公开(公告)号：US5430304A

公开(公告)日：1995-07-04

申请号：US327810

申请日：1994-10-24

申请人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Yoshihisa Oae ,  Tomohiko Abe ,  Shunsuke Fueki

发明人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Yoshihisa Oae ,  Tomohiko Abe ,  Shunsuke Fueki

IPC分类号： H01L21/027 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/31776

摘要： A charged particle beam-exposure method in which a subject is exposed to a pattern via a charged particle beam having an on/off exposure characteristic. A blanking aperture array has n open/close devices which individually/correspond to respective scan positions of the charged particle beam and operate to control the on/off exposure characteristic of the charged particle beam. The method includes: (1) selectively designating bit positions of successive n-bit width data blocks of the pattern, each n-bit width data block stored within a row of the pattern; (2) successively reading each n-bit width data block; (3) forming successive rows of unit pattern data from the successively designated and read n-bit width data block, each successive row corresponding to a successively designated and read n-bit width data block; (4) storing the successive rows of unit pattern data to form unit pattern data in bit matrix form having m columns and n rows; and (5) sequentially supplying the successive rows of unit pattern data to the blanking aperture array to control the on/off exposure characteristic of the charged particle beam.

摘要翻译： 一种带电粒子束曝光方法，其中被摄体经由具有开/关曝光特性的带电粒子束曝光于图案。 消隐孔径阵列具有单独/对应于带电粒子束的相应扫描位置的n个打开/关闭装置，并且用于控制带电粒子束的开/关曝光特性。 该方法包括：（1）有选择地指定图案的连续n位宽度数据块的位位置，每个n位宽数据块存储在该行图案中; （2）连续读取每个n位宽数据块; （3）从连续指定和读取的n位宽度数据块形成连续的单位图形数据行，每个连续行对应于连续指定和读取的n位宽度数据块; （4）存储连续的单位图形数据行以形成具有m列和n行的位矩阵形式的单位图形数据; 并且（5）将连续行的单位图形数据顺序地提供给消隐孔径阵列，以控制带电粒子束的接通/断开曝光特性。

公开(公告)号：US5359202A

公开(公告)日：1994-10-25

申请号：US95424

申请日：1993-07-23

申请人： Hiroshi Yasuda ,  Yoshihisa Oae ,  Tomohiko Abe

发明人： Hiroshi Yasuda ,  Yoshihisa Oae ,  Tomohiko Abe

IPC分类号： G03F7/20 ,  H01J37/06 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/31774

摘要： An electron beam exposure apparatus is provided with an electron gun emitting an electron beam, a blanking aperture array including a plurality of two-dimensionally arranged blanking apertures for selectively deflecting the electron beam passing through the blanking apertures in a predetermined direction so as to shape the electron beam into a plurality of electron beams, a deflection device for regularly deflecting the electron beams passed through the blanking aperture array, and an electron beam controller for controlling the electron beams passed through the blanking aperture array so as to irradiate and expose an object surface. The electron gun has a needle shaped chip which comprises a pair of sloping surfaces which are faces, and a vertex portion connecting the sloping surfaces and forming an inverted V-shape at a tip end of the needle shaped chip when viewed in a direction in which the vertex portion extends.

摘要翻译： 电子束曝光装置设置有发射电子束的电子枪，包括多个二维布置的消隐孔的消隐孔阵列，用于在预定方向上选择性地偏转通过消隐孔的电子束，以使 电子束形成多个电子束，用于规则地偏转通过消隐孔阵列的电子束的偏转装置和用于控制通过消隐孔阵列的电子束以照射和暴露物体表面的电子束控制器 。 电子枪具有针状芯片，该针状芯片包括一对<100>倾斜表面，以及顶点部分，其连接倾斜表面并在针状芯片的尖端处形成倒V形 顶点部分延伸的方向。

公开(公告)号：US5260579A

公开(公告)日：1993-11-09

申请号：US851400

申请日：1992-03-13

申请人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Akio Yamada ,  Yoshihisa Oae ,  Junichi Kai ,  Shunsuke Fueki ,  Kenichi Kawashima

发明人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Akio Yamada ,  Yoshihisa Oae ,  Junichi Kai ,  Shunsuke Fueki ,  Kenichi Kawashima

