散的基体材料中的组分，该组分的原子量大于基体材料的原子量 ，其中所述细分散组分（7）的浓度从所述半轴承（1）的顶点区域（8）朝向所述部分表面的区域（9）连续地减小。 该方法的特征在于，在涂覆过程中，在轴承壳体的顶点区域中设置0.1至5Pa的惰性气体压力。

公开(公告)号：US06444086B1

公开(公告)日：2002-09-03

申请号：US09555905

申请日：2000-08-31

申请人： Gerd Andler ,  Wolfgang Wixwat-Ernst ,  Christoph Metzner ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Siegfried Schiller

发明人： Gerd Andler ,  Wolfgang Wixwat-Ernst ,  Christoph Metzner ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Siegfried Schiller

IPC分类号： C23F100

CPC分类号： C23C14/50 ,  C23C14/022 ,  C23C14/568 ,  F16C33/14

摘要： Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.

摘要翻译： 在连续或舱口设施中具有不同形状的真空涂覆基材的现有装置以这样的方式装备，使得在涂覆工艺之后施加若干涂层。 滑动轴承应涂覆几层，所用的涂层材料和相关条件需要使用几种涂层技术。 这尤其涉及输送参数。 现有设施不符合这些要求。 根据本发明，这种装置包括几个对准的处理室。 通过正和非正配合保持在回火承载体中的滑动轴承通过适于该过程的输送系统而被移动通过包括预处理，雾化和蒸发室的所述室。 用于承载体的回火装置连接在涂层轨迹的上游。 相应的入口和出口通道可进行空气 - 空气输送。

公开(公告)号：US6139191A

公开(公告)日：2000-10-31

申请号：US322464

申请日：1999-05-28

申请人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

发明人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

IPC分类号： F16C33/12 ,  C22C13/00 ,  C22C21/00 ,  C23C14/06 ,  C23C14/16 ,  C23C14/30 ,  F16C17/02 ,  F16C33/02 ,  F16C33/06 ,  F16C33/10 ,  F16C33/14

CPC分类号： C23C14/30 ,  C23C14/06 ,  F16C17/02 ,  F16C33/121 ,  F16C33/124 ,  F16C33/14 ,  Y10S384/912

摘要： A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapor deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterized in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

摘要翻译： 半轴承具有背衬构件和至少一个金属覆盖层，其通过电子束气相沉积施加，并且其包含至少一种精细分散的基体材料中的组分，该组分的原子量大于基体材料的原子量 ，其中所述细分散组分（7）的浓度从所述半轴承（1）的顶点区域（8）朝向所述部分表面的区域（9）连续地减小。 该方法的特征在于，在涂覆过程中，在轴承壳体的顶点区域中设置0.1至5Pa的惰性气体压力。

公开(公告)号：US6146019A

公开(公告)日：2000-11-14

申请号：US322584

申请日：1999-05-28

申请人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

发明人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

IPC分类号： F16C33/06 ,  C23C14/16 ,  C23C14/30 ,  C23C14/54 ,  F16C33/02 ,  F16C33/12 ,  F16C33/14

CPC分类号： F16C33/12 ,  C23C14/16 ,  C23C14/30 ,  C23C14/541 ,  F16C33/122 ,  F16C33/14 ,  F16C2204/20 ,  Y10S384/912 ,  Y10T29/49647 ,  Y10T29/49705

摘要： A plain bearing is described, the overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 .mu.m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of R.sub.z =3 to 7 .mu.m. The method of producing such plain bearings is based on electron beam vapour deposition, wherein a backing member with a roughness of R.sub.z .ltoreq.2 .mu.m is used and vapor deposition of the overlay is effected at a pressure

摘要翻译： 描述了滑动轴承，其覆盖层（3）与通过电镀和常规电子束气相沉积方法施加的覆盖层相比具有显着改善的耐磨性性能。 覆盖层（3）的表面包括圆形凸起部分（4）和凹陷部分（6），其中相对于水平截面（7），凸起部分（4）覆盖一定比例的表面积 30％至50％，基于滑动轴承的整个表面积，截面（7）处于由凸起部分（4）组成的表面积的总比例并且在垂直截面中获得的高度 等于由凹陷部分（6）组成的总相应比例。 圆形隆起部分在平面图中呈现出3至8μm的直径D，其中在俯视图中不是圆形的凸起部分（4）和凹陷部分（6）的情况下，该值与最大值 直径。 表面粗糙度Rz = 3〜7μm。 制造这种滑动轴承的方法是基于电子束气相沉积，其中使用Rz≤2μm的粗糙度的背衬构件，并且在压力<0.1Pa下进行覆盖层的气相沉积。

