公开(公告)号：US07923199B2

公开(公告)日：2011-04-12

申请号：US11337899

申请日：2006-01-24

申请人： Kenji Wada

发明人： Kenji Wada

IPC分类号： G03C5/00

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382

摘要： The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic acid, which are: a photosensitive composition comprising a compound having a proton acceptor functional group and producing a sulfonic acid group upon irradiation with actinic rays or radiation to reduce or lose the acceptor property or change the proton acceptor functional group to be acidic, or a compound capable of generating a specific organic acid upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; and a specific organic acid.

摘要翻译： 本发明提供了一种用于半导体（例如IC）的制造中的液晶，热敏头等电路基板的制造中的光敏性组合物，或者其他的光加工工序，使用该感光性组合物的图案形成方法， 和特定的有机酸，其是：包含具有质子受体官能团的化合物并在用光化射线或辐射照射时产生磺酸基以降低或失去受主性质或将质子受体官能团改变为 酸性或能够在用光化射线或辐射照射时能够产生特定有机酸的化合物; 使用该感光性组合物的图案形成方法; 和特定的有机酸。

公开(公告)号：US07709547B2

公开(公告)日：2010-05-04

申请号：US11602187

申请日：2006-11-21

申请人： Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

发明人： Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

IPC分类号： C08F2/50 ,  C08F2/46 ,  C08J3/28

CPC分类号： B41C1/1066 ,  C09D11/101 ,  C09D11/322

摘要： The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.

摘要翻译： 本发明提供油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版。 本发明的油墨组合物含有阳离子聚合性化合物，用辐射线照射时产生酸的化合物，以及在用放射线照射时产生具有碱性氮原子的有机酸化合物的鎓盐化合物。

公开(公告)号：US20100040975A1

公开(公告)日：2010-02-18

申请号：US12523232

申请日：2008-01-28

申请人： Kenji Wada

发明人： Kenji Wada

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0758 ,  G03F7/2041

摘要： A positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under action of an acid; and (C) a compound capable of decomposing under action of an acid to generate an acid.

摘要翻译： 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在酸的作用下在碱性显影剂中的溶解度增加的树脂; 和（C）能够在酸作用下分解以产生酸的化合物。

公开(公告)号：US20090250182A1

公开(公告)日：2009-10-08

申请号：US12084087

申请日：2006-10-23

申请人： Masaki Teramoto ,  Shinji Kobayashi ,  Kenji Wada

发明人： Masaki Teramoto ,  Shinji Kobayashi ,  Kenji Wada

IPC分类号： D21H23/04

CPC分类号： D21H17/53 ,  D21H21/06 ,  D21H23/04

摘要： A papermaking method according to this invention is carried out using a paper machine provided with a head box (3) including a cell-structure manifold (30). An aqueous solution (M) containing 0.03 to 0.4 wt % of viscous agent is added to a material pulp slurry (S), and the obtained mixed pulp slurry (MS) is introduced into the manifold (30).

摘要翻译： 根据本发明的造纸方法使用具有包括电池结构歧管（30）的头箱（3）的造纸机进行。 将含有0.03〜0.4重量％的粘性剂的水溶液（M）加入到浆料浆料（S）中，将得到的混合纸浆（MS）引入歧管30。

公开(公告)号：US07524609B2

公开(公告)日：2009-04-28

申请号：US11716054

申请日：2007-03-09

申请人： Kenji Wada

发明人： Kenji Wada

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C69/62 ,  C07C309/29

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/121 ,  Y10S430/122

摘要： A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: Z—A—X—B—R—(Y)n  (I) wherein Z represents an organic acid group; A represents a divalent linking group; X represents a divalent linking group having a hetero atom; B represents an oxygen atom or —N(Rx)—; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted with Y, and when B represents —N(Rx)—, R and Rx may be bonded to each other to form a cyclic structure; Y represents —COOH or —CHO, and when a plurality of Y's are present, the plurality of Y's may be the same or different; and n represents an integer of from 1 to 3.