IPC分类号： H01J37/09 ,  H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0435

摘要： A charged particle beam exposure system is directed to an exposure process of an electron beam for sequentially scanning an electron beam employing a blanking aperture array including a plurality of blanking apertures. The system facilitates re-focusing for compensation of focus error due to Coulumb effect and makes wiring the blanking aperture array easier. The system further allows exposure without an irradiation gap. The blanking aperture array 6 is formed with a plurality of said blanking apertures 62 arranged in a two-dimensional configuration. A control system 24 controls the blanking aperture array 62 to set the blanking aperture to the ON state where the charged particle beams pass through the blanking aperture and reach the object 19 to be exposed or the OFF state where the charged particle beams cannot reach the object 19 to be exposed. The other control system of the control means performs a control so that a plurality of said charged particle beams that have passed through different blanking apertures of said blanking aperture array overlaps and is irradiated a plurality of times onto the specified position or the peripheral position in the vicinity of the specified position of the object to be exposed to the charged particle beams.

公开(公告)号：US5215338A

公开(公告)日：1993-06-01

申请号：US800526

申请日：1991-12-02

申请人： Akira Kimura ,  Nobuo Kitao ,  Hiroshi Yasuda ,  Kiyoshi Isozaki ,  Hiroshi Nishimura ,  Yoshimasa Shimomura

发明人： Akira Kimura ,  Nobuo Kitao ,  Hiroshi Yasuda ,  Kiyoshi Isozaki ,  Hiroshi Nishimura ,  Yoshimasa Shimomura

CPC分类号： F16L3/015 ,  H02G3/0475 ,  Y10S285/921 ,  Y10T403/32565

摘要： A universally articulable supporting sheath comprises an interconnected series of links, each having a convex spherical surface at one end, and a concave spherical surface at its opposite end. The concave and convex surfaces mate with one another to form the sheath. Special links having branch openings may be provided. Various forms of waterproofing seals are provided, including O-rings, axially compressed rings, flexible belts, and ridges on the spherical surfaces. The links can be fitted together by thermal expansion. However, an axially split link is also described, which comprises two parts which snap together. The split parts may be molded as a unit with an integral thin wall hinge. The bending characteristics and bending radius of a sheath can be modified by insertion of spacers between the links at selected locations, or by the insertion of pins into radial holes provided in the links. Spacers with tongues may be used to prevent rotation of the links about the sheath axis, while allowing unidirectional articulation. Projections on one of a pair of mating spherical surfaces can be engaged with holes, slots or recesses of rectangular or other shapes to produce various limits on articulation and rotation. A single link may be provided with several alternatively usable holes, recesses and the like. The outer surface of a link can be provided with an axial extension engageable with a surface of an adjoining link to prevent back bending, or to prevent bending altogether.

摘要翻译： 普遍关节的支撑护套包括互连的连接系列，每个连杆在一端具有凸形球形表面，在其相对端具有凹形球形表面。 凹凸表面彼此配合形成护套。 可以提供具有分支开口的特殊连接。 提供各种形式的防水密封件，包括O形圈，轴向压缩环，柔性带和球形表面上的脊。 连杆可以通过热膨胀装配在一起。 然而，还描述了轴向分离连杆，其包括两个部件，它们卡在一起。 分开的部件可以被模制成具有整体薄壁铰链的单元。 护套的弯曲特性和弯曲半径可以通过在选定位置处的连杆之间插入间隔件，或者通过将销插入设置在连杆中的径向孔中来改变。 可以使用具有舌头的间隔器来防止链节围绕护套轴线的旋转，同时允许单向铰接。 一对配对球面之一上的突起可以与矩形或其它形状的孔，槽或凹槽接合，以产生铰接和旋转的各种限制。 单个链节可以设置有多个可选择的可用孔，凹槽等。 连杆的外表面可以设置有可与邻接连杆的表面接合的轴向延伸部，以防止背部弯曲，或者完全防止弯曲。

公开(公告)号：US4906540A

公开(公告)日：1990-03-06

申请号：US366534

申请日：1989-06-15

申请人： Naoto Hoshihara ,  Hiroshi Yasuda ,  Katsuhiro Takahashi

发明人： Naoto Hoshihara ,  Hiroshi Yasuda ,  Katsuhiro Takahashi

IPC分类号： H01M4/68 ,  H01M4/74 ,  H01M4/84

CPC分类号： H01M4/685 ,  H01M4/745 ,  H01M4/84

摘要： A paste type lead storage battery having a grid constituted by a grid base formed of a lead-calcium alloy and a layer of lead-antimony-stannum alloy roll-bonded integrally to the grid base on at least one side thereof. Preferably, the grid is formed by expanding a sheet of base material to which the alloy layer is integrally roll-bonded. Portions of the base and the alloy layer that serve as a active material support are both in contact with a paste-like active material, and antimony and stannum coexist in the alloy layer. The charge restoration after standing in a discharged state and the lifetime during cycles of charge and discharge including heavy discharge are thereby improved.

