SHARING USER INFORMATION WITH PROXIMATE DEVICES
    31.
    发明申请
    SHARING USER INFORMATION WITH PROXIMATE DEVICES 审中-公开
    使用接近设备共享用户信息

    公开(公告)号:US20140012917A1

    公开(公告)日:2014-01-09

    申请号:US13997763

    申请日:2011-12-28

    IPC分类号: H04L29/06

    摘要: Embodiments of techniques and systems for sharing user information between proximate devices are described. In embodiments, a first device may identify a physically-proximate device that may receive user information. Upon receiving an indication that a user of the first device may desire to share user information with a user of the second device, a determination may be made as to whether the two users have matching interests. In embodiments, the interest match determination may be made by a separate interest match evaluator. Upon determination of an interest match, the first device may then send a request to share user information to the second device. If a user of the second device approves the request, user information for the user of the first device may be shared with the user of the second device. Other embodiments may be described and claimed.

    摘要翻译: 描述用于在邻近设备之间共享用户信息的技术和系统的实施例。 在实施例中,第一设备可以识别可以接收用户信息的物理上接近的设备。 在接收到第一设备的用户可能希望与第二设备的用户共享用户信息的指示时,可以确定两个用户是否具有匹配的兴趣。 在实施例中,兴趣匹配确定可以由单独的兴趣匹配评估器进行。 当确定兴趣匹配时,第一设备然后可以发送将用户信息共享到第二设备的请求。 如果第二设备的用户批准该请求,则可以与第二设备的用户共享第一设备的用户的用户信息。 可以描述和要求保护其他实施例。

    Apparatus for uniform cleaning of wafers using megasonic energy

    公开(公告)号:US5579792A

    公开(公告)日:1996-12-03

    申请号:US599007

    申请日:1996-02-09

    IPC分类号: E04B1/84 H01L21/00 B08B3/10

    摘要: Apparatus and method for cleaning/etching the surface of an article with sonic energy in the megahertz range which employ an anti-reflection mechanism within a recirculation tank. A tank having at least one side wall and a bottom structure holds a cleaning/etching liquid and a megasonic transducer is associated with the tank for projecting megasonic energy into the liquid. The anti-reflection mechanism is disposed within the tank in close association with the at least one sidewall or bottom structure of the tank to thereby minimize reflection of megasonic energy from the associated surface. Preferably, the megasonic transducer is associated with a first tank sidewall which opposes a second tank sidewall, and the anti-reflection mechanism is disposed adjacent the second tank sidewall. By way of example, the anti-reflection mechanism can comprise a stream of gas bubbles, a plurality of anechoic structures, or a combination of both gas bubbles and anechoic structures.

    Apparatus for uniform cleaning of wafers using megasonic energy
    33.
    发明授权
    Apparatus for uniform cleaning of wafers using megasonic energy 失效
    使用兆声波能量均匀清洁晶片的装置

    公开(公告)号:US5533540A

    公开(公告)日:1996-07-09

    申请号:US370714

    申请日:1995-01-10

    IPC分类号: E04B1/84 H01L21/00 B08B3/10

    摘要: Apparatus and method for cleaning/etching the surface of an article with sonic energy in the megahertz range which employ an anti-reflection mechanism within a recirculation tank. A tank having at least one side wall and a bottom structure holds a cleaning/etching liquid and a megasonic transducer is associated with the tank for projecting megasonic energy into the liquid. The anti-reflection mechanism is disposed within the tank in close association with the at least one sidewall or bottom structure of the tank to thereby minimize reflection of megasonic energy from the associated surface. Preferably, the megasonic transducer is associated with a first tank sidewall which opposes a second tank sidewall, and the anti-reflection mechanism is disposed adjacent the second tank sidewall. By way of example, the anti-reflection mechanism can comprise a stream of gas bubbles, a plurality of anechoic structures, or a combination of both gas bubbles and anechoic structures.

