摘要:
In order to provide the method and the device for distance measurement by pulse radar that securely eliminates the false echo from the distance over the detectable limit determined by the pulse generation cycle, the pulse radar comprises the pulse signal sending unit that generates the pulse signals with different cycles at OSC 9a˜9c, switches to the predetermined intervals by OSC switch 10, and sends the pulse signal to targets, the reflected signal receiving unit that receives the reflected signals and stores the data in the RAM 25, the reflected signal data acquisition unit that obtains the data of each reflected signal, and the reflected signal identification unit that compares the intensity of the reflected signals obtained at the same lag time point during a certain time period after sending the pulse signal for reference and identifies the reflected signals of the sent pulse signal for reference.
摘要:
A method and apparatus for sensing by a linear image sensor a two-dimensional image of an object to be sensed includes detecting a position of the object by a position sensor having a first resolution, picking up an image of the object being projected in a direction (V-scan direction) generally perpendicular to an internal scan (H-scan) direction of the linear image sensor in synchronism with relative movement between the object and the linear image sensor, periodically switching a pixel size along the V-scan direction between a plurality of predefined pixel sizes during the relative movement between the object and the linear image sensor in accordance with information of the relative movement detected by the position sensor, and producing from an output of the linear image sensor a two-dimensional image of the projected image having a second resolution of the object to be sensed. The second resolution is a higher resolution than the first resolution.
摘要:
A method of inspecting a specimen, including: emitting a light from a lamp of a light source; illuminating a specimen on which plural patterns are formed with the light emitted from the light source and, passed through an objective lens; forming an optical image of the specimen by collecting light reflected from the specimen by the illuminating and passed through the objective lens and a image forming lens; detecting the optical image with a TDI image sensor; and processing a signal outputted from the TDI image sensor and detecting a defect of a pattern among the plural patterns formed on the specimen, wherein the image detected by the TDI image sensor is formed with light having a wavelength selected from the wavelengths of the light emitted from the light source.
摘要:
A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect which occurs on the pattern.
摘要:
A method of inspecting a sample in which the sample is inspected under a plurality of inspection conditions and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要:
The present invention relates to a method of manufacturing a multilayer ceramic capacitor, having the steps of: (a) alternately layering internal electrodes and ceramic green sheets containing a ceramic material having barium titanate to form a laminated body; (b) sintering the laminated body to obtain a sintered body; and (c) forming an external electrode on end faces of the sintered body to obtain a multilayer ceramic capacitor. The barium titanate has a diffraction line derived from (002) plane and a diffraction line derived from (200) plane in an X-ray diffraction chart. The ratio I(200)/Ib of peak intensity I(200) at 2θ(200) to diffraction intensity Ib at a midpoint angle between peak angle 2θ(002) of the diffraction line derived from the (002) plane and peak angle 2θ(200) of the diffraction line derived from the (200) plane is 2 to 10. The product r·Sa of mean particle size r (μm) of the barium titanate and specific surface area Sa (m2/g) is 1 to 2.
摘要翻译:本发明涉及一种制造多层陶瓷电容器的方法,具有以下步骤:(a)将包含具有钛酸钡的陶瓷材料的内部电极和陶瓷生坯交替层叠以形成层压体; (b)烧结层压体以获得烧结体; (c)在烧结体的端面上形成外部电极,得到多层陶瓷电容器。 在X射线衍射图中,钛酸钡具有衍生自(002)面的衍射线和衍生自(200)面的衍射线。 (2)(200) SUB>的峰强度I(200) SUB>的比值I(200)/ I B (002)面的衍射线的峰角2θ(002) SUB>与峰角2θ(200°)之间的中点角度处的衍射强度I 衍生自(200)面的衍射线的 SUB>为2〜10。钛酸钡的平均粒径r(母体)与比表面积Sa(m <2) SUP> / g)为1〜2。
摘要:
A method of inspecting a sample in which the sample is inspected under a plurality of inspection conditions and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要:
An aliphatic diisocyanate compound is prepared in a high yield by reacting dimethyl carbonate with an aliphatic diamine in the presence of an alkali catalyst to produce a corresponding urethane compound; and, within 48 hours after the completion of the preparation of the urethane compound, thermally decomposing the urethane compound under a reduced pressure of 1 to 700 Torr in a high-boiling-point solvent.
摘要:
An aliphatic diisocyante compound is prepared in a high yield by reacting dimethyl carbonate with an aliphatic diamine in the presence of an alkali catalyst to produce a corresponding urethene compound; and, within 48 hours after the completion of the preparation of the urethane compound, thermally decomposing the urethane compound under a reduced pressure of 1 to 700 Torr in a high-boiling-point solvent.
摘要:
The visual line estimating apparatus 200 comprises: an image inputting section 201 operable to take an image of a human; a visual line measurement section 202 operable to measure a direction of a visual line on the basis of the taken image; a visual line measuring result storing section 211 operable to store therein visual line measuring results previously measured; a representative value extracting section 212 operable to extract a previous representative value; and a visual line determining section 213 operable to judge whether or not a difference between the representative value and the visual line measuring result is lower than a predetermined threshold to determine a visual line estimating result from the representative value and the visual line measuring result.