THREE-DIMENSIONAL NANODEVICES INCLUDING NANOSTRUCTURES
    32.
    发明申请
    THREE-DIMENSIONAL NANODEVICES INCLUDING NANOSTRUCTURES 有权
    包括纳米结构的三维纳米器件

    公开(公告)号:US20110193052A1

    公开(公告)日:2011-08-11

    申请号:US12672995

    申请日:2008-05-19

    IPC分类号: H01L29/06 B82Y99/00

    摘要: Provided are three-dimensional (3D) nanodevices including 3D nanostructures. The 3D nanodevice includes at least one nanostructure, each nanostructure including an oscillation portion floating over a substrate and support portions for supporting both lengthwise end portions of the oscillation portion, supports disposed on the substrate to support the support portions of each of the nanostructures, at least one controller disposed at an upper portion of the substrate, a lower portion of the substrate, or both the upper and lower portions of the substrate to control each of the nanostructures, and a sensing unit disposed on each of the oscillation portions to sense an externally supplied adsorption material. Thus, unlike in a typical planar device, generation of impurities between a nanodevice and a substrate can be reduced, and mechanical vibration can be caused. In particular, since 3D nanostructures have mechanical and electrical characteristics, 3D nanodevices including new 3D nanostructures can be provided using nano-electro-mechanical systems (NEMS). Also, a single electron device, a spin device, or a single electron transistor (SET)-field effect transistor (FET) hybrid device can be formed using a simple process unlike in planar devices.

    摘要翻译: 提供了三维(3D)纳米器件,包括3D纳米结构。 3D纳米装置包括至少一个纳米结构,每个纳米结构包括漂浮在基板上的振荡部分和支撑部分,用于支撑振荡部分的两个纵向端部,支撑件设置在基板上以支撑每个纳米结构的支撑部分, 设置在基板的上部,基板的下部或基板的上部和下部的至少一个控制器,以控制每个纳米结构;以及感测单元,设置在每个振荡部分上以感测 外部供应的吸附材料。 因此,与典型的平面器件不同,可以减少纳米器件与衬底之间的杂质的产生,并且可能引起机械振动。 特别地,由于3D纳米结构具有机械和电学特性,可以使用纳米机电系统(NEMS)提供包括新的3D纳米结构的3D纳米器件。 此外,可以使用与平面器件不同的简单工艺来形成单电子器件,自旋器件或单电子晶体管(SET)场效应晶体管(FET)混合器件。

    Semiconductor nanowire sensor device and method for manufacturing the same
    36.
    发明授权
    Semiconductor nanowire sensor device and method for manufacturing the same 有权
    半导体纳米线传感器装置及其制造方法

    公开(公告)号:US08241939B2

    公开(公告)日:2012-08-14

    申请号:US12682571

    申请日:2008-07-24

    IPC分类号: H01L21/00 H01L29/06

    摘要: A method for manufacturing a biosensor includes forming a silicon nanowire channel, etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.

    摘要翻译: 制造生物传感器的方法包括形成硅纳米线通道,蚀刻作为绝缘体上硅(SOI)衬底的顶层的第一导电型单晶硅层,以形成第一导电型单晶硅线 以与第一导电类型相反的第二导电类型的杂质掺杂第一导电型单晶硅线图案的两个侧壁以形成第二导电型沟道,形成第二导电型垫,用于在 第一导电型单晶硅线图案的两端,在第一导电型单晶硅线图案的未掺杂区域中形成用于施加反向偏置电压以使第一导电型单晶硅线型图案绝缘的第一电极 晶体硅线图案和第二导电型沟道,并且形成用于施加双面的第二电极 在第二导电型垫上的第二导电类型沟道上的电压。

    SEMICONDUCTOR NANOWIRE SENSOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    38.
    发明申请
    SEMICONDUCTOR NANOWIRE SENSOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    半导体纳米传感器器件及其制造方法

    公开(公告)号:US20100270530A1

    公开(公告)日:2010-10-28

    申请号:US12682571

    申请日:2008-07-24

    IPC分类号: H01L29/775 H01L21/336

    摘要: A method for manufacturing a biosensor device is provided. The method involves forming a silicon nanowire channel with a line width of several nanometers to several tens of nanometers using a typical photolithography process, and using the channel to manufacture a semiconductor nanowire sensor device. The method includes etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.

    摘要翻译: 提供一种制造生物传感器装置的方法。 该方法包括使用典型的光刻工艺形成线宽为几纳米至几十纳米的硅纳米线通道,并使用该通道制造半导体纳米线传感器装置。 该方法包括蚀刻作为绝缘体上硅(SOI)衬底的顶层的第一导电型单晶硅层,以形成第一导电型单晶硅线图案,掺杂第一导电型单晶硅线阵列的两个侧壁, 形成具有与第一导电类型相反的第二导电类型的杂质的单晶硅线图案,以形成第二导电型沟道,形成用于在第一导电型单晶的两端形成电极的第二导电型焊盘 硅线图案,在第一导电型单晶硅线图案的未掺杂区域中形成第一电极,用于施加反向偏置电压以使第一导电型单晶硅线图案和第二导电型 并且形成用于在第二导通型通道上施加偏置电压的第二电极 导电型垫。