LIQUID CRYSTAL DISPLAY DEVICE
    31.
    发明申请

    公开(公告)号:US20180067350A1

    公开(公告)日:2018-03-08

    申请号:US15806478

    申请日:2017-11-08

    CPC classification number: G02F1/1339 G02F1/133345 G02F2001/133388

    Abstract: A reliability of seal portion of a liquid crystal display device can be improved by the following structure. A liquid crystal display device includes: a TFT substrate which includes a display region and a terminal part, and has an inorganic insulating film formed on an organic passivation film and an alignment film formed over the inorganic insulating film; a counter substrate, the TFT substrate and the counter substrate bonded together by a sealing material formed at a seal part surrounding the display region; and a liquid crystal sealed inside. At the seal part, a transparent conductive oxide film is formed between the inorganic insulating film and the alignment film. The transparent conductive oxide film exists inside an edge of the TFT substrate and hence, the edge of the TFT substrate is free of the transparent conductive oxide film.

    MANUFACTURING METHOD FOR LIQUID CRYSTAL DISPLAY DEVICE
    34.
    发明申请
    MANUFACTURING METHOD FOR LIQUID CRYSTAL DISPLAY DEVICE 有权
    液晶显示装置的制造方法

    公开(公告)号:US20140132902A1

    公开(公告)日:2014-05-15

    申请号:US14156957

    申请日:2014-01-16

    Abstract: A LCD device having a large pixel holding capacitance includes opposedly facing first and second substrates, and liquid crystal between them. The first substrate includes a video signal line, a pixel electrode, a thin film transistor having a first electrode connected to the video signal line and a second electrode connected to the pixel electrode, a first silicon nitride film formed above the second electrode, an organic insulation film above the first silicon nitride film, a capacitance electrode above the organic insulation film, and a second silicon nitride film above the capacitance electrode and below the pixel electrode. A contact hole etched in both the first and second silicon nitride films connects the second electrode and the pixel electrode to each other. A holding capacitance is formed by the pixel electrode, the second silicon nitride film and the capacitance electrode.

    Abstract translation: 具有大像素保持电容的LCD装置包括相对的第一和第二基板以及它们之间的液晶。 第一基板包括视频信号线,像素电极,具有连接到视频信号线的第一电极的薄膜晶体管和连接到像素电极的第二电极,形成在第二电极上方的第一氮化硅膜,有机物 第一氮化硅膜上方的绝缘膜,有机绝缘膜上方的电容电极,以及电容电极上方和像素电极下方的第二氮化硅膜。 在第一和第二氮化硅膜中蚀刻的接触孔将第二电极和像素电极彼此连接。 保持电容由像素电极,第二氮化硅膜和电容电极形成。

    DISPLAY DEVICE AND MANUFACTURING METHOD FOR SAME
    35.
    发明申请
    DISPLAY DEVICE AND MANUFACTURING METHOD FOR SAME 有权
    显示器件及其制造方法

    公开(公告)号:US20130334524A1

    公开(公告)日:2013-12-19

    申请号:US13915671

    申请日:2013-06-12

    CPC classification number: H01L27/1244 H01L27/1225 H01L27/1288 H01L27/3244

    Abstract: The present invention provides a display device having: gate electrodes formed on a transparent substrate; a gate insulating film for covering the gate electrodes; an oxide semiconductor formed on the gate insulating film; drain electrodes and source electrodes formed at a distance from each other with channel regions of the oxide semiconductor in between; an interlayer capacitor film for covering the drain electrodes and source electrodes; common electrodes formed on top of the interlayer capacitor film; and pixel electrodes formed so as to face the common electrodes, and wherein an etching stopper layer for covering the channel regions is formed between the oxide semiconductor and the drain electrodes and source electrodes, the drain electrodes are a multilayer film where a transparent conductive film and a metal film are layered on top of each other, and the drain electrodes and source electrodes make direct contact with the oxide semiconductor.

    Abstract translation: 本发明提供一种显示装置,具有:形成在透明基板上的栅电极; 用于覆盖栅电极的栅极绝缘膜; 形成在栅极绝缘膜上的氧化物半导体; 漏电极和源极之间形成有一定距离的氧化物半导体的沟道区; 用于覆盖漏电极和源电极的层间电容膜; 公共电极形成在层间电容器膜的顶部; 以及形成为与公共电极相对的像素电极,并且其中在氧化物半导体与漏电极和源电极之间形成用于覆盖沟道区的蚀刻停止层,漏电极是多层膜,其中透明导电膜和 金属膜层叠在一起,漏电极和源电极与氧化物半导体直接接触。

    SEMICONDUCTOR DEVICE
    37.
    发明申请

    公开(公告)号:US20230017598A1

    公开(公告)日:2023-01-19

    申请号:US17862419

    申请日:2022-07-12

    Abstract: According to one embodiment, a semiconductor device includes a gate electrode, a first insulating layer covering the gate electrode, an oxide semiconductor provided on the first insulating layer immediately above the gate electrode, a source electrode in contact with the oxide semiconductor, and a drain electrode in contact with the oxide semiconductor. Each of the source electrode and the drain electrode includes an oxide conductive layer in contact with the oxide semiconductor, a first metal layer stacked on the oxide conductive layer, a second metal layer formed of a different material from the first metal layer and stacked on the first metal layer, and a third metal layer formed of a same material as the first metal layer and stacked on the second metal layer.

    SEMICONDUCTOR DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220140117A1

    公开(公告)日:2022-05-05

    申请号:US17511633

    申请日:2021-10-27

    Abstract: According to one embodiment, a method for manufacturing a semiconductor device, includes forming a first insulating film which covers a gate electrode, forming an island-shaped oxide semiconductor in contact with the first insulating film, forming a second insulating film which covers the oxide semiconductor, forming a source electrode in contact with the oxide semiconductor, forming a drain electrode in contact with the oxide semiconductor, forming a third insulating film which covers the source electrode and the drain electrode and forming a channel region between the source electrode and the drain electrode by supplying oxygen from the third insulating film to the oxide semiconductor via the second insulating film.

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