摘要翻译： 一种糊状铅蓄电池，其具有由铅 - 钙合金形成的栅格基体和在至少一侧与栅格基体一体地滚压的铅 - 锑 - 锡合金层构成的栅格。 优选地，通过使合金层一体地辊压粘合的基材片膨胀而形成格栅。 用作活性材料载体的基体和合金层的部分都与糊状活性材料接触，并且锑和锡在合金层中共存。 因此，放电状态下的充电恢复和包括重放电在内的充放电循环期间的寿命得到改善。

公开(公告)号：US4789786A

公开(公告)日：1988-12-06

申请号：US144275

申请日：1988-01-15

申请人： Hiroshi Yasuda ,  Ichiro Honjo

发明人： Hiroshi Yasuda ,  Ichiro Honjo

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2037 ,  H01J37/3175 ,  H01J2237/31779

摘要： A method for projecting a photelectron image includes providing a mask substrate, and selectively contacting a layer which lowers the work function of the mask substrate thereto. Photoelectrons are emitted from the contacted portion.

摘要翻译： 用于投影光电子图像的方法包括提供掩模基板，并且选择性地接触降低掩模基板的功函数的层。 光电子从被接触的部分发射。

公开(公告)号：US4735881A

公开(公告)日：1988-04-05

申请号：US883386

申请日：1986-07-08

申请人： Koichi Kobayashi ,  Hiroshi Yasuda

发明人： Koichi Kobayashi ,  Hiroshi Yasuda

IPC分类号： H01L21/027 ,  G03F7/20 ,  H01J37/302 ,  H01L21/00 ,  H01L21/30 ,  G03C5/00

CPC分类号： H01J37/3026 ,  G03F7/2059 ,  Y10S430/143

摘要： A method incorporated in a high throughput EB lithography suitable to the fabrication of VLSI semiconductor circuit. The method comprises a step of providing patterns which are delineated to join together with an overlap determined in accordance with the time interval between the respective delineations thereof by using an electron beam having a high current density and/or high energy. When a first and a second patterns having respective edge portions contacting with each other are delineated in the order of the first pattern and the second pattern by respective exposures thereof to corresponding at least single shots of an electron beam, at least one of the first and second patterns is extended in the direction perpendicular to the edge portions so that the patterns are provided with an overlap with the amount determined in accordance with the time interval between the respective shots of the electron beam to said edge portions.

摘要翻译： 一种并入适用于制造VLSI半导体电路的高通量EB光刻中的方法。 该方法包括以下步骤：通过使用具有高电流密度和/或高能量的电子束，提供被描绘成与根据其各自描绘之间的时间间隔确定的重叠的图案。 当具有彼此接触的相应边缘部分的第一和第二图案以第一图案和第二图案的顺序通过其相应的曝光被描绘到相应的至少单个电子束的照射时，第一和第二图案中的至少一个 第二图案在垂直于边缘部分的方向上延伸，使得图案设置有与根据电子束的各个镜头与所述边缘部分的各个镜头之间的时间间隔确定的量的重叠。

公开(公告)号：US4719491A

公开(公告)日：1988-01-12

申请号：US13425

申请日：1987-02-11

申请人： Eiichi Katoh ,  Hiroshi Yasuda

发明人： Eiichi Katoh ,  Hiroshi Yasuda

IPC分类号： G03G21/14 ,  G03G15/00 ,  G03G15/04 ,  G03G15/043 ,  G03G15/06 ,  G03G15/09 ,  H02K7/10

CPC分类号： G03G15/757 ,  G03G15/0935

摘要： A copier includes one motor for driving a photoconductive element unit, a developing unit, a fixing unit and other units, and another motor for driving an optical system. A clutch is interposed between the various units and the motor adapted to drive them. A device is provided for uncoupling the clutch for a predetermined period of time to interrupt the transmission of a drive force to the various units. The motor assigned to the units, clutch and drive force interrupting device are controlled such that the drive force interrupting device maintains the clutch uncoupled until the motor reaches a predetermined synchronous rotation speed after the start of rotation so as to interrupt the transmission of the drive force to the load, the clutch being coupled upon the lapse of the predetermined period of time to drive the load.

