公开(公告)号：US10887974B2

公开(公告)日：2021-01-05

申请号：US15187590

申请日：2016-06-20

Applicant: KLA-Tencor Corporation

Inventor： Matthew Derstine ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin

IPC: H05G2/00 ,  H05H1/24

Abstract: A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly. The multi-pass optical assembly includes one or more optical elements configured to perform a plurality of passes of the pumping beam through a portion of the gas to sustain a broadband-light-emitting plasma. The one or more optical elements are arranged to collect an unabsorbed portion of the pumping beam transmitted through the plasma and direct the collected unabsorbed portion of the pumping beam back into the portion of the gas.

公开(公告)号：US20200240928A1

公开(公告)日：2020-07-30

申请号：US16845681

申请日：2020-04-10

Applicant: KLA-Tencor Corporation

Inventor： Eugene Shifrin ,  Bjorn Brauer ,  Sumit Sen ,  Ashok Mathew ,  Sreeram Chandrasekaran ,  Lisheng Gao

IPC: G01N21/95 ,  H01L21/66 ,  G01N21/956

Abstract: Defects from a hot scan can be saved, such as on persistent storage, random access memory, or a split database. The persistent storage can be patch-based virtual inspector virtual analyzer (VIVA) or local storage. Repeater defect detection jobs can determined and the wafer can be inspected based on the repeater defect detection jobs. Repeater defects can be analyzed and corresponding defect records to the repeater defects can be read from the persistent storage. These results may be returned to the high level defect detection controller.

公开(公告)号：US10395358B2

公开(公告)日：2019-08-27

申请号：US15804980

申请日：2017-11-06

Applicant: KLA-Tencor Corporation

Inventor： Bjorn Brauer ,  Eugene Shifrin ,  Ashok Mathew ,  Chetana Bhaskar ,  Lisheng Gao ,  Santosh Bhattacharyya ,  Hucheng Lee ,  Benjamin Murray

IPC: G06T7/00 ,  G01N21/95

Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.

公开(公告)号：US20190115203A1

公开(公告)日：2019-04-18

申请号：US16231048

申请日：2018-12-21

Applicant: KLA-Tencor Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Panzer

IPC: H01J65/04

CPC classification number: H01J65/04 ,  H05G2/008

Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.

公开(公告)号：US20180144996A1

公开(公告)日：2018-05-24

申请号：US15813004

申请日：2017-11-14

Applicant: KLA-Tencor Corporation

Inventor： David Craig Oram ,  Abhinav Mathur ,  Kenong Wu ,  Eugene Shifrin

IPC: H01L21/66 ,  H01L21/67 ,  G01N21/88 ,  G01N21/95

CPC classification number: H01L22/12 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2021/8848 ,  G01N2021/8883 ,  H01L21/67288 ,  H01L22/20

Abstract: A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.

公开(公告)号：US20180130199A1

公开(公告)日：2018-05-10

申请号：US15804980

申请日：2017-11-06

Applicant: KLA-Tencor Corporation

Inventor： Bjorn Brauer ,  Eugene Shifrin ,  Ashok Mathew ,  Chetana Bhaskar ,  Lisheng Gao ,  Santosh Bhattacharyya ,  Hucheng Lee ,  Benjamin Murray

IPC: G06T7/00 ,  G01N21/95

CPC classification number: G06T7/0006 ,  G01N21/9501 ,  G01N2021/95676 ,  G05B19/41875 ,  G06T7/0004 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/10152 ,  G06T2207/20076 ,  G06T2207/20224 ,  G06T2207/30148

Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.