公开(公告)号：US6083356A

公开(公告)日：2000-07-04

申请号：US91099

申请日：1998-09-14

申请人： Klaus Goedicke ,  Fred Fietzke ,  Jonathan Reschke ,  Wolfgang Hempel ,  Bert Scheffel ,  Christoph Metzner ,  Siegfried Schiller

发明人： Klaus Goedicke ,  Fred Fietzke ,  Jonathan Reschke ,  Wolfgang Hempel ,  Bert Scheffel ,  Christoph Metzner ,  Siegfried Schiller

IPC分类号： C23C14/02 ,  H01J37/32 ,  B01J19/08

CPC分类号： H01J37/32018 ,  C23C14/022 ,  H01J37/34 ,  H01J2237/3322

摘要： Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.

摘要翻译： PCT No.PCT / EP96 / 05032 Sec。 371日期：1998年9月14日 102（e）1998年9月14日PCT PCT 1996年11月15日PCT公布。 公开号WO97 / 22988 PCT 日期1997年6月26日用于在真空中通过辉光放电在真空中预处理衬底表面以用于在真空中进行随后的涂覆过程的工艺和设备。 该方法包括保持待预处理的基板和反电极之间的低压辉光放电，其中反电极由真空涂覆工艺中要沉积的涂层的至少一部分组成。 该方法还包括周期性地交替使衬底的极性作为阴极或作为低压辉光放电的阳极，以及分别控制两极性的脉冲长度和放电电压中的至少一个。 极性的交替频率设定在1Hz〜1000kHz的范围内。 该装置包括可抽空的真空室，定位成保持待预处理的基板的基板保持器，至少一个对电极和耦合到待预处理的基板的交流电压发生器， 电极。 基板和对电极以无电势的方式安装。

公开(公告)号：US5780803A

公开(公告)日：1998-07-14

申请号：US821030

申请日：1997-03-20

申请人： Klaus Goedicke ,  Volker Kirchhoff ,  Christoph Metzner ,  Bert Scheffel

发明人： Klaus Goedicke ,  Volker Kirchhoff ,  Christoph Metzner ,  Bert Scheffel

IPC分类号： C23C14/32 ,  H01J37/304 ,  H01J37/305 ,  B23K10/00 ,  B23K15/00

CPC分类号： H01J37/304 ,  C23C14/32 ,  H01J37/3053

摘要： The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.

摘要翻译： 本发明涉及通过电子束蒸发器来稳定大衬底表面涂层中的等离子体产生的方法。 为了以高蒸发速率和蒸气云的稳定等离子体激发而不使用附加电极获得设备的稳定操作，根据本发明，电子束蒸发器的蒸发速率最初设定得高至至少10％ 电子束功率被蒸汽吸收在蒸发室中，并测量所得等离子体的光发射。 然后控制电子枪的操作参数或工艺参数，使得光发射，因此能量吸收保持恒定。

公开(公告)号：US6086963A

公开(公告)日：2000-07-11

申请号：US125106

申请日：1998-09-02

申请人： Klaus Goedicke ,  Bert Scheffel ,  Christoph Metzner

发明人： Klaus Goedicke ,  Bert Scheffel ,  Christoph Metzner

IPC分类号： C03C17/00 ,  C23C14/54 ,  C23C14/24 ,  C23C15/54

CPC分类号： C23C14/54 ,  C03C17/002

摘要： The vacuum vaporization process is controlled using recoil force of the evaporating particles as the measurable variable by measuring the rate of evaporation. The vaporizer vessel is arranged in the vacuum chamber with the aid of force transducers, and the signal emanating from the force transducers can be used to control, for example, the electrical energy to heat the vaporizing material, the beam deflection or the fill level in the vaporizer, with the sensors not coming into contact with the vapor. Vacuum vaporization processes, particularly for vapor deposition of functional coatings on tools and sheet substrates, can be controlled with this method and device.