    摘要翻译: 用于在兆赫兹范围内用声能量清洁/蚀刻物品的表面的装置和方法,其在循环罐内采用防反射机构。 具有至少一个侧壁和底部结构的罐保持清洁/蚀刻液体,并且兆声波换能器与用于将兆声波能量投射到液体中的罐相关联。 防反射机构设置在罐内与罐的至少一个侧壁或底部结构紧密相关联,从而最小化来自相关联表面的兆声波能量的反射。 优选地,兆声波换能器与第二坦克侧壁相对,第一坦克侧壁与第二坦克侧壁相对,并且防反射机构邻近第二坦克侧壁设置。 作为示例,防反射机构可以包括气泡流,多个消声结构或两个气泡和消声结构的组合。

    Process for making self-aligned contacts
    34.
    发明授权
    Process for making self-aligned contacts 失效
    进行自对准接触的过程

    公开(公告)号:US4855252A

    公开(公告)日:1989-08-08

    申请号:US234780

    申请日:1988-08-22

    IPC分类号: H01L21/60 H01L21/768

    摘要: A process for making metal contacts and interconnection lines which are self-aligned to each other is disclosed. After semiconductor devices are formed and an insulating/planarizing layer is deposited, a layer of polyimide is deposited. A pattern of trenches into which the metal interconnection lines will be deposited is formed in the polyimide layer. Next, a pattern of contacts to the underlying semiconductor devices is formed in a photoresist layer. This pattern of contacts is subsequently etched into the insulating/planarizing layer. Since both the patterned photoresist layer and the patterned polyimide layer are used as etch masks, the contact windows through the insulating/planarizing layer and the trenches in the polyimide layer will be aligned with respect to each other. After metal deposition, the metal contacts and interconnection lines will be self-aligned.

    DEVICE AND METHOD FOR AUTOMATIC VIEWING PERSPECTIVE CORRECTION
    37.
    发明申请
    DEVICE AND METHOD FOR AUTOMATIC VIEWING PERSPECTIVE CORRECTION 有权
    用于自动查看视觉校正的装置和方法

    公开(公告)号:US20140092142A1

    公开(公告)日:2014-04-03

    申请号:US13631469

    申请日:2012-09-28

    IPC分类号: G09G5/14

    摘要: Devices and methods for improving viewing perspective of content displayed on the display screen of a computing device include determining one or more viewing angles relative to a viewer of the content, generating a content transformation to apply a corrective distortion to the content to improve the viewing perspective when viewed at the one or more viewing angles, and rendering the content as a function of the content transformation. The viewing angles relative to a viewer of the content may be determined automatically using viewer location sensors, or may be input manually by the viewer. The content transformation visually scales the content by an appropriate factor to compensate for visual distortion experienced by the viewer at one or more viewing angles. Content may be transformed as a function of a single approximate viewing angle or multiple viewing angles.

    摘要翻译: 用于改善在计算设备的显示屏幕上显示的内容的观看透视图的设备和方法包括:确定相对于内容的观看者的一个或多个视角,生成内容变换以对内容应用校正失真以改善观看透视 当在一个或多个视角观看时,并且将内容呈现为内容变换的函数。 可以使用观看者位置传感器自动确定相对于内容的观看者的视角,或者可以由观看者手动输入。 内容变换通过适当的因素来视觉地缩放内容,以补偿观看者在一个或多个视角下经历的视觉失真。 内容可以作为单个近似视角或多个视角的函数而变换。

    Selective deposition of tungsten on TiSi.sub.2
    38.
    发明授权
    Selective deposition of tungsten on TiSi.sub.2 失效
    选择性沉积在TiSi2 + B上

    公开(公告)号:US5023201A

    公开(公告)日:1991-06-11

    申请号:US575460

    申请日:1990-08-30

    IPC分类号: H01L21/285 H01L21/768

    摘要: An improved process for preparing selective deposition of conductive metals on disilicide encroachment barriers allows the construction of integrated circuit components wherein the metal/disilicide interface is substantially free of O and/or F contamination. The level of interfacial oxygen and/or fluorine contamination in the selective W deposition on the TiSi.sub.2 was substantially reduced or eliminated by first forming a C49 TiSi.sub.2 phase on a substrate, selectively depositing W on the C49 TiSi.sub.2 phase and thereafter annealing at a (minimum) temperature sufficient to convert the high resistivity phase C49 TiSi.sub.2 to the low resistivity phase C54 TiSi.sub.2.

    摘要翻译: 用于制备导电金属在二硅化物侵入屏障上的选择性沉积的改进方法允许构建集成电路部件,其中金属/二硅化物界面基本上不含O和/或F污染物。 通过首先在衬底上形成C49TiSi2相,在C49TiSi2相上选择性地沉积W,然后以(最小)的方式退火,基本上减少或消除了选择性W沉积在TiSi 2上的界面氧和/或氟污染物的水平, 温度足以将高电阻率相C49TiSi2转化为低电阻相C54 TiSi2。