摘要翻译： 复印机包括用于驱动光电元件单元，显影单元，定影单元和其它单元的一个电动机和用于驱动光学系统的另一个电动机。 离合器插入在各个单元之间并且电动机适于驱动它们。 提供了一种用于使离合器分离预定时间段的装置，以中断向各种单元的驱动力的传递。 分配给单元的电动机，离合器和驱动力中断装置被控制，使得驱动力中断装置保持离合器分离直到电动机在旋转开始之后达到预定的同步转速，以便中断驱动力的传递 对于负载，离合器在经过预定时间段时被耦合以驱动负载。

公开(公告)号：US4687954A

公开(公告)日：1987-08-18

申请号：US708508

申请日：1985-03-05

申请人： Hiroshi Yasuda ,  Kiyofumi Ochii ,  Fujio Masuoka

发明人： Hiroshi Yasuda ,  Kiyofumi Ochii ,  Fujio Masuoka

IPC分类号： H03K3/3565 ,  H03K3/356

CPC分类号： H03K3/3565

摘要： A transistor circuit with hysteresis operation, which is formed with a detector part and selector part. The detector part detects a change in the level of an input signal according to one of first and second threshold levels, and generates an output signal having a level corresponding to the input signal. The level of the input signal is changed between a first level and a second level which is lower than the first level. The first and second threshold levels fall within a range defined between the first and second levels. The selector part selects one of the first and second threshold levels in accordance with the level of the output signal, and applies the selected one threshold level to the detector part.

摘要翻译： 具有迟滞操作的晶体管电路，其形成有检测器部​​分和选择器部分。 检测器部分根据第一和第二阈值电平之一检测输入信号电平的变化，并产生具有与输入信号对应的电平的输出信号。 输入信号的电平在低于第一电平的第一电平和第二电平之间改变。 第一和第二阈值水平落在第一和第二水平之间限定的范围内。 选择器部分根据输出信号的电平来选择第一和第二阈值电平中的一个，并将所选择的一个阈值电平施加到检测器部分。

公开(公告)号：US4586141A

公开(公告)日：1986-04-29

申请号：US536322

申请日：1983-09-27

申请人： Hiroshi Yasuda ,  Haruo Tsuchikawa ,  Junichi Kai ,  Koichi Kobayashi

发明人： Hiroshi Yasuda ,  Haruo Tsuchikawa ,  Junichi Kai ,  Koichi Kobayashi

IPC分类号： H01J37/305 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30 ,  G06F15/62

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01L21/30 ,  H01J2237/31764 ,  H01J2237/31776

摘要： An electron beam exposure system and method which varies beam size from pattern to pattern corresponding to the accuracy required for each pattern. In order to improve the throughput of the exposer, the beam size is adjusted to the maximum size useable for each pattern. The pattern is divided into rectangles equal to the maximum beam size determined by the pattern size or the accuracy required for the pattern. If a residual part of the pattern smaller than a rectangle remains, the rectangles are adjusted to be smaller than the maximum beam size, so the entire area of the pattern can be divided into equal size rectangles. The pitch and size of the beam are adjusted to this new beam size and exposure is repeated according to the new size rectangles. To increase the processing speed, all the patterns to be exposed in one process are checked as to their size and required accuracy, and the data necessary for the pattern generation such as beam size, pitch and number of exposures are calculated in advance and stored in a memory of a beam controller.

摘要翻译： 一种电子束曝光系统和方法，其根据每种图案所需的精度将光束尺寸从图案变化到图案。 为了提高曝光机的吞吐量，将光束尺寸调整到每个图案可用的最大尺寸。 该图案被分成等于由图案尺寸或图案所需精度确定的最大光束尺寸的矩形。 如果小于矩形的图案的剩余部分保留，则矩形被调整为小于最大光束尺寸，因此图案的整个区域可以被划分成相等尺寸的矩形。 光束的间距和尺寸被调整到这个新的光束尺寸，并且根据新的尺寸矩形重复曝光。 为了提高处理速度，将检查在一个处理中暴露的所有图案的尺寸和所需的精度，并且预先计算诸如光束尺寸，间距和曝光次数的图案生成所需的数据并存储在 光束控制器的存储器。