公开(公告)号：US09927094B2

公开(公告)日：2018-03-27

申请号：US13741566

申请日：2013-01-15

Applicant: KLA-Tencor Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Panzer ,  Matthew Derstine ,  Jincheng Wang ,  Anant Chimmalgi ,  Rajeev Patil ,  Rudolf Brunner

IPC: H01J65/04 ,  F21V9/06 ,  H01J61/52 ,  H01J61/12 ,  H01J61/14 ,  H01J61/16 ,  H01J61/20 ,  H01J61/34 ,  H01J61/35 ,  H01J61/40

CPC classification number: F21V9/06 ,  H01J61/125 ,  H01J61/14 ,  H01J61/16 ,  H01J61/20 ,  H01J61/34 ,  H01J61/35 ,  H01J61/40 ,  H01J61/523 ,  H01J65/04

Abstract: A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma, the plasma bulb being transparent to light from a pump laser, wherein the plasma bulb is transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma. The plasma bulb of the plasma cell is configured to filter short wavelength radiation, such as VUV radiation, emitted by the plasma sustained within the bulb in order to keep the short wavelength radiation from impinging on the interior surface of the bulb.

公开(公告)号：US09734422B2

公开(公告)日：2017-08-15

申请号：US14937409

申请日：2015-11-10

Applicant: KLA-Tencor Corporation

Inventor： Pavel Kolchin ,  Eugene Shifrin

IPC: G06K9/00 ,  G06K9/40 ,  G06K9/62 ,  G06T7/00 ,  G06T5/00

CPC classification number: G06K9/40 ,  G06K9/209 ,  G06K9/6202 ,  G06T5/002 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/20024 ,  G06T2207/30024 ,  G06T2207/30148

Abstract: Enhanced defect detection of a sample includes acquiring two or more inspection images from a sample from two or more locations of the sample for a first optical mode. The defect detection also generates an aggregated defect profile based on the two or more inspection images from the two or more locations for the first optical mode for a selected defect type and calculating one or more noise correlation characteristics of the two or more inspection images acquired from the two or more locations for the first optical mode. Defect detection further includes the generation of a matched filter for the first optical mode based on the generated aggregated defect profile and the calculated one or more noise correlation characteristics.

公开(公告)号：US09727047B2

公开(公告)日：2017-08-08

申请号：US14880187

申请日：2015-10-09

Applicant: KLA-Tencor Corporation

Inventor： Qing Luo ,  Kenong Wu ,  Hucheng Lee ,  Lisheng Gao ,  Eugene Shifrin ,  Yan Xiong ,  Shuo Sun

IPC: G05B19/401 ,  H01L21/66

CPC classification number: G05B19/401 ,  G05B2219/37365 ,  G05B2219/37571 ,  H01J2237/221 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20

Abstract: Systems and methods for detecting defects on a specimen based on structural information are provided. One system includes one or more computer subsystems configured for separating the output generated by a detector of an inspection subsystem in an array area on a specimen into at least first and second segments of the output based on characteristic(s) of structure(s) in the array area such that the output in different segments has been generated in different locations in the array area in which the structure(s) having different values of the characteristic(s) are formed. The computer subsystem(s) are also configured for detecting defects on the specimen by applying one or more defect detection methods to the output based on whether the output is in the first segment or the second segment.

公开(公告)号：US09709811B2

公开(公告)日：2017-07-18

申请号：US14459095

申请日：2014-08-13

Applicant: KLA-Tencor Corporation

Inventor： Anatoly Shchemelinin ,  Ilya Bezel ,  Matthew Panzer ,  Eugene Shifrin

IPC: G02B27/10

CPC classification number: G02B27/1006

Abstract: A system for separating plasma pumping light and collected broadband light includes a pump source configured to generate pumping illumination including at least a first wavelength, a gas containment element for containing a volume of gas, a collector configured to focus the pumping illumination from the pumping source into the volume of gas to generate a plasma within the volume of gas, wherein the plasma emits broadband radiation including at least a second wavelength and an illumination separation prism element positioned between a reflective surface of the collector and the pump source and arranged to spatially separate the pumping illumination including the first wavelength and the emitted broadband radiation including at least a second wavelength emitted from the plasma.