摘要翻译： PCT No.PCT / DE97 / 00267 Sec。 371日期：1998年9月2日 102（e）1998年9月2日PCT PCT 1997年2月7日提交PCT公布。 公开号WO97 / 30187 日期1997年8月21日通过测量蒸发速率，通过蒸发颗粒的反冲力作为可测量的变量控制真空蒸发过程。 蒸发器容器借助于力传感器布置在真空室中，并且来自力传感器的信号可用于控制例如电能以加热气化材料，光束偏转或填充水平 蒸发器，传感器不与蒸气接触。 这种方法和装置可以控制真空汽化过程，特别是用于工具和片材基底上的功能涂层的气相沉积。

公开(公告)号：US5955202A

公开(公告)日：1999-09-21

申请号：US945247

申请日：1997-10-20

申请人： Michael Steeg ,  Klaus Goedicke ,  Torsten Kopte ,  Christoph Metzner

发明人： Michael Steeg ,  Klaus Goedicke ,  Torsten Kopte ,  Christoph Metzner

IPC分类号： F16C17/00 ,  C23C14/04 ,  C23C14/30 ,  F16C33/12 ,  F16C33/14 ,  G01D5/34

CPC分类号： C23C14/044 ,  C23C14/30 ,  F16C33/12 ,  F16C33/14 ,  F16C2204/20 ,  Y10S384/912 ,  Y10T428/31678

摘要： A curved sliding element for a plain bearing and a method of producing same. The sliding element includes a generally semi-circular backing member having a central apex and a concave surface. At least one, and preferably two, intermediate layers are applied to the concave surface of the backing member. A dispersion alloy overlay is applied to the exposed intermediate layer using an electron beam vaporizer. The electron beam vaporizer evenly deposits the dispersion alloy over an angular segment, approximately 70.degree. on either side of the apex, in a such controlled manner that the thickness of the overlay deviates less than 15% across the entire angular segment. The vaporizer is moved during the overlay deposition in a linear path relative to the backing member while maintaining the distance from the linear path of the vaporizer to the apex between 150 to 350 mm. The relative speed between the vaporizer and the backing member can be varied to enhance deposition characteristics, such as by reducing the speed as the backing member nears the vaporizer and increasing the speed as the backing member moves away from the vaporizer. It may also be beneficial to position a screen between the linear path and the backing member. The screen includes a face presented toward the vaporizer which is maintained at a temperature above the melting point of the dispersion alloy.

摘要翻译： PCT No.PCT / DE96 / 00729 Sec。 371日期：1997年10月20日 102（e）1997年10月20日PCT PCT 1996年4月19日PCT公布。 出版物WO96 / 33352 日期1996年10月24日用于滑动轴承的弯曲滑动元件及其制造方法。 滑动元件包括具有中心顶点和凹面的大致半圆形背衬构件。 至少一个，优选两个中间层施加到背衬构件的凹面上。 使用电子束蒸发器将分散合金覆盖层施加到暴露的中间层。 电子束蒸发器以这种受控的方式将分散合金均匀地沉积在顶点的任一侧上的角度段上约70°的角分段，使得覆盖层的厚度在整个角度段上偏离小于15％。 在覆盖沉积期间，蒸发器相对于背衬构件以线性路径移动，同时保持从蒸发器的线性路径到150至350mm之间的顶点的距离。 可以改变蒸发器和背衬构件之间的相对速度以增强沉积特性，例如通过当背衬构件靠近蒸发器时降低速度并且当背衬构件远离蒸发器移动时增加速度。 将屏幕定位在线性路径和背衬构件之间也可能是有益的。 屏幕包括朝向蒸发器呈现的面，其保持在高于分散合金熔点的温度。

公开(公告)号：US5750185A

公开(公告)日：1998-05-12

申请号：US638393

申请日：1996-04-29

申请人： Klaus Goedicke ,  Christoph Metzner ,  Volker Kirchhoff ,  Wolfgang Hempel ,  Nicolas Schiller

发明人： Klaus Goedicke ,  Christoph Metzner ,  Volker Kirchhoff ,  Wolfgang Hempel ,  Nicolas Schiller

IPC分类号： C23C14/30 ,  C23C14/54 ,  H01J37/304 ,  H01J37/305 ,  B05D3/06

CPC分类号： H01J37/3053 ,  C23C14/30 ,  C23C14/548 ,  H01J37/304 ,  H01J2237/3132

摘要： A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

摘要翻译： 一种用于多组分蒸发剂的电子束沉积的方法，以确定具有恒定组成和厚度的一致的层质量。 使用所获得的信号作为参考输入，原位测量从电子束冲击点处蒸发器发射的X射线，以控制蒸发过程的参数，从而控制沉积层的沉积速率和材料组成。 该方法用于在例如带钢或塑料膜上生产耐腐蚀，耐高温，耐磨或光学层。