摘要翻译： 一种光敏组合物，其包含（A）在用光化射线或辐射照射时能够产生由式（I）表示的有机酸的化合物：<？在线公式描述=“在线式”末端=“铅 “？”ZAXBR-（Y）n（I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z表示有机酸基团; A表示二价连接基团; X表示具有杂原子的二价连接基团; B表示氧原子或-N（Rx） - ; Rx表示氢原子或一价有机基团; R表示被Y取代的一价有机基团，当B表示-N（Rx） - 时，R和Rx可以彼此键合形成环状结构; Y表示-COOH或-CHO，当存在多个Y时，多个Y可以相同或不同; n表示1〜3的整数。

公开(公告)号：US07341817B2

公开(公告)日：2008-03-11

申请号：US10993094

申请日：2004-11-22

申请人： Kenji Wada ,  Kunihiko Kodama

发明人： Kenji Wada ,  Kunihiko Kodama

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： C07C381/12 ,  C07C309/39 ,  C07C309/42 ,  C07C323/66 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122

摘要： A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

摘要翻译： 一种光敏组合物，其包含能够在用光化射线或辐射照射时能够产生特定磺酸的化合物; 能够在用光化射线或辐射照射时能够产生特定磺酸的化合物; 以及使用光敏组合物的图案形成方法，其包含在用光化射线或辐射照射时能够产生特定磺酸的化合物。

公开(公告)号：US20070141828A1

公开(公告)日：2007-06-21

申请号：US11707022

申请日：2007-02-16

申请人： Tsuyoshi Shintate ,  Toshiaki Mikoshiba ,  Kenji Wada ,  Kazuaki Sakurada ,  Jun Yamada

发明人： Tsuyoshi Shintate ,  Toshiaki Mikoshiba ,  Kenji Wada ,  Kazuaki Sakurada ,  Jun Yamada

IPC分类号： H01L21/4763

CPC分类号： H05K3/4664 ,  H05K3/125 ,  H05K2203/013 ,  Y10S257/921

摘要： There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.

公开(公告)号：US20070115326A1

公开(公告)日：2007-05-24

申请号：US11602187

申请日：2006-11-21

申请人： Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

发明人： Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

IPC分类号： C08F2/50 ,  B41J2/14

CPC分类号： B41C1/1066 ,  C09D11/101 ,  C09D11/322

摘要： The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.

摘要翻译： 本发明提供油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版。 本发明的油墨组合物含有阳离子聚合性化合物，用辐射线照射时产生酸的化合物，以及在用放射线照射时产生具有碱性氮原子的有机酸化合物的鎓盐化合物。

公开(公告)号：US20060166135A1

公开(公告)日：2006-07-27

申请号：US11335679

申请日：2006-01-20

申请人： Kenji Wada

发明人： Kenji Wada

IPC分类号： G03C1/76

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0382

摘要： A photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the photosensitive composition, and a pattern forming method using the photosensitive composition, are provided, which are a photosensitive composition excellent in the sensitivity, resolution and pattern profile, assured of large exposure latitude and small pitch dependency, and improved in the sensitivity and dissolution contrast at the exposure with EUV light, a pattern forming method using the photosensitive composition, and a compound useful for the photosensitive composition.

摘要翻译： 用于半导体（例如IC）的制造中的光敏组合物，在液晶，热敏头等的电路基板的制造中或在其它光制造工艺中，用于感光组合物的化合物和图案 提供了使用感光性组合物的成膜方法，它们是灵敏度，分辨率和图案轮廓优异的感光组合物，确保了大的曝光宽容度和小的间距依赖性，并且在用EUV光曝光时提高了灵敏度和溶解度对比度， 使用该感光性组合物的图案形成方法和可用于感光性组合物的化合物。

公开(公告)号：US07074632B2

公开(公告)日：2006-07-11

申请号：US10759266

申请日：2004-01-20

申请人： Kenji Wada

发明人： Kenji Wada

IPC分类号： H01L21/00

CPC分类号： H01L27/14683 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/48 ,  H01L24/73 ,  H01L27/14618 ,  H01L27/1462 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14632 ,  H01L27/14636 ,  H01L27/14687 ,  H01L31/0203 ,  H01L31/18 ,  H01L33/382 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/00015 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01046 ,  H01L2924/01057 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/15153 ,  H01L2924/15165 ,  H01L2924/15312 ,  H01L2924/16195 ,  H01L2924/3025 ,  H01L2933/0016 ,  Y10S257/911 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/85399 ,  H01L2224/05599 ,  H01L2224/45015 ,  H01L2924/207

摘要： A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.